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    • 4. 发明授权
    • CVD method of manufacturing diamond crystal
    • 制造金刚石晶体的CVD方法
    • US6060118A
    • 2000-05-09
    • US988612
    • 1997-12-11
    • Takefumi IshikuraSatoshi YamashitaShin-ichi OjikaHiroshi Kawarada
    • Takefumi IshikuraSatoshi YamashitaShin-ichi OjikaHiroshi Kawarada
    • C30B25/02C23C16/26B05D3/06
    • C30B25/02C30B29/04Y10S977/879Y10T428/30Y10T428/31678
    • There is provided a diamond crystal in which the (111) oriented plane is of the diamond crystal synthesized on a substrate by a chemical vapor deposition method parallel to a substrate surface, and the area of the (111) oriented plane parallel to the substrate surface is 1/24or less an area of the crystal on the substrate. A source gas is activated on a substrate consisting of a material which is not reactive with carbon. The source gas contains at least carbon and hydrogen in such a manner that the ratio of the number of carbon atoms to the total number of molecules of the source gas is 0.5% or less. Subsequently, a diamond crystal in which the (111) orientation plane is parallel to the substrate surface, and the area of the (111) orientation plane parallel to the substrate surface is precipitated on the substrate. A copper plate is preferably contains used as the substrate. The source gas preferably contains at least methane gas and hydrogen gas, and the concentration of methane gas is preferably set to be 0.5% or less.
    • 提供了一种金刚石晶体,其中(111)取向平面是通过与基板表面平行的化学气相沉积方法在基板上合成的金刚石晶体,并且(111)取向平面于基板表面的面积 是+ E,fra 1/24 + EE或更小的衬底上晶体的面积。 源气体在由不与碳反应的材料组成的基材上活化。 原料气体至少含有碳原子和氢原子,使得碳原子数与原料气体的总分子数之比为0.5%以下。 随后,其中(111)取向平面平行于衬底表面的金刚石晶体和平行于衬底表面的(111)取向平面的面积沉淀在衬底上。 铜板优选用作基板。 源气体优选至少含有甲烷气体和氢气,甲烷气体的浓度优选设定为0.5%以下。