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1. 发明授权

US06999157B2 Illumination optical system and method, and exposure apparatus 失效
公开(公告)号：US06999157B2
公开(公告)日：2006-02-14
申请号：US10421271
申请日：2003-04-23
申请人： Michio Kohno
发明人： Michio Kohno
IPC分类号： G03G27/42 , G03B27/54 , G03B27/32 , G03C5/00
CPC分类号： G03F7/70108 , G03F7/70183
摘要： An illumination optical system for illuminating a reticle using light from a light source includes an illumination-light generating mechanism for generating a light amount distribution on a plane that has a substantially Fourier conversion relationship with the reticle while making variable a ratio of a light amount or area between a first area and a second area different from the first area, the first and second areas being on the plane, wherein light from the first area illuminates the reticle to resolve a desired pattern on the reticle, and light from the second area illuminates the reticle to restrain an auxiliary pattern on the reticle from resolving.

2. 发明授权

US5581348A Surface inspecting device using bisected multi-mode laser beam and system having the same 失效
标题翻译：使用二等分多模激光束的表面检查装置及具有相同功能的系统
公开(公告)号：US5581348A
公开(公告)日：1996-12-03
申请号：US591916
申请日：1996-01-25
申请人： Seiya Miura , Michio Kohno , Takehiko Iwanaga
发明人： Seiya Miura , Michio Kohno , Takehiko Iwanaga
IPC分类号： G01N21/94 , G01N21/95 , G01N21/00 , G02B27/10
CPC分类号： G01N21/94
摘要： A surface state inspecting device includes an illumination system for illuminating a surface to be inspected, with a beam having non-uniform sectional intensity distribution, a uniforming system for substantially uniforming the sectional intensity distribution of the beam, and an inspecting portion for detecting scattered light from the surface to determine the state of the surface.
摘要翻译：表面状态检查装置包括用于照射具有不均匀分布强度分布的光束的被检查表面的照明系统，用于使束的截面强度分布基本均匀化的均匀系统，以及用于检测散射光的检查部从表面来确定表面的状态。

3. 发明授权

US5381225A Surface-condition inspection apparatus 失效
标题翻译：表面状态检查装置
公开(公告)号：US5381225A
公开(公告)日：1995-01-10
申请号：US199971
申请日：1994-02-22
申请人： Michio Kohno
发明人： Michio Kohno
IPC分类号： G01B11/30 , G01N21/88 , G01N21/94 , G01N21/956 , G03F1/84 , G01N21/89
CPC分类号： G01N21/94 , G01N2021/95676
摘要： An apparatus for inspecting a surface condition of an object having at least a first surface to be inspected and a second surface to be inspected with a higher detection resolution than the first surface includes a holding mechanism, and first and second inspection systems. The holding mechanism holds the object so as to dispose the second surface at a constant position irrespective of the distance between the first and second surfaces. The first and second inspection systems inspect the first and second surfaces of the object, respectively, and each includes an irradiator producing a condensed light beam to illuminate a surface of the object and a receiver for receiving light from a surface of the object. The first and second inspection systems set the angle subtended by the condensed light beam of the first inspection system to be smaller than the angle subtended by the condensed light beam of the second inspection system.
摘要翻译：用于检查具有至少第一待检查表面的物体的表面状况的设备和具有比第一表面更高的检测分辨率的待检查的第二表面的设备包括保持机构以及第一和第二检查系统。保持机构保持物体，以将第二表面设置在恒定位置，而与第一和第二表面之间的距离无关。第一和第二检查系统分别检查物体的第一和第二表面，并且每个包括产生聚光的照射器以照射物体的表面的辐射器和用于从物体的表面接收光的接收器。第一检测系统和第二检查系统将第一检查系统的凝结光束对向的角度设定为小于第二检查系统的聚光束所对向的角度。

4. 发明授权

US4886975A Surface examining apparatus for detecting the presence of foreign particles on two or more surfaces 失效
标题翻译：表面检查装置，用于检测两个或多个表面上的外来颗粒的存在
公开(公告)号：US4886975A
公开(公告)日：1989-12-12
申请号：US348177
申请日：1989-05-02
申请人： Eiichi Murakami , Michio Kohno , Akiyoshi Suzuki
发明人： Eiichi Murakami , Michio Kohno , Akiyoshi Suzuki
IPC分类号： G01N21/94 , G01N21/956
CPC分类号： G01N21/94 , G01N2021/4719 , G01N2021/95676
摘要： An apparatus usable with an object having surfaces, for examining the states of the surfaces, includes on irradiating system for irradiating the surfaces of the object with a single light beam, and a plurality of light-receiving systems provided in association with the surfaces of the object, respectively, the plural light-receiving systems being arranged to receive light scatteringly reflected from the surfaces of the object, respectively, and to produce outputs corresponding to the states of the surfaces of the object, respectively.
摘要翻译：可用于具有用于检查表面状态的表面的物体的装置包括用于用单个光束照射物体的表面的照射系统，以及与所述物体的表面相关联地设置的多个光接收系统目的是分别将多个光接收系统分别接收从物体的表面散射地反射的光，并分别产生与物体的表面的状态相对应的输出。

5. 发明授权

US4705940A Focus detection in a projection optical system 失效
标题翻译：投影光学系统中的焦点检测
公开(公告)号：US4705940A
公开(公告)日：1987-11-10
申请号：US757341
申请日：1985-07-22
申请人： Michio Kohno
发明人： Michio Kohno
IPC分类号： H01L21/30 , G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , G01J1/20
CPC分类号： G03F9/7026
摘要： A projection optical system including a projection optical element for projecting a pattern of a mask onto a wafer, wherein astigmatism is corrected with respect to a predetermined region of a field of the projection optical element and wherein the astigmatism is not corrected with respect to another region of the field of the projection optical element. Also provided is a detector for detecting a state of focus of the projection optical element with respect to the wafer, on the basis of the effect of the astigmatism on a light beam from the region of the field of the projection optical element, in which region the astigmatism is not corrected.
摘要翻译：一种投影光学系统，包括用于将掩模的图案投影到晶片上的投影光学元件，其中相对于所述投影光学元件的场的预定区域校正散光，并且其中所述像散相对于另一区域不被校正的投影光学元件的场。还提供了一种用于基于像散对来自投影光学元件的场的区域的光束的影响来检测投影光学元件相对于晶片的焦点状态的检测器，其中区域散光没有改正。

6. 发明授权

US06857764B2 Illumination optical system and exposure apparatus having the same 失效
标题翻译：照明光学系统和具有该光学系统的曝光装置
公开(公告)号：US06857764B2
公开(公告)日：2005-02-22
申请号：US09342210
申请日：1999-06-29
申请人： Michio Kohno
发明人： Michio Kohno
IPC分类号： G02B5/10 , G02B17/08 , G03F7/20 , H01L21/027 , F21V13/12 , G02B6/32
CPC分类号： G03F7/70066
摘要： An illumination optical system includes a luminous intensity distribution converting optical system for converting an illuminance distribution of a light source image into a luminous intensity distribution upon a predetermined plane, a light transmitting element having its light entrance surface disposed substantially in coincidence with the predetermined plane, and a light collecting optical system for defining an illumination region upon a surface to be illuminated, by use of light from the light transmitting element.
摘要翻译：照明光学系统包括：发光强度分布转换光学系统，用于将光源图像的照度分布转换为预定平面上的发光强度分布;光传输元件，其光入射面基本上与预定平面重合; 以及聚光光学系统，用于通过使用来自光发射元件的光来限定被照射表面上的照明区域。

7. 发明授权

US5448350A Surface state inspection apparatus and exposure apparatus including the same 失效
标题翻译：表面状态检查装置及包括该表面状态的曝光装置
公开(公告)号：US5448350A
公开(公告)日：1995-09-05
申请号：US352444
申请日：1994-12-09
申请人： Michio Kohno
发明人： Michio Kohno
IPC分类号： G01B11/30 , G01N21/88 , G01N21/94 , G01N21/956 , G03F1/84 , G03F7/20 , H01L21/027 , H01L21/66 , G01N21/89
CPC分类号： G01N21/94 , G01N21/956 , G03F7/70483
摘要： This invention relates to a surface state inspection apparatus, and more particularly, to a surface state inspection apparatus which is suitable for detecting foreign particles or pattern defects on a pattern or on a surface of a photomask, a reticle or the like, serving as an original plate for pattern transfer in a semiconductor exposure apparatus. Light beams issued from a point to be inspected are guided to an aperture diaphragm using an optical system from a plurality of directions, and further, to a common detector. Hence, the present invention provides the effects that the amount of scattered light detected by the common detector can be greatly increased without providing a large condenser optical system, thereby increasing the S/N ratio, and a foreign particle or a defect at the point to be inspected is completely detected even if the outgoing direction of scattered light from the foreign particle or the defect has a peculiarity.
摘要翻译：表面状态检查装置技术领域本发明涉及一种表面状态检查装置，更具体地说，涉及一种表面状态检查装置，该表面状态检查装置适用于检测图案上的外来颗粒或图案缺陷，或者用作光掩模，掩模版等的表面在半导体曝光装置中用于图案转印的原版。从被检查点发出的光束使用光学系统从多个方向引导到孔径光阑，并且进一步被引导到公共检测器。因此，本发明提供了如下效果：即使没有提供大的电容式光学系统也能够大幅提高普通检测器所检测出的散射光的量，从而提高S / N比，将外来粒子或缺陷点即使来自异物或缺陷的散射光的出射方向具有特殊性，也被完全检测。

8. 发明授权

US5105092A Inspecting apparatus having a detection sensitivity controller means 失效
标题翻译：具有检测灵敏度控制装置的检查装置
公开(公告)号：US5105092A
公开(公告)日：1992-04-14
申请号：US718909
申请日：1991-06-24
申请人： Katsutoshi Natsubori , Nobuhiro Kodachi , Michio Kohno
发明人： Katsutoshi Natsubori , Nobuhiro Kodachi , Michio Kohno
IPC分类号： G01N21/88 , G01J1/44 , G01N21/94 , G01N21/956 , H01L21/027 , H01L21/30 , H01L21/66
CPC分类号： G01N21/94 , G01J2001/4453 , G01N2021/95676 , G01N21/8851
摘要： An inspecting apparatus, for inspecting a surface state of an article to be inspected, includes a zone detecting system for detecting a zone which can cause strong scattering of light; a surface state detecting system for detecting the surface state of the article, the surface state detecting system including a light source for projecting an inspecting light beam to the article, a light scanning mechanism for relatively moving the article and the inspecting light beam so that the article is scanned with the inspecting light beam, and a photoelectric converter for detecting light from the article scanned with the inspecting light beam by the light source and the light scanning mechanism; an inspecting device for receiving an output signal from the photoelectric converter and for inspecting the surface state of the article; and a sensitivity controller for controlling the detection sensitivity of the surface state detecting system on the basis of the detection by the zone detecting system, such that when the inspecting light beam scans the zone, the detection sensitivity of the surface state detecting system is relatively reduced.
摘要翻译：用于检查被检查物品的表面状态的检查装置包括：区域检测系统，用于检测能够引起强烈散射光的区域; 表面状态检测系统，用于检测物品的表面状态，表面状态检测系统包括用于将检查光束投射到物品的光源，用于使物品和检查光束相对移动的光扫描机构，用检查光束扫描物品，以及用于通过光源和光扫描机构检测用检查光束扫描的物品的光的光电转换器; 检测装置，用于从光电转换器接收输出信号并检查物品的表面状态; 以及灵敏度控制器，其基于区域检测系统的检测来控制表面状态检测系统的检测灵敏度，使得当检查光束扫描该区域时，表面状态检测系统的检测灵敏度相对降低。

9. 发明授权

US5017798A Surface examining apparatus for detecting the presence of foreign particles on two or more surfaces 失效
标题翻译：表面检查装置，用于检测两个或多个表面上的外来颗粒的存在
公开(公告)号：US5017798A
公开(公告)日：1991-05-21
申请号：US406090
申请日：1989-09-12
申请人： Eiichi Murakami , Michio Kohno , Akiyoshi Suzuki
发明人： Eiichi Murakami , Michio Kohno , Akiyoshi Suzuki
IPC分类号： G01N21/94 , G01N21/956
CPC分类号： G01N21/94 , G01N2021/4719 , G01N2021/95676
摘要： An apparatus usable with an object having surfaces, for examining the states of the surfaces, includes on irradiating system for irradiating the surfaces of the object with a single light beam, and a plurality of light-receiving systems provided in association with the surfaces of the object, respectively, the plural light-receiving systems being arranged to receive light scatteringly reflected from the surfaces of the object, respectively, and to produce outputs corresponding to the states of the surfaces of the object, respectively.

10. 发明授权

US4865455A Optical device having a variable geometry filter usable for aligning a mask or reticle with a wafer 失效
标题翻译：具有可用于将掩模或掩模版与晶片对准的可变几何滤镜的光学器件
公开(公告)号：US4865455A
公开(公告)日：1989-09-12
申请号：US314272
申请日：1989-02-22
申请人： Michio Kohno , Akiyoshi Suzuki
发明人： Michio Kohno , Akiyoshi Suzuki
IPC分类号： H01L21/30 , G02B27/46 , G03F9/00 , H01L21/027
CPC分类号： G03F9/70
摘要： An optical device including a spatial filter disposed at a location coincident with or in close proximity to a position optically conjugate with a pupil of a projection optical system for projecting a pattern of a mask onto a wafer. The spatial filter is adapted to intercept a light beam specularly reflected by a surface of the mask and/or by a surface of the wafer to thereby allow photoelectric detection of a light beam scatteringly reflected from the mask surface and/or the wafer surface. The spatial filter has a variable geometry filtering portion to assume high-accuracy photoelectric detection of the scatteringly reflected light beam.
摘要翻译：一种光学装置，包括设置在与投影光学系统的光瞳光学共轭的位置重合或紧邻的位置处的空间滤光器，用于将掩模的图案投影到晶片上。空间滤波器适于截取由掩模的表面镜面反射的光束和/或由晶片的表面，从而允许从掩模表面和/或晶片表面散射地反射的光束的光电检测。空间滤波器具有可变几何滤波部分，以假设散射反射光束的高精度光电检测。

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