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    • 1. 发明专利
    • Nitriding treatment method
    • 硝化处理方法
    • JP2013082976A
    • 2013-05-09
    • JP2011224275
    • 2011-10-11
    • Toyota Gakuen学校法人トヨタ学園Gifu Prefecture岐阜県Feather Safety Razor Co Ltdフェザー安全剃刀株式会社
    • HARA TAMIOOSHIMA NOBUAKIYAMAGUCHI TAKASHIOGAWA HIROSHIGEHOSONO KOTAOTSU TAKASHIMURAI MASAAKIFUJIMURA KAZUKI
    • C23C8/36C23C8/38H01J37/077H05H1/24
    • PROBLEM TO BE SOLVED: To provide a nitriding treatment method capable of increasing hardness of a surface and improving durability while maintaining characteristics of toughness or the like that a nitriding treatment target object has.SOLUTION: The nitriding treatment method is used for performing nitriding treatment by irradiating a surface of a nitriding treatment target object 16 with nitrogen plasma and forming a thin diffusion layer of nitrogen atoms on the surface of the nitriding treatment target object 16. For instance, an electron beam is pulled out from argon plasma 21, nitrogen plasma 24 is generated from a nitrogen gas by the electron beam, the nitrogen atoms are diffused from the surface of the nitriding treatment target object 16 to the inside by the nitrogen plasma 24, and the diffusion layer of the nitrogen atoms having a thickness of 10 μm or less is formed. It is preferable that a temperature of the nitriding treatment is 350-600°C, and it is preferable that the time of the nitriding treatment is 1-8 hours. Also, it is preferable that a bias voltage to be applied to the nitriding treatment target object 16 is -50 to -5 V.
    • 待解决的问题:提供能够提高表面硬度并提高耐久性的氮化处理方法,同时保持氮化处理对象物具有的韧性等的特性。 解决方案:氮化处理方法用于通过用氮等离子体照射氮化处理对象物16的表面并在氮化处理对象物16的表面上形成薄的氮原子扩散层来进行氮化处理。对于 例如,从氩等离子体21中拉出电子束,通过电子束从氮气产生氮等离子体24,通过氮等离子体24将氮原子从氮化处理对象物16的表面扩散到内部 形成厚度为10μm以下的氮原子的扩散层。 氮化处理的温度优选为350〜600℃,优选氮化处理时间为1-8小时。 此外,优选施加于氮化处理对象物16的偏置电压为-50〜-5V。版权所有(C)2013,JPO&INPIT
    • 2. 发明专利
    • Film formation method and cutter material obtained by the film formation method
    • 电影形成方法获得的电影形成方法和切割材料
    • JP2013151587A
    • 2013-08-08
    • JP2012012264
    • 2012-01-24
    • Toyota Gakuen学校法人トヨタ学園Feather Safety Razor Co Ltdフェザー安全剃刀株式会社
    • HARA TAMIOMURAI MASAAKIFUJIMURA KAZUKI
    • C09K3/18A61B17/3211B05D3/04B05D5/00B26B9/00C23C16/513
    • PROBLEM TO BE SOLVED: To provide a film formation method that can form a film capable of giving excellent oil repellency and water repellency to a surface of a material by a simple method, and to provide a cutter material obtained by using the film formation method.SOLUTION: In the case of forming a fluorine containing film 24 on a surface of a material 23 such as surgical knives used for surgery, the fluorine containing film 24 is formed on the surface of the material 23 by generating an atmospheric pressure plasma jet 21 by using a raw material gas 17 containing a fluorine compound such as tetrafluoromethane, etc. using an atmospheric pressure plasma jet-generating device 11, and then by irradiating the surface of the material 23 with the atmospheric pressure plasma jet 21. An inert gas such as argon, etc. is contained in the raw material gas 17. It is preferred to hold the temperature of the material 23 at 100°C or below in the case of forming the fluorine containing film 24 on the surface of the material 23.
    • 要解决的问题:提供能够通过简单的方法形成能够赋予材料表面优异的拒油性和拒水性的膜的成膜方法,并提供通过使用成膜方法获得的切割材料。 解决方案:在用于手术的外科手术刀等材料23的表面上形成含氟膜24的情况下,通过利用大气压等离子体喷射器21,在材料23的表面上形成含氟膜24, 使用含有氟化合物如四氟甲烷等的原料气体17,使用大气压等离子体喷射发生装置11,然后用大气压等离子体射流21照射材料23的表面。惰性气体如 氩等被包含在原料气体17中。在形成含氟膜24的情况下,优选将材料23的温度保持在100℃以下 材料表面23。
    • 3. 发明专利
    • Edge surface layer reforming method of cutter or the like
    • 切片或边缘的边缘表面层重新形成方法
    • JPS61106767A
    • 1986-05-24
    • JP22718984
    • 1984-10-29
    • Agency Of Ind Science & TechnolFeather Safety Razor Co Ltd
    • SATO MAMORUFUJIMOTO FUMINORIISHIDA MINORUMURAI MASAAKI
    • C23C14/24B23B27/14B26B9/00B26B13/00B26B21/58C23C14/22C23C14/48
    • C23C14/48
    • PURPOSE:To generate a thin film having a strong adhering property against an edge base material, to reform an edge surface layer, and to improve a mechanical property by performing a vacuum vapor-deposition processing the an edge of a cutter, and performing an ion implantation processing. CONSTITUTION:In a vacuum, a cutter W made of stainless steel, etc. is placed on a mask 1 and a negative voltage is applied, a vapor-depositing matter of Cr, etc. is evaporated toward said cutter from a vapor deposition source 2, and also anion such as an N ion, etc. is accelerated and irradiated from an ion source 3. By said ion, a thick reformed layer is generated by forming a mixing phase consisting of a base material atom of an edge of the cutter W, a vapor-depositing atom and the ion, and a vapor-deposited thin film whose adhering property is very strong against the edge base material is formed. In this way, an edge surface layer of said cutter W is reformed and the mechanical property can be improved.
    • 目的:为了生成对边缘基材具有强粘合性的薄膜,通过对切割器的边缘进行真空蒸镀处理,进行离子交换,从而改善边缘表面层,提高机械性能 植入处理。 构成:在真空中,将由不锈钢等制成的切割器W放置在掩模1上并施加负电压,Cr等的蒸气沉积物质从气相沉积源2向所述切割器蒸发 ,还可以从离子源3照射离子源3等阴离子。通过所述离子,通过形成由切割器W的边缘的基材原子构成的混合相而产生厚的重整层 ,气相沉积原子和离子,以及对边缘基材具有非常强的粘附性的气相沉积薄膜。 以这种方式,将所述切割器W的边缘表面层重新形成,并且可以提高机械特性。