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1. 发明授权

US09797063B2 Vitreous silica crucible 有权
公开(公告)号：US09797063B2
公开(公告)日：2017-10-24
申请号：US13307253
申请日：2011-11-30
申请人： Toshiaki Sudo , Hiroshi Kishi , Eriko Suzuki
发明人： Toshiaki Sudo , Hiroshi Kishi , Eriko Suzuki
IPC分类号： C30B15/10 , C03B19/09
CPC分类号： C30B15/10 , C03B19/095 , Y10T117/1032
摘要： The present invention provides a vitreous silica crucible which can suppress buckling and sidewall lowering of the crucible without fear of mixing of impurities into silicon melt. According to the present invention, provided is a vitreous silica crucible for pulling a silicon single crystal, wherein a ratio I2/I1 is 0.67 to 1.17, where I1 and I2 are area intensities of the peaks at 492 cm−1 and 606 cm−1, respectively, in Raman spectrum of vitreous silica of the region having a thickness of 2 mm from an outer surface to an inner surface of a wall of the crucible.

2. 发明授权

US09469560B2 Method of manufacturing vitreous silica crucible, vitreous silica crucible 有权
标题翻译：玻璃石坩埚，石英玻璃坩埚的制造方法
公开(公告)号：US09469560B2
公开(公告)日：2016-10-18
申请号：US13307316
申请日：2011-11-30
申请人： Toshiaki Sudo , Takuma Yoshioka , Koichi Suzuki , Shinsuke Yamazaki
发明人： Toshiaki Sudo , Takuma Yoshioka , Koichi Suzuki , Shinsuke Yamazaki
IPC分类号： C03B19/09 , C03B19/06 , C30B11/00 , C30B15/10
CPC分类号： C03B19/095 , C03B19/066 , C30B11/002 , C30B15/10 , Y10T428/131 , Y10T428/1314 , Y10T428/1317
摘要： The present invention provides a method of manufacturing a vitreous silica crucible having a transparent layer by use of waste vitreous silica. According to the present invention, there is provided a method of manufacturing a vitreous silica crucible for manufacturing a monocrystalline or polycrystalline silicon ingot, including a process of vitrifying a silica powder sintered body having a crucible shape in the whole or part of the thickness direction by arc fusing the silica powder sintered body from the inner surface side, wherein the method further includes at least one means of (1) depressurizing the silica powder sintered body from the outer surface side during the arc fusing, and (2) forming a synthetic vitreous silica layer on the inner surface by spraying synthetic silica powder onto the inner surface of the silica powder sintered body during the arc fusing.
摘要翻译：本发明提供一种通过使用废二氧化硅二氧化硅制造具有透明层的石英玻璃坩埚的方法。根据本发明，提供了一种制造用于制造单晶硅或多晶硅锭的石英玻璃坩埚的方法，该方法包括将整个或部分厚度方向上具有坩埚形状的二氧化硅粉末烧结体玻璃化的方法，从内表面电弧熔融二氧化硅粉末烧结体，其中该方法还包括（1）在电弧熔合期间从外表面侧使二氧化硅粉末烧结体减压的至少一种方法，和（2）形成合成玻璃态通过在电弧熔合期间将合成二氧化硅粉末喷涂到二氧化硅粉末烧结体的内表面上，在内表面上形成二氧化硅层。

3. 发明授权

US09347148B2 Vitreous silica crucible with specific ratio of transparent layer and bubble-containing layer thicknesses 有权
标题翻译：玻璃硅石坩埚具有特定比例的透明层和含气泡层厚度
公开(公告)号：US09347148B2
公开(公告)日：2016-05-24
申请号：US13308250
申请日：2011-11-30
申请人： Toshiaki Sudo , Ken Kitahara , Koichi Suzuki , Shinsuke Yamazaki
发明人： Toshiaki Sudo , Ken Kitahara , Koichi Suzuki , Shinsuke Yamazaki
IPC分类号： C30B15/10
CPC分类号： C30B15/10 , Y10T117/1032
摘要： Provided is a vitreous silica crucible, which is resistant to deformation and corrosion even when heated at high temperature for a long time. There is provided a vitreous silica crucible of the present invention including a substantially cylindrical straight body portion, a curved bottom portion, and a corner portion smoothly connecting the straight body portion and the bottom portion, wherein a wall of the vitreous silica crucible includes, from an inner surface side, a transparent layer and a bubble-containing layer, and a ratio of a thickness of the bubble-containing layer with respect to a thickness of the transparent layer at an intermediate position between an upper end and a lower end of the straight body portion is 0.7 to 1.4.
摘要翻译：提供一种二氧化硅玻璃坩埚，即使长时间在高温下加热也能抵抗变形和腐蚀。提供了一种本发明的石英玻璃坩埚，其包括基本上圆柱形的直体部分，弯曲的底部部分和平滑地连接直体部分和底部部分的角部分，其中，石英坩埚坩埚的壁包括内表面侧，透明层和含气泡层，以及气泡含量层的厚度相对于透明层的厚度在上端和下端之间的中间位置的比例直体部分为0.7〜1.4。

4. 发明授权

US09109300B2 Vitreous silica crucible provided with mineralizer on its inner surface and method of manufacturing silicon ingot using same 有权
标题翻译：在其内表面提供矿化剂的玻璃状硅石坩埚及使用其制造硅锭的方法
公开(公告)号：US09109300B2
公开(公告)日：2015-08-18
申请号：US13179280
申请日：2011-07-08
申请人： Toshiaki Sudo , Hiroshi Kishi
发明人： Toshiaki Sudo , Hiroshi Kishi
IPC分类号： C30B15/10
CPC分类号： C30B15/10 , Y10T117/1032
摘要： The present invention provides a vitreous silica crucible which can suppress buckling and sidewall lowering of the crucible in multi-pulling. According to the present invention, provided is a vitreous silica crucible for pulling a silicon single crystal, comprising a mineralizer on an inner surface of the crucible, wherein the mineralizer contains at least one atoms selected from the group consisting of Ca, Sr, Ba, Ra, Ti, Zr, Cr, Mo, Fe, Co, Ni, Cu, and Ag, and the concentration of the mineralizer on the inner surface is 1.0×105 to 1.0×1017 atoms/cm2.
摘要翻译：本发明提供一种可以抑制多拉的坩埚的翘曲和侧壁降低的石英玻璃坩埚。根据本发明，提供了一种用于拉动硅单晶的玻璃状石英坩埚，其包括在坩埚的内表面上的矿化剂，其中矿化剂含有选自Ca，Sr，Ba， Ra，Ti，Zr，Cr，Mo，Fe，Co，Ni，Cu和Ag，矿化剂在内表面的浓度为1.0×10 5〜1.0×10 17原子/ cm 2。

5. 发明授权

US08936684B2 Vitreous silica crucible 有权
标题翻译：石英玻璃坩埚
公开(公告)号：US08936684B2
公开(公告)日：2015-01-20
申请号：US13308344
申请日：2011-11-30
申请人： Toshiaki Sudo , Hiroshi Kishi , Ken Kitahara
发明人： Toshiaki Sudo , Hiroshi Kishi , Ken Kitahara
IPC分类号： C30B15/10 , C03B19/09
CPC分类号： C30B15/10 , C03B19/095 , Y10T117/10 , Y10T117/1024 , Y10T117/1032
摘要： The present invention provides a vitreous silica crucible which can suppress buckling and sidewall lowering of the crucible and the generation of cracks. According to the present invention, a vitreous silica crucible is provided for pulling a silicon single crystal having a wall, the wall including a non-doped inner surface layer made of natural vitreous silica or synthetic vitreous silica, a mineralizing element-maldistributed vitreous silica layer containing dispersed island regions each containing a mineralizing element, and wherein the vitreous silica of the island regions and the vitreous silica of a surrounding region of the island regions is a combination of mineralizing element-doped natural vitreous silica and non-doped synthetic vitreous silica, or a combination of mineralizing element-doped synthetic vitreous silica and non-doped natural vitreous silica, and the inner surface layer is made of vitreous silica of a different kind from that of the island region.
摘要翻译：本发明提供一种可以抑制坩埚的翘曲和侧壁降低以及产生裂纹的石英玻璃坩埚。根据本发明，提供一种玻璃状石英坩埚，用于拉拔具有壁的硅单晶，所述壁包括由天然氧化硅玻璃或合成玻璃态二氧化硅制成的非掺杂内表面层，矿化元素分布不均的玻璃状石英层含有各自含有矿化元素的分散的岛状区域，岛状区域的石英二氧化硅和岛状区域的周围区域的玻璃态二氧化硅是矿化元素掺杂天然玻璃质石英和非掺杂合成玻璃态二氧化硅的组合，或矿化元素掺杂的合成玻璃体二氧化硅和非掺杂天然玻璃体二氧化硅的组合，并且内表面层由与岛状区域不同种类的玻璃态二氧化硅制成。

6. 发明授权

US08281620B1 Apparatus for manufacturing vitreous silica crucible 有权
标题翻译：玻璃石坩埚制造装置
公开(公告)号：US08281620B1
公开(公告)日：2012-10-09
申请号：US13095425
申请日：2011-04-27
申请人： Toshiaki Sudo , Takeshi Fujita
发明人： Toshiaki Sudo , Takeshi Fujita
IPC分类号： C03B19/09
CPC分类号： C03B19/095 , Y02P40/57
摘要： During fabrication of a vitreous silica crucible, contamination of the vitreous silica crucible due to wear particles and debris of components of an apparatus for manufacturing a vitreous silica crucible is reduced by preventing damage and wear of the components of the apparatus due to silica fume. The apparatus for manufacturing a vitreous silica crucible is divided into a lower section for accommodating a mold and a mold driving system and an upper section for accommodating an arc electrode driving system, wherein a sectioning member including one or more communication paths for allowing penetration of arc electrodes, thereby the air flow is controlled so as to reduce exchange between gas in the upper section and gas in the lower section.
摘要翻译：在制造石英玻璃坩埚期间，通过防止二氧化硅烟雾对设备的部件造成损坏和磨损，从而降低了由于磨石颗粒和用于制造石英玻璃坩埚的装置的部件的碎屑引起的石英玻璃坩埚的污染。用于制造石英玻璃坩埚的装置被分成用于容纳模具的下部和模具驱动系统以及用于容纳弧形电极驱动系统的上部，其中，包括一个或多个连通路径以允许电弧穿透的分段部件电极，从而控制空气流，以减少上部气体与下部气体之间的交换。

7. 发明授权

US08276402B2 Method and apparatus for manufacturing vitreous silica crucible 有权
标题翻译：石英玻璃坩埚的制造方法和装置
公开(公告)号：US08276402B2
公开(公告)日：2012-10-02
申请号：US13095431
申请日：2011-04-27
申请人： Toshiaki Sudo , Hiroshi Kishi , Kouta Hasebe
发明人： Toshiaki Sudo , Hiroshi Kishi , Kouta Hasebe
IPC分类号： C03B19/06 , C03B19/09 , C03B20/00
CPC分类号： C03B19/095
摘要： Provided is a method of manufacturing a vitreous silica crucible, including: an arc fusing process for fusing the silica powder molded body by using arc flames generated from the plurality of carbon electrodes, wherein the arc fusing process is performed in a state of disposing tips of at least a pair of carbon electrodes of the plurality of carbon electrodes closer to a target surface of the silica powder molded body than other carbon electrode tips, and setting distances from each of the tips of the closer carbon electrodes to the target surface, to be equal, and the arc fusing process is performed by heating and fusing the silica powder molded body while performing fire polishing, which partially removes an inner surface of the silica powder molded body by using arc flames generated by the closer carbon electrodes.
摘要翻译：本发明提供一种石英玻璃坩埚的制造方法，其特征在于，包括：通过使用由所述多个碳电极产生的电弧火焰来熔融所述二氧化硅粉末成形体的电弧熔合法，其中，所述电弧定影处理以多个碳电极中的至少一对碳电极比其他碳电极端部更靠近二氧化硅粉末成形体的目标表面，并且将距离更近的碳电极的每个尖端到目标表面的距离设定为相等，通过在进行火抛光的同时对二氧化硅粉末成形体进行加热熔融来进行电弧定影处理，通过使用由较近的碳电极产生的电弧火来部分除去二氧化硅粉末成形体的内表面。

8. 发明申请

US20120141704A1 METHOD OF MANUFACTURING VITREOUS SILICA CRUCIBLE, VITREOUS SILICA CRUCIBLE 有权
标题翻译：维生素二氧化硅可溶性，维生素二氧化硅可溶性的方法
公开(公告)号：US20120141704A1
公开(公告)日：2012-06-07
申请号：US13307316
申请日：2011-11-30
申请人： Toshiaki SUDO , Takuma YOSHIOKA , Koichi SUZUKI , Shinsuke YAMAZAKI
发明人： Toshiaki SUDO , Takuma YOSHIOKA , Koichi SUZUKI , Shinsuke YAMAZAKI
IPC分类号： C03B20/00 , B32B1/02 , B32B17/00 , C03B19/09
CPC分类号： C03B19/095 , C03B19/066 , C30B11/002 , C30B15/10 , Y10T428/131 , Y10T428/1314 , Y10T428/1317
摘要： The present invention provides a method of manufacturing a vitreous silica crucible having a transparent layer by use of waste vitreous silica. According to the present invention, there is provided a method of manufacturing a vitreous silica crucible for manufacturing a monocrystalline or polycrystalline silicon ingot, including a process of vitrifying a silica powder sintered body having a crucible shape in the whole or part of the thickness direction by arc fusing the silica powder sintered body from the inner surface side, wherein the method further includes at least one means of (1) depressurizing the silica powder sintered body from the outer surface side during the arc fusing, and (2) forming a synthetic vitreous silica layer on the inner surface by spraying synthetic silica powder onto the inner surface of the silica powder sintered body during the arc fusing.
摘要翻译：本发明提供一种通过使用废二氧化硅二氧化硅制造具有透明层的石英玻璃坩埚的方法。根据本发明，提供了一种制造用于制造单晶硅或多晶硅锭的石英玻璃坩埚的方法，该方法包括将整个或部分厚度方向上具有坩埚形状的二氧化硅粉末烧结体玻璃化的方法，从内表面电弧熔融二氧化硅粉末烧结体，其中该方法还包括（1）在电弧熔合期间从外表面侧使二氧化硅粉末烧结体减压的至少一种方法，和（2）形成合成玻璃态通过在电弧熔合期间将合成二氧化硅粉末喷涂到二氧化硅粉末烧结体的内表面上，在内表面上形成二氧化硅层。

9. 发明申请

US20120137733A1 METHOD AND APPARATUS FOR MANUFACTURING VITREOUS SILICA CRUCIBLE 有权
标题翻译：用于制造维生素二氧化硅可溶性的方法和装置
公开(公告)号：US20120137733A1
公开(公告)日：2012-06-07
申请号：US13308277
申请日：2011-11-30
申请人： Toshiaki Sudo , Hiroshi Kishi , Kouta Hasebe
发明人： Toshiaki Sudo , Hiroshi Kishi , Kouta Hasebe
IPC分类号： C03B20/00 , C03B19/09
CPC分类号： C03B19/095 , C03B29/02 , Y02P40/57
摘要： Provided is a method for manufacturing a vitreous silica crucible and a manufacturing apparatus for the same, which can reduce the amount of bubbles and impurities of a crucible inner surface and enhance a crystallization yield of silicon single crystal. A method for manufacturing a vitreous silica crucible of the invention includes a silica powder supplying process of supplying silica powder in a rotating mold to form a silica powder layer; an arc fusing process of fusing the silica powder layer by arc discharge generated by carbon electrodes; and a fire polishing process of throwing an arc flame toward a target surface of the silica powder layer for surface removal, wherein, in the fire polishing process, the distances from the tips of the carbon electrodes to the target surface is set to be equal.
摘要翻译：提供一种制造石英玻璃坩埚及其制造装置的方法，其可以减少坩埚内表面的气泡和杂质的量，并提高单晶硅的结晶产率。本发明的石英玻璃坩埚的制造方法包括在旋转模具中供给二氧化硅粉末以形成二氧化硅粉末层的二氧化硅粉末供给工序; 通过由碳电极产生的电弧放电使二氧化硅粉末层熔融的电弧熔合工艺; 以及向二氧化硅粉末层的靶表面投射弧形火焰以进行表面去除的火抛光处理，其中，在火焰研磨处理中，将从碳电极的前端到目标表面的距离设定为相等。

10. 发明授权

US09416463B2 Vitreous silica crucible 有权
标题翻译：石英玻璃坩埚
公开(公告)号：US09416463B2
公开(公告)日：2016-08-16
申请号：US13148463
申请日：2010-12-13
申请人： Toshiaki Sudo , Hiroshi Kishi
发明人： Toshiaki Sudo , Hiroshi Kishi
IPC分类号： C30B35/00 , C30B15/10 , C03B19/09
CPC分类号： C30B15/10 , C03B19/095 , C30B35/002 , Y02P40/57 , Y10T117/1032
摘要： Provided is a vitreous silica crucible having a reference point, which is capable of accurately detecting the location of a defect in the vitreous silica crucible used for pulling silicon single crystal, determining a defect generating site of silicon single crystal, and investigating the cause of the defect. The reference point used for specifying the position relationship with respect to a particular part is formed in at least one site of an end portion, an inner wall and an outer wall of the crucible.
摘要翻译：本发明提供一种具有参考点的氧化硅玻璃坩埚，其能够精确地检测用于拉拔单晶硅的玻璃状石英坩埚中的缺陷的位置，确定单晶硅的缺陷产生位置，并调查其原因缺陷。用于指定相对于特定部件的位置关系的参考点形成在坩埚的端部，内壁和外壁的至少一个位置中。

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