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    • 2. 发明申请
    • REFLECTION MIRROR AND ITS PRODUCTION PROCESS
    • 反射镜及其制作工艺
    • US20080112051A1
    • 2008-05-15
    • US11972761
    • 2008-01-11
    • Tamotsu MORIMOTOMasato KawasakiHideaki Miyazawa
    • Tamotsu MORIMOTOMasato KawasakiHideaki Miyazawa
    • B60R1/06
    • G02B5/0808
    • To provide a reflection mirror having a high reflectance in the visible region and excellent in moisture resistance and sulfur resistance, and its production process. A reflection mirror 10 comprising a substrate 11, a silicon nitride film 14 and a silver film 13 formed between the substrate 11 and the silicon nitride film 14, wherein when 10 ppm of hydrogen sulfide is introduced, and the reflection mirror is left to stand for 100 hours in an atmosphere at a temperature of 50° C. under a relative humidity of 80%, the rate of change of the luminous reflectance (chromaticity Y of the tristimulus value as defined in JIS Z8701 (1982)) after being left to stand is within 10% based on the luminous reflectance before being left to stand. Further, a process for producing a reflection mirror 10, which comprises forming a silver film 13 by a sputtering method and then forming a silicon nitride film 14 by a chemical vapor deposition method.
    • 提供可见光区域的高反射率的反射镜,耐湿性和耐硫性优异的反射镜及其制造方法。 反射镜10包括基板11,氮化硅膜14和形成在基板11和氮化硅膜14之间的银膜13,其中当引入10ppm的硫化氢时,将反射镜放置在 在相对湿度80%的温度为50℃的气氛中100小时,放置后的光反射率(JIS Z8701(1982)定义的三刺激值的色度Y)的变化率 基于放置前的光反射率在10%以内。 此外,制造反射镜10的方法包括通过溅射法形成银膜13,然后通过化学气相沉积法形成氮化硅膜14。
    • 4. 发明申请
    • ELECTROMAGNETIC WAVE SHIELDING FILM AND PROTECTIVE PLATE FOR PLASMA DISPLAY PANEL
    • 电磁波屏蔽膜和等离子显示面板的保护板
    • US20080118762A1
    • 2008-05-22
    • US11970097
    • 2008-01-07
    • Tamotsu MorimotoMasaaki KonishiMasato KawasakiTakuji Oyama
    • Tamotsu MorimotoMasaaki KonishiMasato KawasakiTakuji Oyama
    • B32B15/04B32B19/00
    • H01J11/44H01J2211/446H05K9/0096Y10T428/31678
    • To provide an electromagnetic wave shielding film for a PDP having a low luminous reflectance even without providing a protective film, and a protective plate for a PDP having a low luminous reflectance using the electromagnetic wave shielding film for a PDP.An electromagnetic wave shielding film 10, which comprises a substrate 11 and an electroconductive film 12, wherein the electroconductive film 12 has a multilayer structure in which (n+1) (wherein n is an integer of from 3 to 5) inorganic layers 12a having a refractive index of from 1.55 to 2.5 and n metal layers 12b are alternately laminated from the substrate 11 side; each inorganic layer 12a is a layer containing at least one member selected from a metal oxide, a metal nitride and a metal oxynitride; each metal layer 12b is a layer made of pure silver or a silver alloy; and the second to n-th metal layers from the substrate are thicker than the first metal layer from the substrate, is used.
    • 为了提供即使不提供保护膜也具有低反射率的PDP的电磁波屏蔽膜,以及使用PDP电磁波屏蔽膜的具有低反射率的PDP的保护板。 一种电磁波屏蔽膜10,其包括基板11和导电膜12,其中导电膜12具有其中(n + 1)(其中n为3至5的整数)的无机层12a的多层结构 折射率为1.55〜2.5,n个金属层12b从基板11侧交替层叠; 每个无机层12a是含有选自金属氧化物,金属氮化物和金属氮氧化物中的至少一种的层; 每个金属层12b是由纯银或银合金制成的层; 并且使用来自基板的第二至第n金属层比来自基板的第一金属层厚。
    • 6. 发明授权
    • Electroconductive laminate, and electromagnetic wave shielding film for plasma display and protective plate for plasma display
    • 导电层压板,等离子体显示用电磁波屏蔽膜及等离子体显示用保护板
    • US07740946B2
    • 2010-06-22
    • US11839839
    • 2007-08-16
    • Tamotsu MorimotoMasato KawasakiMakoto HiramotoKoichi KandaSusumu Nakagama
    • Tamotsu MorimotoMasato KawasakiMakoto HiramotoKoichi KandaSusumu Nakagama
    • B32B9/00
    • H05K9/0096B32B17/10018
    • To provide an electroconductive laminate excellent in electrical conductivity and visible light transparency, an electromagnetic wave shielding film for a plasma display, and a protective plate for a plasma display having excellent electromagnetic wave shielding properties, a broad transmission/reflection band and a high visible light transmittance.An electroconductive laminate 10 comprising a substrate 11, and an electroconductive film 12 having a three-layer structure having a first oxide layer 12a, a metal layer 12b and a second oxide layer 12c laminated sequentially from the substrate 11 side, or having a 3×n layer structure (wherein n is an integer of at least 2) having the above three-layer structure repeated, wherein the first oxide layer 12a contains “zinc oxide” and “titanium oxide or niobium oxide”, the metal layer 12b is a layer containing silver, and the second oxide layer 12c contains a mixture of zinc oxide and aluminum oxide, or the like.
    • 为了提供导电性和可见光透明性优异的导电性层叠体,等离子体显示用电磁波屏蔽膜和具有优异的电磁波屏蔽性,宽透射/反射带和高可见光的等离子体显示用保护板 透光率。 包含基板11的导电性层叠体10和具有三层结构的导电性膜12,具有从基板11侧依次层叠的第一氧化物层12a,金属层12b和第二氧化物层12c,或者具有3× 重复上述三层结构的n层结构(其中n为至少为2的整数),其中第一氧化物层12a包含“氧化锌”和“氧化钛或氧化铌”,金属层12b是层 并且第二氧化物层12c含有氧化锌和氧化铝的混合物等。