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1. 发明授权

US5372916A X-ray exposure method with an X-ray mask comprising phase shifter sidewalls 失效
标题翻译：具有包括移相器侧壁的X射线掩模的X射线曝光方法
公开(公告)号：US5372916A
公开(公告)日：1994-12-13
申请号：US909309
申请日：1992-07-06
申请人： Taro Ogawa , Kozo Mochiji , Seiichi Murayama , Hiroaki Oizumi , Takashi Soga , Seiji Yamamoto , Isao Ochiai
发明人： Taro Ogawa , Kozo Mochiji , Seiichi Murayama , Hiroaki Oizumi , Takashi Soga , Seiji Yamamoto , Isao Ochiai
IPC分类号： G03F1/22 , G03F1/26 , G03F7/20 , G03C5/00
CPC分类号： G03F7/70583 , G03F1/22 , G03F1/26 , G03F7/2039 , G03F7/70283 , G03F7/7035
摘要： In an X-ray exposure method, consideration was made to application of a concept of a phase shift method which is used for a light exposure method, in order to improve the resolution. As a result, phase shift layers made of a material having an appropriate refractivity are provided on side walls of an absorbing pattern of an X-ray mask to improve the resolution by an interference effect. One or more layers made of a material having a refractivity different from that of the absorbing pattern are formed on the side walls of the absorbing pattern of the X-ray mask.
摘要翻译：在X射线曝光方法中，为了提高分辨率，考虑了应用用于曝光方法的相移方法的概念。结果，由具有适当折射率的材料制成的相移层设置在X射线掩模的吸收图案的侧壁上，以通过干涉效应提高分辨率。在X射线掩模的吸收图案的侧壁上形成由具有与吸收图案的折射率不同的折射率的材料制成的一层或多层。

2. 发明授权

US4841556A Plasma X-ray source 失效
标题翻译：等离子X射线源
公开(公告)号：US4841556A
公开(公告)日：1989-06-20
申请号：US12992
申请日：1987-02-10
申请人： Yasuo Kato , Isao Ochiai , Yoshio Watanabe , Seiichi Murayama
发明人： Yasuo Kato , Isao Ochiai , Yoshio Watanabe , Seiichi Murayama
IPC分类号： H01J35/22 , H01L21/027 , H01L21/30 , H05G2/00
CPC分类号： H05G2/003
摘要： A plasma X-ray source in which a discharge tube containing a pair of coaxial cylindrical electrodes is filled with a gas, a high voltage pulse from a charged capacitor is applied between the cylindrical electrodes to convert the gas into a plasma, the plasma is focused on a position near the end of the inner one of the cylindrical electrodes to generate X-rays, and the X-rays thus generated are emitted to the outside of the discharge tube through a window provided thereon, is disclosed. In the above X-ray source, the high voltage pulse is applied between the cylindrical electrodes so that the inner cylindrical electrode is at a negative potential with respect to the outer cylindrical electrode.
摘要翻译：一种等离子体X射线源，其中包含一对同轴圆柱形电极的放电管填充有气体，在圆柱形电极之间施加来自带电电容器的高电压脉冲，将气体转换成等离子体，等离子体聚焦在靠近内部一个圆柱形电极的端部的位置处产生X射线，并且由此产生的X射线通过设置在其上的窗口发射到放电管的外部。在上述X射线源中，在圆柱形电极之间施加高电压脉冲，使得内部圆柱形电极相对于外部圆柱形电极处于负电位。

3. 发明授权

US08742365B2 Ultraviolet water treatment apparatus 有权
标题翻译：紫外线水处理设备
公开(公告)号：US08742365B2
公开(公告)日：2014-06-03
申请号：US13021185
申请日：2011-02-04
申请人： Norimitsu Abe , Shinji Kobayashi , Seiichi Murayama , Takeshi Ide , Akihiko Shirota , Takahiro Soma
发明人： Norimitsu Abe , Shinji Kobayashi , Seiichi Murayama , Takeshi Ide , Akihiko Shirota , Takahiro Soma
IPC分类号： H01J37/00
CPC分类号： C02F1/325 , C02F2201/004 , C02F2201/3225 , C02F2201/3227 , C02F2201/324 , C02F2303/04
摘要： According to one embodiment, an ultraviolet water treatment apparatus includes an ultraviolet lamp unit provided with a first plumbing flange coupling on each of both ends thereof, and further provided therein with an ultraviolet irradiation tube including an ultraviolet lamp and a lamp protective tube configured to protect the ultraviolet lamp, and a cleaning device drive unit provided with a second plumbing flange coupling on each of both ends thereof and configured to drive a cleaning device configured to clean a surface of the lamp protective tube. The ultraviolet lamp unit and the cleaning device drive unit are coupled with each other on the first and second plumbing flange couplings.
摘要翻译：根据一个实施方案，一种紫外线水处理装置包括：紫外线灯单元，其在其两端各设有第一管道法兰接头，并且还设置有包括紫外线灯和保护管的紫外线照射管，紫外线灯和清洁装置驱动单元，其在其两端的每一端设置有第二管道法兰联接器，并且构造成驱动构造成清洁灯保护管的表面的清洁装置。紫外灯单元和清洁装置驱动单元在第一和第二管道法兰联接器上彼此联接。

4. 发明授权

US07820038B2 Ultraviolet radiation water treatment system 有权
公开(公告)号：US07820038B2
公开(公告)日：2010-10-26
申请号：US11373996
申请日：2006-03-14
申请人： Norimitsu Abe , Takeshi Ide , Takeshi Matsushiro , Hiroyuki Suzuki , Seiichi Murayama
发明人： Norimitsu Abe , Takeshi Ide , Takeshi Matsushiro , Hiroyuki Suzuki , Seiichi Murayama
IPC分类号： B01D17/12
CPC分类号： C02F1/325 , B01D21/0009 , B01D21/0012 , B01D21/32 , C02F1/001 , C02F1/5236 , C02F1/66 , C02F1/76 , C02F2001/007 , C02F2201/324 , C02F2201/326 , C02F2209/005 , C02F2209/11 , C02F2301/043
摘要： A water treatment system that performs a water purifying treatment by use of ultraviolet radiation, comprises a front stage ultraviolet radiation device for radiating ultraviolet light in a front stage process in a water purifying treatment process, a rear stage ultraviolet radiation device for radiating ultraviolet light in a rear stage process, and a controller for controlling these ultraviolet radiation devices.

5. 发明申请

US20080203004A1 ULTRAVIOLET IRRADIATION WATER TREATMENT APPARATUS 有权
标题翻译：超紫外线辐射水处理设备
公开(公告)号：US20080203004A1
公开(公告)日：2008-08-28
申请号：US12106890
申请日：2008-04-21
申请人： Norimitsu Abe , Takeshi Ide , Takahiro Soma , Seiichi Murayama , Masao Kaneko , Shojiro Tamaki , Masumi Nakadate , Akira Morikawa
发明人： Norimitsu Abe , Takeshi Ide , Takahiro Soma , Seiichi Murayama , Masao Kaneko , Shojiro Tamaki , Masumi Nakadate , Akira Morikawa
IPC分类号： B01D35/06
CPC分类号： C02F1/32 , C02F1/325 , C02F2201/3227 , C02F2201/324 , C02F2201/328
摘要： An ultraviolet irradiation water treatment apparatus includes a vessel having a cylindrical side portion, and plural rod-shaped ultraviolet lamps are disposed in parallel with a central axis of the side portion in the vessel. A water inlet pipe through which water flows into the vessel is provided in an outer wall of the side portion at a position in a tangential direction of an inner periphery of the side portion.
摘要翻译：紫外线照射水处理装置包括具有圆筒形侧部的容器，并且多个杆状紫外线灯与容器中的侧部的中心轴平行设置。在侧部的内周的切线方向的位置处，在侧部的外壁上设置有水流入容器内的进水管。

6. 发明授权

US5034655A Circular fluorescent lamp 失效
标题翻译：圆形荧光灯
公开(公告)号：US5034655A
公开(公告)日：1991-07-23
申请号：US397856
申请日：1989-08-24
申请人： Seiichi Murayama , Hiromitsu Matsuno , Tetsuo Ono , Yasusuke Seki , Atsuo Koyama , Churyo Kodama , Tsuyoshi Kobayashi
发明人： Seiichi Murayama , Hiromitsu Matsuno , Tetsuo Ono , Yasusuke Seki , Atsuo Koyama , Churyo Kodama , Tsuyoshi Kobayashi
IPC分类号： H01J61/72 , H01J61/32 , H01J61/42
CPC分类号： H01J61/42 , H01J61/322
摘要： A fluorescent lamp has at least a pair of electrodes, at least two circular discharge tubes connected to said electrodes and enclosing rare gas and mercury therein, and a phosphor coating provided on an inside wall of each of said discharge tubes, the two circular discharge tubes being arranged coaxially circularly on one and the same plane, the diameter of each of the discharge tubes being selected to have a value within a range of from 5 mm to 25 mm both inclusive, the luminance on surface of each of the discharge tubes being selected to have a value within a range of from 2.times.10.sup.4 Cd/m.sup.2 to 6.times.10.sup.4 Cd/m.sup.2.
摘要翻译：荧光灯具有至少一对电极，至少两个连接到所述电极的圆形放电管并且包围其中的稀有气体和汞，以及设置在每个所述放电管的内壁上的荧光体涂层，所述两个圆形放电管在同一平面上圆周同轴地布置，每个放电管的直径被选择为具有在5mm至25mm的范围内的值，其中，每个放电管的表面上的亮度被选择具有在2×10 4 Cd / m 2至6×10 4 Cd / m 2范围内的值。

7. 发明授权

US4643799A Method of dry etching 失效
标题翻译：干蚀刻方法
公开(公告)号：US4643799A
公开(公告)日：1987-02-17
申请号：US809202
申请日：1985-12-16
申请人： Kanji Tsujii , Yusuke Yajima , Seiichi Murayama
发明人： Kanji Tsujii , Yusuke Yajima , Seiichi Murayama
IPC分类号： C23C14/22 , C23C26/00 , C23F4/00 , H01L21/3065 , H01L21/306 , B44C1/22 , C03C15/00 , C03C25/06
CPC分类号： C23C26/00 , C23C14/22 , C23F4/00 , H01L21/3065
摘要： A dry etching method according to the present invention is composed of the steps of evacuating the reaction chamber in which a substrate to be etched is set, introducing etching gas into the reaction chamber, causing the substrate to adsorb the introduced etching gas and thereafter evacuate the etching gas remaining in the reaction chamber, and irradiating the surface of the substrate to be etched with photon energy through a light window provided in the reaction chamber.
摘要翻译：根据本发明的干法蚀刻方法包括以下步骤：抽空其中设置待蚀刻基板的反应室，将蚀刻气体引入反应室，使基板吸附导入的蚀刻气体，然后将蚀刻残留在反应室中的气体，并且通过设置在反应室中的光窗口用光子能量照射待蚀刻的基板的表面。

8. 发明申请

US20120061300A1 MEMBRANE FILTRATION SYSTEM 审中-公开
标题翻译：膜过滤系统
公开(公告)号：US20120061300A1
公开(公告)日：2012-03-15
申请号：US13186177
申请日：2011-07-19
申请人： Takeshi Matsushiro , Katsuya Yokokawa , Futoshi Kurokawa , Ryo Namba , Koichi Matsui , Hideaki Yamagata , Yuka Hiraga , Seiichi Murayama , Hiroyuki Tokimoto
发明人： Takeshi Matsushiro , Katsuya Yokokawa , Futoshi Kurokawa , Ryo Namba , Koichi Matsui , Hideaki Yamagata , Yuka Hiraga , Seiichi Murayama , Hiroyuki Tokimoto
IPC分类号： B01D61/12
CPC分类号： C02F1/441 , B01D61/022 , B01D61/025 , B01D61/04 , B01D61/06 , B01D61/08 , B01D61/10 , B01D61/12 , B01D61/14 , B01D61/58 , B01D2311/14 , B01D2313/243 , C02F1/444 , C02F2103/06 , C02F2103/08 , C02F2209/03 , C02F2303/10 , Y02A20/131 , Y02W10/30
摘要： According to one embodiment, a membrane filtration system includes a raw water tank, a pretreatment membrane module, a raw water feed line, a high-pressure RO membrane module, a high-pressure line, a preceding power recovery unit which pressurize the pretreated water by transmitting the pressure of the concentrate to the pretreated water, a succeeding power recovery unit which pressurize the raw water by transmitting a remaining pressure of the concentrate to the raw water, a concentrate discharge line, a first pressure transmission line communicating to the power recovery unit by being branched from the high-pressure line, a second pressure transmission line communicating to the power recovery unit by being branched from the raw water feed line, and a valve provided in the drain line to regulate a discharge of the concentrate from the power recovery unit in accordance with a pressure loss in the pretreatment membrane module.
摘要翻译：根据一个实施例，膜过滤系统包括原水槽，预处理膜组件，原水供给管线，高压RO膜组件，高压管线，对预处理水进行加压的前面的动力回收单元通过将浓缩物的压力传递给预处理水，后续动力回收单元，其通过将浓缩物的剩余压力传递到原水来对原水加压，浓缩物排出管线，与动力回收通信的第一压力传输线通过从高压管线分支的第二压力传输线，通过从原水供给管线分支而与动力回收单元连通的第二压力传输线，以及设置在排水管线中的阀，用于调节浓缩物从动力排出回收单元根据预处理膜组件中的压力损失。

9. 发明授权

US4908492A Microwave plasma production apparatus 失效
标题翻译：微波等离子体生产设备
公开(公告)号：US4908492A
公开(公告)日：1990-03-13
申请号：US347573
申请日：1989-05-05
申请人： Yukio Okamoto , Seiichi Murayama
发明人： Yukio Okamoto , Seiichi Murayama
IPC分类号： H01J27/16 , H01J37/08 , H01J49/10 , H05H1/46
CPC分类号： H05H1/46
摘要： A microwave plasma production apparatus according to the present invention is so configured that a cylindrical coaxial wave guide is formed by a cylindrical outer conductor and a helical coil shaped inner conductor, and at least a part of a nonconductive discharge tube is disposed inside said inner conductor, microwave being applied between said outer conductor and said inner conductor.
摘要翻译：根据本发明的微波等离子体制造装置的结构是，圆柱形同轴波导由圆柱形外导体和螺旋形线圈形内导体形成，并且至少一部分非导电放电管设置在所述内导体内微波施加在所述外部导体和所述内部导体之间。

10. 发明授权

US4803406A High-pressure discharge lamp operating circuit 失效
标题翻译：高压放电灯工作电路
公开(公告)号：US4803406A
公开(公告)日：1989-02-07
申请号：US795268
申请日：1985-11-05
申请人： Makoto Yasuda , Tsune Miyashita , Seiichi Murayama , Yoji Arai , Fuzio Yamada
发明人： Makoto Yasuda , Tsune Miyashita , Seiichi Murayama , Yoji Arai , Fuzio Yamada
IPC分类号： H05B41/24 , H05B41/16 , H05B41/288 , H05B41/292 , H05B41/38 , H05B37/00
CPC分类号： H05B41/2882 , H05B41/2928 , H05B41/382 , H05B41/388 , Y02B20/204 , Y10S315/07
摘要： A high-pressure discharge lamp operating circuit performs a low-frequency AC operating at an early stage of operating and thereafter performs a high-frequency AC operation or DC operation during the steady-state of lamp operation. This circuit comprises a circuit for effecting a transition from the low-frequency AC operation to the high-frequency AC operation or DC operation either at the time which is a predetermined time period after the ignition of discharge before the high-pressure discharge lamp reaches the steady-state of operation, or after having detected at least one of predetermined lamp characteristics, thereby providing a stabilized light output.
摘要翻译：高压放电灯工作电路在工作的早期阶段进行低频交流动作，然后在灯运行稳定状态下进行高频交流动作或直流动作。该电路包括用于在高压放电灯到达之前在放电点火之后的预定时间段内实现从低频AC操作转换到高频AC操作或DC操作的电路或者在已经检测到预定灯特性中的至少一个之后，从而提供稳定的光输出。

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