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1. 发明申请

US20070298265A1 ELECTROCONDUCTIVE LAMINATE, AND ELECTROMAGNETIC WAVE SHIELDING FILM FOR PLASMA DISPLAY AND PROTECTIVE PLATE FOR PLASMA DISPLAY 失效
标题翻译：电磁层压板，等离子体显示用电磁波屏蔽膜和等离子体显示用保护板
公开(公告)号：US20070298265A1
公开(公告)日：2007-12-27
申请号：US11839839
申请日：2007-08-16
申请人： Tamotsu Morimoto , Masato Kawasaki , Makoto Hiramoto , Koichi Kanda , Susumu Nakagama
发明人： Tamotsu Morimoto , Masato Kawasaki , Makoto Hiramoto , Koichi Kanda , Susumu Nakagama
IPC分类号： B32B17/06 , B32B15/04
CPC分类号： H05K9/0096 , B32B17/10018
摘要： To provide an electroconductive laminate excellent in electrical conductivity and visible light transparency, an electromagnetic wave shielding film for a plasma display, and a protective plate for a plasma display having excellent electromagnetic wave shielding properties, a broad transmission/reflection band and a high visible light transmittance. An electroconductive laminate 10 comprising a substrate 11, and an electroconductive film 12 having a three-layer structure having a first oxide layer 12a, a metal layer 12b and a second oxide layer 12c laminated sequentially from the substrate 11 side, or having a 3×n layer structure (wherein n is an integer of at least 2) having the above three-layer structure repeated, wherein the first oxide layer 12a contains “zinc oxide” and “titanium oxide or niobium oxide”, the metal layer 12b is a layer containing silver, and the second oxide layer 12c contains a mixture of zinc oxide and aluminum oxide, or the like.
摘要翻译：为了提供导电性和可见光透明性优异的导电性层叠体，等离子体显示用电磁波屏蔽膜和具有优异的电磁波屏蔽性，宽透射/反射带和高可见光的等离子体显示用保护板透光率。包含基板11的导电层压板10和具有三层结构的导电膜12具有第一氧化物层12a，金属层12b和第二氧化物层12c，其从基板11侧依次层叠，或具有重复上述三层结构的3×n层结构（其中n为至少为2的整数），其中第一氧化物层12a包含“氧化锌”和“氧化钛或氧化铌”，金属层12b 是含有银的层，第二氧化物层12c含有氧化锌和氧化铝的混合物等。

2. 发明授权

US07740946B2 Electroconductive laminate, and electromagnetic wave shielding film for plasma display and protective plate for plasma display 失效
标题翻译：导电层压板，等离子体显示用电磁波屏蔽膜及等离子体显示用保护板
公开(公告)号：US07740946B2
公开(公告)日：2010-06-22
申请号：US11839839
申请日：2007-08-16
申请人： Tamotsu Morimoto , Masato Kawasaki , Makoto Hiramoto , Koichi Kanda , Susumu Nakagama
发明人： Tamotsu Morimoto , Masato Kawasaki , Makoto Hiramoto , Koichi Kanda , Susumu Nakagama
IPC分类号： B32B9/00
CPC分类号： H05K9/0096 , B32B17/10018
摘要： To provide an electroconductive laminate excellent in electrical conductivity and visible light transparency, an electromagnetic wave shielding film for a plasma display, and a protective plate for a plasma display having excellent electromagnetic wave shielding properties, a broad transmission/reflection band and a high visible light transmittance.An electroconductive laminate 10 comprising a substrate 11, and an electroconductive film 12 having a three-layer structure having a first oxide layer 12a, a metal layer 12b and a second oxide layer 12c laminated sequentially from the substrate 11 side, or having a 3×n layer structure (wherein n is an integer of at least 2) having the above three-layer structure repeated, wherein the first oxide layer 12a contains “zinc oxide” and “titanium oxide or niobium oxide”, the metal layer 12b is a layer containing silver, and the second oxide layer 12c contains a mixture of zinc oxide and aluminum oxide, or the like.
摘要翻译：为了提供导电性和可见光透明性优异的导电性层叠体，等离子体显示用电磁波屏蔽膜和具有优异的电磁波屏蔽性，宽透射/反射带和高可见光的等离子体显示用保护板透光率。包含基板11的导电性层叠体10和具有三层结构的导电性膜12，具有从基板11侧依次层叠的第一氧化物层12a，金属层12b和第二氧化物层12c，或者具有3× 重复上述三层结构的n层结构（其中n为至少为2的整数），其中第一氧化物层12a包含“氧化锌”和“氧化钛或氧化铌”，金属层12b是层并且第二氧化物层12c含有氧化锌和氧化铝的混合物等。

3. 发明申请

US20070224432A1 ELECTROCONDUCTIVE LAMINATE, AND ELECTROMAGNETIC WAVE SHIELDING FILM AND PROTECTIVE PLATE FOR PLASMA DISPLAY 有权
标题翻译：电磁层压板和电磁波屏蔽膜和等离子显示器的保护板
公开(公告)号：US20070224432A1
公开(公告)日：2007-09-27
申请号：US11755555
申请日：2007-05-30
申请人： Tamotsu Morimoto , Hideaki Miyazawa , Masahiro Fusen , Koichi Kanda , Susumu Nakagama
发明人： Tamotsu Morimoto , Hideaki Miyazawa , Masahiro Fusen , Koichi Kanda , Susumu Nakagama
IPC分类号： B32B15/04
CPC分类号： H05K9/0096 , H01J2211/446
摘要： To provide an electroconductive laminate having a broad transmission/reflection band and having excellent electrical conductivity (electromagnetic wave shielding properties), visible light transparency and near infrared shielding properties, and an electromagnetic wave shielding film for a plasma display and a protective plate for a plasma display. An electroconductive laminate 10 comprising a substrate 11 and an electroconductive film 12 formed on the substrate 11, wherein the electroconductive film 12 has a multilayer structure having an oxide layer 12a and a metal layer 12b alternately laminated from the substrate 11 side in a total layer number of (2n+1) (wherein n is an integer of at least 1), the oxide layer 12a contains zinc oxide and a high refractive index metal oxide having a refractive index of at least 2.3 as the main components, and the metal layer 12b contains silver or a silver alloy as the main component; and a protective plate for a plasma display comprising a support, an electroconductive laminate 10 provided on the support, and an electrode electrically in contact with an electroconductive film of the electroconductive laminate 10.
摘要翻译：为了提供具有宽的透射/反射带并且具有优异的导电性（电磁波屏蔽性），可见光透明度和近红外屏蔽性能的导电层压板，以及用于等离子体显示器的电磁波屏蔽膜和用于等离子体的保护板显示。一种导电性层叠体10，其包含基板11和形成在基板11上的导电膜12，其中，导电膜12具有多层结构，该多层结构具有从基板11侧交替层叠的氧化物层12a和金属层12b （2n + 1）（其中n是至少为1的整数）的层数，氧化物层12a包含氧化锌和折射率为至少2.3的高折射率金属氧化物作为主要成分，并且金属层12b包含银或银合金作为主要成分; 以及用于等离子体显示器的保护板，其包括支撑体，设置在支撑体上的导电层压体10以及与导电性层叠体10的导电膜电接触的电极。

4. 发明授权

US08040062B2 Electroconductive laminate, and electromagnetic wave shielding film and protective plate for plasma display 有权
标题翻译：导电层压板，电磁波屏蔽膜和等离子显示屏保护板
公开(公告)号：US08040062B2
公开(公告)日：2011-10-18
申请号：US11755555
申请日：2007-05-30
申请人： Tamotsu Morimoto , Hideaki Miyazawa , Masahiro Fusen , Koichi Kanda , Susumu Nakagama
发明人： Tamotsu Morimoto , Hideaki Miyazawa , Masahiro Fusen , Koichi Kanda , Susumu Nakagama
IPC分类号： H01J17/49 , H01J9/00
CPC分类号： H05K9/0096 , H01J2211/446
摘要： Provided is an electroconductive laminate having a substrate and an electroconductive film formed on the substrate, wherein the electroconductive film has a multilayer structure having an oxide layer and a metal layer alternately laminated from the substrate side in a total layer number of (2n+1) (wherein n is an integer of at least 1); the oxide layer predominantly contains zinc oxide and titanium oxide having a refractive index of at least 2.3; the oxide layer has an atomic ratio of titanium to a total amount of titanium and zinc of 15-50 atomic %; and the metal layer predominantly contains silver or a silver alloy. Also provided is a process for producing the electroconductive laminate.
摘要翻译：提供了一种导电层压体，其具有在基板上形成的基板和导电膜，其中导电膜具有多层结构，其具有从基板侧以总层数（2n + 1）交替层叠的氧化物层和金属层，（其中n为至少1的整数）; 氧化物层主要含有氧化锌和折射率至少为2.3的氧化钛; 氧化物层具有钛与钛和锌的总量为15-50原子％的原子比; 并且金属层主要含有银或银合金。还提供了用于生产导电层压体的方法。

5. 发明授权

US06800182B2 Sputtering target, process for its production and film forming method 有权
标题翻译：溅射靶，其生产工艺及成膜方法
公开(公告)号：US06800182B2
公开(公告)日：2004-10-05
申请号：US10121695
申请日：2002-04-15
申请人： Akira Mitsui , Hiroshi Ueda , Kouichi Kanda , Susumu Nakagama
发明人： Akira Mitsui , Hiroshi Ueda , Kouichi Kanda , Susumu Nakagama
IPC分类号： C23C1400
CPC分类号： C04B41/009 , C03C17/245 , C03C2217/213 , C03C2218/154 , C03C2218/155 , C04B35/573 , C04B41/5096 , C04B41/85 , C23C14/10 , C23C14/3414 , C04B41/4515 , C04B41/4517 , C04B41/4523 , C04B35/565 , C04B38/00
摘要： A sputtering target is provided that includes SiC and metallic Si and has an atomic ratio of C to Si of from 0.5 to 0.95 and a density of from 2.75×103 kg/m3 to 3.1×103 kg/m3. The sputtering target is capable of forming at high speed a film that contains SiO2 as the main component and has a low refractive index. The sputtering target can be produced by a process in which a molded product of SiC is impregnated with molten Si.
摘要翻译：提供了包括SiC和金属Si并且C与Si的原子比为0.5至0.95并且密度为2.75×10 3 kg / m 3至3.1×10 3 kg / m 2的溅射靶 <3>。溅射靶能够以高速形成含有SiO 2作为主要成分且折射率低的膜。溅射靶可以通过以熔融Si浸渍SiC的成型体的方法来制造。

6. 发明申请

US20090130418A1 TRANSPARENT CONDUCTIVE FILM, ITS PRODUCTION METHOD AND SPUTTERING TARGET USED FOR ITS PRODUCTION 审中-公开
标题翻译：透明导电膜，其生产方法和用于其生产的溅射靶
公开(公告)号：US20090130418A1
公开(公告)日：2009-05-21
申请号：US12329852
申请日：2008-12-08
申请人： Hidefumi ODAKA , Akira MITSUI , Susumu NAKAGAMA
发明人： Hidefumi ODAKA , Akira MITSUI , Susumu NAKAGAMA
IPC分类号： B32B15/00 , C23C14/34 , C09D1/00
CPC分类号： C23C14/3414 , C04B35/457 , C04B2235/3206 , C04B2235/3217 , C04B2235/3232 , C04B2235/3244 , C04B2235/3251 , C04B2235/3256 , C04B2235/3258 , C04B2235/3284 , C04B2235/3286 , C04B2235/5436 , C04B2235/5445 , C04B2235/77 , C04B2235/786 , C23C14/086 , G02F1/13439
摘要： Providing a tin oxide target suitable for the formation of a transparent conductive film by DC sputtering method, DC pulse sputtering method or AC sputtering method.A sputtering target which is used for forming a transparent conductive film by a sputtering method, comprising tin oxide as the main component, and at least one element selected from the A dopant group consisting of zinc, niobium, titanium, magnesium, aluminum and zirconium and at least one element selected from the B dopant group consisting of tungsten, tantalum and molybdenum, as dopants.
摘要翻译：通过DC溅射法，DC脉冲溅射法或AC溅射法提供适合于形成透明导电膜的氧化锡靶。用于通过溅射法形成透明导电膜的溅射靶，其包含氧化锡作为主要成分，以及选自由锌，铌，钛，镁，铝和锆组成的A掺杂剂组中的至少一种元素，以及选自由钨，钽和钼组成的B掺杂剂组中的至少一种元素作为掺杂剂。

7. 发明授权

US06248291B1 Process for producing sputtering targets 失效
标题翻译：生产溅射靶的工艺
公开(公告)号：US06248291B1
公开(公告)日：2001-06-19
申请号：US08952078
申请日：1997-12-12
申请人： Susumu Nakagama , Masao Higeta , Atsushi Hayashi
发明人： Susumu Nakagama , Masao Higeta , Atsushi Hayashi
IPC分类号： B22F314
CPC分类号： C23C14/3414
摘要： A process for producing sputtering targets, which comprises molding a mixture of a powder of a high-melting substance having a melting point of 900° C. or above with a powder of a low-melting metal having a melting point of 700° C. or below at a temperature below the melting point of the low-melting metal under heat and pressure.
摘要翻译：一种生产溅射靶的方法，包括将熔点为900℃以上的高熔点物质的粉末与熔点为700℃的低熔点金属的粉末混合成型。或低于在低熔点金属的熔点下的温度和压力。

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