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    • 4. 发明申请
    • METHOD FOR FORMING SELF-ALIGNED, DUAL SILICON NITRIDE LINER FOR CMOS DEVICES
    • 用于形成用于CMOS器件的自对准的双硅氮化物衬底的方法
    • US20060199320A1
    • 2006-09-07
    • US10906670
    • 2005-03-01
    • Thomas DyerHaining Yang
    • Thomas DyerHaining Yang
    • H01L21/8234
    • H01L21/823807H01L21/823828H01L21/823864H01L29/7843
    • A method for forming a self-aligned, dual silicon nitride liner for CMOS devices includes forming a first type nitride layer over a first polarity type device and a second polarity type device, and forming a topographic layer over the first type nitride layer. Portions of the first type nitride layer and the topographic layer over the second polarity type device are patterned and removed. A second type nitride layer is formed over the second polarity type device, and over remaining portions of the topographic layer over the first polarity type device so as to define a vertical pillar of second type nitride material along a sidewall of the topographic layer, the second type nitride layer in contact with a sidewall of the first type nitride layer. The topographic layer is removed and the vertical pillar is removed.
    • 用于形成用于CMOS器件的自对准双氮化硅衬垫的方法包括在第一极性类型器件和第二极性器件上形成第一氮化物层,并在第一氮化物层上形成形貌层。 第一类型氮化物层和第二极性类型器件上的形貌层的部分被图案化和去除。 在第二极性类型器件上形成第二类型氮化物层,并且在第一极性类型器件上方形成地形层的剩余部分,以沿着地形层的侧壁限定第二类型氮化物材料的垂直柱,第二 氮化物层与第一氮化物层的侧壁接触。 去除地形层并移除垂直柱。
    • 7. 发明申请
    • CMOS DEVICES WITH HYBRID CHANNEL ORIENTATIONS AND METHOD FOR FABRICATING THE SAME
    • 具有混合通道方向的CMOS器件及其制造方法
    • US20080096339A1
    • 2008-04-24
    • US11968479
    • 2008-01-02
    • Thomas DyerXiangdong ChenJames ToomeyHaining Yang
    • Thomas DyerXiangdong ChenJames ToomeyHaining Yang
    • H01L21/8238
    • H01L21/823807H01L21/82385H01L21/823857
    • The present invention relates to a method of fabricating a semiconductor substrate that includes forming at least first and second device regions, wherein the first device region includes a first recess having interior surfaces oriented along a first set of equivalent crystal planes, and wherein the second device region includes a second recess having interior surfaces oriented along a second, different set of equivalent crystal planes. The semiconductor device structure formed using such a semiconductor substrate includes at least one n-channel field effect transistor (n-FET) formed at the first device region having a channel that extends along the interior surfaces of the first recess, and at least one p-channel field effect transistor (p-FET) formed at the second device region having a channel that extends along the interior surfaces of the second recess.
    • 本发明涉及一种制造半导体衬底的方法,该方法包括形成至少第一和第二器件区域,其中第一器件区域包括具有沿第一组等效晶面取向的内表面的第一凹槽,并且其中第二器件 区域包括具有沿着第二不同组的等效晶面取向的内表面的第二凹部。 使用这种半导体衬底形成的半导体器件结构包括形成在第一器件区域处的至少一个n沟道场效应晶体管(n-FET),具有沿着第一凹部的内表面延伸的沟道,以及至少一个p - 沟道场效应晶体管(p-FET),其形成在具有沿着第二凹部的内表面延伸的沟道的第二器件区域处。
    • 10. 发明申请
    • Tissue products containing a polymer dispersion
    • 含有聚合物分散体的组织产品
    • US20070137809A1
    • 2007-06-21
    • US11303036
    • 2005-12-15
    • Thomas DyerMichael LostoccoDeborah NickelTroy Runge
    • Thomas DyerMichael LostoccoDeborah NickelTroy Runge
    • B31F1/12D21H17/34
    • D21H27/002D21H17/35D21H17/37D21H21/18D21H23/50
    • Tissue products are disclosed containing an additive composition. The additive composition, for instance, comprises an aqueous dispersion containing an olefin polymer, an ethylene-carboxylic acid copolymer, or mixtures thereof. The olefin polymer may comprise an interpolymer of ethylene and octene, while the ethylene-carboxylic acid copolymer may comprise ethylene-acrylic acid copolymer. The additive composition may also contain a dispersing agent, such as a fatty acid. The additive composition may be incorporated into the tissue web by being combined with the fibers that are used to form the web. Alternatively, the additive composition may be topically applied to the web after the web has been formed. For instance, in one embodiment, the additive composition may be applied to the web as a creping adhesive during a creping operation. The additive composition may improve the strength of the tissue web without substantially affecting the perceived softness of the web in an adverse manner.
    • 公开了含有添加剂组合物的组织产品。 添加剂组合物例如包含含有烯烃聚合物,乙烯 - 羧酸共聚物或其混合物的水分散体。 烯烃聚合物可以包含乙烯和辛烯的互聚物,而乙烯 - 羧酸共聚物可以包含乙烯 - 丙烯酸共聚物。 添加剂组合物还可以含有分散剂,例如脂肪酸。 添加剂组合物可以通过与用于形成纤维网的纤维组合而结合到组织纤维网中。 或者,添加剂组合物可以在幅材已经形成之后局部施加到幅材上。 例如,在一个实施方案中,添加剂组合物可以在起皱操作期间作为起皱粘合剂施加到幅材上。 添加剂组合物可以改善组织织物的强度,而不会以不利的方式基本上影响纤维网的感觉到的柔软度。