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1. 发明授权

US06228429B1 Methods and apparatus for processing insulating substrates 有权
标题翻译：用于处理绝缘基板的方法和装置
公开(公告)号：US06228429B1
公开(公告)日：2001-05-08
申请号：US09495545
申请日：2000-02-01
申请人： Terry Bluck , James H. Rogers , Jun Xie , Eric C. Lawson
发明人： Terry Bluck , James H. Rogers , Jun Xie , Eric C. Lawson
IPC分类号： B05D140
CPC分类号： C23C14/345 , B05D3/145 , C23C14/50 , C23C14/568 , G11B5/8404
摘要： A disk gripper for gripping an insulating disk, such as a glass disk, at its edge during processing includes a contact device for contacting the edge of the insulating disk and a mechanism for moving the contact device between a contact position, in contact with the edge of the disk, and a retracted position. In a first processing station, a conductive coating is applied to a disk held by the gripper, with the contact device in the retracted position. In a second processing station, ions are generated in a plasma adjacent to the surface of the disk held by the gripper. The contact device is in the contact position in contact with the conductive coating, and a bias voltage is applied to the contact device in the second processing station. The ions are accelerated from the plasma toward the disk by the bias voltage applied to the conductive coating.
摘要翻译：用于在加工过程中在其边缘处夹持诸如玻璃盘的绝缘盘的盘夹持器包括用于接触绝缘盘的边缘的接触装置和用于使接触装置在与边缘接触的接触位置之间移动的机构的缩回位置。在第一处理站中，将导电涂层施加到由夹持器保持的盘上，其中接触装置处于缩回位置。在第二处理站中，在由夹持器保持的盘的表面附近的等离子体中产生离子。接触装置处于与导电涂层接触的接触位置，并且偏压被施加到第二处理站中的接触装置。通过施加到导电涂层的偏置电压将离子从等离子体加速到盘。

2. 发明授权

US6101972A Plasma processing system and method 有权
标题翻译：等离子体处理系统及方法
公开(公告)号：US6101972A
公开(公告)日：2000-08-15
申请号：US235943
申请日：1999-01-22
申请人： Terry Bluck , James H. Rogers , Jun Xie
发明人： Terry Bluck , James H. Rogers , Jun Xie
IPC分类号： H05H1/46 , B01J19/08 , B05C21/00 , C23C16/26 , C23C16/27 , C23C16/44 , C23C16/50 , C23C16/513 , G11B5/84 , H01J37/317 , H05H1/00
CPC分类号： H01J37/3178 , C23C16/26 , C23C16/513 , H01J2237/08 , H01J2237/0822 , H01J2237/3142
摘要： A substrate processing system includes a processing chamber, a substrate holder positioned in the chamber, a gas source for supplying a process gas to the chamber, at least one ion source located in the chamber, and a power source for energizing the ion source by positively biasing the anode and negatively biasing the cathode, the bias in each instance being relative to the chamber. The ion source ionizes the process gas producing ions for processing a substrate disposed on a substrate holder in the chamber. One embodiment includes two such ion sources. In this case, the power source energizes the first and second anodes and the cathodes in a time multiplexed manner, such that only one of the first or second ion sources is energized at any time and interactions between ion sources are eliminated.
摘要翻译：基板处理系统包括处理室，位于所述室中的基板保持器，用于向所述室提供处理气体的气体源，位于所述室中的至少一个离子源，以及用于通过正向激励所述离子源的电源偏置阳极并负偏压阴极，每种情况下的偏压相对于室。离子源电离产生离子的工艺气体，以处理设置在腔室中的衬底保持器上的衬底。一个实施例包括两个这样的离子源。在这种情况下，电源以时间复用的方式激励第一和第二阳极和阴极，使得在任何时间仅使第一或第二离子源中的仅一个被激励，并且消除离子源之间的相互作用。

3. 发明授权

US06368678B1 Plasma processing system and method 有权
标题翻译：等离子体处理系统及方法
公开(公告)号：US06368678B1
公开(公告)日：2002-04-09
申请号：US09495548
申请日：2000-02-01
申请人： Terry Bluck , James H. Rogers
发明人： Terry Bluck , James H. Rogers
IPC分类号： H05H124
CPC分类号： H01J37/32009 , C23C16/26 , C23C16/50 , C23C16/513 , H01J37/3178 , H01J37/3233 , H01J2237/08 , H01J2237/0822 , H01J2237/3142
摘要： A substrate processing system includes a processing chamber, an electrically floating substrate holder positioned in the chamber, a gas source for supplying a process gas to the chamber, at least one ion source located in the chamber, and a power source for energizing the ion source by positively biasing the anode and negatively biasing the cathode in a train of pulses of selectably variable duty cycle and magnitude to maintain a selected time averaged current, the bias in each instance being relative to the chamber. The ion source ionizes the process gas producing ions for processing a substrate disposed on the floating substrate holder in the chamber. The floating substrate is biased in accord with the net charge thereon as controlled by the energetic electron flux. One embodiment includes two such ion sources. In this case, the power source energizes the first and second anodes and the cathodes in a time multiplexed manner, such that only one of the first or second ion sources is energized at any time and interactions between ion sources are eliminated.
摘要翻译：基板处理系统包括处理室，定位在室中的电浮置基板保持器，用于向室提供处理气体的气体源，位于室中的至少一个离子源，以及用于激励离子源的电源通过积极偏置阳极并且以可选择的可变占空比和幅度的脉冲序列负偏置阴极以保持所选择的时间平均电流，每种情况下的偏压相对于室。离子源离子化产生离子的工艺气体，以处理设置在腔室中的浮动衬底保持器上的衬底。浮动衬底在其上由与能量电子通量控制的净电荷相一致地被偏置。一个实施例包括两个这样的离子源。在这种情况下，电源以时间复用的方式激励第一和第二阳极和阴极，使得在任何时间仅使第一或第二离子源中的仅一个被激励，并且消除离子源之间的相互作用。

4. 发明授权

US06203862B1 Processing systems with dual ion sources 失效
标题翻译：具有双离子源的加工系统
公开(公告)号：US06203862B1
公开(公告)日：2001-03-20
申请号：US09076971
申请日：1998-08-07
申请人： Terry Bluck , James H. Rogers , Sean P. McGinnis
发明人： Terry Bluck , James H. Rogers , Sean P. McGinnis
IPC分类号： H05H100
CPC分类号： C23C16/513 , C23C16/26 , H01J37/3178 , H01J2237/08 , H01J2237/0822 , H01J2237/3142
摘要： A substrate processing system includes a processing chamber, a substrate holder positioned in the chamber, a gas source for supplying a process gas to the chamber, first and second ion sources located in the chamber, and a power source for energizing the first and second ion sources. Each ion source ionizes the process gas to produce ions for processing a substrate disposed on the substrate holder. The first and second ion sources include first and second anodes, respectively. The power source energizes the first and second anodes in a time multiplexed manner, such that only one of the first and second ion sources is energized at any time and interactions between ion sources are eliminated.
摘要翻译：基板处理系统包括处理室，位于室中的基板保持器，用于向室提供处理气体的气体源，位于室中的第一和第二离子源，以及用于激励第一和第二离子的电源来源。每个离子源使工艺气体离子化以产生用于处理设置在衬底保持器上的衬底的离子。第一和第二离子源分别包括第一和第二阳极。电源以时间复用的方式激励第一和第二阳极，使得第一和第二离子源中的仅一个在任何时间被激励，并且消除了离子源之间的相互作用。

5. 发明授权

US08262922B2 Plasma confinement rings having reduced polymer deposition characteristics 有权
标题翻译：具有降低的聚合物沉积特性的等离子体约束环
公开(公告)号：US08262922B2
公开(公告)日：2012-09-11
申请号：US12230236
申请日：2008-08-26
申请人： Rajinder Dhindsa , Felix Kozakevich , James H. Rogers , David Trussell
发明人： Rajinder Dhindsa , Felix Kozakevich , James H. Rogers , David Trussell
IPC分类号： H01L21/302
CPC分类号： H01J37/32623 , H01J37/32477 , H01J37/32522 , H01J37/32642 , Y10S156/914 , Y10S156/915
摘要： Plasma confinement ring assemblies are provided that include confinement rings adapted to reach sufficiently high temperatures on plasma-exposed surfaces of the rings to avoid polymer deposition on those surfaces. The plasma confinement rings include thermal chokes adapted to localize heating at selected portions of the rings that include the plasma exposed surfaces. The thermal chokes reduce heat conduction from those portions to other portions of the rings, which causes selected portions of the rings to reach desired temperatures during plasma processing.
摘要翻译：提供等离子体限制环组件，其包括适于在等离子体暴露的表面上达到足够高的温度的限制环，以避免聚合物沉积在这些表面上。等离子体约束环包括适于在包括等离子体暴露表面的环的选定部分处定位加热的热扼流圈。热扼流圈减少从这些部分到环的其他部分的热传导，这导致环的选定部分在等离子体处理期间达到期望的温度。

6. 发明授权

US4233600A Method and system for detecting plate clashing in disc refiners 失效
标题翻译：用于检测圆盘磨浆机板块碰撞的方法和系统
公开(公告)号：US4233600A
公开(公告)日：1980-11-11
申请号：US913409
申请日：1978-06-07
申请人： James H. Rogers , Donald J. Butler
发明人： James H. Rogers , Donald J. Butler
IPC分类号： B02C7/14 , B02C7/11 , B02C23/04 , B02C25/00 , D21D1/00 , D21D1/30 , G08B21/00
CPC分类号： D21D1/30 , B02C23/04 , B02C7/11 , D21D1/002
摘要： A refiner plate clash detection system and method for plate clash detection is provided herein. The system includes a receiver for a first signal having a significant increase in level at at least one distinct predetermined frequency related to the clash and the characteristics of the discs of the refiner. A filter is provided having a passband matched to pass the distinct frequency of the signal to provide a filtered output signal in which the center frequency of the passband of the filter is determined by the formulaf.sub.o =n.SIGMA..sub.Rwhereinf.sub.o is the center frequency (expressed in Hertz) of said passbandn=the number of segments at a given radius, per single disc and.SIGMA..sub.R =the sum of the rotational rates (expressed in Hertz) of the two discs enclosing a given refining volume.The filtered signal is then smoothed. A threshold level is established. A comparator is provided for receiving the smoothed signal and for comparing it with the threshold level, and for providing an output signal of predetermined form, when the smoothed signal exceeds the threshold level. A receiver is provided for receiving the output signal for generating an alarm operation signal in response thereto. Protection can be automatically initiated by the plate clash detection system; alternately, it can be done manually by an operator, using the detection system as a warning device.
摘要翻译：本文提供了一种用于板碰撞检测的精磨机碰撞检测系统和方法。该系统包括用于第一信号的接收器，其具有在与冲突相关的至少一个不同的预定频率和精磨机的盘的特性上显着增加的水平。提供一个滤波器，其具有匹配的通带以通过信号的不同频率以提供滤波的输出信号，其中滤波器的通带的中心频率由公式fo = n SIGMA R确定，其中fo是中心频率以赫兹表示的所述通带n =给定半径处的每个盘和SIGMA的段的数量R =包围给定精炼体积的两个盘的旋转速率（以赫兹表示）的总和。

7. 发明授权

US4023666A High speed bottle transfer machine 失效
标题翻译：高速转瓶机
公开(公告)号：US4023666A
公开(公告)日：1977-05-17
申请号：US665232
申请日：1976-03-09
申请人： James H. Rogers
发明人： James H. Rogers
IPC分类号： B65G47/68
CPC分类号： B65G47/681
摘要： Discloses a machine for feeding groups of bottles in case formation in one-by-one fashion onto an outlet conveyor. The machine involves the use of a spacing conveyor interposed between the feed conveyor and the outlet conveyor and channel means disposed over the end of the feed conveyor so as to orient the groups of bottles in side-by-side rows as they were taken from the case. Spacing guides are positioned on the spacing conveyor at an angle so that a row of bottles in side-by-side relation are retained on the spacing conveyor while the foremost row is angled so that the bottles reach the outlet conveyor at different times and can then be carried away one at a time. The spacing guides are angled so that the last bottle in one row is fed onto the outlet conveyor before the first bottle of the next row is fed onto the outlet conveyor. A series of gates are supplied at the end of all but the last channel so that the gates separate the bottles as they are fed onto the outlet conveyor. A timing screw driven in the same direction as the outlet conveyor and in synchronism therewith engages each of the bottles in a pocket as it is fed onto the outlet conveyor and carries it along the outlet conveyor.
摘要翻译：公开了一种用于在一个一个方式形成壳体的情况下将瓶子组送入到出口输送机上的机器。该机器涉及使用间隔输送机，该输送机置于进料输送机和出口输送机之间，并且通道装置设置在进料输送机的端部之上，以便当它们从案件。间隔导向件以一定角度定位在间隔输送机上，使得一排并排关系的瓶子保持在间隔输送机上，而最前排成一定角度，使得瓶子在不同时间到达出口输送机，然后可以一次被带走。间隔引导件是成角度的，使得一排中的最后一个瓶子被供给到出口输送机上，然后将下一排的第一个瓶子送到出口输送机上。除了最后一个通道之外，在所有通道的末端都提供一系列的门，以便在将瓶子送入出口输送机时将门分开。与出口输送机沿同一方向驱动的定时螺钉，并与其同步地将每个瓶子在进料到出口输送机上并沿着出口输送机运送时将其接合在口袋中。

8. 发明申请

US20100178774A1 PLASMA CONFINEMENT RINGS INCLUDING RF ABSORBING MATERIAL FOR REDUCING POLYMER DEPOSITION 有权
标题翻译：等离子体束环包括用于减少聚合物沉积的射频吸收材料
公开(公告)号：US20100178774A1
公开(公告)日：2010-07-15
申请号：US12730588
申请日：2010-03-24
申请人： James H. Rogers
发明人： James H. Rogers
IPC分类号： H01L21/465
CPC分类号： H01L21/3065 , H01J37/32477 , H01J37/32623 , H01J37/32642
摘要： Plasma confinement rings are adapted to reach sufficiently high temperatures on plasma-exposed surfaces of the rings to substantially reduce polymer deposition on those surfaces. The plasma confinement rings include an RF lossy material effective to enhance heating at portions of the rings. A low-emissivity material can be provided on a portion of the plasma confinement ring assembly to enhance heating effects.
摘要翻译：等离子体限制环适于在等离子体暴露的表面上达到足够高的温度，以基本上减少在这些表面上的聚合物沉积。等离子体约束环包括有效地增强环的部分处的加热的RF有损耗材料。可以在等离子体约束环组件的一部分上提供低辐射材料以增强加热效果。

9. 发明申请

US20080193890A1 Textile Curing Oven With Active Cooling 审中-公开
标题翻译：纺织固化炉主动冷却
公开(公告)号：US20080193890A1
公开(公告)日：2008-08-14
申请号：US11672583
申请日：2007-02-08
申请人： James H. Rogers
发明人： James H. Rogers
IPC分类号： F27B9/28 , F27D15/02 , F27D9/00
CPC分类号： F27B9/28 , F26B13/12 , F26B21/004 , F26B21/10
摘要： An oven for bonding adhesives to the back surface of a textile article includes a housing with a transport frame for passing the textile article through a curing chamber within the housing. The oven also has an air source and a duct system that delivers an airflow into a cool zone on the opposite, pile surface side of the textile article. The airflow has a lower temperature than the elevated temperature of the curing chamber and is supplied to the cool zone in sufficient amounts such that the pressure in the cool zone exceeds the ambient pressure in the curing chamber.
摘要翻译：用于将粘合剂粘合到纺织制品的后表面的烤箱包括具有用于使纺织品通过壳体内的固化室的运输框架的壳体。烘箱还具有空气源和管道系统，其将气流输送到纺织物品的相对的绒面表面侧上的凉爽区域中。气流具有比固化室升高的温度更低的温度，并以足够的量供应到冷区，使得冷区中的压力超过固化室中的环境压力。

10. 发明授权

US08500952B2 Plasma confinement rings having reduced polymer deposition characteristics 有权
标题翻译：具有降低的聚合物沉积特性的等离子体约束环
公开(公告)号：US08500952B2
公开(公告)日：2013-08-06
申请号：US13585570
申请日：2012-08-14
申请人： Rajinder Dhindsa , Felix Kozakevich , James H. Rogers , David Trussell
发明人： Rajinder Dhindsa , Felix Kozakevich , James H. Rogers , David Trussell
IPC分类号： C23C16/00 , C23C16/509 , H01L21/306 , H01L21/302
CPC分类号： H01J37/32623 , H01J37/32477 , H01J37/32522 , H01J37/32642 , Y10S156/914 , Y10S156/915
摘要： Plasma confinement ring assemblies are provided that include confinement rings adapted to reach sufficiently high temperatures on plasma-exposed surfaces of the rings to avoid polymer deposition on those surfaces. The plasma confinement rings include thermal chokes adapted to localize heating at selected portions of the rings that include the plasma exposed surfaces. The thermal chokes reduce heat conduction from those portions to other portions of the rings, which causes selected portions of the rings to reach desired temperatures during plasma processing.
摘要翻译：提供等离子体限制环组件，其包括适于在等离子体暴露的表面上达到足够高的温度的限制环，以避免聚合物沉积在这些表面上。等离子体约束环包括适于在包括等离子体暴露表面的环的选定部分处定位加热的热扼流圈。热扼流圈减少从这些部分到环的其他部分的热传导，这导致环的选定部分在等离子体处理期间达到期望的温度。

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