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1. 发明授权

US06767636B2 Thermal spray rare earth oxide particles, sprayed components, and corrosion resistant components 有权
标题翻译：热喷涂稀土氧化物颗粒，喷涂组分和耐腐蚀组分
公开(公告)号：US06767636B2
公开(公告)日：2004-07-27
申请号：US10101612
申请日：2002-03-21
申请人： Yasushi Takai , Takao Maeda , Toshihiko Tsukatani
发明人： Yasushi Takai , Takao Maeda , Toshihiko Tsukatani
IPC分类号： B32B516
CPC分类号： C23C4/11 , Y10T428/24372 , Y10T428/24413 , Y10T428/256 , Y10T428/2982
摘要： Rare earth oxide particles having an average particle diameter of 3-20 &mgr;m, a dispersion index of up to 0.4, and an aspect ratio of up to 2 are suitable for thermal spraying. Despite their high melting point, the rare earth oxide particles of high purity can form an adherent coating by thermal spraying.
摘要翻译：平均粒径为3-20μm的稀土氧化物粒子，分散指数为0.4以上，纵横比为2以下，适用于热喷涂。尽管高熔点，但高纯度的稀土氧化物颗粒可以通过热喷涂形成粘附涂层。

2. 发明授权

US06733843B2 Method for thermal spray coating and rare earth oxide powder used therefor 有权
标题翻译：热喷涂法和稀土氧化物粉末的使用方法
公开(公告)号：US06733843B2
公开(公告)日：2004-05-11
申请号：US10423903
申请日：2003-04-28
申请人： Toshihiko Tsukatani , Yasushi Takai , Takao Maeda
发明人： Toshihiko Tsukatani , Yasushi Takai , Takao Maeda
IPC分类号： C23C410
CPC分类号： C23C4/11 , Y10T428/25 , Y10T428/26 , Y10T428/2982
摘要： The invention discloses an efficient method for the formation of a highly corrosion- or etching-resistant thermal spray coating layer of a rare earth oxide or rare earth-based composite oxide by a process of plasma thermal spray method by using a unique thermal spray powder consisting of granules of the oxide. The thermal spray granules are characterized by a specified average particle diameter of 5 to 80 &mgr;m with a specified dispersion index of 0.1 to 0.7 and a specified BET specific surface area of 1 to 5 m2/g as well as a very low content of impurity iron not exceeding 5 ppm by weight as oxide. The flame spat powder used here is characterized by several other granulometric parameters including globular particle configuration, particle diameter D90, bulk density and cumulative pore volume.
摘要翻译：本发明公开了一种通过使用独特的热喷涂粉末等离子体热喷涂方法形成稀土氧化物或稀土类复合氧化物的高耐腐蚀或耐蚀刻热喷涂层的有效方法，的氧化物颗粒。热喷雾颗粒的特征在于指定的平均粒径为5-80μm，指定的分散指数为0.1-0.7，指定的BET比表面积为1-5m 2 / g，并且含量非常低的杂质铁作为氧化物不超过5ppm。这里使用的火焰喷雾粉的特征在于几种其他粒度参数，包括球状颗粒构型，粒径D90，体积密度和累积孔体积。

3. 发明授权

US06576354B2 Method for thermal spray coating and rare earth oxide powder used therefor 有权
公开(公告)号：US06576354B2
公开(公告)日：2003-06-10
申请号：US09893565
申请日：2001-06-29
申请人： Toshihiko Tsukatani , Yasushi Takai , Takao Maeda
发明人： Toshihiko Tsukatani , Yasushi Takai , Takao Maeda
IPC分类号： B32B1504
CPC分类号： C23C4/11 , Y10T428/25 , Y10T428/26 , Y10T428/2982
摘要： The invention discloses an efficient method for the formation of a highly corrosion- or etching-resistant thermal spray coating layer of a rare earth oxide or rare earth-based composite oxide by a process of plasma thermal spray method by using a unique thermal spray powder consisting of granules of the oxide. The thermal spray granules are characterized by a specified average particle diameter of 5 to 80 &mgr;m with a specified dispersion index of 0.1 to 0.7 and a specified BET specific surface area of 1 to 5 m2/g as well as a very low content of impurity iron not exceeding 5 ppm by weight as oxide. The flame spat powder used here is characterized by several other granulometric parameters including globular particle configuration, particle diameter D90, bulk density and cumulative pore volume.

4. 发明授权

US08138060B2 Wafer 有权
标题翻译：晶圆
公开(公告)号：US08138060B2
公开(公告)日：2012-03-20
申请号：US12258850
申请日：2008-10-27
申请人： Toshihiko Tsukatani , Takao Maeda , Junichi Nakayama , Hirofumi Kawazoe , Masaru Konya , Noriaki Hamaya , Hajime Nakano
发明人： Toshihiko Tsukatani , Takao Maeda , Junichi Nakayama , Hirofumi Kawazoe , Masaru Konya , Noriaki Hamaya , Hajime Nakano
IPC分类号： B32B27/32 , B32B9/04 , B32B13/04 , B32B9/00 , B32B19/00
CPC分类号： C23C4/18 , C23C4/02 , C23C4/11 , C23C18/1216 , C23C24/04
摘要： A wafer has a rare earth oxide layer disposed, typically sprayed, on a substrate. It is useful as a dummy wafer in a plasma etching or deposition system.
摘要翻译：晶片具有通常喷涂在基板上的稀土氧化物层。作为等离子体蚀刻或沉积系统中的虚设晶片是有用的。

5. 发明授权

US07968205B2 Corrosion resistant multilayer member 有权
标题翻译：耐腐蚀多层构件
公开(公告)号：US07968205B2
公开(公告)日：2011-06-28
申请号：US11550929
申请日：2006-10-19
申请人： Hajime Nakano , Toshihiko Tsukatani , Takao Maeda
发明人： Hajime Nakano , Toshihiko Tsukatani , Takao Maeda
IPC分类号： B32B9/00
CPC分类号： C23C4/18 , C23C4/02 , C23C4/11 , C23C4/134 , C23C24/04 , H01J37/32477 , H01J37/32559
摘要： A corrosion resistant member to be exposed to a halogen-containing gas atmosphere or a halogen-containing gas plasma atmosphere, comprising a substrate and a plurality of layers deposited thereon including a layer of rare earth fluoride providing the outermost surface and a layer of rare earth oxide having a porosity of less than 5% underlying the rare earth fluoride layer.
摘要翻译：暴露于含卤素气体气氛或含卤素的气体等离子体气氛中的耐腐蚀构件，包括基材和沉积在其上的多层，其中包括提供最外表面的稀土氟化物层和稀土层具有低于稀土氟化物层下面5％孔隙率的氧化物。

6. 发明授权

US07816013B2 Wafer 有权
标题翻译：晶圆
公开(公告)号：US07816013B2
公开(公告)日：2010-10-19
申请号：US12326310
申请日：2008-12-02
申请人： Toshihiko Tsukatani , Masaru Konya , Noriaki Hamaya , Hajime Nakano , Takao Maeda
发明人： Toshihiko Tsukatani , Masaru Konya , Noriaki Hamaya , Hajime Nakano , Takao Maeda
IPC分类号： B32B9/04 , B32B9/06 , B32B13/04
CPC分类号： H01L21/02002
摘要： A wafer has a rare earth fluoride coating disposed, typically sprayed on a substrate as an outermost layer, the rare earth fluoride being selected from lanthanoid fluorides, yttrium fluoride, and scandium fluoride. It is useful as a dummy wafer in a plasma etching or deposition system.
摘要翻译：晶片具有通常喷涂在作为最外层的基板上的稀土氟化物涂层，稀土氟化物选自镧系氟化物，氟化钇和氟化钪。作为等离子体蚀刻或沉积系统中的虚设晶片是有用的。

7. 发明授权

US07674427B2 Rare earth metal member and making method 有权
标题翻译：稀土金属构件及制作方法
公开(公告)号：US07674427B2
公开(公告)日：2010-03-09
申请号：US11476066
申请日：2006-06-28
申请人： Toshihiko Tsukatani , Hajime Nakano , Takao Maeda
发明人： Toshihiko Tsukatani , Hajime Nakano , Takao Maeda
IPC分类号： C22C28/00 , C23G1/02 , E01B9/10 , F16B33/00
CPC分类号： H01J37/32431 , C22B59/00 , C22C28/00 , C23G1/10 , H01J37/32477 , H01J2237/022 , Y10S438/968
摘要： By using a rare earth metal having a minimal content of impurity metal element, machining it into a member and cleaning with an organic acid-base capping agent, there is obtained a rare earth metal member composed entirely of a rare earth metal and containing not more than 100 ppm of impurity metal element in a sub-surface zone, which member is characterized by a high surface purity, a large grain size, minimized grain boundaries, and improved halogen resistance or corrosion resistance.
摘要翻译：通过使用杂质金属元素含量最少的稀土金属，将其加工成部件并用有机酸基封盖剂进行清洗，得到完全由稀土金属组成的稀土金属部件，并且不含有在表面区域中超过100ppm的杂质金属元素，其特征在于高表面纯度，大晶粒尺寸，最小化的晶界和改善的耐卤素性或耐腐蚀性。

8. 发明申请

US20070003790A1 Rare earth metal member and making method 有权
标题翻译：稀土金属构件及制作方法
公开(公告)号：US20070003790A1
公开(公告)日：2007-01-04
申请号：US11476066
申请日：2006-06-28
申请人： Toshihiko Tsukatani , Hajime Nakano , Takao Maeda
发明人： Toshihiko Tsukatani , Hajime Nakano , Takao Maeda
IPC分类号： B32B19/00
CPC分类号： H01J37/32431 , C22B59/00 , C22C28/00 , C23G1/10 , H01J37/32477 , H01J2237/022 , Y10S438/968
摘要： By using a rare earth metal having a minimal content of impurity metal element, machining it into a member and cleaning with an organic acid-base capping agent, there is obtained a rare earth metal member composed entirely of a rare earth metal and containing not more than 100 ppm of impurity metal element in a sub-surface zone, which member is characterized by a high surface purity, a large grain size, minimized grain boundaries, and improved halogen resistance or corrosion resistance.
摘要翻译：通过使用杂质金属元素含量最少的稀土金属，将其加工成部件并用有机酸基封盖剂进行清洗，得到完全由稀土金属组成的稀土金属部件，并且不含有在表面区域中超过100ppm的杂质金属元素，其特征在于高表面纯度，大晶粒尺寸，最小化的晶界和改善的耐卤素性或耐腐蚀性。

9. 发明授权

US08337956B2 Wafer 有权
公开(公告)号：US08337956B2
公开(公告)日：2012-12-25
申请号：US13331180
申请日：2011-12-20
申请人： Toshihiko Tsukatani , Takao Maeda , Junichi Nakayama , Hirofumi Kawazoe , Masaru Konya , Noriaki Hamaya , Hajime Nakano
发明人： Toshihiko Tsukatani , Takao Maeda , Junichi Nakayama , Hirofumi Kawazoe , Masaru Konya , Noriaki Hamaya , Hajime Nakano
IPC分类号： B05D3/02 , B05D3/12 , B05D1/36 , B05D7/00 , C23C4/04
CPC分类号： C23C4/18 , C23C4/02 , C23C4/11 , C23C18/1216 , C23C24/04
摘要： A wafer has a rare earth oxide layer disposed, typically sprayed, on a substrate. It is useful as a dummy wafer in a plasma etching or deposition system.

10. 发明申请

US20120088034A1 WAFER 有权
公开(公告)号：US20120088034A1
公开(公告)日：2012-04-12
申请号：US13331180
申请日：2011-12-20
申请人： Toshihiko Tsukatani , Takao Maeda , Junichi Nakayama , Hirofumi Kawazoe , Masaru Konya , Noriaki Hamaya , Hajime Nakano
发明人： Toshihiko Tsukatani , Takao Maeda , Junichi Nakayama , Hirofumi Kawazoe , Masaru Konya , Noriaki Hamaya , Hajime Nakano
IPC分类号： B05D7/00 , C23C4/10 , C23C4/04 , B05D3/02 , B05D3/00
CPC分类号： C23C4/18 , C23C4/02 , C23C4/11 , C23C18/1216 , C23C24/04
摘要： A wafer has a rare earth oxide layer disposed, typically sprayed, on a substrate. It is useful as a dummy wafer in a plasma etching or deposition system.
摘要翻译：晶片具有通常喷涂在基板上的稀土氧化物层。作为等离子体蚀刻或沉积系统中的虚设晶片是有用的。

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