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    • 8. 发明授权
    • Thin transparent conducting films of cadmium stannate
    • 锑酸锡薄透明导电薄膜
    • US06221495B1
    • 2001-04-24
    • US08740347
    • 1996-11-07
    • Xuanzhi WuTimothy J. Coutts
    • Xuanzhi WuTimothy J. Coutts
    • B32B1500
    • C23C14/5806C03C17/00C23C14/0629C23C14/086H01L31/073H01L31/1884Y02E10/543
    • A process for preparing thin Cd2SnO4 films. The process comprises the steps of RF sputter coating a Cd2SnO4 layer onto a first substrate; coating a second substrate with a CdS layer; contacting the Cd2SnO4 layer with the CdS layer in a water- and oxygen-free environment and heating the first and second substrates and the Cd2SnO4 and CdS layers to a temperature sufficient to induce crystallization of the Cd2SnO4 layer into a uniform single-phase spinel-type structure, for a time sufficient to allow full crystallization of the Cd2SnO4 layer at that temperature; cooling the first and second substrates to room temperature; and separating the first and second substrates and layers from each other. The process can be conducted at temperatures less than 600° C., allowing the use of inexpensive soda lime glass substrates.
    • 制备薄Cd2SnO4薄膜的方法。 该方法包括以下步骤:将Cd 2 SnO 4层RF溅射涂覆到第一衬底上; 用CdS层涂覆第二衬底; 使Cd2SnO4层与CdS层在无水和无氧环境中接触,并将第一和第二衬底以及Cd2SnO4和CdS层加热至足以使Cd2SnO4层结晶成均匀的单相尖晶石型 结构,足以使该Cd2SnO4层在该温度下完全结晶; 将第一和第二衬底冷却至室温; 以及将第一和第二基板和层彼此分离。 该过程可以在低于600℃的温度下进行,允许使用廉价的钠钙玻璃基材。