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1. 发明授权

US07460208B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07460208B2
公开(公告)日：2008-12-02
申请号：US11061754
申请日：2005-02-18
申请人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Martinus Hendricus Hendricus Hoeks , Lambertus Gerardus Maria Kessels , Tobrjörn Sandström
发明人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Martinus Hendricus Hendricus Hoeks , Lambertus Gerardus Maria Kessels , Tobrjörn Sandström
IPC分类号： G03B27/52 , G02B26/00
CPC分类号： G03F7/70291 , G03F7/70833 , G03F7/70875
摘要： A lithographic apparatus provided with an array of individually controllable elements that is detachably mounted to mounting points on a support frame of the lithographic apparatus.
摘要翻译：一种光刻设备，其具有独立可控元件的阵列，其可拆卸地安装到光刻设备的支撑框架上的安装点。

2. 发明授权

US08159647B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08159647B2
公开(公告)日：2012-04-17
申请号：US12170120
申请日：2008-07-09
申请人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Peter C. Kochersperger , Kars Zeger Troost
发明人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Peter C. Kochersperger , Kars Zeger Troost
IPC分类号： G03B27/68 , G03B27/42
CPC分类号： G03F7/707 , G03F7/70283 , G03F7/70291 , G03F7/703 , G03F7/70783
摘要： A maskless lithography system has a patterning array assembly formed by a plurality of patterning arrays, each patterning array having a substrate. Each patterning array has a plurality of individually controllable elements to endow an incoming radiation beam with a patterned cross-section. To reduce the global unflatness of the patterning array assembly that is oriented in a first plane, the position of at least one substrate of a patterning array is adjusted to a second orientation. Reduction of the global unflatness of the patterning array assembly reduces a telecentricity error without introducing additional error into the maskless lithography system.
摘要翻译：无掩模光刻系统具有由多个图案化阵列形成的图案阵列组件，每个图案阵列具有衬底。每个图案阵列具有多个可独立控制的元件，以赋予具有图案化横截面的入射辐射束。为了减小在第一平面中定向的图案阵列组件的全局不平坦度，将图案化阵列的至少一个衬底的位置调整到第二取向。降低图形阵列组件的全局不平坦性减少了远心误差，而不会在无掩模光刻系统中引入额外的误差。

3. 发明授权

US07508494B2 Lithographic apparatus and a subtrate table for exciting a shockwave in a substrate 失效
标题翻译：平版印刷设备和用于激发基板中的冲击波的减号表
公开(公告)号：US07508494B2
公开(公告)日：2009-03-24
申请号：US11643952
申请日：2006-12-22
申请人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Johannes Hendrikus Gertrudis Franssen , Johannes Theodorus Guillielmus Maria Van De Ven , Michiel Puyt , Teun Peterus Adrianus De Wilt
发明人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Johannes Hendrikus Gertrudis Franssen , Johannes Theodorus Guillielmus Maria Van De Ven , Michiel Puyt , Teun Peterus Adrianus De Wilt
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/707 , H01L21/683
摘要： A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a plurality of projections constructed and arranged to support corresponding parts of a bottom section of the substrate, and an actuator constructed and arranged to excite a shockwave in the substrate.
摘要翻译：光刻设备包括构造和布置成调节辐射束的照明系统，以及构造和布置成支撑图案形成装置的支撑件。图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。所述装置还包括被构造和布置成保持基板的基板台，以及构造和布置成将图案化的辐射束投影到基板的目标部分上的投影系统。衬底台包括多个突起，其被构造和布置成支撑衬底的底部的对应部分，以及构造和布置成激发衬底中的冲击波的致动器。

4. 发明授权

US07474384B2 Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus 有权
标题翻译：光刻设备，设备制造方法和用于光刻设备的投影元件
公开(公告)号：US07474384B2
公开(公告)日：2009-01-06
申请号：US10994201
申请日：2004-11-22
申请人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Stephen Roux , Michael L. Nelson
发明人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Stephen Roux , Michael L. Nelson
IPC分类号： G03B27/54 , G03B27/52
CPC分类号： G03F7/709 , G03F7/70258 , G03F7/70308
摘要： A lithographic apparatus, a device manufacturing method, and a projection element for use in a lithographic apparatus are disclosed. The lithographic apparatus has a radiation system for providing a pulsed beam of radiation, a patterning device for imparting the beam with a pattern to form a patterned radiation beam, and a projection system having a projection element for projecting the patterned beam onto a target portion of a substrate. The apparatus further comprises an actuator for moving the projection element for shifting the patterned beam that is projected onto the substrate during at least one pulse of the radiation system. This can be done to compensate for a positional error between a substrate table holding the substrate and an aerial image of the projection system. The positional error could occur due to mechanical vibrations in the frame system of the lithographic apparatus.
摘要翻译：公开了一种用于光刻设备的光刻设备，设备制造方法和投影元件。光刻设备具有用于提供脉冲辐射束的辐射系统，用于将光束赋予图案以形成图案化辐射束的图案形成装置，以及具有用于将图案化光束投影到目标部分的投影元件的投影系统底物。该装置还包括用于移动投影元件的致动器，用于移动在辐射系统的至少一个脉冲期间投影到基板上的图案化光束。这可以进行以补偿保持基板的基板台与投影系统的空中图像之间的位置误差。位置误差可能由于光刻设备的框架系统中的机械振动而发生。

5. 发明授权

US07411652B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US07411652B2
公开(公告)日：2008-08-12
申请号：US10946333
申请日：2004-09-22
申请人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Peter C. Kochersperger , Kars Zeger Troost
发明人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Peter C. Kochersperger , Kars Zeger Troost
IPC分类号： G03B27/42 , G03B27/62
CPC分类号： G03F7/707 , G03F7/70283 , G03F7/70291 , G03F7/703 , G03F7/70783
摘要： One or more patterning arrays are mounted to a mounting plate via height adjustment structures that enable the flatness of the active surfaces of the patterning arrays to be controlled. The height adjustment structures may comprise an array of piezoelectric actuators or screws. Alternatively, the backside of the patterning means may be polished to optical flatness and bonded by crystal bonding to an optically flat surface of a rigid mounting body.
摘要翻译：一个或多个图形阵列通过高度调节结构安装到安装板，使得能够控制图案化阵列的有效表面的平坦度。高度调节结构可以包括压电致动器或螺钉的阵列。或者，可以将图案形成装置的背面抛光到光学平面度，并通过晶体结合键合到刚性安装体的光学平坦表面。

6. 发明申请

US20080151212A1 Lithographic apparatus, a substrate table and a method for releasing a wafer 失效
标题翻译：光刻设备，衬底台和用于释放晶片的方法
公开(公告)号：US20080151212A1
公开(公告)日：2008-06-26
申请号：US11643952
申请日：2006-12-22
申请人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Johannes Hendrikus Gertrudis Franssen , Johannes Theodorus Guillielmus Maria Van De Ven , Michiel Puyt , Teun Peterus Adrianus De Wilt
发明人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Johannes Hendrikus Gertrudis Franssen , Johannes Theodorus Guillielmus Maria Van De Ven , Michiel Puyt , Teun Peterus Adrianus De Wilt
IPC分类号： G03B27/32 , G03B27/58
CPC分类号： G03F7/707 , H01L21/683
摘要： A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a plurality of projections constructed and arranged to support corresponding parts of a bottom section of the substrate, and an actuator constructed and arranged to excite a shockwave in the substrate.
摘要翻译：光刻设备包括构造和布置成调节辐射束的照明系统，以及构造和布置成支撑图案形成装置的支撑件。图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。所述装置还包括被构造和布置成保持基板的基板台，以及构造和布置成将图案化的辐射束投影到基板的目标部分上的投影系统。衬底台包括多个突起，其被构造和布置成支撑衬底的底部的对应部分，以及构造和布置成激发衬底中的冲击波的致动器。

7. 发明授权

US09304077B2 Inspection apparatus and method 有权
标题翻译：检验仪器及方法
公开(公告)号：US09304077B2
公开(公告)日：2016-04-05
申请号：US13166384
申请日：2011-06-22
申请人： Lucas Henricus Johannes Stevens , Arno Jan Bleeker
发明人： Lucas Henricus Johannes Stevens , Arno Jan Bleeker
IPC分类号： G01N21/00 , G01N21/17 , G01N21/956
CPC分类号： G01N21/1717 , G01N21/00 , G01N21/95623
摘要： Ghost reflections in a catadioptric scatterometer objective are excluded from an angle-resolved spectrum measurement by using a partial pupil for illumination and for the measurement excluding the area of the pupil plane that has been illuminated. Ghost reflections are reflected back into same point in the pupil plane. The ghost reflections do not interfere with the signal in the non-illuminated area of the pupil plane. An illumination system provides a beam of electromagnetic radiation to illuminate a first area in an illumination pupil plane of the objective. The objective is arranged as to illuminate the substrate with the beam of electromagnetic radiation. The illumination pupil plane is the back projected image of the pupil plane of the objective and is also imaged into the measurement pupil plane at the back focal plane of the objective, via auxiliary optics. A detector is configured to measure an angle resolved spectrum arising from the illumination of the substrate, in a measurement area of the measurement pupil plane of the objective excluding an area corresponding to the first area.
摘要翻译：通过使用用于照明的部分光瞳和除了被照明的光瞳面的区域之外的测量，从角度分辨光谱测量中排除反射折射式散射仪物镜中的鬼反射。幽灵反射回到瞳孔平面上的相同点。幽灵反射不影响瞳孔平面的非照明区域中的信号。照明系统提供电磁辐射束以照射物镜的照明光瞳平面中的第一区域。该目的被布置为用电磁辐射束照射基板。照明光瞳平面是物镜的光瞳平面的背投影像，并且还通过辅助光学器件在物镜的后焦平面处成像到测量光瞳平面中。检测器被配置为测量除了与第一区域相对应的区域之外的物镜的测量光瞳平面的测量区域中由基板照射产生的角度分辨光谱。

8. 发明授权

US08054467B2 Method and apparatus for angular-resolved spectroscopic lithography characterization 有权
标题翻译：用于角分辨光谱光刻特征的方法和装置
公开(公告)号：US08054467B2
公开(公告)日：2011-11-08
申请号：US12805852
申请日：2010-08-20
申请人： Arie Jeffrey Maria Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
发明人： Arie Jeffrey Maria Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
IPC分类号： G01J3/45
CPC分类号： G01N21/8806 , G03F7/70341 , G03F7/70633 , G03F7/7065 , G03F9/7034
摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
摘要翻译：通过在高数值孔径透镜的光瞳平面中测量作为辐射的结果的角度分辨光谱从衬底反射来确定衬底的性质的装置和方法。该属性可以是角度和波长相关的，并且可以包括TM和TE偏振辐射的强度及其相对相位差。

9. 发明申请

US20110043777A1 TARGET MATERIAL, A SOURCE, AN EUV LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD USING THE SAME 审中-公开
标题翻译：目标材料，源，EUV光刻设备及使用其的器件制造方法
公开(公告)号：US20110043777A1
公开(公告)日：2011-02-24
申请号：US12933668
申请日：2009-03-20
申请人： Vladimir Mihailovitc Krivtsun , Vadim Yevgenyevich Banine , Arno Jan Bleeker , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Johannes Hubertus Josephina Moors , Sergey Churilov , Denis Glushkov
发明人： Vladimir Mihailovitc Krivtsun , Vadim Yevgenyevich Banine , Arno Jan Bleeker , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Johannes Hubertus Josephina Moors , Sergey Churilov , Denis Glushkov
IPC分类号： G03B27/54 , G03F7/20 , C22C28/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/008
摘要： A target material is configured to be used in a source constructed and arranged to generate a radiation beam having a wavelength in an extreme ultraviolet range. The target material includes a Gd-based composition configured to modify a melting temperature of Gd.
摘要翻译：目标材料被配置为用于构造和布置成产生具有极紫外范围波长的辐射束的源。目标材料包括配置成改变Gd的熔融温度的Gd基组合物。

10. 发明授权

US07728956B2 Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data 有权
标题翻译：使用存储图案变化数据的数据缓冲器在衬底上利用多个管芯设计的平版印刷设备和器件制造方法
公开(公告)号：US07728956B2
公开(公告)日：2010-06-01
申请号：US11098607
申请日：2005-04-05
申请人： Arno Jan Bleeker , Kars Zeger Troost , Adrianus Johannes Henricus Maas
发明人： Arno Jan Bleeker , Kars Zeger Troost , Adrianus Johannes Henricus Maas
IPC分类号： G03B27/32
CPC分类号： G03F7/70508 , G03F7/70275 , G03F7/70291
摘要： A lithographic system and method are provided that allow for variations of a basic device design to be generated without substantially increasing the cost of the data path hardware. The lithographic apparatus includes an array of individually controllable elements, a control system, a first data buffer, and a second data buffer. The control system provides control signals to the array of individually controllable elements. The first data buffer stores pattern data that corresponds to a pattern to be exposed on a plurality of areas on the substrate. The second data buffer stores pattern variation data, corresponding to at least one change to a part of the pattern. The control system is configured, such that at least one variation of the pattern is exposed on one of the areas on the substrate with the pattern variation data.
摘要翻译：提供了一种光刻系统和方法，其允许在不显着增加数据路径硬件的成本的情况下生成基本设备设计的变化。光刻设备包括独立可控元件阵列，控制系统，第一数据缓冲器和第二数据缓冲器。控制系统向独立可控元件阵列提供控制信号。第一数据缓冲器存储对应于要暴露在基板上的多个区域上的图案的图案数据。第二数据缓冲器存储对应于图案的一部分的至少一个改变的图案变化数据。控制系统被配置为使得图案的至少一个变化在图案变化数据的基板上的一个区域上露出。

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