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1. 发明授权

US07812930B2 Lithographic apparatus and device manufacturing method using repeated patterns in an LCD to reduce datapath volume 有权
标题翻译：平版印刷设备和设备制造方法，使用LCD中的重复图案来减少数据路径的体积
公开(公告)号：US07812930B2
公开(公告)日：2010-10-12
申请号：US11084866
申请日：2005-03-21
申请人： Theodorus Leonardus Van Den Akker , Martinus Hendricus Hendricus Hoeks , Pieter Willem Herman De Jager , Lambertus Gerardus Maria Kessels , Marco Cornelis Jacobus Martinus Van Hassel , Frank Anton Morselt
发明人： Theodorus Leonardus Van Den Akker , Martinus Hendricus Hendricus Hoeks , Pieter Willem Herman De Jager , Lambertus Gerardus Maria Kessels , Marco Cornelis Jacobus Martinus Van Hassel , Frank Anton Morselt
IPC分类号： G03B27/32
CPC分类号： G03F7/70291 , G03F7/70508
摘要： A method and device for programming an array of individually controllable elements configured to impart a beam with a pattern. For example, the method can be suitable for use in a lithographic apparatus. The method includes generating first data representing a first pattern, generating second data representing a second pattern, writing the first data to a first buffer, and reading the first data from the first buffer to program the array of individually controllable elements to display the first pattern, while writing the second data to a second buffer in parallel.
摘要翻译：用于对被配置为赋予光束的图案的独立可控元件的阵列的编程的方法和装置。例如，该方法可适用于光刻设备。该方法包括产生表示第一图案的第一数据，产生表示第二图案的第二数据，将第一数据写入第一缓冲器，以及从第一缓冲器读取第一数据以对独立可控元件阵列进行编程以显示第一图案同时将第二数据并行地写入第二缓冲器。

2. 发明授权

US07209216B2 Lithographic apparatus and device manufacturing method utilizing dynamic correction for magnification and position in maskless lithography 有权
标题翻译：平版印刷设备和设备制造方法利用无掩模光刻术中的放大和位置的动态校正
公开(公告)号：US07209216B2
公开(公告)日：2007-04-24
申请号：US11089539
申请日：2005-03-25
申请人： Pieter Willem Herman De Jager , Theodorus Leonardus Van Den Akker , Willem Jurrianus Venema , Wouter Frans Willem Mulckhuyse , Lambertus Gerardus Maria Kessels
发明人： Pieter Willem Herman De Jager , Theodorus Leonardus Van Den Akker , Willem Jurrianus Venema , Wouter Frans Willem Mulckhuyse , Lambertus Gerardus Maria Kessels
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F7/70291 , G03F7/70508
摘要： A lithographic apparatus in which a size and/or a position of features formed on a substrate are adjusted by adjusting an intensity of radiation at boundaries of pattern features.
摘要翻译：其中通过调节图案特征边界处的辐射强度来调节形成在基底上的特征的尺寸和/或位置的光刻设备。

3. 发明授权

US07317510B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07317510B2
公开(公告)日：2008-01-08
申请号：US11020643
申请日：2004-12-27
申请人： Marcel Bontekoe , Patricius Aloysius Jacobus Tinnemans , Lambertus Gerardus Maria Kessels , Marco Cornelis Jacobus Martinus Van Hassel , Wouter Frans Willem Mulckhuyse
发明人： Marcel Bontekoe , Patricius Aloysius Jacobus Tinnemans , Lambertus Gerardus Maria Kessels , Marco Cornelis Jacobus Martinus Van Hassel , Wouter Frans Willem Mulckhuyse
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70291 , G03F7/70283 , G03F7/70508
摘要： A lithography apparatus including a projection system configured to project a beam of radiation as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation to form a requested dose pattern on a substrate. The requested dose pattern is built up over time from an array of localized exposures in which at least neighboring localized exposures are imaged at substantially different times and in which each localized exposure is produced by one of the sub-beams of radiation. The lithography apparatus also includes a rasterizer device arranged to convert data defining the requested dose pattern to a sequence of data representing the requested dose at a corresponding sequence of points within the pattern, and also a data manipulation device arranged to receive the sequence of data and constitute a control signal suitable for controlling the array of individually controllable elements.
摘要翻译：一种光刻设备，包括投影系统，该投影系统被配置为将辐射束投影为辐射子束阵列和被配置成调制辐射子束的独立可控元件的阵列，以在衬底上形成所请求的剂量图案。所要求的剂量模式随着时间的推移从局部暴露的阵列中建立起来，其中至少相邻的局部曝光在基本上不同的时间成像，并且其中每个局部曝光由辐射的子束之一产生。光刻设备还包括光栅化器装置，其被设置为将定义所请求的剂量图案的数据转换成在图案内的相应的点序列处表示所请求的剂量的数据序列，以及数据操纵装置，被配置为接收数据序列，构成适于控制单独可控元件阵列的控制信号。

4. 发明授权

US07460208B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07460208B2
公开(公告)日：2008-12-02
申请号：US11061754
申请日：2005-02-18
申请人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Martinus Hendricus Hendricus Hoeks , Lambertus Gerardus Maria Kessels , Tobrjörn Sandström
发明人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Martinus Hendricus Hendricus Hoeks , Lambertus Gerardus Maria Kessels , Tobrjörn Sandström
IPC分类号： G03B27/52 , G02B26/00
CPC分类号： G03F7/70291 , G03F7/70833 , G03F7/70875
摘要： A lithographic apparatus provided with an array of individually controllable elements that is detachably mounted to mounting points on a support frame of the lithographic apparatus.
摘要翻译：一种光刻设备，其具有独立可控元件的阵列，其可拆卸地安装到光刻设备的支撑框架上的安装点。

5. 发明授权

US07362415B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07362415B2
公开(公告)日：2008-04-22
申请号：US11005231
申请日：2004-12-07
申请人： Dominicus Jacobus Petrus Adrianus Franken , Arno Jano Bleeker , Wilhelmus Josephus Box , Martinus Hendricus Hendricus Hoeks , Henricus Gerardus Tegenbosch , Kars Zeger Troost , Lambertus Gerardus Maria Kessels
发明人： Dominicus Jacobus Petrus Adrianus Franken , Arno Jano Bleeker , Wilhelmus Josephus Box , Martinus Hendricus Hendricus Hoeks , Henricus Gerardus Tegenbosch , Kars Zeger Troost , Lambertus Gerardus Maria Kessels
IPC分类号： G03B27/54 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70875 , G03F7/70291
摘要： A system and method are used to allow for compensation of a thermal output of an array of individually controllable elements. This can be done by inputting control signals to the array when it is not being used to pattern a projection beam in order to maintain the temperature of the array. A heating element can be provided to maintain the temperature of the array. A thermal reservoir can be provided to maintain the temperature of the array or a cooling element can be provided to reduce the temperature of the array during use.
摘要翻译：使用系统和方法来补偿单独可控元件阵列的热输出。这可以通过在不使用阵列投影光束来控制阵列的温度时将控制信号输入到阵列来完成。可以提供加热元件以保持阵列的温度。可以提供热储存器以保持阵列的温度或者可以提供冷却元件以在使用期间降低阵列的温度。

6. 发明授权

US07477772B2 Lithographic apparatus and device manufacturing method utilizing 2D run length encoding for image data compression 有权
标题翻译：利用2D游程长度编码进行图像数据压缩的平版印刷设备和设备制造方法
公开(公告)号：US07477772B2
公开(公告)日：2009-01-13
申请号：US11140559
申请日：2005-05-31
申请人： Andrej Makarovic , Willem Jurrianus Venema , Lambertus Gerardus Maria Kessels , Marcel Bontekoe
发明人： Andrej Makarovic , Willem Jurrianus Venema , Lambertus Gerardus Maria Kessels , Marcel Bontekoe
IPC分类号： G06K9/00 , G06K9/54
CPC分类号： G03F7/70291 , G03F7/70508 , G03F7/70558
摘要： A lithographic apparatus comprises an array of individually controllable elements and a data processing pipeline. The array of individually controllable elements modulates a beam of radiation. The data processing pipeline converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements in order substantially to form the requested dose pattern on a substrate. The data processing pipeline comprises an offline pre-processing device and an online rasterizer. The offline pre-processing device converts the first representation of the requested dose pattern to an intermediate representation, which can be rasterized in a fewer number of operations than the first representation. The storage device stores the intermediate representation. The online rasterizer accesses the stored intermediate representation and produces therefrom a stream of bitmap data to be used to generate the sequence of control data substantially in real time.
摘要翻译：光刻设备包括独立可控元件阵列和数据处理流水线。独立可控元件的阵列调制辐射束。数据处理流水线将所请求的剂量模式的第一表示转换成适合于控制独立可控元件的阵列的控制数据序列，以便基本上在衬底上形成所请求的剂量图案。数据处理流水线包括离线预处理设备和在线光栅器。离线预处理设备将所请求的剂量模式的第一表示转换为中间表示，其可以以比第一表示少的操作进行光栅化。存储设备存储中间表示。在线光栅化器访问存储的中间表示，并由此产生用于基本上实时生成控制数据序列的位图数据流。

7. 发明授权

US07826672B2 Lithographic apparatus and device manufacturing method utilizing a multiple dictionary compression method for FPD 有权
标题翻译：利用FPD的多字典压缩方法的平版印刷设备和器件制造方法
公开(公告)号：US07826672B2
公开(公告)日：2010-11-02
申请号：US12554083
申请日：2009-09-04
申请人： Lambertus Gerardus Maria Kessels , Patricius Aloysius Jacobus Tinnemans , Remco Johannes Van Engelen
发明人： Lambertus Gerardus Maria Kessels , Patricius Aloysius Jacobus Tinnemans , Remco Johannes Van Engelen
IPC分类号： G06K9/46 , H04N1/32 , H03M7/00
CPC分类号： G03F7/70291 , G03F7/70508
摘要： A system is provided that includes a device having an emissive portion, a memory, and a dictionary decompressor. The device having an emissive portion is configured to produce a patterned beam. The memory is configured to store a compressed representation of a requested dose pattern, comprising two groups of repeating pattern features, to be formed on a surface by the patterned beam. The dictionary decompressor at least partially decompresses the compressed representation. The dictionary decompressor comprises a first dictionary memory configured to store pattern data corresponding to a first group of the two groups of repeating pattern features and a second dictionary memory configured to store pattern data corresponding to a second group of the two groups of repeating pattern features. The repeating pattern features in the first group have one or more differing characteristics than the repeating pattern features in the second group. Related methods are also provided.
摘要翻译：提供一种包括具有发射部分的设备，存储器和字典解压缩器的系统。具有发射部分的装置被配置为产生图案化的束。存储器被配置为存储要由图案化的波束在表面上形成的包括两组重复图案特征的所请求的剂量图案的压缩表示。字典解压缩器至少部分地解压缩压缩表示。字典解压缩器包括第一字典存储器，其被配置为存储对应于两组重复图案特征的第一组的图案数据，以及第二字典存储器，其被配置为存储对应于两组重复图案特征的第二组的图案数据。第一组中的重复图案特征具有与第二组中的重复图案特征相比具有一个或多个不同的特征。还提供了相关方法。

8. 发明授权

US07606430B2 Lithographic apparatus and device manufacturing method utilizing a multiple dictionary compression method for FPD 有权
标题翻译：利用FPD的多字典压缩方法的平版印刷设备和器件制造方法
公开(公告)号：US07606430B2
公开(公告)日：2009-10-20
申请号：US11214055
申请日：2005-08-30
申请人： Lambertus Gerardus Maria Kessels , Patricius Aloysius Jacobus Tinnemans , Remco Johannes Van Engelen
发明人： Lambertus Gerardus Maria Kessels , Patricius Aloysius Jacobus Tinnemans , Remco Johannes Van Engelen
IPC分类号： G06K9/46 , H04N1/32 , H03M7/00
CPC分类号： G03F7/70291 , G03F7/70508
摘要： A lithographic apparatus comprises an array of individually controllable elements that modulate a beam of radiation, a compressed-pattern memory that stores a compressed representation of a requested dose pattern to be formed on a substrate by the modulated beam, and a dictionary decompressor that at least partially decompresses the compressed representation. The dictionary decompressor comprises an external dictionary memory, a first dictionary decoder that at least partially decompresses at least a part of the compressed representation by extracting, from the external dictionary memory, portions of pattern data corresponding to references to the external dictionary memory contained in the compressed representation, and a second dictionary decoder having an internal dictionary memory, the second dictionary decoder that at least partially decompresses at least a part of the compressed representation by extracting, from the internal dictionary memory, portions of pattern data corresponding to references to the internal dictionary memory contained in compressed representation.
摘要翻译：光刻设备包括调制辐射束的单独可控元件的阵列，压缩图案存储器，其通过调制束存储要在衬底上形成的所请求的剂量图案的压缩表示;以及字典解压缩器，至少部分解压缩压缩表示。字典解压缩器包括外部字典存储器，第一字典解码器，其通过从外部字典存储器提取对应于对包含在所述外部字典存储器中的外部字典存储器的引用的图案数据的至少部分来解压缩压缩表示的至少一部分压缩表示和具有内部字典存储器的第二字典解码器，所述第二字典解码器通过从内部字典存储器提取对应于对内部的引用的模式数据的部分来至少部分地解压缩压缩表示的至少一部分包含在压缩表示中的字典存储器。

9. 发明授权

US07321416B2 Lithographic apparatus, device manufacturing method, device manufactured thereby, and controllable patterning device utilizing a spatial light modulator with distributed digital to analog conversion 有权
标题翻译：平版印刷设备，器件制造方法，由此制造的器件，以及利用具有分布式数模转换的空间光调制器的可控制的图案形成装置
公开(公告)号：US07321416B2
公开(公告)日：2008-01-22
申请号：US11152849
申请日：2005-06-15
申请人： Martinus Cornelis Reijnen , Andrej Makarovic , Lambertus Gerardus Maria Kessels , Stoyan Nihtianov , Petrus Wilhelmus Josephus Maria Kemper , Kamen Hristov Chilov
发明人： Martinus Cornelis Reijnen , Andrej Makarovic , Lambertus Gerardus Maria Kessels , Stoyan Nihtianov , Petrus Wilhelmus Josephus Maria Kemper , Kamen Hristov Chilov
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70291
摘要： The present invention comprises a lithographic apparatus and device manufacturing method method that uses a patterning device that increase a number of individually controllable elements that are programmed simultaneously to increase an update rate of an array of individually controllable elements. A number of required high speed analog inputs to the array is reduced. The complexity of the array is reduced and the maximum update speed of the array is increased. Furthermore, the number of elements within an array can be readily expanded. The patterning device can be divided into a plurality of groups of cells and the lithographic apparatus can comprise a plurality of supply channels. Each supply channel can be arranged to provide a voltage signal to each cell in a respective group of cells. This can reduce the number of required inputs to the patterning device for individually addressing each cell.
摘要翻译：本发明包括光刻设备和器件制造方法，其使用图案化装置，其增加同时编程的单独可控元件的数量，以增加单独可控元件阵列的更新速率。降低了阵列所需的高速模拟输入的数量。减少阵列的复杂性，并增加阵列的最大更新速度。此外，阵列中的元素的数量可以容易地扩展。图案形成装置可以分成多组单元，并且光刻设备可以包括多个供应通道。每个供应通道可以被布置成向相应的单元组中的每个单元提供电压信号。这可以减少用于单独寻址每个单元的图案形成装置的所需输入的数量。

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