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1. 发明授权

US08940638B2 Substrate wiring method and semiconductor manufacturing device 有权
标题翻译：基板接线方法及半导体制造装置
公开(公告)号：US08940638B2
公开(公告)日：2015-01-27
申请号：US13583438
申请日：2011-02-23
申请人： Satohiko Hoshino , Hidefumi Matsui , Masaki Narushima
发明人： Satohiko Hoshino , Hidefumi Matsui , Masaki Narushima
IPC分类号： H01L21/44 , H01L21/768 , C23C14/04 , C23C14/22 , H01L21/02 , H01L21/285 , H01L23/532 , C23C16/02 , H01L23/522
CPC分类号： H01L21/76814 , C23C14/046 , C23C14/221 , C23C16/0281 , H01L21/02063 , H01L21/28556 , H01L21/76843 , H01L21/76877 , H01L21/76898 , H01L23/5222 , H01L23/53238 , H01L23/53295 , H01L2924/0002 , H01L2924/00
摘要： In a substrate wiring method, copper is embedded all the way to the lowest parts of a wiring pattern formed on a substrate. The method is used to wire a substrate in a processing chamber kept in a vacuum state, the substrate having a wiring pattern formed thereon. The method includes a preprocessing step in which the wiring pattern on the substrate is cleaned using a desired cleaning gas and an embedding step in which, after the preprocessing step, metal nanoparticles are embedded in the wiring pattern using a clustered metal gas.
摘要翻译：在基板布线方法中，将铜一直嵌入形成在基板上的布线图案的最低部分。该方法用于将保持在真空状态的处理室中的衬底导线，该衬底具有形成在其上的布线图案。该方法包括预处理步骤，其中使用期望的清洁气体清洁基板上的布线图案;以及嵌入步骤，其中在预处理步骤之后，使用聚集的金属气体将金属纳米颗粒嵌入布线图案中。

2. 发明申请

US20130056024A1 SUBSTRATE CLEANING METHOD AND SEMICONDUCTOR MANUFACTURING APPARATUS 审中-公开
标题翻译：基板清洗方法和半导体制造装置
公开(公告)号：US20130056024A1
公开(公告)日：2013-03-07
申请号：US13583355
申请日：2011-02-23
申请人： Satohiko Hoshino , Hidefumi Matsui , Masaki Narushima
发明人： Satohiko Hoshino , Hidefumi Matsui , Masaki Narushima
IPC分类号： B08B7/04 , B08B7/02 , B08B5/02
CPC分类号： H01L21/02063 , H01J37/3244 , H01J37/32449 , H01J37/32816 , H01J37/32862 , H01L21/76808 , H01L21/76814
摘要： A substrate cleaning method for cleaning a substrate on which a film is formed with a pattern in a vacuum-state processing chamber includes a preprocessing step where the film formed on the substrate on which the pattern has been formed by an etching process is cleaned by using a cleaning gas; and a consecutive step including an oxidation step where residues attached on a surface of the pattern are oxidized by using an oxidizing gas and a reduction step where the oxidized residues are reduced by using a reducing gas, which are consecutively carried out posterior to the preprocessing step. The gases used in the preprocessing step and the consecutive step are clustered by ejecting the gases into the processing chamber from a gas nozzle whose internal pressure PS is maintained to be higher than an internal pressure PO of the processing chamber.
摘要翻译：用于清洁在真空状态处理室中形成有图案的膜的基板的基板清洗方法包括预处理步骤，其中通过使用蚀刻工艺在形成有图案的基板上形成的膜被清洁清洁气体; 以及包括氧化步骤的连续步骤，其中附着在图案表面上的残留物通过使用氧化气体被氧化，还原步骤通过使用在预处理步骤后面连续执行的还原气体还原氧化残余物。在预处理步骤和连续步骤中使用的气体通过将气体从其内部压力PS保持为高于处理室的内部压力PO的气体喷嘴喷射到处理室中而聚集。

3. 发明申请

US20120128892A1 SURFACE PROCESSING METHOD AND SURFACE PROCESSING APPARATUS 审中-公开
标题翻译：表面处理方法和表面处理装置
公开(公告)号：US20120128892A1
公开(公告)日：2012-05-24
申请号：US13114096
申请日：2011-05-24
申请人： Noriaki TOYODA , Isao Yamada , Masaki Narushima , Masayuki Harashima , Eisuke Morisaki
发明人： Noriaki TOYODA , Isao Yamada , Masaki Narushima , Masayuki Harashima , Eisuke Morisaki
IPC分类号： C23C16/02 , C23C16/34
CPC分类号： H01L21/02024 , C30B33/00 , H01L29/1608
摘要： A disclosed surface processing method includes a first processing step, wherein a gas cluster beam is generated from a source material that does not contain nitrogen, and irradiated to a member to be processed, and a second processing step, wherein a nitrogen gas cluster beam is generated and irradiated to the member to be processed.
摘要翻译：所公开的表面处理方法包括：第一处理步骤，其中从不含氮的源材料产生气体束束并照射到待处理的构件;以及第二处理步骤，其中氮气簇束为产生并照射到待处理的构件。

4. 发明授权

US08168946B2 Charged particle separation apparatus and charged particle bombardment apparatus 有权
标题翻译：带电粒子分离装置和带电粒子轰击装置
公开(公告)号：US08168946B2
公开(公告)日：2012-05-01
申请号：US12816512
申请日：2010-06-16
申请人： Masaki Narushima , Koichi Mori , Isao Yamada , Noriaki Toyoda
发明人： Masaki Narushima , Koichi Mori , Isao Yamada , Noriaki Toyoda
IPC分类号： H01J49/28 , H01J3/26
CPC分类号： H01J49/282
摘要： A charged particle separation apparatus that separates ionized gas clusters is disclosed. The charged particle separation apparatus includes an electric field applying part including two electrodes across which electric voltage is applied in order to generate electric field between the two electrodes thereby deflecting a trajectory of the ionized gas cluster, the electrodes including one of an opening and a void; and a plate opening that allows the ionized gas cluster whose trajectory is deflected by the electric field applying part to go therethrough.
摘要翻译：公开了一种分离离子化气体簇的带电粒子分离装置。带电粒子分离装置包括电场施加部分，其包括施加电压的两个电极，以便在两个电极之间产生电场，从而偏转电离气体簇的轨迹，电极包括开口和空隙之一 ; 以及允许由电场施加部件偏转轨迹的离子化气体团簇通过的板状开口。

5. 发明申请

US20100320380A1 CHARGED PARTICLE SEPARATION APPARATUS AND CHARGED PARTICLE BOMBARDMENT APPARATUS 有权
标题翻译：充电颗粒分离装置和充电颗粒物料装置
公开(公告)号：US20100320380A1
公开(公告)日：2010-12-23
申请号：US12816512
申请日：2010-06-16
申请人： Masaki Narushima , Koichi Mori , Isao Yamada , Noriaki Toyoda
发明人： Masaki Narushima , Koichi Mori , Isao Yamada , Noriaki Toyoda
IPC分类号： B01D59/44
CPC分类号： H01J49/282
摘要： A charged particle separation apparatus that separates ionized gas clusters is disclosed. The charged particle separation apparatus includes an electric field applying part including two electrodes across which electric voltage is applied in order to generate electric field between the two electrodes thereby deflecting a trajectory of the ionized gas cluster, the electrodes including one of an opening and a void; and a plate opening that allows the ionized gas cluster whose trajectory is deflected by the electric field applying part to go therethrough.
摘要翻译：公开了一种分离离子化气体簇的带电粒子分离装置。带电粒子分离装置包括电场施加部分，其包括施加电压的两个电极，以便在两个电极之间产生电场，从而偏转电离气体簇的轨迹，电极包括开口和空隙之一 ; 以及允许由电场施加部件偏转轨迹的离子化气体团簇通过的板状开口。

6. 发明申请

US20060099348A1 Deposition method 审中-公开
标题翻译：沉积法
公开(公告)号：US20060099348A1
公开(公告)日：2006-05-11
申请号：US11249390
申请日：2005-10-14
申请人： Masaki Narushima , Koumei Matsuzawa , Takayuki Komiya , Eiichi Kondoh
发明人： Masaki Narushima , Koumei Matsuzawa , Takayuki Komiya , Eiichi Kondoh
IPC分类号： C23C16/00
CPC分类号： C23C18/08
摘要： A deposition method for depositing on a substrate includes the step of: using a process medium made by adding a precursor to a medium in a supercritical state. The precursor is added to the medium in the supercritical state where the precursor is dissolved in an organic solvent.
摘要翻译：用于沉积在衬底上的沉积方法包括以下步骤：使用通过在超临界状态下将前体添加到介质中制备的处理介质。将前体加入超临界状态的介质中，其中前体溶于有机溶剂中。

7. 发明授权

US07025554B2 Vacuum process system 有权
标题翻译：真空过程系统
公开(公告)号：US07025554B2
公开(公告)日：2006-04-11
申请号：US10614777
申请日：2003-07-07
申请人： Jun Ozawa , Jun Hirose , Masaki Narushima
发明人： Jun Ozawa , Jun Hirose , Masaki Narushima
IPC分类号： B65G49/07
CPC分类号： H01L21/67161 , H01L21/67167 , H01L21/67184 , H01L21/6719 , H01L21/67196 , H01L21/67201 , H01L21/67745 , Y10S414/139
摘要： A vacuum process system comprises: a load port on which an object to be processed is set; a common transfer chamber disposed adjacent to the load port, having an internal space set at an atmospheric pressure level, and including a first transfer device that is movable and transfers the object into/from the load port, the first transfer device being disposed within the internal space; and a process unit having one process chamber for subjecting the object to a predetermined process, and a vacuum transfer chamber connected to the process chamber, having an internal space set at a vacuum pressure level, and including a second transfer device for transferring the object into/from the process chamber, the second transfer device being disposed within the internal space. The process units are individually connected to the common transfer chamber such that the process units are substantially parallel to each other. The vacuum chamber of each process unit is connected to the common transfer chamber. Each process unit extends linearly in a direction substantially perpendicular to the common transfer chamber. The object is transferred into/from the vacuum transfer chamber by means of the first transfer device.
摘要翻译：真空处理系统包括：设置待处理对象的装载端口; 与负载端口相邻设置的公共传送室，具有设定在大气压力水平的内部空间，并且包括第一传送装置，该第一传送装置可移动并将物体传送到/从所述装载端口传送，所述第一传送装置设置在所述传送室内内部空间; 以及处理单元，其具有用于使物体经受预定处理的一个处理室和连接到处理室的真空传送室，其具有设置在真空压力水平的内部空间，并且包括用于将物体传送到 /从处理室，第二传送装置设置在内部空间内。处理单元分别连接到公共传送室，使得处理单元基本上彼此平行。每个处理单元的真空室连接到公共传送室。每个处理单元在基本上垂直于公共传送室的方向上线性地延伸。物体通过第一传送装置传送到/从真空传送室传送。

8. 发明授权

US5332442A Surface processing apparatus 失效
标题翻译：表面处理装置
公开(公告)号：US5332442A
公开(公告)日：1994-07-26
申请号：US973915
申请日：1992-11-12
申请人： Masao Kubodera , Masaki Narushima , Masahito Ozawa , Hiromi Kumagai , Tomihiro Yonenaga , Sumi Tanaka
发明人： Masao Kubodera , Masaki Narushima , Masahito Ozawa , Hiromi Kumagai , Tomihiro Yonenaga , Sumi Tanaka
IPC分类号： C23C16/44 , C23C16/455 , C23C16/458 , C23C16/48 , C30B25/10 , C30B31/20 , H01L21/00 , C23C16/00
CPC分类号： C23C16/45512 , C23C16/4584 , C23C16/481 , C30B25/105 , C30B31/20 , H01L21/67017 , H01L21/67115
摘要： The present invention relates to a surface processing apparatus which performs heating processing of an object of heating which is mounted on a mounting device provided inside a process container, and which includes a plural number of lamps provided so as to oppose a rear surface of a processing surface of an object of processing, a rotating unit which has the plural number of lamps mounted to it in a ring shape, and a drive unit which drives the rotating unit. Also, the present invention relates to a processing apparatus for leading a process gas from a gas supply tube to a gas chamber partitioned inside a process container, and which blows process gas from an outlet of the gas chamber and onto an object of processing which is mounted on a mounting device provided inside the process container, and which includes a plural number of partition plates each provided with a plural number of through holes, being provided at required intervals in a direction of gas flow and inside the gas chamber.
摘要翻译：本发明涉及一种对加热对象进行加热处理的表面处理装置，该加热处理装置安装在设置在处理容器内部的安装装置上，并且包括多个设置成与处理容器的后表面相对的灯处理对象的表面，具有安装在环状的多个灯的旋转单元和驱动旋转单元的驱动单元。本发明还涉及一种处理装置，用于将处理气体从气体供给管引导到在处理容器内分隔的气体室，并且将处理气体从气体室的出口吹送到处理对象物上，安装在设置在处理容器内部的安装装置上，并且包括多个分隔板，每个分隔件设置有多个通孔，沿气流方向和气室内部需要间隔设置。

9. 发明申请

US20130295751A1 THIN FILM FORMING DEVICE FOR SOLAR CELL AND THIN FILM FORMING METHOD 审中-公开
标题翻译：用于太阳能电池和薄膜形成方法的薄膜形成装置
公开(公告)号：US20130295751A1
公开(公告)日：2013-11-07
申请号：US13978942
申请日：2012-01-13
申请人： Takamasa Kato , Masaki Narushima , Kenichi Hara
发明人： Takamasa Kato , Masaki Narushima , Kenichi Hara
IPC分类号： H01L21/02
CPC分类号： H01L21/02617 , C23C24/02 , H01L21/02543 , H01L21/02546 , H01L21/02557 , H01L21/02562 , H01L21/02568 , H01L21/02601 , H01L21/02628 , H01L31/0322 , H01L31/0326 , H01L31/03923 , H01L31/03925 , H01L31/18 , H01L31/1828 , H01L31/20 , Y02E10/541 , Y02E10/543
摘要： This thin film forming method for a solar cell forms a thin film that contains a plurality of elements on the surface of an object to be processed. A raw material solution that contains the elements is dispersed in a processing space and microparticles by an electric field, and the microparticles that are dispersed form a thin film that adheres to the surface of the object to be processed. Thus, a thin film for a solar cell element with preferable crystallinity can be formed even in an atmosphere at atmospheric pressure.
摘要翻译：该太阳能电池薄膜形成方法形成在被处理物的表面上含有多个元素的薄膜。含有这些元素的原料溶液通过电场分散在处理空间和微粒中，并且分散的微粒形成粘附到待处理物体的表面的薄膜。因此，即使在大气压的气氛中也可以形成具有优选结晶性的太阳能电池元件用薄膜。

10. 发明申请

US20100319545A1 CHARGED PARTICLE SEPARATION APPARATUS AND CHARGED PARTICLE BOMBARDMENT APPARATUS 审中-公开
标题翻译：充电颗粒分离装置和充电颗粒物料装置
公开(公告)号：US20100319545A1
公开(公告)日：2010-12-23
申请号：US12818758
申请日：2010-06-18
申请人： MASAKI NARUSHIMA , Koichi Mori , Isao Yamada , Noriaki Toyoda
发明人： MASAKI NARUSHIMA , Koichi Mori , Isao Yamada , Noriaki Toyoda
IPC分类号： B03C3/68 , B03C3/38
CPC分类号： H01J49/421 , H01J27/026 , H01J37/147 , H01J2237/3142 , H01J2237/3151 , H01J2237/31701
摘要： A charged particle separation apparatus that separates ionized gas clusters is disclosed. The charged particle separation apparatus includes three or more electric field applying parts arranged in an incident direction of an ionized gas cluster, wherein each of the electric field applying parts includes a pair of electrodes; an electric power source configured to supply alternating-current electric voltages to the three or more electric field applying parts in such a manner that an alternating-current electric voltage applied across one pair of the electrodes of one of the three or more electric field applying parts is different in phase from an alternating-current voltage applied across another pair of the electrodes of an adjacent one of the three or more electric field applying parts; and a plate including an opening in an extension of the incident direction.
摘要翻译：公开了一种分离离子化气体簇的带电粒子分离装置。带电粒子分离装置包括沿电离气体簇的入射方向配置的三个以上的电场施加部，其中，各电场施加部包括一对电极; 电源，被配置为向三个或更多个电场施加部提供交流电压，使得施加在三个或更多个电场施加部中的一个的一对电极上的交流电压与施加在三个或更多个电场施加部件中相邻一个的另一对电极上的交流电压的相位不同; 以及包括在入射方向的延伸部中的开口的板。

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