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1. 发明申请

US20120160155A1 COMPOSITE CRUCIBLE, METHOD OF MANUFACTURING THE SAME, AND METHOD OF MANUFACTURING SILICON CRYSTAL 有权
标题翻译：复合硬质合金，其制造方法和制造硅晶体的方法
公开(公告)号：US20120160155A1
公开(公告)日：2012-06-28
申请号：US13394268
申请日：2010-08-20
申请人： Toshiaki Sudo , Takuma Yoshioka , Hiroshi Kishi , Takeshi Fujita , Minoru Kanda , Koichi Suzuki , Ken Kitahara
发明人： Toshiaki Sudo , Takuma Yoshioka , Hiroshi Kishi , Takeshi Fujita , Minoru Kanda , Koichi Suzuki , Ken Kitahara
IPC分类号： C30B15/10 , C03B19/02 , C03B20/00
CPC分类号： C04B41/5022 , C03B5/025 , C03B19/02 , C03B19/09 , C03B19/095 , C03C17/004 , C03C17/02 , C03C2217/213 , C03C2218/13 , C03C2218/17 , C04B35/185 , C04B41/009 , C04B41/86 , C04B2235/6027 , C30B15/10 , C30B29/06 , C30B35/002 , Y02P40/57 , Y10T117/1032 , C04B41/4527
摘要： The purpose of the present invention is to provide a crucible which has high viscosity at high temperature, and can be used for a long time, and can be manufactured at low cost, and a method of manufacturing the same. The composite crucible 10 is characterized in the use of mullite (3Al2O3.2SiO2) as the basic material of the crucible. The composite crucible 10 has the crucible body 11 made of mullite material whose main component is alumina and silica, and a transparent vitreous silica layer 12 formed on the inner surface of the crucible body 11. The thickness of the transparent vitreous silica layer 12 is smaller than that of the crucible body 11. The crucible body 11 can be formed by the slip casting method, and the transparent vitreous silica layer 12 can be formed by the thermal spraying method.
摘要翻译：本发明的目的是提供一种在高温下具有高粘度且长时间使用并且可以低成本制造的坩埚及其制造方法。复合坩埚10的特征在于使用莫来石（3Al2O3.2SiO2）作为坩埚的基本材料。复合坩埚10具有由主成分为氧化铝和二氧化硅的莫来石材料制成的坩埚体11和形成在坩埚体11的内表面上的透明玻璃状石英层12.透明玻璃状石英层12的厚度较小坩埚主体11可以通过流延法形成，透明玻璃状二氧化硅层12可以通过热喷涂法形成。

2. 发明授权

US09133063B2 Composite crucible, method of manufacturing the same, and method of manufacturing silicon crystal 有权
标题翻译：复合坩埚及其制造方法以及硅晶体的制造方法
公开(公告)号：US09133063B2
公开(公告)日：2015-09-15
申请号：US13394268
申请日：2010-08-20
申请人： Toshiaki Sudo , Takuma Yoshioka , Hiroshi Kishi , Takeshi Fujita , Minoru Kanda , Koichi Suzuki , Ken Kitahara
发明人： Toshiaki Sudo , Takuma Yoshioka , Hiroshi Kishi , Takeshi Fujita , Minoru Kanda , Koichi Suzuki , Ken Kitahara
IPC分类号： C30B15/10 , C03B19/02 , C03B20/00 , C04B41/50 , C03B19/09 , C04B35/185 , C04B41/00 , C04B41/86 , C30B29/06 , C30B35/00
CPC分类号： C04B41/5022 , C03B5/025 , C03B19/02 , C03B19/09 , C03B19/095 , C03C17/004 , C03C17/02 , C03C2217/213 , C03C2218/13 , C03C2218/17 , C04B35/185 , C04B41/009 , C04B41/86 , C04B2235/6027 , C30B15/10 , C30B29/06 , C30B35/002 , Y02P40/57 , Y10T117/1032 , C04B41/4527
摘要： The purpose of the present invention is to provide a crucible which has high viscosity at high temperature, and can be used for a long time, and can be manufactured at low cost, and a method of manufacturing the same. The composite crucible 10 is characterized in the use of mullite (3Al2O3.2SiO2) as the basic material of the crucible. The composite crucible 10 has the crucible body 11 made of mullite material whose main component is alumina and silica, and a transparent vitreous silica layer 12 formed on the inner surface of the crucible body 11. The thickness of the transparent vitreous silica layer 12 is smaller than that of the crucible body 11. The crucible body 11 can be formed by the slip casting method, and the transparent vitreous silica layer 12 can be formed by the thermal spraying method.
摘要翻译：本发明的目的是提供一种在高温下具有高粘度且长时间使用并且可以低成本制造的坩埚及其制造方法。复合坩埚10的特征在于使用莫来石（3Al2O3.2SiO2）作为坩埚的基本材料。复合坩埚10具有由主成分为氧化铝和二氧化硅的莫来石材料制成的坩埚体11和形成在坩埚体11的内表面上的透明玻璃状石英层12.透明玻璃状石英层12的厚度较小坩埚主体11可以通过流延法形成，透明玻璃状二氧化硅层12可以通过热喷涂法形成。

3. 发明申请

US20120141622A1 APPARATUS FOR MANUFACTURING VITREOUS SILICA CRUCIBLE 审中-公开
标题翻译：用于制造维生素二氧化硅可溶性的装置
公开(公告)号：US20120141622A1
公开(公告)日：2012-06-07
申请号：US13308308
申请日：2011-11-30
申请人： Toshiaki Sudo , Hiroshi Kishi , Takeshi Fujita , Minoru Kanda
发明人： Toshiaki Sudo , Hiroshi Kishi , Takeshi Fujita , Minoru Kanda
IPC分类号： B29C35/02
CPC分类号： C03B19/095
摘要： Provided is an apparatus for manufacturing a vitreous silica crucible which has a structure which can reduce gaps between a partition wall and electrodes inserted into through-holes formed in the partition wall while enabling electrodes to move to adjust a heating temperature of arc discharge. A plate-shaped partition wall 15 is placed above the rotating mold 10. Electrodes 13 for heating and fusing are inserted into through-holes 16 penetrating in a thickness direction, and are directed toward the rotating mold 10. A rocking unit 40 is provided on an upper side of the partition wall 15 and rocks the electrodes 13 around virtual rocking axes P, and the virtual rocking axes P pass through the through-holes 16.
摘要翻译：本发明提供一种制造石英玻璃坩埚的装置，其具有能够减少分隔壁与插入形成在隔壁中的通孔的电极之间的间隙的结构，同时使电极移动以调节电弧放电的加热温度。板状分隔壁15被放置在旋转模具10的上方。用于加热和熔合的电极13被插入穿透厚度方向的通孔16中，并被引导到旋转模具10上。摆动单元40设置在分隔壁15的上侧并围绕虚拟摇摆轴线P围绕电极13，并且虚拟摇摆轴线P穿过通孔16。

4. 发明申请

US20120160159A1 VITREOUS SILICA CRUCIBLE FOR PULLING SILICON SINGLE CRYSTAL AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：用于拉丝硅单晶的耐火二氧化硅巧克力及其制造方法
公开(公告)号：US20120160159A1
公开(公告)日：2012-06-28
申请号：US13394284
申请日：2010-08-10
申请人： Toshiaki Sudo , Makiko Kodama , Minoru Kanda , Hiroshi Kishi
发明人： Toshiaki Sudo , Makiko Kodama , Minoru Kanda , Hiroshi Kishi
IPC分类号： C30B15/10 , C03B20/00
CPC分类号： C03B19/095 , C30B15/10 , C30B29/06 , C30B29/18 , C30B35/002 , Y02P40/57 , Y10T117/1032
摘要： The present invention provides a vitreous silica crucible which can suppress the sidewall lowering of the crucible under high temperature during pulling a silicon single crystal, and a method of manufacturing such a vitreous silica crucible. The vitreous silica crucible 10 includes an opaque vitreous silica layer 11 provided on the outer surface side of the crucible and containing numerous bubbles, and a transparent vitreous silica layer 12 provided on the inner surface side. The opaque vitreous silica layer 11 includes a first opaque vitreous silica portion 11a provided on the crucible upper portion, and a second opaque vitreous silica portion 11b provided on the crucible lower portion. The specific gravity of the second opaque vitreous silica portion 11b is 1.7 to 2.1, and the specific gravity of the first opaque vitreous silica portion 11a is 1.4 to 1.8, and smaller than that of the second opaque vitreous silica portion. The particle size distribution of the material silica powder for the first opaque vitreous silica portion 11a is wider than that of the second opaque vitreous silica portion 11b, and the material silica powder for the first opaque vitreous silica portion 11a includes more fine powder than that for the second opaque vitreous silica portion 11b.
摘要翻译：本发明提供一种可以在拉拔硅单晶时抑制坩埚在高温下的侧壁降低的石英玻璃坩埚，以及制造这种石英玻璃坩埚的方法。玻璃状石英玻璃坩埚10包括设置在坩埚的外表面侧并且含有大量气泡的不透明玻璃状石英层11和设置在内表面侧的透明氧化硅玻璃层12。不透明玻璃状石英层11包括设置在坩埚上部的第一不透明玻璃状石英部分11a和设置在坩埚下部的第二不透明玻璃状石英部分11b。第二不透玻璃状二氧化硅部11b的比重为1.7〜2.1，第一不透明玻璃状石英部11a的比重为1.4〜1.8，小于第二不透明玻璃状二氧化硅部的比重。用于第一不透明玻璃状石英部分11a的材料二氧化硅粉末的粒度分布比第二不透明玻璃状二氧化硅部分11b的粒度分布宽，并且用于第一不透明玻璃状石英部分11a的材料二氧化硅粉末包含比第二不透明玻璃状石英部分11b。

5. 发明授权

US08936685B2 Vitreous silica crucible for pulling silicon single crystal and method of manufacturing the same 有权
标题翻译：用于拉硅单晶的玻璃状硅石坩埚及其制造方法
公开(公告)号：US08936685B2
公开(公告)日：2015-01-20
申请号：US13394284
申请日：2010-08-20
申请人： Toshiaki Sudo , Makiko Kodama , Minoru Kanda , Hiroshi Kishi
发明人： Toshiaki Sudo , Makiko Kodama , Minoru Kanda , Hiroshi Kishi
IPC分类号： C30B15/10 , C03B19/09 , C30B29/06 , C30B35/00 , C30B29/18
CPC分类号： C03B19/095 , C30B15/10 , C30B29/06 , C30B29/18 , C30B35/002 , Y02P40/57 , Y10T117/1032
摘要： The present invention provides a vitreous silica crucible which can suppress the sidewall lowering of the crucible under high temperature during pulling a silicon single crystal, and a method of manufacturing such a vitreous silica crucible. The vitreous silica crucible 10 includes an opaque vitreous silica layer 11 provided on the outer surface side of the crucible and containing numerous bubbles, and a transparent vitreous silica layer 12 provided on the inner surface side. The opaque vitreous silica layer 11 includes a first opaque vitreous silica portion 11a provided on the crucible upper portion, and a second opaque vitreous silica portion 11b provided on the crucible lower portion. The specific gravity of the second opaque vitreous silica portion 11b is 1.7 to 2.1, and the specific gravity of the first opaque vitreous silica portion 11a is 1.4 to 1.8, and smaller than that of the second opaque vitreous silica portion. The particle size distribution of the material silica powder for the first opaque vitreous silica portion 11a is wider than that of the second opaque vitreous silica portion 11b, and the material silica powder for the first opaque vitreous silica portion 11a includes more fine powder than that for the second opaque vitreous silica portion 11b.
摘要翻译：本发明提供一种可以在拉拔硅单晶时抑制坩埚在高温下的侧壁降低的石英玻璃坩埚，以及制造这种石英玻璃坩埚的方法。玻璃状石英玻璃坩埚10包括设置在坩埚的外表面侧并且含有大量气泡的不透明玻璃状石英层11和设置在内表面侧的透明氧化硅玻璃层12。不透明玻璃状石英层11包括设置在坩埚上部的第一不透明玻璃状石英部分11a和设置在坩埚下部的第二不透明玻璃状石英部分11b。第二不透玻璃状二氧化硅部11b的比重为1.7〜2.1，第一不透明玻璃状石英部11a的比重为1.4〜1.8，小于第二不透明玻璃状二氧化硅部的比重。用于第一不透明玻璃状石英部分11a的材料二氧化硅粉末的粒度分布比第二不透明玻璃状二氧化硅部分11b的粒度分布宽，并且用于第一不透明玻璃状石英部分11a的材料二氧化硅粉末包含比第二不透明玻璃状石英部分11b。

6. 发明授权

US08739573B2 Apparatus and method for manufacturing vitreous silica crucible 有权
标题翻译：玻璃石坩埚制造装置及方法
公开(公告)号：US08739573B2
公开(公告)日：2014-06-03
申请号：US13389392
申请日：2010-08-09
申请人： Toshiaki Sudo , Eriko Suzuki , Hiroshi Kishi , Takeshi Fujita
发明人： Toshiaki Sudo , Eriko Suzuki , Hiroshi Kishi , Takeshi Fujita
IPC分类号： C25B11/12 , C03B19/09 , C25B11/04 , C04B35/52
CPC分类号： C25B11/12 , C03B19/09 , C03B19/095 , C04B35/52 , C25B11/0405 , Y02P40/57
摘要： There are provided an apparatus and a method for manufacturing a vitreous silica crucible which can prevent the deterioration of the inner surface property in the manufacturing process of a vitreous silica crucible. The apparatus includes a mold defining an outer shape of a vitreous silica crucible, and an arc discharge unit having electrodes and a power-supply unit, wherein each of the electrodes includes a tip end directed to the mold, the other end opposite to the tip end, and a bent portion provided between the tip end and the other end.
摘要翻译：提供了一种可以防止在石英玻璃坩埚的制造过程中内表面特性劣化的石英玻璃坩埚的制造装置和方法。该装置包括限定二氧化硅玻璃坩埚的外形的模具和具有电极和电源单元的电弧放电单元，其中每个电极包括指向模具的尖端，与尖端相对的另一端端部和设置在前端和另一端之间的弯曲部分。

7. 发明申请

US20120131954A1 APPARATUS AND METHOD FOR MANUFACTURING VITREOUS SILICA CRUCIBLE 有权
标题翻译：用于制造维生素二氧化硅可溶性的装置和方法
公开(公告)号：US20120131954A1
公开(公告)日：2012-05-31
申请号：US13389392
申请日：2010-08-09
申请人： Toshiaki Sudo , Eriko Suzuki , Hiroshi Kishi , Takeshi Fujita
发明人： Toshiaki Sudo , Eriko Suzuki , Hiroshi Kishi , Takeshi Fujita
IPC分类号： C03B20/00
CPC分类号： C25B11/12 , C03B19/09 , C03B19/095 , C04B35/52 , C25B11/0405 , Y02P40/57
摘要： There are provided an apparatus and a method for manufacturing a vitreous silica crucible which can prevent the deterioration of the inner surface property in the manufacturing process of a vitreous silica crucible. The apparatus includes a mold defining an outer shape of a vitreous silica crucible, and an arc discharge unit having electrodes and a power-supply unit, wherein each of the electrodes includes a tip end directed to the mold, the other end opposite to the tip end, and a bent portion provided between the tip end and the other end.
摘要翻译：提供了一种可以防止在石英玻璃坩埚的制造过程中内表面特性劣化的石英玻璃坩埚的制造装置和方法。该装置包括限定二氧化硅玻璃坩埚的外形的模具和具有电极和电源单元的电弧放电单元，其中每个电极包括指向模具的尖端，与尖端相对的另一端端部和设置在前端和另一端之间的弯曲部分。

8. 发明授权

US09416463B2 Vitreous silica crucible 有权
标题翻译：石英玻璃坩埚
公开(公告)号：US09416463B2
公开(公告)日：2016-08-16
申请号：US13148463
申请日：2010-12-13
申请人： Toshiaki Sudo , Hiroshi Kishi
发明人： Toshiaki Sudo , Hiroshi Kishi
IPC分类号： C30B35/00 , C30B15/10 , C03B19/09
CPC分类号： C30B15/10 , C03B19/095 , C30B35/002 , Y02P40/57 , Y10T117/1032
摘要： Provided is a vitreous silica crucible having a reference point, which is capable of accurately detecting the location of a defect in the vitreous silica crucible used for pulling silicon single crystal, determining a defect generating site of silicon single crystal, and investigating the cause of the defect. The reference point used for specifying the position relationship with respect to a particular part is formed in at least one site of an end portion, an inner wall and an outer wall of the crucible.
摘要翻译：本发明提供一种具有参考点的氧化硅玻璃坩埚，其能够精确地检测用于拉拔单晶硅的玻璃状石英坩埚中的缺陷的位置，确定单晶硅的缺陷产生位置，并调查其原因缺陷。用于指定相对于特定部件的位置关系的参考点形成在坩埚的端部，内壁和外壁的至少一个位置中。

9. 发明授权

US09115445B2 Vitreous silica crucible 有权
标题翻译：石英玻璃坩埚
公开(公告)号：US09115445B2
公开(公告)日：2015-08-25
申请号：US13148457
申请日：2010-12-13
申请人： Toshiaki Sudo , Hiroshi Kishi , Makiko Kodama
发明人： Toshiaki Sudo , Hiroshi Kishi , Makiko Kodama
IPC分类号： C30B35/00 , C03C19/00 , C03C23/00 , C30B15/10
CPC分类号： C30B35/002 , C03C19/00 , C03C23/0025 , C30B15/10 , Y10T117/1032
摘要： Provided is a vitreous silica crucible which has a special region for suppressing vibration of melt surface during pulling of a silicon single crystal and at the same time, a marking capable of accurately monitoring a changed position of the melt surface when passing through the special region. The special region for preventing sloshing of silicon melt is provided on an inner wall of a straight body portion, and the marking is provided at least at an upper end and a lower end of the special region.
摘要翻译：本发明提供一种玻璃状石英玻璃坩埚，其特征在于，在单晶硅拉拔期间具有抑制熔融表面的振动的特殊区域，同时具有能够精确地监测经过特殊区域时的熔融面的变化位置的标记。用于防止硅熔体晃动的特殊区域设置在直体部分的内壁上，并且标记至少设置在特殊区域的上端和下端。

10. 发明申请

US20120125257A1 VITREOUS SILICA CRUCIBLE 有权
标题翻译：紫外线可溶性
公开(公告)号：US20120125257A1
公开(公告)日：2012-05-24
申请号：US13148463
申请日：2010-12-13
申请人： Toshiaki Sudo , Hiroshi Kishi
发明人： Toshiaki Sudo , Hiroshi Kishi
IPC分类号： C30B15/10
CPC分类号： C30B15/10 , C03B19/095 , C30B35/002 , Y02P40/57 , Y10T117/1032
摘要： Provided is a vitreous silica crucible having a reference point, which is capable of accurately detecting the location of a defect in the vitreous silica crucible used for pulling silicon single crystal, determining a defect generating site of silicon single crystal, and investigating the cause of the defect. The reference point used for specifying the position relationship with respect to a particular part is formed in at least one site of an end portion, an inner wall and an outer wall of the crucible.
摘要翻译：本发明提供一种具有参考点的氧化硅玻璃坩埚，其能够精确地检测用于拉拔单晶硅的玻璃状石英坩埚中的缺陷的位置，确定单晶硅的缺陷产生位置，并调查其原因缺陷。用于指定相对于特定部件的位置关系的参考点形成在坩埚的端部，内壁和外壁的至少一个位置中。

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