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1. 发明专利

JP2013082976A Nitriding treatment method 有权
标题翻译：硝化处理方法
公开(公告)号：JP2013082976A
公开(公告)日：2013-05-09
申请号：JP2011224275
申请日：2011-10-11
申请人： Toyota Gakuen , 学校法人トヨタ学園 , Gifu Prefecture , 岐阜県 , Feather Safety Razor Co Ltd , フェザー安全剃刀株式会社
发明人： HARA TAMIO , OSHIMA NOBUAKI , YAMAGUCHI TAKASHI , OGAWA HIROSHIGE , HOSONO KOTA , OTSU TAKASHI , MURAI MASAAKI , FUJIMURA KAZUKI
IPC分类号： C23C8/36 , C23C8/38 , H01J37/077 , H05H1/24
摘要： PROBLEM TO BE SOLVED: To provide a nitriding treatment method capable of increasing hardness of a surface and improving durability while maintaining characteristics of toughness or the like that a nitriding treatment target object has.SOLUTION: The nitriding treatment method is used for performing nitriding treatment by irradiating a surface of a nitriding treatment target object 16 with nitrogen plasma and forming a thin diffusion layer of nitrogen atoms on the surface of the nitriding treatment target object 16. For instance, an electron beam is pulled out from argon plasma 21, nitrogen plasma 24 is generated from a nitrogen gas by the electron beam, the nitrogen atoms are diffused from the surface of the nitriding treatment target object 16 to the inside by the nitrogen plasma 24, and the diffusion layer of the nitrogen atoms having a thickness of 10 μm or less is formed. It is preferable that a temperature of the nitriding treatment is 350-600°C, and it is preferable that the time of the nitriding treatment is 1-8 hours. Also, it is preferable that a bias voltage to be applied to the nitriding treatment target object 16 is -50 to -5 V.
摘要翻译：待解决的问题：提供能够提高表面硬度并提高耐久性的氮化处理方法，同时保持氮化处理对象物具有的韧性等的特性。解决方案：氮化处理方法用于通过用氮等离子体照射氮化处理对象物16的表面并在氮化处理对象物16的表面上形成薄的氮原子扩散层来进行氮化处理。对于例如，从氩等离子体21中拉出电子束，通过电子束从氮气产生氮等离子体24，通过氮等离子体24将氮原子从氮化处理对象物16的表面扩散到内部形成厚度为10μm以下的氮原子的扩散层。氮化处理的温度优选为350〜600℃，优选氮化处理时间为1-8小时。此外，优选施加于氮化处理对象物16的偏置电压为-50〜-5V。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2013151587A Film formation method and cutter material obtained by the film formation method 有权
标题翻译：电影形成方法获得的电影形成方法和切割材料
公开(公告)号：JP2013151587A
公开(公告)日：2013-08-08
申请号：JP2012012264
申请日：2012-01-24
申请人： Toyota Gakuen , 学校法人トヨタ学園 , Feather Safety Razor Co Ltd , フェザー安全剃刀株式会社
发明人： HARA TAMIO , MURAI MASAAKI , FUJIMURA KAZUKI
IPC分类号： C09K3/18 , A61B17/3211 , B05D3/04 , B05D5/00 , B26B9/00 , C23C16/513
摘要： PROBLEM TO BE SOLVED: To provide a film formation method that can form a film capable of giving excellent oil repellency and water repellency to a surface of a material by a simple method, and to provide a cutter material obtained by using the film formation method.SOLUTION: In the case of forming a fluorine containing film 24 on a surface of a material 23 such as surgical knives used for surgery, the fluorine containing film 24 is formed on the surface of the material 23 by generating an atmospheric pressure plasma jet 21 by using a raw material gas 17 containing a fluorine compound such as tetrafluoromethane, etc. using an atmospheric pressure plasma jet-generating device 11, and then by irradiating the surface of the material 23 with the atmospheric pressure plasma jet 21. An inert gas such as argon, etc. is contained in the raw material gas 17. It is preferred to hold the temperature of the material 23 at 100°C or below in the case of forming the fluorine containing film 24 on the surface of the material 23.
摘要翻译：要解决的问题：提供能够通过简单的方法形成能够赋予材料表面优异的拒油性和拒水性的膜的成膜方法，并提供通过使用成膜方法获得的切割材料。解决方案：在用于手术的外科手术刀等材料23的表面上形成含氟膜24的情况下，通过利用大气压等离子体喷射器21，在材料23的表面上形成含氟膜24，使用含有氟化合物如四氟甲烷等的原料气体17，使用大气压等离子体喷射发生装置11，然后用大气压等离子体射流21照射材料23的表面。惰性气体如氩等被包含在原料气体17中。在形成含氟膜24的情况下，优选将材料23的温度保持在100℃以下材料表面23。

3. 发明专利

JP2010132469A Method and apparatus for producing nitrogen compound 有权
标题翻译：用于生产氮化合物的方法和装置
公开(公告)号：JP2010132469A
公开(公告)日：2010-06-17
申请号：JP2008307549
申请日：2008-12-02
申请人： Nippon Plasmatreat Kk , Toyota Gakuen , 学校法人トヨタ学園 , 日本プラズマトリート株式会社
发明人： HARA TAMIO , KUBOTA YUSUKE , KOGA KAZUTAKA
IPC分类号： C01C1/04 , C01B21/22 , C01B21/32 , C01B21/34 , C01B21/36 , C01B21/38 , C01B21/50
摘要： PROBLEM TO BE SOLVED: To provide a method and an apparatus for producing a nitrogen compound where the nitrogen compound is produced without a high temperature and high pressure environment and a metal complex.
SOLUTION: In the method for producing the nitrogen compound from nitrogen and a raw material substance except nitrogen, it is characterized in that the nitrogen compound is produced by generating the plasma of a gas containing nitrogen and the raw material substance. When hydrogen is used as the raw material substance, ammonia is produced as the nitrogen compound. When oxygen is used as the raw material substance, NOx is produced as the nitrogen compound.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：待解决的问题：提供一种制备氮化合物的方法和装置，其中氮化合物在没有高温高压环境下生产，而金属络合物。解决方案：在氮气和除氮以外的原料物质的氮化合物的制造方法中，其特征在于，通过产生含氮气体和原料物质的等离子体来制造氮化合物。当使用氢作为原料物质时，产生氨作为氮化合物。当使用氧作为原料物质时，产生氮作为氮化合物。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2009202087A Nitridation method 有权
标题翻译：硝化方法
公开(公告)号：JP2009202087A
公开(公告)日：2009-09-10
申请号：JP2008046171
申请日：2008-02-27
申请人： Nippon Plasmatreat Kk , Toyota Gakuen , 学校法人トヨタ学園 , 日本プラズマトリート株式会社
发明人： HARA TAMIO , ICHIKI RYUSUKE , KUBOTA YUSUKE , IKEZAWA SHUNJIRO , SHANKAR PARAJULEE , TSURUMOTO YASUHIKO
IPC分类号： B01J27/24 , B01J19/08 , B01J35/02 , B01J37/34
摘要： PROBLEM TO BE SOLVED: To provide a nitridation method (a method for nitriding a material) having low environmental loads and high efficiency. SOLUTION: The nitridation method comprises a step of irradiating a material (a glass substrate 30 having a TiO 2 film 32 on the surface thereof) with an atmospheric-pressure plasma jet 2 generated by using a gaseous raw material 40 containing nitrogen at the least. Nitrogen molecules are not only ionized but also efficiently dissociated to produce nitrogen atoms of high concentration by a high-voltage pulse discharge inside the atmospheric-pressure plasma jet 2. When the surface of the material is irradiated with the atmospheric-pressure plasma jet 2 generated by using the gaseous raw material 40 (even air can be used) containing nitrogen at the least, the surface of the material is nitrided in a short period of time by nitrogen atoms of high concentration contained in a plasma flame. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供具有低环境负荷和高效率的氮化方法（氮化材料的方法）。解决方案：氮化方法包括用大气压等离子体射流2照射材料（其表面上具有TiO 2 SB 膜32的玻璃基板30）的步骤，其通过使用至少含氮的气态原料40。氮分子不仅被电离，而且通过在大气压等离子体射流2内部的高压脉冲放电，有效地解离以产生高浓度的氮原子。当材料的表面被产生的大气压等离子体射流2照射时通过使用至少含有氮的气态原料40（均匀的空气），材料的表面在等离子体火焰中包含的高浓度的氮原子在短时间内被氮化。版权所有（C）2009，JPO＆INPIT

5. 发明专利

JP2010040417A Electron beam generating device 有权
标题翻译：电子束生成装置
公开(公告)号：JP2010040417A
公开(公告)日：2010-02-18
申请号：JP2008204159
申请日：2008-08-07
申请人： Toyota Gakuen , Toyota Motor Corp , トヨタ自動車株式会社 , 学校法人トヨタ学園
发明人： HARA TAMIO , ICHIKI RYUSUKE
IPC分类号： H05H1/24 , C23C8/38
摘要： PROBLEM TO BE SOLVED: To reduce a heat load of a porous plate-made electrode by devising a shape of the porous plate-made electrode to achieve the high densification of electron beam excited plasma and service life prolongation of the electrode. SOLUTION: In the electron beam generating device 5, the outer shape of each electrode part 10 held at an electrode holding part of a cooling chamber, shows a rectangular shape. The electrode part 10 includes a porous discharge anode 15, a porous accelerating electrode 16, a first insulating plate 17, a second insulating plate 18, a lead wire 19, and a frame-like metal plate 20. The first insulating plate 17 and the second insulating plate 18 are constituted of a heat-conductive electric insulating material, having a thermal conductivity of 5W/(m×K) or higher. The heat load of the porous discharge anode 15 and the porous accelerating electrode 16 can be reduced, and efficient cooling of the center part of a first center porous part 151 of the porous discharge anode 15, that particularly becomes high temperature. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了通过设计多孔板状电极的形状来减少多孔板状电极的热负荷，以实现电子束激发等离子体的高致密化和电极的使用寿命延长。解决方案：在电子束产生装置5中，保持在冷却室的电极保持部分的每个电极部分10的外形呈矩形。电极部分10包括多孔放电阳极15，多孔加速电极16，第一绝缘板17，第二绝缘板18，引线19和框架状金属板20.第一绝缘板17和第二绝缘板18由热传导率为5W /（m×K）以上的导热电绝缘材料构成。可以减少多孔放电阳极15和多孔促进电极16的热负荷，并且有效地冷却多孔放电阳极15的第一中心多孔部分151的中心部分，特别是变成高温。版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2010196129A Method of manufacturing steel material 有权
标题翻译：制造钢材的方法
公开(公告)号：JP2010196129A
公开(公告)日：2010-09-09
申请号：JP2009043784
申请日：2009-02-26
申请人： Toyota Gakuen , Toyota Motor Corp , トヨタ自動車株式会社 , 学校法人トヨタ学園
发明人： MIYAMOTO NORITAKA , ICHIKI RYUSUKE , YOSHIDA MASASHI , HARA TAMIO , OKUMIYA MASAHIRO , TSUNEKAWA YOSHIKI
IPC分类号： C23C8/38 , C21D1/06
摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing steel material which permits inexpensive treatment without a severe temperature control for steel material, improves mechanical strength and, at the same time, hardly brings about the deterioration of toughness. SOLUTION: Nitriding gas is turned into plasma by introducing electron beams which are drawn from discharge plasma and are accelerated into the environment of the nitriding gas, and a low-carbon steel material is caused to be brought into contact with the nitriding gas which is turned into the plasma to perform the solid solution of nitrogen atoms of the nitriding gas from the surface into the internal part of the low-carbon steel material. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：待解决的问题：为了提供一种钢材的制造方法，其在不对钢材进行严格的温度控制的情况下便于处理，提高机械强度，并且同时几乎不会导致韧性的劣化。解决方案：通过引入从放电等离子体中吸收的电子束并将其加速到氮化气体的环境中，使氮化气变成等离子体，使低碳钢材料与氮化气接触将其变成等离子体，以将表面的氮化气体的氮原子的固溶体进入低碳钢材料的内部。版权所有（C）2010，JPO＆INPIT

7. 发明专利

JP2008130503A Atmospheric pressure plasma jet apparatus 有权
标题翻译：大气压力等离子喷射装置
公开(公告)号：JP2008130503A
公开(公告)日：2008-06-05
申请号：JP2006317241
申请日：2006-11-24
申请人： Nippon Plasmatreat Kk , Toyota Gakuen , 学校法人トヨタ学園 , 日本プラズマトリート株式会社
发明人： HARA TAMIO , TAKEMURA YUICHIRO , TSURUMOTO YASUHIKO
IPC分类号： H05H1/24
摘要： PROBLEM TO BE SOLVED: To provide an atmospheric pressure plasma jet apparatus capable of lengthening the plasma plume that can efficiently reform the surface irrespective of the surface shape of the material.
SOLUTION: An atmospheric pressure plasma jet generating means 3 generates an atmospheric pressure plasma jet 25, by using a raw material gas composed of a single kind of gas, or two or more kinds of gases that hardly react with one another in a plasma. The upper part 31 and the lower part 33 of a processing chamber as inclusion preventing means prevents an ambient gas from being included into the atmospheric pressure plasma get 25.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供能够延长能够有效地改变表面的等离子体羽流的大气压等离子体喷射装置，而与材料的表面形状无关。解决方案：大气压等离子体射流产生装置3通过使用由单种气体构成的原料气体或两种或更多种在几乎不发生反应的气体中产生大气压等离子体射流25 等离子体。作为包含防止装置的处理室的上部31和下部33防止环境气体被包含在大气压等离子体中。25.版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2004190055A Aluminum surface nitriding method 审中-公开
公开(公告)号：JP2004190055A
公开(公告)日：2004-07-08
申请号：JP2002356168
申请日：2002-12-09
申请人： Kawasaki Heavy Ind Ltd , Toyota Gakuen , Toyota Motor Corp , トヨタ自動車株式会社 , 学校法人トヨタ学園 , 川崎重工業株式会社
发明人： TSUNEKAWA YOSHIKI , HARA TAMIO , SHOYAMA HIROAKI , BABA AKIHIRO , YANO HITOSHI , KAJIKAWA YOSHIAKI , KASA YOSHITOKU , SUEMITSU TAKESHI , MORI TAKASHI
IPC分类号： C23C8/36 , C23C8/02 , C23C14/00 , C23C14/06 , C23C14/34
摘要： PROBLEM TO BE SOLVED: To provide an aluminum nitriding method for removing an oxide film on a surface of a base aluminum member and depositing a thick aluminum nitride layer by using nitrogen plasma with high concentration.
SOLUTION: An aluminum containing metal 5 is set on a sample stand 34 in a reaction chamber by using an electron beam excitation plasma (EBEP) apparatus to generate plasma in the reaction chamber 3 by electron beams of low voltage and large current, the reaction chamber is evacuated, hydrogen gas is introduced therein, and hydrogen plasma is generated by accelerated electron beams to clean a surface of the metal. Next, substitution is performed to reaction gas containing nitrogen gas to generate reaction plasma by accelerated electron beams. A nitrided aluminum film is deposited on the surface of the metal by generating nitriding reaction while performing sputtering by applying the bias voltage to the metal.
COPYRIGHT: (C)2004,JPO&NCIPI

9. 发明专利

JP2009018260A Method apparatus for cleaning by plasma exited gas 审中-公开
标题翻译：等离子体气体清洗方法装置
公开(公告)号：JP2009018260A
公开(公告)日：2009-01-29
申请号：JP2007183331
申请日：2007-07-12
申请人： Nisshin Kiko Kk , Toyota Gakuen , Toyota Motor Corp , トヨタ自動車株式会社 , 学校法人トヨタ学園 , 日進機工株式会社
发明人： ODA HIROMITSU , IIDA KEIICHI , MOROTO TAKAYUKI , HARA TAMIO
IPC分类号： B08B7/00 , H05H1/24
CPC分类号： H05H1/341 , B08B7/0035
摘要： PROBLEM TO BE SOLVED: To improve cleaning efficiency for a surface to be cleaned regardless of presence or not of a recessed place. SOLUTION: The surface to be cleaned 11a is cleaned by irradiating the surface to be cleaned 11a with a plasma exited gas P/G from a plasma irradiating nozzle 2 of a plasma radiator 1 constituting an apparatus for cleaning by a plasma exited gas. The plasma irradiating nozzle 2 is provided with a gas jetting nozzle 3 having a jetting opening 3a so installed as to surround its periphery. Nitrogen gas N/G is jetted through the jetting opening 3a of the gas jetting nozzle 3 when the plasma exited gas P/G is emitted from the plasma jetting nozzle 2. Thereby, the surface to be cleaned 11a is irradiated with the plasma exited gas P/G while the periphery of the emitted plasma exited gas P/G is surrounded with a gas curtain G/C. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提高待清洁的表面的清洁效率，无论是否存在凹陷的地方。解决方案：通过等离子体排出气体P / G从等离子体辐射器1的等离子体照射喷嘴2照射构成用于通过等离子体释放气体清洁的装置的待清洁的表面11a进行清洁。等离子体照射喷嘴2设置有喷射喷嘴3，喷射喷嘴3具有围绕其周边安装的喷射开口3a。当等离子体排出气体P / G从等离子体喷射喷嘴2发射时，氮气N / G通过气体喷射喷嘴3的喷射口3a喷射。由此，待清洁的表面11a被等离子体排出的气体 P / G，而发射的等离子体气体P / G的周边被气帘G / C包围。版权所有（C）2009，JPO＆INPIT

10. 发明专利

JP2005177548A Production method for visible light response type photocatalyst body 审中-公开
标题翻译：可见光反应型光催化体的生产方法
公开(公告)号：JP2005177548A
公开(公告)日：2005-07-07
申请号：JP2003418243
申请日：2003-12-16
申请人： Toyota Gakuen , Toyota Motor Corp , トヨタ自動車株式会社 , 学校法人トヨタ学園
发明人： HARA TAMIO , SHOYAMA HIROAKI , HISHIDA RIYUUMO
IPC分类号： B01J35/02 , B01J37/34 , C23C14/08 , C23C14/58
摘要： PROBLEM TO BE SOLVED: To provide a production method for a visible light response type photocatalyst body reforming a UV ray response type titanium oxide photocatalyst film formed on a surface of a substrate to the visible light response type photocatalyst film without raising the temperature of the substrate to 250°C or higher.
SOLUTION: In the production method for the visible light response type photocatalyst body, a skin layer part of the titanium oxide photocatalyst film is reformed to the visible light response type photocatalyst by nitriding-treating the titanium oxide photocatalyst film formed on the surface of the substrate in a plasma containing a nitrogen atom produced by dissociating, electro-dissociating and exciting the gas containing at least nitrogen.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：解决问题的方案：提供一种可见光反应型光催化剂体的制造方法，其将形成在基材表面上的紫外线响应型氧化钛光催化剂膜重整成可见光响应型光催化剂膜而不升高温度的基板至250℃以上。解决方案：在可见光反应型光催化剂体的制造方法中，通过对形成在该表面上的氧化钛光催化剂膜进行氮化处理，将氧化钛光催化剂膜的表层部分重整成可见光反应型光催化剂含有通过解离，电解和激发至少含有氮的气体而产生的氮原子的等离子体中的底物。版权所有（C）2005，JPO＆NCIPI

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