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1. 发明授权

US08440385B2 Positive resist composition, method of forming resist pattern and polymeric compound 有权
标题翻译：正型抗蚀剂组合物，形成抗蚀剂图案和聚合物的方法
公开(公告)号：US08440385B2
公开(公告)日：2013-05-14
申请号：US12979076
申请日：2010-12-27
申请人： Tomoyuki Hirano , Daiju Shiono , Masatoshi Arai
发明人： Tomoyuki Hirano , Daiju Shiono , Masatoshi Arai
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0397 , C08F220/38 , C08F2220/283 , G03F7/0045 , G03F7/0046 , C08F220/18 , C08F2220/281 , C08F2220/382
摘要： A positive resist composition including a base component (A′) which exhibits increased solubility in an alkali developing solution under the action of acid and generates acid upon exposure, the base component (A′) including a resin component (A1) having a structural unit (a0-1) represented by general formula (a0-1), a structural unit (a0-2) which generates acid upon exposure and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group (wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof).
摘要翻译：一种正性抗蚀剂组合物，其包含在酸性作用下在碱性显影液中显示出增加的溶解性并在曝光时产生酸的基础组分（A'），所述基础组分（A'）包括具有结构单元的树脂组分（A1）由通式（a0-1）表示的（a0-1），曝光时产生酸的结构单元（a0-2）和由含有酸解离的溶解抑制基团的丙烯酸酯衍生的结构单元（a1）（其中 R 1表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的卤代烷基，R 2表示二价连接基团，R 3表示在其环骨架中含有-SO 2 - 的环状基团）。

2. 发明授权

US08980524B2 Positive resist composition and method of forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US08980524B2
公开(公告)日：2015-03-17
申请号：US12979067
申请日：2010-12-27
申请人： Tomoyuki Hirano , Daiju Shiono , Masatoshi Arai
发明人： Tomoyuki Hirano , Daiju Shiono , Masatoshi Arai
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , C08F220/38 , G03F7/004 , C08F220/18 , C08F220/28
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/38 , C08F2220/281 , G03F7/0045 , G03F7/0046 , G03F7/2041 , Y10S430/108 , Y10S430/111 , Y10S430/122 , Y10S430/126
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure and a fluorine-containing polymeric compound (C′) which generates acid upon exposure, the base component (A) having a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, and the fluorine-containing polymeric compound (C′) having a structural unit (c0) which generates acid upon exposure and a structural unit (c1) represented by formula (c1) (wherein R2 represents a divalent linking group, R3 represents a cyclic group containing —SO2— within the ring skeleton, Q0 represents a single bond or a divalent linking group, and R0 represents an organic group which may have a fluorine atom).
摘要翻译：一种正性抗蚀剂组合物，包括在酸作用下在碱性显影液中显示出增加的溶解性的基础组分（A），暴露时产生酸的酸产生剂组分（B）和含氟聚合化合物（C'）在曝光时产生酸，具有由通式（a0-1）表示的结构单元（a0-1）的基础组分（A）和由含有酸解离的溶解抑制基团的丙烯酸酯衍生的结构单元（a1）和具有曝光时产生酸的结构单元（c0）的含氟聚合化合物（C'）和由式（c1）表示的结构单元（c1）（其中R 2表示二价连接基团，R 3表示环状基团在环骨架中含有-SO 2 - ，Q 0表示单键或二价连接基团，R 0表示可以具有氟原子的有机基团）。

3. 发明授权

US08927191B2 Resist composition, method of forming resist pattern and polymeric compound 有权
标题翻译：抗蚀剂组合物，抗蚀剂图案和高分子化合物的形成方法
公开(公告)号：US08927191B2
公开(公告)日：2015-01-06
申请号：US13351716
申请日：2012-01-17
申请人： Junichi Tsuchiya , Daichi Takaki , Masatoshi Arai , Daiju Shiono , Tomoyuki Hirano
发明人： Junichi Tsuchiya , Daichi Takaki , Masatoshi Arai , Daiju Shiono , Tomoyuki Hirano
IPC分类号： G03F7/039 , C08F226/06
CPC分类号： C08F226/06 , G03F7/0392 , G03F7/0397
摘要： A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-1). In the formula (a5-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; each of Ra and Rb independently represents a hydrocarbon group which may have a substituent, and Ra and Rb may be mutually bonded to form a ring.
摘要翻译：一种抗蚀剂组合物，其包含在酸作用下在显影液中溶解性变差的碱成分（A）和曝光时产生酸的酸发生剂成分（B），其中，所述碱成分（A）含有高分子化合物）具有由通式（a5-1）表示的结构单元（a5）。在式（a5-1）中，R表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的卤代烷基; Ra和Rb各自独立地表示可以具有取代基的烃基，Ra和Rb可以相互键合形成环。

4. 发明申请

US20120183900A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND 有权
标题翻译：耐蚀组合物，形成耐蚀图案和聚合物的方法
公开(公告)号：US20120183900A1
公开(公告)日：2012-07-19
申请号：US13351716
申请日：2012-01-17
申请人： Junichi Tsuchiya , Daichi Takaki , Masatoshi Arai , Daiju Shiono , Tomoyuki Hirano
发明人： Junichi Tsuchiya , Daichi Takaki , Masatoshi Arai , Daiju Shiono , Tomoyuki Hirano
IPC分类号： G03F7/20 , C08F226/06 , G03F7/004
CPC分类号： C08F226/06 , G03F7/0392 , G03F7/0397
摘要： A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-1). In the formula (a5-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; each of Ra and Rb independently represents a hydrocarbon group which may have a substituent, and Ra and Rb may be mutually bonded to form a ring.
摘要翻译：一种抗蚀剂组合物，其包含在酸作用下在显影液中溶解性变差的碱成分（A）和曝光时产生酸的酸发生剂成分（B），其中，所述碱成分（A）含有高分子化合物）具有由通式（a5-1）表示的结构单元（a5）。在式（a5-1）中，R表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的卤代烷基; Ra和Rb各自独立地表示可以具有取代基的烃基，Ra和Rb可以相互键合形成环。

5. 发明申请

US20120148953A1 Resist composition, and method of forming resist pattern 有权
标题翻译：抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US20120148953A1
公开(公告)日：2012-06-14
申请号：US13373965
申请日：2011-12-05
申请人： Masatoshi Arai , Junichi Tsuchiya , Daiju Shiono , Tomoyuki Hirano , Daichi Takaki
发明人： Masatoshi Arai , Junichi Tsuchiya , Daiju Shiono , Tomoyuki Hirano , Daichi Takaki
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0045 , G03F7/0382 , G03F7/0397 , G03F7/2041
摘要： A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-1). In formula (a5-1), R represents a hydrogen atom, an alkyl group or a halogenated alkyl group, X represents single bond or divalent linking group, W represents a cyclic alkylene group which may include an oxygen atom at arbitrary position, each of Ra and Rb independently represents a hydrogen atom or an alkyl group which may include an oxygen atom at arbitrary position, or alternatively, Ra and Rb may be bonded to each other to form a ring together with the nitrogen atom in the formula, and p represents integer of 1 to 3.
摘要翻译：一种抗蚀剂组合物，其包含在酸的作用下在显影溶液中显示出改变的溶解性的碱成分（A）和曝光时产生酸的酸产生剂成分（B），其中，所述碱成分（A）含有高分子化合物 A1）具有由通式（a5-1）表示的结构单元（a5）。式（a5-1）中，R表示氢原子，烷基或卤代烷基，X表示单键或二价连接基，W表示可以在任意位置含有氧原子的环状亚烷基， Ra和Rb独立地表示氢原子或可以在任意位置包含氧原子的烷基，或者Ra和Rb可以与式中的氮原子一起形成环，p表示 1〜3的整数。

6. 发明授权

US08658343B2 Resist composition, and method of forming resist pattern 有权
标题翻译：抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US08658343B2
公开(公告)日：2014-02-25
申请号：US13373965
申请日：2011-12-05
申请人： Masatoshi Arai , Junichi Tsuchiya , Daiju Shiono , Tomoyuki Hirano , Daichi Takaki
发明人： Masatoshi Arai , Junichi Tsuchiya , Daiju Shiono , Tomoyuki Hirano , Daichi Takaki
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0382 , G03F7/0397 , G03F7/2041
摘要： A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-1). In formula (a5-1), R represents a hydrogen atom, an alkyl group or a halogenated alkyl group, X represents single bond or divalent linking group, W represents a cyclic alkylene group which may include an oxygen atom at arbitrary position, each of Ra and Rb independently represents a hydrogen atom or an alkyl group which may include an oxygen atom at arbitrary position, or alternatively, Ra and Rb may be bonded to each other to form a ring together with the nitrogen atom in the formula, and p represents integer of 1 to 3.
摘要翻译：一种抗蚀剂组合物，其包含在酸的作用下在显影溶液中显示出改变的溶解性的碱成分（A）和曝光时产生酸的酸产生剂成分（B），其中，所述碱成分（A）含有高分子化合物 A1）具有由通式（a5-1）表示的结构单元（a5）。式（a5-1）中，R表示氢原子，烷基或卤代烷基，X表示单键或二价连接基，W表示可以在任意位置含有氧原子的环状亚烷基， Ra和Rb独立地表示氢原子或可以在任意位置包含氧原子的烷基，或者Ra和Rb可以与式中的氮原子一起形成环，p表示 1〜3的整数。

7. 发明申请

US20120196226A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：耐蚀组合物和形成耐力图案的方法
公开(公告)号：US20120196226A1
公开(公告)日：2012-08-02
申请号：US13343481
申请日：2012-01-04
申请人： Shinji Kumada , Satoshi Maemori , Masatoshi Arai , Daiju Shiono
发明人： Shinji Kumada , Satoshi Maemori , Masatoshi Arai , Daiju Shiono
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0045 , G03F7/0397 , G03F7/20
摘要： A resist composition including a base component (A), which exhibits changed solubility in a developing solution under the action of acid and can be used in a lithography process that employs light having a wavelength of 193 nm or less as the exposure light source, an acid generator component (B) which generates acid upon exposure, and a polymeric compound (C) having a structural unit (c0) represented by general formula (c0) shown below, wherein the amount of the polymeric compound (C) is less than 25 parts by mass relative to 100 parts by mass of the base component (A). In the formula, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, and R1 represents an organic group having one or more primary or secondary alcoholic hydroxyl groups, or a chain-like tertiary alcoholic hydroxyl group.
摘要翻译：一种抗蚀剂组合物，其包含在酸的作用下在显影液中溶解度变化的碱成分（A），可以用于使用波长为193nm以下的光作为曝光光源的光刻工序，暴露时产生酸的酸产生剂组分（B）和具有如下所示的通式（c0）表示的结构单元（c0）的聚合化合物（C），其中聚合化合物（C）的量小于25 相对于100质量份的基础成分（A）为质量份。在该式中，R表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的卤代烷基，R1表示具有一个或多个伯或仲醇羟基的有机基团，或链状叔醇羟基。

8. 发明申请

US20120208128A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND 有权
标题翻译：耐蚀组合物，形成耐蚀图案和聚合物的方法
公开(公告)号：US20120208128A1
公开(公告)日：2012-08-16
申请号：US13371151
申请日：2012-02-10
申请人： Daichi Takaki , Daiju Shiono , Masatoshi Arai , Jun Iwashita , Kenri Konno
发明人： Daichi Takaki , Daiju Shiono , Masatoshi Arai , Jun Iwashita , Kenri Konno
IPC分类号： G03F7/20 , C08F214/18 , C08F228/06 , G03F7/004
CPC分类号： C08F228/06 , C08F220/22 , C08F220/38 , C08F228/02 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A resist composition including a base component (A) which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the base component (A) including a resin component (A1) containing a structural unit (a0-1) having a group represented by general formula (a0-1) shown below and a structural unit (a1) derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid.
摘要翻译：一种抗蚀剂组合物，其包含在暴露后产生酸的基体组分（A），并且在酸的作用下在显影液中显示出改变的溶解性，所述基础组分（A）包含含有结构单元（a0-1）的树脂组分（A1）具有由下述通式（a0-1）表示的基团和由可以具有与被取代基取代的具有氢原子键合的含有氢原子并含有酸的丙烯酸酯的结构单元（a1）通过酸的作用显示出极性增加的可分解基团。

9. 发明授权

US09012125B2 Resist composition and method of forming resist pattern 有权
标题翻译：抗蚀剂图案的抗蚀剂组成和方法
公开(公告)号：US09012125B2
公开(公告)日：2015-04-21
申请号：US13343481
申请日：2012-01-04
申请人： Shinji Kumada , Satoshi Maemori , Masatoshi Arai , Daiju Shiono
发明人： Shinji Kumada , Satoshi Maemori , Masatoshi Arai , Daiju Shiono
IPC分类号： G03F7/004 , G03F7/20 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0397 , G03F7/20
摘要： A resist composition including a base component (A), which exhibits changed solubility in a developing solution under the action of acid and can be used in a lithography process that employs light having a wavelength of 193 nm or less as the exposure light source, an acid generator component (B) which generates acid upon exposure, and a polymeric compound (C) having a structural unit (c0) represented by general formula (c0) shown below, wherein the amount of the polymeric compound (C) is less than 25 parts by mass relative to 100 parts by mass of the base component (A). In the formula, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, and R1 represents an organic group having one or more primary or secondary alcoholic hydroxyl groups, or a chain-like tertiary alcoholic hydroxyl group.
摘要翻译：一种抗蚀剂组合物，其包含在酸的作用下在显影液中溶解度变化的碱成分（A），可以用于使用波长为193nm以下的光作为曝光光源的光刻工序，暴露时产生酸的酸产生剂组分（B）和具有如下所示的通式（c0）表示的结构单元（c0）的聚合化合物（C），其中聚合化合物（C）的量小于25 相对于100质量份的基础成分（A）为质量份。在该式中，R表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的卤代烷基，R1表示具有一个或多个伯或仲醇羟基的有机基团，或链状叔醇羟基。

10. 发明授权

US08986919B2 Resist composition, method of forming resist pattern and polymeric compound 有权
标题翻译：抗蚀剂组合物，抗蚀剂图案和高分子化合物的形成方法
公开(公告)号：US08986919B2
公开(公告)日：2015-03-24
申请号：US13371151
申请日：2012-02-10
申请人： Daichi Takaki , Daiju Shiono , Masatoshi Arai , Jun Iwashita , Kenri Konno
发明人： Daichi Takaki , Daiju Shiono , Masatoshi Arai , Jun Iwashita , Kenri Konno
IPC分类号： C08F22/02 , C08F220/38 , C08F228/06 , C08F228/02 , C08F220/22 , G03F7/004 , G03F7/039
CPC分类号： C08F228/06 , C08F220/22 , C08F220/38 , C08F228/02 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A resist composition including a base component (A) which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the base component (A) including a resin component (A1) containing a structural unit (a0-1) having a group represented by general formula (a0-1) shown below and a structural unit (a1) derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid.
摘要翻译：一种抗蚀剂组合物，其包含在暴露后产生酸的基体组分（A），并且在酸的作用下在显影液中显示出改变的溶解性，所述基础组分（A）包含含有结构单元（a0-1）的树脂组分（A1）具有由下述通式（a0-1）表示的基团和由可以具有与被取代基取代的具有氢原子键合的含有氢原子并含有酸的丙烯酸酯的结构单元（a1）通过酸的作用显示出极性增加的可分解基团。

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