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    • 5. 发明授权
    • Resist composition and patterning process
    • 抗蚀剂组成和图案化工艺
    • US06667145B1
    • 2003-12-23
    • US09694369
    • 2000-10-24
    • Tsunehiro NishiTakeru WatanabeTakeshi KinshoKoji HasegawaTomohiro KobayashiJun Hatakeyama
    • Tsunehiro NishiTakeru WatanabeTakeshi KinshoKoji HasegawaTomohiro KobayashiJun Hatakeyama
    • G03C173
    • G03F7/039G03F7/0045Y10S430/106
    • A resist composition contains as a base resin a polymer represented by the following formula and having a Mw of 1,000-500,000. R1 is H, methyl or CO2R2, R2 is alkyl, R3 is H, methyl or CH2CO2R2, at least one of R4 to R7 is a carboxyl or hydroxyl-containing monovalent hydrocarbon group, and the reminders are independently H or alkyl, at least one of R8 to R11 is a monovalent hydrocarbon group of 2 to 15 carbon atoms containing a —CO2— partial structure, and the reminders are independently H or alkyl, R12 is a polycyclic hydrocarbon group or an alkyl group containing such a polycyclic hydrocarbon group, R13 is an acid labile group, Z is a divalent group of atoms to construct a 5- or 6-membered ring which contains a carboxylate, carbonate or acid anhydride therein, k is 0 or 1, x is a number from more than 0 to 1, “a” to “d” are from 0 to less than 1, x+a+b+c+d=1. The resist composition has significantly improved resolution, substrate adhesiveness, and etching resistance and is very useful in precise microfabrication.
    • 抗蚀剂组合物包含作为基础树脂的由下式表示的聚合物,其Mw为1,000-500,000.R 1是H,甲基或CO 2 R 2,R 2是烷基,R 3是 H,甲基或CH 2 CO 2 R 2,R 4至R 7中的至少一个是含羧基或羟基的一价烃基,并且提醒独立地为H或烷基,R 8, R 11是含有-CO 2 - 部分结构的2至15个碳原子的一价烃基,并且提醒独立地是H或烷基,R 12是多环烃基或含有这种多环的烷基 烃基,R 13是酸不稳定基团,Z是构成其中含有羧酸酯,碳酸酯或酸酐的5-或6-元环的二价原子基团,k是0或1,x是 数字从0到1,“a”到“d”从0到小于1,x + a + b + c + d = 1。 抗蚀剂组合物具有显着提高的分辨率,基底粘附性和耐蚀刻性,并且在精确微细加工中非常有用。