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JP2013082976A Nitriding treatment method 有权
标题翻译：硝化处理方法
公开(公告)号：JP2013082976A
公开(公告)日：2013-05-09
申请号：JP2011224275
申请日：2011-10-11
申请人： Toyota Gakuen , 学校法人トヨタ学園 , Gifu Prefecture , 岐阜県 , Feather Safety Razor Co Ltd , フェザー安全剃刀株式会社
发明人： HARA TAMIO , OSHIMA NOBUAKI , YAMAGUCHI TAKASHI , OGAWA HIROSHIGE , HOSONO KOTA , OTSU TAKASHI , MURAI MASAAKI , FUJIMURA KAZUKI
IPC分类号： C23C8/36 , C23C8/38 , H01J37/077 , H05H1/24
摘要： PROBLEM TO BE SOLVED: To provide a nitriding treatment method capable of increasing hardness of a surface and improving durability while maintaining characteristics of toughness or the like that a nitriding treatment target object has.SOLUTION: The nitriding treatment method is used for performing nitriding treatment by irradiating a surface of a nitriding treatment target object 16 with nitrogen plasma and forming a thin diffusion layer of nitrogen atoms on the surface of the nitriding treatment target object 16. For instance, an electron beam is pulled out from argon plasma 21, nitrogen plasma 24 is generated from a nitrogen gas by the electron beam, the nitrogen atoms are diffused from the surface of the nitriding treatment target object 16 to the inside by the nitrogen plasma 24, and the diffusion layer of the nitrogen atoms having a thickness of 10 μm or less is formed. It is preferable that a temperature of the nitriding treatment is 350-600°C, and it is preferable that the time of the nitriding treatment is 1-8 hours. Also, it is preferable that a bias voltage to be applied to the nitriding treatment target object 16 is -50 to -5 V.
摘要翻译：待解决的问题：提供能够提高表面硬度并提高耐久性的氮化处理方法，同时保持氮化处理对象物具有的韧性等的特性。解决方案：氮化处理方法用于通过用氮等离子体照射氮化处理对象物16的表面并在氮化处理对象物16的表面上形成薄的氮原子扩散层来进行氮化处理。对于例如，从氩等离子体21中拉出电子束，通过电子束从氮气产生氮等离子体24，通过氮等离子体24将氮原子从氮化处理对象物16的表面扩散到内部形成厚度为10μm以下的氮原子的扩散层。氮化处理的温度优选为350〜600℃，优选氮化处理时间为1-8小时。此外，优选施加于氮化处理对象物16的偏置电压为-50〜-5V。版权所有（C）2013，JPO＆INPIT

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