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1. 发明授权

US5742386A Apparatus for detecting foreign matter on a substrate, and an exposure apparatus including the same 失效
标题翻译：用于检测基板上的异物的装置，以及包括该异物的曝光装置
公开(公告)号：US5742386A
公开(公告)日：1998-04-21
申请号：US799879
申请日：1997-02-13
申请人： Noriyuki Nose , Minoru Yoshii , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
发明人： Noriyuki Nose , Minoru Yoshii , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
IPC分类号： G01N21/88 , G01N21/47 , G01N21/94 , G01N21/956 , G03F7/20 , H01L21/027 , G01N21/00
CPC分类号： G01N21/4738 , G01N21/94 , G01N21/956
摘要： An apparatus for detecting foreign matter on a substrate includes an optical system for projecting a light beam onto a pellicle and a pattern surface, a first detector for detecting scattered light from foreign matter on the pattern surface, a second detector for detecting information relating to the reflectivity or the transmittance of the pellicle by detecting a light beam reflected by the pellicle, and a correction unit for correcting an output signal from the first detector using an output signal from the second detector.
摘要翻译：用于检测基板上的异物的装置包括：用于将光束投射到防护薄膜组件和图案表面上的光学系统;用于检测来自图案表面上异物的散射光的第一检测器，用于检测与图案表面有关的信息的第二检测器; 通过检测由防护薄膜组件反射的光束来检测防护薄膜组件的反射率或透射率;以及校正单元，用于使用来自第二检测器的输出信号来校正来自第一检测器的输出信号。

2. 发明授权

US5767962A Inspection system and device manufacturing method using the same 失效
标题翻译：检验系统和装置制造方法采用该方法
公开(公告)号：US5767962A
公开(公告)日：1998-06-16
申请号：US755352
申请日：1996-11-25
申请人： Masayuki Suzuki , Noriyuki Nose , Minoru Yoshii , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
发明人： Masayuki Suzuki , Noriyuki Nose , Minoru Yoshii , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
IPC分类号： G01N21/88 , G01B11/30 , G01N21/94 , G01N21/956 , G03F1/84 , H01L21/66 , G01N21/00
CPC分类号： G01N21/94
摘要： An inspection system includes a light source, a scanning device for scanning a surface to be inspected, with light from the light source, wherein the scanning device includes an optical member disposed with inclination with respect to a primary scan direction, the optical member being adapted to provide a convergent light being converged to form a spot at a distance changeable with the position of a scan, and a light receiving device for receiving scattered light from the surface.
摘要翻译：检查系统包括光源，用于扫描来自光源的光的扫描装置，其中所述扫描装置包括相对于主扫描方向倾斜设置的光学构件，所述光学构件适于以提供会聚的光会聚在一起形成与扫描位置可变的距离的光点，以及用于接收来自表面的散射光的光接收装置。

3. 发明授权

US5861952A Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position 失效
标题翻译：包括光束的强度调制和在检查位置散射的光的检测的光学检查方法和装置
公开(公告)号：US5861952A
公开(公告)日：1999-01-19
申请号：US984509
申请日：1992-12-02
申请人： Toshihiko Tsuji , Kyoichi Miyazaki , Seiji Takeuchi , Minoru Yoshii , Noriyuki Nose
发明人： Toshihiko Tsuji , Kyoichi Miyazaki , Seiji Takeuchi , Minoru Yoshii , Noriyuki Nose
IPC分类号： G01N21/94 , G01B9/02 , G01N21/88
CPC分类号： G01N21/94
摘要： A light source portion having an acousto-optic element produces a laser beam of two light components having a frequency difference .DELTA.w and having registered polarization directions. The laser beam is subsequently divided by a half mirror. One of the divided laser beams is detected by a photoelectric detector as reference light, and a corresponding signal is applied to a synchronism detector. The other laser beam is projected by a scanning optical system to the surface of, e.g., an original to be examined to scan the same. At the position on the surface irradiated by the scanning light spot, the laser beam is modulated at a beat frequency .DELTA.w on the basis of optical heterodyne interference. A synchronism detector detects a signal corresponding to the scattered light from a particle or defect on the surface being examined, in synchronism with the frequency of the reference light, whereby the particle or defect can be detected with a good signal-to-noise ratio.
摘要翻译：具有声光元件的光源部分产生具有频差DELTA w并具有记录的偏振方向的两个光分量的激光束。激光束随后被半反射镜分开。其中一个激光束被光电检测器作为参考光检测，相应的信号被施加到同步检测器。另一个激光束由扫描光学系统投影到例如要检查的原件的表面以扫描它。在由扫描光点照射的表面上的位置处，基于光学外差干扰以激光束以拍频DELTA w进行调制。同步检测器与参考光的频率同步地检测与被检查的表面上的颗粒或缺陷相对应的散射光的信号，从而可以以良好的信噪比检测颗粒或缺陷。

4. 发明授权

US5486919A Inspection method and apparatus for inspecting a particle, if any, on a substrate having a pattern 失效
标题翻译：用于在具有图案的基板上检查颗粒（如果有的话）的检查方法和装置
公开(公告)号：US5486919A
公开(公告)日：1996-01-23
申请号：US76951
申请日：1993-06-15
申请人： Toshihiko Tsuji , Seiji Takeuchi , Kyoichi Miyazaki , Minoru Yoshii , Noriyuki Nose , Tetsuzo Mori
发明人： Toshihiko Tsuji , Seiji Takeuchi , Kyoichi Miyazaki , Minoru Yoshii , Noriyuki Nose , Tetsuzo Mori
IPC分类号： G01J9/02 , G01J9/04 , G01N21/88 , G01N21/94 , G03F7/20 , G01B9/02
CPC分类号： G03F7/70616 , G01N21/88 , G01N21/94 , G03F7/7065 , G03F7/70916 , G01J2009/0261 , G01J9/04 , G01N2021/4792 , G01N21/8806
摘要： Disclosed is an inspection method and apparatus: wherein (i) first light having a first state of polarization and a first wavelength, and (ii) second light having a second state of polarization, different from the first state of polarization, and a second wavelength, different from the first wavelength are produced; at least the first light is projected to a position of inspection; and heterodyne interference light produced on the basis of the second light and light scattered at the inspection position and having its state of polarization changed, by the scattering, from the first state of polarization, is detected.
摘要翻译：公开了一种检查方法和装置：其中（i）具有第一偏振状态和第一波长的第一光，以及（ii）具有与第一偏振态不同的第二极化状态的第二光，以及第二波长，与第一波长不同; 至少第一个光被投射到检查的位置; 并且检测基于第二光产生的外差干涉光和在检查位置上散射并且具有从第一极化状态通过散射改变其偏振状态的光。

5. 发明授权

US5461474A Inspection apparatus for detecting foreign matter on a surface to be inspected, and an exposure apparatus and a device manufacturing method using the same 失效
标题翻译：用于检测被检查表面上的异物的检查装置，以及曝光装置及使用其的装置制造方法
公开(公告)号：US5461474A
公开(公告)日：1995-10-24
申请号：US266512
申请日：1994-06-27
申请人： Minoru Yoshii , Noriyuki Nose , Masayuki Suzuki , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
发明人： Minoru Yoshii , Noriyuki Nose , Masayuki Suzuki , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , H01L21/66
CPC分类号： G01N21/956 , G01N21/94
摘要： When inspecting the presence of foreign matter on a surface to be inspected by scanning the surface with a light beam from a light source utilizing a scanning system, and receiving scattered light from the surface by a detector, a correlation is utilized between a signal representing first scattered light obtained from the detector when the light beam scans a first line on the surface, and a signal representing second scattered light obtained from the detector when the light beam scans a second line displaced from the first line by a predetermined amount in a direction orthogonal to the direction of the first line.
摘要翻译：当通过利用扫描系统的来自光源的光束扫描表面并通过检测器接收来自表面的散射光来检查要检查的表面上的异物的存在时，在表示第一当光束扫描表面上的第一条线时，从检测器获得的散射光，以及当光束沿正交方向扫描从第一条线移位预定量的第二条线时，从检测器获得的第二散射光的信号到第一行的方向。

6. 发明授权

US5652657A Inspection system for original with pellicle 失效
标题翻译：检测系统为原装带防护罩
公开(公告)号：US5652657A
公开(公告)日：1997-07-29
申请号：US467922
申请日：1995-06-06
申请人： Minoru Yoshii , Michio Kohno , Seiya Miura , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
发明人： Minoru Yoshii , Michio Kohno , Seiya Miura , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , G03F1/62 , G03F1/84 , H01L21/027 , G01B11/00
CPC分类号： G01N21/94
摘要： An inspection system inspecting an original with a pellicle, which system includes a light source for providing a light beam, a first detecting device for receiving light produced as a result of passage of the light beam through the pellicle, a second detecting device for receiving light produced as a result of non-passage of the light beam through the pellicle, and a processing system for determining information related to transmissivity of the pellicle, on the basis of outputs of the first and second detecting devices.
摘要翻译：一种用防护薄膜组件检查原件的检查系统，该系统包括用于提供光束的光源，用于接收由于光束通过防护薄膜的结果而产生的光的第一检测装置，用于接收光的第二检测装置由于不通过光束通过防护薄膜组件而产生的结果，以及用于根据第一和第二检测装置的输出确定与防护薄膜组件的透射率有关的信息的处理系统。

7. 发明授权

US5610715A Displacement detecting system, an expose apparatus, and a device manufacturing method employing a scale whose displacement is detected by a selected detection head 失效
标题翻译：位移检测系统，曝光装置以及使用由所选检测头检测位移的标度的装置制造方法
公开(公告)号：US5610715A
公开(公告)日：1997-03-11
申请号：US412309
申请日：1995-03-29
申请人： Minoru Yoshii , Kyoichi Miyazaki , Seiji Takeuchi
发明人： Minoru Yoshii , Kyoichi Miyazaki , Seiji Takeuchi
IPC分类号： G01B11/00 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/68 , G01B9/02
CPC分类号： G03F7/70775 , G03F9/70
摘要： A displacement detecting system includes a scale provided on a surface of a movable object and having a diffraction grating formed along a predetermined direction, a head unit disposed above the surface of the movable object and having a plurality of detection heads, for detecting displacement of the scale in the predetermined direction, the detection heads being disposed along a direction different from the predetermined direction, and a selecting device for selecting at least one detection head out of the detection heads, for detection of a displacement of the scale in the predetermined direction.
摘要翻译：位移检测系统包括设置在可移动物体的表面上并具有沿着预定方向形成的衍射光栅的标尺，头单元，其设置在可移动物体的表面上方并具有多个检测头，用于检测位移检测头沿着与预定方向不同的方向设置，以及选择装置，用于从检测头中选择至少一个检测头，以检测标尺在预定方向上的位移。

8. 发明授权

US5777744A Exposure state detecting system and exposure apparatus using the same 失效
标题翻译：曝光状态检测系统及使用其的曝光装置
公开(公告)号：US5777744A
公开(公告)日：1998-07-07
申请号：US648417
申请日：1996-05-15
申请人： Minoru Yoshii , Masanobu Hasegawa , Kyoichi Miyazaki , Seiji Takeuchi
发明人： Minoru Yoshii , Masanobu Hasegawa , Kyoichi Miyazaki , Seiji Takeuchi
IPC分类号： G03F7/20 , G01B11/00
CPC分类号： G03F7/70558 , G03F7/70641 , G03F7/70675
摘要： A state-of-formation detecting system for detecting a state of formation of a periodic pattern formed, through exposure light, upon an object with a photosensitive material applied thereto, includes a light projecting device for projecting input light onto the periodic pattern, and a determining device for receiving signal light from the periodic pattern and for detecting a change in the input light, to determine the state of formation of the periodic pattern on the basis of the change in the input light.
摘要翻译：一种用于检测通过曝光光形成的周期性图案的形成状态的状态检测系统，包括用于将输入光投射到周期性图案上的投光装置，以及确定装置，用于接收来自周期性图案的信号光并用于检测输入光的变化，以基于输入光的变化确定周期性图案的形成状态。

9. 发明授权

US5585918A Foreign particle inspecting system 失效
标题翻译：国外颗粒检测系统
公开(公告)号：US5585918A
公开(公告)日：1996-12-17
申请号：US494539
申请日：1995-06-26
申请人： Seiji Takeuchi , Kyoichi Miyazaki , Toshihiko Tsuji
发明人： Seiji Takeuchi , Kyoichi Miyazaki , Toshihiko Tsuji
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , G03F1/84 , H01L21/00 , H01L21/027 , H05B37/00
CPC分类号： H01L21/67253 , G01N21/94 , G03F1/84 , G01N2021/95676
摘要： An inspecting system includes a light source, an irradiating optical system for irradiating a surface of an object such as a reticle or photomask with light from the light source, a detection optical system for detecting scattered light from the surface of the object, and a light blocking device provided substantially parallel to the surface of the object, the light blocking device having a first light transmitting portion for passing light coming from the light source toward the surface of the object and a second light transmitting portion for passing light coming from an irradiated position on the surface of the object toward the detection optical system.
摘要翻译：一种检查系统，包括光源，用于从光源的光照射诸如掩模版或光掩模的物体的表面的照射光学系统，用于检测来自物体的表面的散射光的检测光学系统，以及光遮光装置设置成基本上平行于物体的表面，遮光装置具有用于使来自光源的光朝向物体的表面通过的第一透光部分和用于使来自照射位置的光通过的第二透光部分在物体的表面上朝向检测光学系统。

10. 发明授权

US5969820A Surface position detecting system and exposure apparatus using the same 失效
标题翻译：表面位置检测系统及使用其的曝光装置
公开(公告)号：US5969820A
公开(公告)日：1999-10-19
申请号：US873748
申请日：1997-06-12
申请人： Minoru Yoshii , Masanobu Hasegawa , Kyoichi Miyazaki
发明人： Minoru Yoshii , Masanobu Hasegawa , Kyoichi Miyazaki
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/7026
摘要： A surface position detecting system for detecting a position of a surface of an object disposed opposed to an exposure system, with respect to a direction of an optical system of the exposure system, includes an irradiation device for projecting light to the surface of the object, obliquely with respect to the optical axis of the exposure system, a detecting device for detecting light from the surface of the object irradiated with light from the irradiation device, the detecting device detecting a position of the surface of the object with respect to the optical axis direction of the exposure system, and a light quantity adjusting device provided in at least least one of the irradiation device and the detecting device, for controlling the quantity of light passage.
摘要翻译：用于检测与曝光系统相对设置的物体的表面相对于曝光系统的光学系统的方向的位置的表面位置检测系统包括：用于将光投射到物体的表面的照射装置，相对于曝光系统的光轴倾斜的检测装置，用于检测来自被照射装置的光的物体的表面的光的检测装置，检测装置检测物体相对于光轴的表面的位置曝光系统的方向，以及设置在照射装置和检测装置的至少一个中的光量调节装置，用于控制光通过量。

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