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    • 1. 发明申请
    • Microfluidic Apparatuses with Nanochannels
    • 具有纳米通道的微流体装置
    • US20080180188A1
    • 2008-07-31
    • US11669682
    • 2007-01-31
    • Timothy BeerlingKarsten G. KraiczekReid A. Brennen
    • Timothy BeerlingKarsten G. KraiczekReid A. Brennen
    • H01P5/10
    • G01N30/6095B01L3/5027B01L2200/12B01L2300/0877B01L2300/0887B82Y15/00Y10T436/2575
    • In some embodiments of the present invention, the buried silicon oxide technology is employed in the fabrication of fluid channels, particularly nanochannels. For example, a fluid channel can be made in a buried silicon oxide layer by etching the buried oxide layer with a method that selectively removes silicon oxide but not silicon. Thus, one dimension of the resulting fluid channel is limited by the thickness of the buried oxide layer. It is possible to manufacture a very thin buried oxide layer with great precision, thus a nanochannel can be fabricated in a controlled manner. Moreover, in addition to buried oxide, any pairs of substances with a high etch ratio with respect to each other can be used in the same way. Further provided are the fluid channels, apparatuses, devices and systems comprising the fluid channels, and uses thereof.
    • 在本发明的一些实施例中,掩埋氧化硅技术用于制造流体通道,特别是纳米通道。 例如,通过用选择性地去除氧化硅而不是硅的方法蚀刻掩埋氧化物层,可以在掩埋氧化硅层中制造流体通道。 因此,所得流体通道的一个尺寸受到掩埋氧化物层的厚度的限制。 可以以很高的精度制造非常薄的掩埋氧化物层,因此可以以受控的方式制造纳米通道。 此外,除了掩埋氧化物之外,可以以相同的方式使用具有相对于彼此的高蚀刻比的任何物质对。 进一步提供了包括流体通道的流体通道,装置,装置和系统及其用途。
    • 2. 发明授权
    • Microfluidic apparatuses with nanochannels
    • 具有纳米通道的微流控装置
    • US08168140B2
    • 2012-05-01
    • US11669682
    • 2007-01-31
    • Timothy BeerlingKarsten G. KraiczekReid A. Brennen
    • Timothy BeerlingKarsten G. KraiczekReid A. Brennen
    • B01L3/00B01L3/18G01N1/10
    • G01N30/6095B01L3/5027B01L2200/12B01L2300/0877B01L2300/0887B82Y15/00Y10T436/2575
    • In some embodiments of the present invention, the buried silicon oxide technology is employed in the fabrication of fluid channels, particularly nanochannels. For example, a fluid channel can be made in a buried silicon oxide layer by etching the buried oxide layer with a method that selectively removes silicon oxide but not silicon. Thus, one dimension of the resulting fluid channel is limited by the thickness of the buried oxide layer. It is possible to manufacture a very thin buried oxide layer with great precision, thus a nanochannel can be fabricated in a controlled manner. Moreover, in addition to buried oxide, any pairs of substances with a high etch ratio with respect to each other can be used in the same way. Further provided are the fluid channels, apparatuses, devices and systems comprising the fluid channels, and uses thereof.
    • 在本发明的一些实施例中,掩埋氧化硅技术用于制造流体通道,特别是纳米通道。 例如,通过用选择性地去除氧化硅而不是硅的方法蚀刻掩埋氧化物层,可以在掩埋氧化硅层中制造流体通道。 因此,所得流体通道的一个尺寸受到掩埋氧化物层的厚度的限制。 可以以很高的精度制造非常薄的掩埋氧化物层,因此可以以受控的方式制造纳米通道。 此外,除了掩埋氧化物之外,可以以相同的方式使用具有相对于彼此的高蚀刻比的任何物质对。 进一步提供了包括流体通道的流体通道,装置,装置和系统及其用途。
    • 4. 发明申请
    • Microfluidic device with valve and method
    • US20080031782A1
    • 2008-02-07
    • US11500234
    • 2006-08-07
    • Timothy BeerlingReid A. Brennen
    • Timothy BeerlingReid A. Brennen
    • B01L11/00B01L3/00
    • F16K99/0032B01L3/502707B01L3/502738B01L2300/1805B01L2300/1827B01L2400/0677F16K99/0001F16K99/0036F16K2099/0074F16K2099/0078F16K2099/0084
    • The invention provides a microfluidic system, including an optional separation system for separating and preparing an analyte solution, a microfluidic device downstream from the separation system for dispensing and analyte solution, comprising a substrate having a channel defining a portion of a microfluidic channel; a polymeric substrate having a channel for contacting the substrate to define the second portion of the microfluidic channel; a cooling element associated with the substrate and channel for cooling an analyte solution in the microfluidic channel; and a heating element adjacent to the microfluidic channel for heating the analyte solution, wherein the cooling element operates to maintain the channel in a closed state by cooling the analyte solution in the channel and wherein the heating element may be activated to place the channel in an open state by heating the analyte solution in the channel; and a detector for detecting the dispensed analyte solutionThe invention also provides a microfluidic device and/or valve, including a substrate having a micro fluidic channel for carrying an analyte solution; a cooling element associated with the substrate and micro fluidic channel for cooling the analyte solution in the channel; and a heating element adjacent to the channel for heating the analyte solution in the channel wherein the cooling element operates to maintain the channel in a closed state by cooling the analyte solution in the channel and wherein the heating element may be activated to place the channel in an open state by heating the cooled analyte solution in the channel.The invention also provides a method of valve control in a microfluidic device, including maintaining a cooling element in an active state to freeze an analyte solution in a microfluidic channel and close the microfluidic channel; and engaging a heating element to thaw the analyte solution in the microfluidic channel and open the microfluidic channel to allow fluid flow through the channel.
    • 6. 发明授权
    • Producing a substrate having high surface-area texturing
    • 生产具有高表面积纹理的基材
    • US07354695B2
    • 2008-04-08
    • US11092540
    • 2005-03-29
    • Reid A. BrennenSally A. Swedberg
    • Reid A. BrennenSally A. Swedberg
    • G03C5/00B23K26/00
    • G01N30/6095B23K26/066B23K26/355B23K26/361B23K26/40B23K2103/42B23K2103/50B23K2103/52B41M5/24Y10S430/146
    • A method is provided for preparing high surface-area texturing of a substrate using methods by which material from a substrate is subtracted from or added to the surface of the substrate. In one embodiment, the method is a subtractive lithographic method that involves exposing a laser-ablatable substrate, such as a polymeric or ceramic substrate, to laser light. A mask may be used to define the pattern of light incident on the substrate. High surface-area textured substrates, in particular, miniaturized planar analysis devices having high surface-area textured features, prepared by the methods disclosed herein, are also provided. A method by which the high surface-area textured substrate or the miniaturized planar analysis device is used as a master from which replicate copies thereof may be made is also provided.
    • 提供了一种用于使用从底物中减去或添加来自衬底的材料或将其添加到衬底表面的方法来制备衬底的高表面积纹理的方法。 在一个实施例中,该方法是一种减法光刻方法,其涉及将激光可烧蚀基底(例如聚合物或陶瓷基底)暴露于激光。 可以使用掩模来限定入射在基板上的光的图案。 还提供了通过本文公开的方法制备的高表面积纹理化衬底,特别是具有高表面积纹理特征的小型化平面分析器件。 还提供了高表面积纹理基板或小型平面分析装置作为可以从其复制的副本的主体的方法。
    • 7. 发明授权
    • Microdevice having an annular lining for producing an electrospray emitter
    • 微型设备具有用于产生电喷雾发射器的环形衬里
    • US07282705B2
    • 2007-10-16
    • US10741901
    • 2003-12-19
    • Reid A. Brennen
    • Reid A. Brennen
    • H01J49/04F15C1/06
    • B81B1/00G01N30/6095G01N30/7266H01J49/167Y10T137/2191Y10T137/2224
    • A microdevice is constructed from a substrate having a microchannel formed therein and a cover plate arranged over the substrate. The cover plate in combination with the microchannel at least partially defines a conduit within the microdevice. The conduit has a surface that extends from an upstream region toward a downstream region and terminates at an opening. The microdevice also includes an annular lining that conforms to the conduit surface at the downstream region and extends from the opening toward the upstream region in the conduit. An emitter may be produced in situ by depositing an emitter material on the annular lining. In addition, material may be removed from the cover plate and/or substrate about the opening. As a result, an exterior microdevice surface is formed and a downstream portion of the emitter is exposed that protrudes from the exterior surface.
    • 微型器件由其中形成有微通道的衬底和布置在衬底上的盖板构成。 与微通道组合的盖板至少部分地限定了微型装置内的导管。 导管具有从上游区域向下游区域延伸并终止在开口处的表面。 微型装置还包括在下游区域处符合导管表面并且从开口朝向导管中的上游区域延伸的环形衬里。 可以通过在环形衬里上沉积发射体材料来原位产生发射极。 此外,可以围绕开口从盖板和/或基板移除材料。 结果,形成外部微器件表面,并且从外表面露出发射体的下游部分。
    • 10. 发明授权
    • Apparatus and method for gas flow management
    • 气流管理装置及方法
    • US07397028B2
    • 2008-07-08
    • US11216884
    • 2005-08-30
    • Reid A. BrennenTom A van de GoorGangqiang LiKevin P. Killeen
    • Reid A. BrennenTom A van de GoorGangqiang LiKevin P. Killeen
    • B01D59/44
    • H01J49/10
    • The invention described herein provides a mass spectrometry system, having an ion source including an ionization device for producing ions, a collection conduit adjacent to the ionization device for collecting ions produced by the ionization device, a first gas source for supplying gas to desolvate ions produced by the ionization device, a second gas source for supplying gas at a defined flow to the ionization region, and a detector downstream from the ion source for detecting ions produced by the ion source. The invention also provides an ion source including an ionization device for producing ions, a collection conduit adjacent to the ionization device for collecting ions produced by the ionization device, a first gas source for supplying gas to desolvate ions produced by the ionization device, and a second gas source for supplying gas at a defined flow to the ionization region. A method for producing analyte ions is also disclosed. The method includes producing analyte ions from an ionization device, directing a first heated gas toward the analyte ions to desolvate the analyte ions, and directing a second gas toward the analyte ions at a defined and continual flow rate.
    • 本发明提供了一种质谱系统,其具有离子源,该离子源包括用于产生离子的离子化装置,与电离装置相邻的收集管,用于收集由离子化装置产生的离子;第一气体源,用于向产生的脱溶质离子供应气体 通过电离装置将用于以规定的流量供给到电离区域的气体的第二气体源和离子源下游的检测器,用于检测由离子源产生的离子。 本发明还提供了一种离子源,其包括用于产生离子的离子化装置,与离子化装置相邻的用于收集由离子化装置产生的离子的收集管,用于向离子化装置产生的脱溶质离子供给气体的第一气体源, 用于以限定的流量供应气体至电离区的第二气体源。 还公开了一种生产分析物离子的方法。 该方法包括从电离装置产生分析物离子,将第一加热气体引向分析物离子以使分析物离子脱溶质,并以限定和持续的流速将第二气体引向分析物离子。