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    • 2. 发明授权
    • CVD method of manufacturing diamond crystal
    • 制造金刚石晶体的CVD方法
    • US6060118A
    • 2000-05-09
    • US988612
    • 1997-12-11
    • Takefumi IshikuraSatoshi YamashitaShin-ichi OjikaHiroshi Kawarada
    • Takefumi IshikuraSatoshi YamashitaShin-ichi OjikaHiroshi Kawarada
    • C30B25/02C23C16/26B05D3/06
    • C30B25/02C30B29/04Y10S977/879Y10T428/30Y10T428/31678
    • There is provided a diamond crystal in which the (111) oriented plane is of the diamond crystal synthesized on a substrate by a chemical vapor deposition method parallel to a substrate surface, and the area of the (111) oriented plane parallel to the substrate surface is 1/24or less an area of the crystal on the substrate. A source gas is activated on a substrate consisting of a material which is not reactive with carbon. The source gas contains at least carbon and hydrogen in such a manner that the ratio of the number of carbon atoms to the total number of molecules of the source gas is 0.5% or less. Subsequently, a diamond crystal in which the (111) orientation plane is parallel to the substrate surface, and the area of the (111) orientation plane parallel to the substrate surface is precipitated on the substrate. A copper plate is preferably contains used as the substrate. The source gas preferably contains at least methane gas and hydrogen gas, and the concentration of methane gas is preferably set to be 0.5% or less.
    • 提供了一种金刚石晶体,其中(111)取向平面是通过与基板表面平行的化学气相沉积方法在基板上合成的金刚石晶体,并且(111)取向平面于基板表面的面积 是+ E,fra 1/24 + EE或更小的衬底上晶体的面积。 源气体在由不与碳反应的材料组成的基材上活化。 原料气体至少含有碳原子和氢原子,使得碳原子数与原料气体的总分子数之比为0.5%以下。 随后,其中(111)取向平面平行于衬底表面的金刚石晶体和平行于衬底表面的(111)取向平面的面积沉淀在衬底上。 铜板优选用作基板。 源气体优选至少含有甲烷气体和氢气,甲烷气体的浓度优选设定为0.5%以下。
    • 10. 发明授权
    • Head control device, storage device, and contact detection method
    • 头控制装置,存储装置和接触检测方法
    • US07623314B2
    • 2009-11-24
    • US11998326
    • 2007-11-29
    • Satoshi YamashitaShunji SaitohYukio AbeShigenori Yanagi
    • Satoshi YamashitaShunji SaitohYukio AbeShigenori Yanagi
    • G11B21/02G11B27/36
    • G11B5/607G11B5/6076
    • A head control device for controlling, through thermal expansion of a heater, a position of a head for reading and writing data from and to a storage medium, includes a heater control unit that increases a current supplied to the heater stepwise; and an external-force sample retrieving unit that retrieves sampling values of signals each indicating a magnitude of an external force acting on the head in a moving direction of a head support mechanism. The head control device also includes an external-force evaluating unit that calculates a representative value of the sampling values retrieved by the external-force sample retrieving unit to evaluate the magnitude of the external force every time the heater control unit increases the current; and a contact detecting unit that detects contact between the head and the storage medium by comparing each evaluation result by the external-force evaluating unit with a predetermined threshold value.
    • 一种头控制装置,用于通过加热器的热膨胀来控制用于从存储介质读取和写入数据的头部的位置,其包括加热器控制单元,其逐步增加供应给加热器的电流; 以及外力取样单元,其检索各自表示在头部支撑机构的移动方向上作用在头部上的外力的大小的信号的采样值。 头部控制装置还包括外力评估单元,其计算由外力抽样检索单元检索出的取样值的代表值,以便每当加热器控制单元增加电流时评估外力的大小; 以及接触检测单元,其通过将外力评估单元的每个评估结果与预定阈值进行比较来检测头部和存储介质之间的接触。