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1. 发明授权

US4675265A Electrophotographic light-sensitive element with amorphous C overlayer 失效
标题翻译：具有无定形C覆盖层的电子照相光敏元件
公开(公告)号：US4675265A
公开(公告)日：1987-06-23
申请号：US844003
申请日：1986-03-25
申请人： Toyoki Kazama , Koichi Aizawa , Kiyoto Yamaguchi , Kenichi Hara , Toshiyuki Iijima
发明人： Toyoki Kazama , Koichi Aizawa , Kiyoto Yamaguchi , Kenichi Hara , Toshiyuki Iijima
IPC分类号： G03G5/082 , G03G5/14
CPC分类号： G03G5/08214
摘要： Electrophotographic light-sensitive elements according to the invention comprise(a) a conductive support;(b) a photoconductive layer; and(c) a surface protective layer.The conductive support is formed in a sheet-like or cylindrical shape from any suitable conductive material, and acts as an electrode of the light-sensitive element as well as acting as a physical support. The photoconductive layer comprises amorphous hydrogenated silicon having a high absorption efficiency and photoconductivity. The a--Si:H of a photoconductive layer may contain other elements such as fluorine, carbon, nitrogen and germanium, and may be doped with elements belonging to groups III and V of the periodic table. The surface protective layer is the outermost layer of an electrophotographic light-sensitive element according to the invention, and imparts resistance to environmental conditions. The surface protective layer comprises hydrogenated amorphous carbon, and may additionally contain silicon, nitrogen, oxygen or fluorine. The percentage of hydrogen can vary from 1 to 60 mole percent depending upon the conditions under which the surface layer is formed. Preferably, hydrogen is between 10 and 40 mole percent.
摘要翻译：根据本发明的电子照相感光元件包括（a）导电支撑体; （b）光电导层; 和（c）表面保护层。导电支撑件由任何合适的导电材料形成为片状或圆柱形，并且用作光敏元件的电极以及用作物理支撑件。光电导层包括具有高吸收效率和光电导性的无定形氢化硅。光电导层的a-Si：H可以含有其它元素如氟，碳，氮和锗，并且可以掺杂属于元素周期表的III和Ⅴ族的元素。表面保护层是根据本发明的电子照相感光元件的最外层，并赋予对环境条件的抵抗力。表面保护层包括氢化无定形碳，并且可另外含有硅，氮，氧或氟。取决于形成表面层的条件，氢的百分比可以在1至60摩尔％之间变化。优选地，氢在10至40摩尔％之间。

2. 发明授权

US4770966A Electrophotographic photosensitive material comprising amorphous carbon protective layer containing hydrogen and fluorine 失效
标题翻译：包含含有氢和氟的无定形碳保护层的电子照相感光材料
公开(公告)号：US4770966A
公开(公告)日：1988-09-13
申请号：US24822
申请日：1987-03-12
申请人： Toyoki Kazama , Koichi Aizawa , Kenichi Hara , Toshiyuki Iijima , Yukio Takano
发明人： Toyoki Kazama , Koichi Aizawa , Kenichi Hara , Toshiyuki Iijima , Yukio Takano
IPC分类号： H01L31/08 , G03G5/043 , G03G5/08 , G03G5/082 , G03G5/14
CPC分类号： G03G5/08235 , G03G5/0433 , G03G5/08285
摘要： A photosensitive material comprising a photosensitive layer composed of an amorphous silicon-based material formed on an electrically conductive support, and a surface layer formed on said photosensitive layer, the surface layer being composed of amorphous carbon containing hydrogen and fluorine has improved printing durability and humidity resistance.
摘要翻译：包含形成在导电性支持体上的由非晶硅系材料构成的感光层和形成在感光层上的表面层的感光材料，表面层由含有氢和氟的无定形碳组成，具有改善的印刷耐久性和湿度抵抗性。

3. 发明授权

US4833055A Electrophotographic photoreceptor comprising amorphous silicon and amorphous carbon buffer layer 失效
标题翻译：包含非晶硅和无定形碳缓冲层的电子照相感光体
公开(公告)号：US4833055A
公开(公告)日：1989-05-23
申请号：US058245
申请日：1987-06-04
申请人： Toyoki Kazama , Koichi Aizawa , Kenichi Hara , Toshiyuki Iijima , Yukio Takano
发明人： Toyoki Kazama , Koichi Aizawa , Kenichi Hara , Toshiyuki Iijima , Yukio Takano
IPC分类号： G03G5/08 , G03G5/082 , G03G5/14
CPC分类号： G03G5/08285 , G03G5/08221
摘要： An electrophotographic photoreceptor comprises a conductive base, a photoconductive layer formed of amophous silicon on the conductive base, a buffer layer on the photoconductive layer, and a surface layer covering the photoconductive layer through the buffer layer, wherein the buffer layer is formed of amorphous carbon.
摘要翻译：电子照相感光体包括导电性基体，导电性基底上的氨基硅形成的光电导层，光电导层上的缓冲层，以及通过缓冲层覆盖光电导层的表面层，其中缓冲层由无定形碳形成。

4. 发明授权

US06720121B2 Electrophotographic photoconductor and manufacturing method therefor 有权
标题翻译：电子照相感光体及其制造方法
公开(公告)号：US06720121B2
公开(公告)日：2004-04-13
申请号：US10114312
申请日：2002-04-03
申请人： Yoichi Nakamura , Koichi Aizawa , Teruo Sasaki , Kenichi Hara
发明人： Yoichi Nakamura , Koichi Aizawa , Teruo Sasaki , Kenichi Hara
IPC分类号： G03G5047
CPC分类号： G03G5/0517 , G03G5/04 , Y10S430/103
摘要： An electrophotographic photoconductor and method of manufacturing thereof exhibits excellent characteristics of residual potential and repetition potential by containment of an additive of a compound. The electrophotographic photoconductor includes a conductive substrate and a photosensitive layer on the substrate, in which the photosensitive layer contains tri(4-nitrophenyl) phosphate.
摘要翻译：电子照相感光体及其制造方法通过容纳化合物的添加剂表现出优异的残留电位和重复电位特性。电子照相感光体包括在基底上的导电基底和感光层，其中感光层含有磷酸三（4-硝基苯基）酯。

5. 发明申请

US20130295751A1 THIN FILM FORMING DEVICE FOR SOLAR CELL AND THIN FILM FORMING METHOD 审中-公开
标题翻译：用于太阳能电池和薄膜形成方法的薄膜形成装置
公开(公告)号：US20130295751A1
公开(公告)日：2013-11-07
申请号：US13978942
申请日：2012-01-13
申请人： Takamasa Kato , Masaki Narushima , Kenichi Hara
发明人： Takamasa Kato , Masaki Narushima , Kenichi Hara
IPC分类号： H01L21/02
CPC分类号： H01L21/02617 , C23C24/02 , H01L21/02543 , H01L21/02546 , H01L21/02557 , H01L21/02562 , H01L21/02568 , H01L21/02601 , H01L21/02628 , H01L31/0322 , H01L31/0326 , H01L31/03923 , H01L31/03925 , H01L31/18 , H01L31/1828 , H01L31/20 , Y02E10/541 , Y02E10/543
摘要： This thin film forming method for a solar cell forms a thin film that contains a plurality of elements on the surface of an object to be processed. A raw material solution that contains the elements is dispersed in a processing space and microparticles by an electric field, and the microparticles that are dispersed form a thin film that adheres to the surface of the object to be processed. Thus, a thin film for a solar cell element with preferable crystallinity can be formed even in an atmosphere at atmospheric pressure.
摘要翻译：该太阳能电池薄膜形成方法形成在被处理物的表面上含有多个元素的薄膜。含有这些元素的原料溶液通过电场分散在处理空间和微粒中，并且分散的微粒形成粘附到待处理物体的表面的薄膜。因此，即使在大气压的气氛中也可以形成具有优选结晶性的太阳能电池元件用薄膜。

6. 发明申请

US20130217225A1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 审中-公开
标题翻译：制造半导体器件的方法
公开(公告)号：US20130217225A1
公开(公告)日：2013-08-22
申请号：US13819431
申请日：2011-07-29
申请人： Takashi Hayakawa , Kenichi Hara , Takashi Tanaka
发明人： Takashi Hayakawa , Kenichi Hara , Takashi Tanaka
IPC分类号： H01L21/306
CPC分类号： H01L21/30604 , H01L21/288 , H01L21/31053 , H01L21/32134 , H01L21/32135 , H01L21/32136 , H01L21/32139 , H01L21/7682 , H01L21/76852 , H01L21/76885 , H01L21/76897 , H01L23/5222 , H01L23/53238 , H01L23/53295 , H01L2924/0002 , H01L2924/00
摘要： A method comprising the steps of: forming a copper film (101) on a Cu barrier film (100); forming a mask material (102) on the copper film (101); anisotropically etching the copper film (101) until the Cu barrier film (100) is exposed, using the mask material (102) as a mask; and removing the mask material (102) and subsequently forming a plating film (104) that contains a substance for suppressing copper diffusion on the anisotropically etched copper film (101), using an electroless plating method that utilizes a selective deposition in which catalytic action occurs with respect to the copper film (101) but not the Cu barrier film (100).
摘要翻译：一种方法，包括以下步骤：在Cu阻挡膜（100）上形成铜膜（101）; 在所述铜膜（101）上形成掩模材料（102）; 使用掩模材料（102）作为掩模，各向异性地蚀刻铜膜（101）直到Cu阻挡膜（100）露出; 并且使用利用选择性沉积的化学镀方法，除去掩模材料（102）并随后在各向异性蚀刻的铜膜（101）上形成含有抑制铜扩散的物质的镀膜（104）相对于铜膜（101）而不是铜阻挡膜（100）。

7. 发明申请

US20130203260A1 ETCHING METHOD AND ETCHING APPARATUS 审中-公开
标题翻译：蚀刻方法和蚀刻装置
公开(公告)号：US20130203260A1
公开(公告)日：2013-08-08
申请号：US13819382
申请日：2011-07-29
申请人： Kenichi Hara , Takashi Hayakawa
发明人： Kenichi Hara , Takashi Hayakawa
IPC分类号： H01L21/768 , H01L21/67
CPC分类号： H01L21/76886 , C23F4/00 , H01J37/3053 , H01J2237/0817 , H01J2237/334 , H01L21/32136 , H01L21/67069 , H01L23/53228 , H01L2924/0002 , H01L2924/00
摘要： This etching method comprises a step for forming an organic compound gas (22) atmosphere around a copper film (101) that has a mask material (102) formed on the surface thereof and a step for using the mask material (102) as a mask on the copper film (101), irradiating with oxygen ions (6), and performing anisotropic etching of the copper film (101) in the organic compound gas (22) atmosphere.
摘要翻译：该蚀刻方法包括在其表面形成有掩模材料（102）的铜膜（101）周围形成有机化合物气体（22）气氛的步骤和使用掩模材料（102）作为掩模的步骤在铜膜（101）上照射氧离子（6），并对有机化合物气体（22）气氛中的铜膜（101）进行各向异性蚀刻。

8. 发明申请

US20080226826A1 Substrate Processing Method and Substrate Processing Apparatus 审中-公开
标题翻译：基板加工方法及基板加工装置
公开(公告)号：US20080226826A1
公开(公告)日：2008-09-18
申请号：US12091197
申请日：2007-06-22
申请人： Takashi Tanaka , Kenichi Hara , Mitsuaki Iwashita
发明人： Takashi Tanaka , Kenichi Hara , Mitsuaki Iwashita
IPC分类号： B05D3/10 , B05C11/08
CPC分类号： H01L21/76849 , C23C18/1689 , C23C18/1834 , C23C18/50 , H01L21/288 , H01L21/67051 , H01L21/6723 , H01L23/53238 , H01L2924/0002 , H01L2924/00
摘要： A substrate processing method includes applying electroless plating of CoWB onto a Cu interconnection line formed on a wafer W, and then performing a post-cleaning process by use of a cleaning liquid on the target substrate or wafer before a by-product is precipitated on the surface of the CoWB film formed by the electroless plating to cover the Cu interconnection line.
摘要翻译：基板处理方法包括将CoWB的无电镀施加到形成在晶片W上的Cu互连线上，然后在副产物沉淀在靶基板或晶片上之后，通过使用目标基板或晶片上的清洗液进行后清洗处理通过无电镀形成的CoWB膜的表面覆盖Cu互连线。

9. 发明授权

US4320378A Oxygen sensor 失效
标题翻译：氧传感器
公开(公告)号：US4320378A
公开(公告)日：1982-03-16
申请号：US194248
申请日：1980-03-18
申请人： Harutaka Taniguchi , Kenichi Hara , Hideo Shiraishi , Shinji Kiyofuji
发明人： Harutaka Taniguchi , Kenichi Hara , Hideo Shiraishi , Shinji Kiyofuji
IPC分类号： G01N27/12 , G01N27/403 , G01N27/407 , H01L7/00
CPC分类号： G01N27/4071 , G01N27/4077
摘要： Into a metal tube (24) provided with vent-holes (32) is inserted an oxygen sensor element (10) which comprises a ceramic round rod coated with a porous thick membrane of transition-metal oxide, divided electrode thick membranes (14) and a protective layer therefor, thereby to obtain an oxygen sensor. One electrode of the oxygen sensor element is connected to the metal tube and the opposite electrode is connected to a connecting lead wire (64, 66) electrically insulated from the tube, so that the oxygen sensor is rich in toughness against the mechanical oscillation and impact. The sensor may suitably be used to detect the oxygen content in the waste gas of automobiles.
摘要翻译：在设置有通气孔（32）的金属管（24）中插入氧传感器元件（10），该氧传感器元件（10）包括涂覆有过渡金属氧化物的多孔厚膜的陶瓷圆棒，分隔电极厚膜（14）和其保护层，从而获得氧传感器。氧传感器元件的一个电极连接到金属管，并且相对电极连接到与管电绝缘的连接引线（64,66），使得氧传感器具有相对于机械振荡和冲击的韧性。传感器可适当地用于检测汽车废气中的氧气含量。

10. 发明授权

US08062955B2 Substrate processing method and substrate processing apparatus 有权
标题翻译：基板处理方法和基板处理装置
公开(公告)号：US08062955B2
公开(公告)日：2011-11-22
申请号：US12091131
申请日：2007-06-22
申请人： Takashi Tanaka , Kenichi Hara , Mitsuaki Iwashita
发明人： Takashi Tanaka , Kenichi Hara , Mitsuaki Iwashita
IPC分类号： H01L21/76
CPC分类号： H01L21/76849 , C23C18/1689 , C23C18/1834 , C23C18/50 , H01L21/288 , H01L21/67051 , H01L21/6723 , H01L23/53238 , H01L2924/0002 , H01L2924/00
摘要： A CoWB film is formed as a cap metal on a Cu interconnection line formed on a substrate or wafer W, by repeating a plating step and a post-cleaning step a plurality of times. The plating step is arranged to apply electroless plating containing CoWB onto the Cu interconnection line. The post-cleaning step is arranged to clean the wafer W by use of a cleaning liquid, after the plating step.
摘要翻译：通过重复电镀步骤和后清洗步骤多次，在形成在基板或晶片W上的Cu互连线上形成CoWB膜作为帽金属。电镀步骤被布置成将含有CoWB的无电镀施加到Cu互连线上。后清洗步骤被布置成在电镀步骤之后通过使用清洁液体清洁晶片W.

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