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1. 发明授权

US08440385B2 Positive resist composition, method of forming resist pattern and polymeric compound 有权
标题翻译：正型抗蚀剂组合物，形成抗蚀剂图案和聚合物的方法
公开(公告)号：US08440385B2
公开(公告)日：2013-05-14
申请号：US12979076
申请日：2010-12-27
申请人： Tomoyuki Hirano , Daiju Shiono , Masatoshi Arai
发明人： Tomoyuki Hirano , Daiju Shiono , Masatoshi Arai
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0397 , C08F220/38 , C08F2220/283 , G03F7/0045 , G03F7/0046 , C08F220/18 , C08F2220/281 , C08F2220/382
摘要： A positive resist composition including a base component (A′) which exhibits increased solubility in an alkali developing solution under the action of acid and generates acid upon exposure, the base component (A′) including a resin component (A1) having a structural unit (a0-1) represented by general formula (a0-1), a structural unit (a0-2) which generates acid upon exposure and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group (wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof).
摘要翻译：一种正性抗蚀剂组合物，其包含在酸性作用下在碱性显影液中显示出增加的溶解性并在曝光时产生酸的基础组分（A'），所述基础组分（A'）包括具有结构单元的树脂组分（A1）由通式（a0-1）表示的（a0-1），曝光时产生酸的结构单元（a0-2）和由含有酸解离的溶解抑制基团的丙烯酸酯衍生的结构单元（a1）（其中 R 1表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的卤代烷基，R 2表示二价连接基团，R 3表示在其环骨架中含有-SO 2 - 的环状基团）。

2. 发明授权

US08980524B2 Positive resist composition and method of forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US08980524B2
公开(公告)日：2015-03-17
申请号：US12979067
申请日：2010-12-27
申请人： Tomoyuki Hirano , Daiju Shiono , Masatoshi Arai
发明人： Tomoyuki Hirano , Daiju Shiono , Masatoshi Arai
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , C08F220/38 , G03F7/004 , C08F220/18 , C08F220/28
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/38 , C08F2220/281 , G03F7/0045 , G03F7/0046 , G03F7/2041 , Y10S430/108 , Y10S430/111 , Y10S430/122 , Y10S430/126
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure and a fluorine-containing polymeric compound (C′) which generates acid upon exposure, the base component (A) having a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, and the fluorine-containing polymeric compound (C′) having a structural unit (c0) which generates acid upon exposure and a structural unit (c1) represented by formula (c1) (wherein R2 represents a divalent linking group, R3 represents a cyclic group containing —SO2— within the ring skeleton, Q0 represents a single bond or a divalent linking group, and R0 represents an organic group which may have a fluorine atom).
摘要翻译：一种正性抗蚀剂组合物，包括在酸作用下在碱性显影液中显示出增加的溶解性的基础组分（A），暴露时产生酸的酸产生剂组分（B）和含氟聚合化合物（C'）在曝光时产生酸，具有由通式（a0-1）表示的结构单元（a0-1）的基础组分（A）和由含有酸解离的溶解抑制基团的丙烯酸酯衍生的结构单元（a1）和具有曝光时产生酸的结构单元（c0）的含氟聚合化合物（C'）和由式（c1）表示的结构单元（c1）（其中R 2表示二价连接基团，R 3表示环状基团在环骨架中含有-SO 2 - ，Q 0表示单键或二价连接基团，R 0表示可以具有氟原子的有机基团）。

3. 发明授权

US08927191B2 Resist composition, method of forming resist pattern and polymeric compound 有权
标题翻译：抗蚀剂组合物，抗蚀剂图案和高分子化合物的形成方法
公开(公告)号：US08927191B2
公开(公告)日：2015-01-06
申请号：US13351716
申请日：2012-01-17
申请人： Junichi Tsuchiya , Daichi Takaki , Masatoshi Arai , Daiju Shiono , Tomoyuki Hirano
发明人： Junichi Tsuchiya , Daichi Takaki , Masatoshi Arai , Daiju Shiono , Tomoyuki Hirano
IPC分类号： G03F7/039 , C08F226/06
CPC分类号： C08F226/06 , G03F7/0392 , G03F7/0397
摘要： A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-1). In the formula (a5-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; each of Ra and Rb independently represents a hydrocarbon group which may have a substituent, and Ra and Rb may be mutually bonded to form a ring.
摘要翻译：一种抗蚀剂组合物，其包含在酸作用下在显影液中溶解性变差的碱成分（A）和曝光时产生酸的酸发生剂成分（B），其中，所述碱成分（A）含有高分子化合物）具有由通式（a5-1）表示的结构单元（a5）。在式（a5-1）中，R表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的卤代烷基; Ra和Rb各自独立地表示可以具有取代基的烃基，Ra和Rb可以相互键合形成环。

4. 发明申请

US20120183900A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND 有权
标题翻译：耐蚀组合物，形成耐蚀图案和聚合物的方法
公开(公告)号：US20120183900A1
公开(公告)日：2012-07-19
申请号：US13351716
申请日：2012-01-17
申请人： Junichi Tsuchiya , Daichi Takaki , Masatoshi Arai , Daiju Shiono , Tomoyuki Hirano
发明人： Junichi Tsuchiya , Daichi Takaki , Masatoshi Arai , Daiju Shiono , Tomoyuki Hirano
IPC分类号： G03F7/20 , C08F226/06 , G03F7/004
CPC分类号： C08F226/06 , G03F7/0392 , G03F7/0397
摘要： A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-1). In the formula (a5-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; each of Ra and Rb independently represents a hydrocarbon group which may have a substituent, and Ra and Rb may be mutually bonded to form a ring.
摘要翻译：一种抗蚀剂组合物，其包含在酸作用下在显影液中溶解性变差的碱成分（A）和曝光时产生酸的酸发生剂成分（B），其中，所述碱成分（A）含有高分子化合物）具有由通式（a5-1）表示的结构单元（a5）。在式（a5-1）中，R表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的卤代烷基; Ra和Rb各自独立地表示可以具有取代基的烃基，Ra和Rb可以相互键合形成环。

5. 发明申请

US20120148953A1 Resist composition, and method of forming resist pattern 有权
标题翻译：抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US20120148953A1
公开(公告)日：2012-06-14
申请号：US13373965
申请日：2011-12-05
申请人： Masatoshi Arai , Junichi Tsuchiya , Daiju Shiono , Tomoyuki Hirano , Daichi Takaki
发明人： Masatoshi Arai , Junichi Tsuchiya , Daiju Shiono , Tomoyuki Hirano , Daichi Takaki
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0045 , G03F7/0382 , G03F7/0397 , G03F7/2041
摘要： A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-1). In formula (a5-1), R represents a hydrogen atom, an alkyl group or a halogenated alkyl group, X represents single bond or divalent linking group, W represents a cyclic alkylene group which may include an oxygen atom at arbitrary position, each of Ra and Rb independently represents a hydrogen atom or an alkyl group which may include an oxygen atom at arbitrary position, or alternatively, Ra and Rb may be bonded to each other to form a ring together with the nitrogen atom in the formula, and p represents integer of 1 to 3.
摘要翻译：一种抗蚀剂组合物，其包含在酸的作用下在显影溶液中显示出改变的溶解性的碱成分（A）和曝光时产生酸的酸产生剂成分（B），其中，所述碱成分（A）含有高分子化合物 A1）具有由通式（a5-1）表示的结构单元（a5）。式（a5-1）中，R表示氢原子，烷基或卤代烷基，X表示单键或二价连接基，W表示可以在任意位置含有氧原子的环状亚烷基， Ra和Rb独立地表示氢原子或可以在任意位置包含氧原子的烷基，或者Ra和Rb可以与式中的氮原子一起形成环，p表示 1〜3的整数。

6. 发明授权

US08658343B2 Resist composition, and method of forming resist pattern 有权
标题翻译：抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US08658343B2
公开(公告)日：2014-02-25
申请号：US13373965
申请日：2011-12-05
申请人： Masatoshi Arai , Junichi Tsuchiya , Daiju Shiono , Tomoyuki Hirano , Daichi Takaki
发明人： Masatoshi Arai , Junichi Tsuchiya , Daiju Shiono , Tomoyuki Hirano , Daichi Takaki
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0382 , G03F7/0397 , G03F7/2041
摘要： A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-1). In formula (a5-1), R represents a hydrogen atom, an alkyl group or a halogenated alkyl group, X represents single bond or divalent linking group, W represents a cyclic alkylene group which may include an oxygen atom at arbitrary position, each of Ra and Rb independently represents a hydrogen atom or an alkyl group which may include an oxygen atom at arbitrary position, or alternatively, Ra and Rb may be bonded to each other to form a ring together with the nitrogen atom in the formula, and p represents integer of 1 to 3.
摘要翻译：一种抗蚀剂组合物，其包含在酸的作用下在显影溶液中显示出改变的溶解性的碱成分（A）和曝光时产生酸的酸产生剂成分（B），其中，所述碱成分（A）含有高分子化合物 A1）具有由通式（a5-1）表示的结构单元（a5）。式（a5-1）中，R表示氢原子，烷基或卤代烷基，X表示单键或二价连接基，W表示可以在任意位置含有氧原子的环状亚烷基， Ra和Rb独立地表示氢原子或可以在任意位置包含氧原子的烷基，或者Ra和Rb可以与式中的氮原子一起形成环，p表示 1〜3的整数。

7. 发明授权

US09250531B2 Method of forming resist pattern and negative tone-development resist composition 有权
标题翻译：形成抗蚀剂图案和负色调显影抗蚀剂组合物的方法
公开(公告)号：US09250531B2
公开(公告)日：2016-02-02
申请号：US14003708
申请日：2012-03-07
申请人： Tomoyuki Hirano , Daichi Takaki , Daiju Shiono , Kenri Konno , Isamu Takagi
发明人： Tomoyuki Hirano , Daichi Takaki , Daiju Shiono , Kenri Konno , Isamu Takagi
IPC分类号： G03F7/004 , G03F7/38 , C08F220/24 , C08F224/00 , C08F226/02 , C08F228/06 , G03F7/32 , C08F220/28 , C08F220/38 , G03F7/039 , G03F7/20
CPC分类号： G03F7/325 , C08F220/24 , C08F220/28 , C08F220/38 , C08F224/00 , C08F226/02 , C08F228/06 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A method of forming a resist pattern including: forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent by action of an acid; exposing the resist film; and patterning by a negative-tone development using a developing solution containing the organic solvent, wherein the base component (A) contains a resin component (A1) having a structural unit (a0) which generates acid upon exposure and a structural unit (a1) derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid, and the developing solution contains a nitrile solvent.
摘要翻译：一种形成抗蚀剂图案的方法，包括：使用含有通过酸作用在有机溶剂中溶解度降低的基础组分（A）的抗蚀剂组合物在基材上形成抗蚀剂膜; 曝光抗蚀膜; 以及使用含有有机溶剂的显影液进行负色发展的图案化，其中，所述基材（A）含有具有曝光时产生酸的结构单元（a0）的树脂成分（A1）和结构单元（a1）衍生自可以具有与被取代基取代的在α-位上的碳原子键合的氢原子的丙烯酸酯，并且含有通过酸作用显示出极性增加的酸分解基团，显影液含有腈溶剂。

8. 发明授权

US08501387B2 Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound 有权
公开(公告)号：US08501387B2
公开(公告)日：2013-08-06
申请号：US13310625
申请日：2011-12-02
申请人： Daiju Shiono , Takahiro Dazai , Sanae Furuya , Tomoyuki Hirano , Takayoshi Mori
发明人： Daiju Shiono , Takahiro Dazai , Sanae Furuya , Tomoyuki Hirano , Takayoshi Mori
IPC分类号： G03F7/004 , G03F7/028 , G03F7/033 , G03F7/039 , G03F7/26
摘要： A resist composition for immersion exposure, including a base component that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component that generates acid upon exposure, and a fluorine-containing compound represented by a general formula (c-1) that is decomposable in an alkali developing solution: wherein R1 represents an organic group which may contain a polymerizable group, with the proviso that said polymerizable group has a carbon-carbon multiple bond, and the carbon atoms forming the multiple bond are not directly bonded to the carbon atom within the —C(═O)— group in general formula (c-1); and R2 represents an organic group having a fluorine atom.

9. 发明授权

US08268529B2 Positive resist composition, method of forming resist pattern using the same, and polymeric compound 有权
标题翻译：正型抗蚀剂组合物，使用其形成抗蚀剂图案的方法和聚合物
公开(公告)号：US08268529B2
公开(公告)日：2012-09-18
申请号：US12687430
申请日：2010-01-14
申请人： Takahiro Dazai , Daiju Shiono , Tomoyuki Hirano , Tasuku Matsumiya , Masaru Takeshita
发明人： Takahiro Dazai , Daiju Shiono , Tomoyuki Hirano , Tasuku Matsumiya , Masaru Takeshita
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , C08F28/06
CPC分类号： C08F220/26 , C08F228/06 , G03F7/0045 , G03F7/0397
摘要： A positive resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure dissolved in an organic solvent (S), the base component (A) containing a polymeric compound (A1) including a structural unit (a0) derived from an acrylate ester having a cyclic group containing a sulfonyl group on the side chain thereof, a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group and a structural unit (a5) represented by general formula (a5-1) (Y1 represents an aliphatic hydrocarbon group; Z represents a monovalent organic group; a represents an integer of 1 to 3, and b represents an integer of 0 to 2, provided that a+b=1 to 3).
摘要翻译：一种正性抗蚀剂组合物，其包含在碱的作用下在碱性显影液中的溶解度变化的碱成分（A）和暴露于有机溶剂（S）时产生酸的酸产生剂成分（B），所述碱含有由侧链上具有含有磺酰基的环状基团的丙烯酸酯衍生的结构单元（a0）的高分子化合物（A1）的组分（A），来源于丙烯酸酯的结构单元（a1）酸解离，溶解抑制基团和由通式（a5-1）表示的结构单元（a5）（Y1表示脂族烃基; Z表示一价有机基团; a表示1〜3的整数，b表示 0〜2的整数，条件是a + b = 1〜3）。

10. 发明授权

US08182976B2 Positive resist composition, method of forming resist pattern, and polymeric compound 有权
标题翻译：正型抗蚀剂组合物，形成抗蚀剂图案的方法和聚合物
公开(公告)号：US08182976B2
公开(公告)日：2012-05-22
申请号：US12461688
申请日：2009-08-20
申请人： Takahiro Dazai , Tomoyuki Hirano , Daiju Shiono , Tasuku Matsumiya
发明人： Takahiro Dazai , Tomoyuki Hirano , Daiju Shiono , Tasuku Matsumiya
IPC分类号： G03F7/028 , G03F7/038 , G03F7/28 , C08F22/10 , C08F22/20 , C08F22/24
CPC分类号： G03F7/0397 , C08F28/06 , C08F220/28 , C08F228/06 , G03F7/0045 , G03F7/2041
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including at least one structural unit (a0) selected from the group consisting of a structural unit represented by general formula (a0-1) [R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof] and a structural unit (a2) derived from an acrylate ester containing a lactone-containing cyclic group, and the polymeric compound (A1) containing an acid dissociable, dissolution inhibiting group within the structure thereof.
摘要翻译：一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和曝光时产生酸的酸发生剂成分（B），所述树脂成分（A）包含至少一种结构单元（a0）选自由通式（a0-1）表示的结构单元[R2表示二价连接基团，R 3表示在其环骨架中含有-SO 2的环状基团]和结构单元（a2）和含有含内酯的环状基团的丙烯酸酯衍生的聚合化合物（A1）和在其结构内含有酸解离性，溶解抑制基团的高分子化合物（A1）。

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