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1. 发明授权

US08604451B2 Target supply apparatus 有权
标题翻译：目标供应装置
公开(公告)号：US08604451B2
公开(公告)日：2013-12-10
申请号：US12642308
申请日：2009-12-18
申请人： Takayuki Yabu , Masaki Nakano , Hitoshi Nagano , Takanobu Ishihara
发明人： Takayuki Yabu , Masaki Nakano , Hitoshi Nagano , Takanobu Ishihara
IPC分类号： H05G2/00 , G01J3/10 , A61N5/06
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005
摘要： A target supply apparatus controls a gas pressure inside a tank storing a liquid target material to be outputted from a nozzle by a pressure of gas supplied from a gas supply having a pressure regulator. The target supply apparatus comprises a gas passage introducing gas supplied from the gas supply into the tank, and a high-precision pressure regulator arranged on the gas passage and regulating a pressure of gas flowing the gas passage. The high-precision pressure regulator is able to regulate pressure with accuracy higher than the pressure regulator.
摘要翻译：目标供给装置通过从具有压力调节器的气体供给源提供的气体的压力来控制储存从喷嘴输出的液体目标材料的罐内的气体压力。目标供给装置包括从气体供给到罐中的气体导入气体的通道，以及配置在气体通路上的高精度的压力调节器，调节气体流路的气体的压力。高精度压力调节器能够以高于压力调节器的精度来调节压力。

2. 发明授权

US08343429B2 Target supply unit of extreme ultraviolet light source apparatus and method of manufacturing the same 有权
标题翻译：极紫外光源装置的目标供应单元及其制造方法
公开(公告)号：US08343429B2
公开(公告)日：2013-01-01
申请号：US12581461
申请日：2009-10-19
申请人： Takayuki Yabu , Takanobu Ishihara , Masaki Nakano
发明人： Takayuki Yabu , Takanobu Ishihara , Masaki Nakano
IPC分类号： G21K5/08
CPC分类号： H05G2/003 , H05G2/005 , Y10T29/49826
摘要： In a target supply unit of an extreme ultraviolet light source apparatus for generating extreme ultraviolet light by applying a laser beam to a target material to turn the target material into plasma, clogging of a target nozzle for supplying the target material to a laser beam application point is suppressed. The target supply unit includes: a target container for accommodating the target material; a target nozzle for injecting the target material supplied from the target container; and a reducing gas supply unit for supplying a reducing gas into the target container. Instead of using the reducing gas, a carbon-based material having a reduction action may be provided within the target container for causing reduction reaction.
摘要翻译：在用于通过向目标材料施加激光以将目标材料转化为等离子体来产生极紫外光的目标供应单元中，将用于将目标材料供应的目标喷嘴堵塞到激光束施加点被压制目标供给单元包括：用于容纳目标材料的目标容器; 用于喷射从目标容器供给的目标材料的目标喷嘴; 以及用于向目标容器供给还原气体的还原气体供给单元。代替使用还原气体，可以在目标容器内提供具有还原作用的碳基材料用于引起还原反应。

3. 发明申请

US20120311969A1 TARGET SUPPLY UNIT OF EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND METHOD OF MANUFACTURING THE SAME 审中-公开
标题翻译：极光紫外线光源装置的目标供应装置及其制造方法
公开(公告)号：US20120311969A1
公开(公告)日：2012-12-13
申请号：US13590888
申请日：2012-08-21
申请人： Takayuki Yabu , Takanobu Ishihara , Masaki Nakano
发明人： Takayuki Yabu , Takanobu Ishihara , Masaki Nakano
IPC分类号： B65B63/08
CPC分类号： H05G2/003 , H05G2/005 , Y10T29/49826
摘要： In a target supply unit of an extreme ultraviolet light source apparatus for generating extreme ultraviolet light by applying a laser beam to a target material to turn the target material into plasma, clogging of a target nozzle for supplying the target material to a laser beam application point is suppressed. The target supply unit includes: a target container for accommodating the target material; a target nozzle for injecting the target material supplied from the target container; and a reducing gas supply unit for supplying a reducing gas into the target container. Instead of using the reducing gas, a carbon-based material having a reduction action may be provided within the target container for causing reduction reaction.
摘要翻译：在用于通过向目标材料施加激光以将目标材料转化为等离子体来产生极紫外光的目标供应单元中，将用于将目标材料供应的目标喷嘴堵塞到激光束施加点被压制目标供给单元包括：用于容纳目标材料的目标容器; 用于喷射从目标容器供给的目标材料的目标喷嘴; 以及用于向目标容器供给还原气体的还原气体供给单元。代替使用还原气体，可以在目标容器内提供具有还原作用的碳基材料用于引起还原反应。

4. 发明授权

US06771685B1 Discharge electrodes connecting structure for laser apparatus and laser apparatus therewith 有权
标题翻译：激光装置的放电电极连接结构和激光装置
公开(公告)号：US06771685B1
公开(公告)日：2004-08-03
申请号：US09648632
申请日：2000-08-28
申请人： Takayuki Yabu , Takanobu Ishihara , Takashi Matsunaga , Yasufumi Kawasuji
发明人： Takayuki Yabu , Takanobu Ishihara , Takashi Matsunaga , Yasufumi Kawasuji
IPC分类号： H01S3097
CPC分类号： H01S3/038 , H01S3/0971 , H01S3/225
摘要： The invention provides a discharge electrodes connecting structure for a laser apparatus in which a thickness of the return plate is set to be within an optimum range, and a laser apparatus employing the same. Accordingly, a laser apparatus is provided with a laser chamber (2) sealing a laser gas, a pair of anode (5A) and cathode (5B) provided within the laser chamber in an opposing manner, generating a discharge so as to excite a laser gas flowing therebetween and oscillating a laser beam, a conductive anode base (6) holding the anode, an insulative cathode base (8) holding the cathode, and a return plate (9) electrically connecting the anode base to the laser chamber so as to supply a current to the anode. A thickness (t) of the return plate is set to be equal to or more than 100 &mgr;m and equal to or less than 500 &mgr;m, and the return plate is arranged substantially in parallel to a gas flow of the laser gas flowing between the discharge electrodes.
摘要翻译：本发明提供一种用于激光装置的放电电极连接结构，其中将返回板的厚度设置在最佳范围内，以及采用该放电电极连接结构的激光装置。因此，激光装置设置有激光室（2），密封激光气体，以相对的方式设置在激光室内的一对阳极（5A）和阴极（5B），产生放电以激发激光在其间流动的气体和激光束的振荡，保持阳极的导电阳极基座（6），保持阴极的绝缘阴极基座（8）和将阳极基座电连接到激光室的回流板（9）向阳极提供电流。返回板的厚度（t）设定为100μm以上且500μm以下，返回板大致平行于在排出口之间流动的激光气体的气流电极。

5. 发明授权

US06570899B1 Gas laser device 有权
标题翻译：气体激光装置
公开(公告)号：US06570899B1
公开(公告)日：2003-05-27
申请号：US09648630
申请日：2000-08-28
申请人： Takayuki Yabu , Takanobu Ishihara , Shunsuke Yoshioka
发明人： Takayuki Yabu , Takanobu Ishihara , Shunsuke Yoshioka
IPC分类号： H01S500
CPC分类号： H01S3/225 , H01S3/036 , H01S3/038
摘要： A gas laser device including a dust filter with which a flow rate of laser gas flowing between discharge electrodes is approximately uniform in a longitudinal direction of the discharge electrodes without a variation with time is provided. For this purpose, the gas laser device includes a laser chamber (2) containing laser gas, a pair of discharge electrodes (5, 5) disposed inside the laser chamber (2) to face to each other for exciting a laser medium by discharge to thereby oscillate laser light, a fan (14) for circulating the laser gas to send the same to an area between the discharge electrodes (5, 5), and a dust filter (12) for eliminating dust generated inside the laser chamber (2), and has a configuration in which a filter inlet port (15), which is formed in an inner wall (2A) of the laser chamber (2) and guides the laser gas into the dust filter (12), is formed to be approximately vertical to the inner wall (2A) of the laser chamber (2).
摘要翻译：本发明提供一种气体激光装置，其特征在于，具备：尘埃滤波器，其在放电电极之间流过的激光气体的流量在放电电极的长度方向上大致均匀，而不随时间变化。为此，气体激光装置包括含有激光气体的激光室（2），设置在激光室（2）的内部的一对放电电极（5,5），以相互面对，通过放电激励激光介质从而振荡激光;用于循环激光气体以将其发送到放电电极（5）之间的区域的风扇（14）和用于消除激光室（2）内部产生的灰尘的防尘过滤器（12）并且具有这样的结构，其中形成在激光室（2）的内壁（2A）中并将激光气体引导到防尘过滤器（12）中的过滤器入口（15）形成为近似垂直于激光室（2）的内壁（2A）。

6. 发明授权

US08698112B2 Extreme ultraviolet light generation apparatus 有权
标题翻译：极紫外光发生装置
公开(公告)号：US08698112B2
公开(公告)日：2014-04-15
申请号：US13396289
申请日：2012-02-14
申请人： Takayuki Yabu , Kouji Kakizaki , Takanobu Ishihara , Tamotsu Abe , Osamu Wakabayashi
发明人： Takayuki Yabu , Kouji Kakizaki , Takanobu Ishihara , Tamotsu Abe , Osamu Wakabayashi
IPC分类号： H01J35/20
CPC分类号： H05G2/006 , G03F7/70033 , H05G2/008
摘要： An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber.
摘要翻译：一种被配置为通过用来自激光装置的激光束照射目标材料以将目标材料转换成等离子体而产生极紫外光的装置包括具有用于将激光束引入腔室的入口的腔室，该腔室包括电导电结构件; 以及目标发生器，其包括具有带电对象通过的第一通孔的电极，用于保持电极的电绝缘体和具有第二通孔的屏蔽部件，被充电对象通过该屏蔽部件，所述屏蔽部件为位于等离子体产生区域和至少电绝缘体之间。目标发生器产生液体目标材料的充电目标，并将该充电目标输送到室内的等离子体产生区域，并且该屏蔽部件具有导电性能并且与该腔室的导电结构部件电连接。

7. 发明授权

US06490310B1 Laser discharge electrodes with current return plate structure 有权
标题翻译：具有电流回流板结构的激光放电电极
公开(公告)号：US06490310B1
公开(公告)日：2002-12-03
申请号：US09658920
申请日：2000-09-11
申请人： Takayuki Yabu , Takanobu Ishihara , Takashi Matsunaga , Yasufumi Kawasuji
发明人： Takayuki Yabu , Takanobu Ishihara , Takashi Matsunaga , Yasufumi Kawasuji
IPC分类号： H01S3097
CPC分类号： H01S3/038
摘要： A discharge electrode for a laser device allowing return plates to be easily attached/detached and a laser device with the discharge electrode are provided. To this end, structure in which a pair of an anode (5A) and a cathode (5B), provided facing each other inside a laser chamber (2) sealing in laser gases, for discharging electricity to excite the laser gases flowing through a space between them, thereby oscillating a laser beam, a conductive anode base (6) for holding the anode (5A), an insulating cathode base (8) for holding the cathode (5B), and a plurality of return plates (9B) for electrically connecting the anode base (6) and the laser chamber (2) and supplying an electric current to the anode (5A) are provided, and in which upper portions and lower portions of the return plates (9B) are connected respectively with an upper fixed plate (9A) and a lower fixed plate (9C), is given.
摘要翻译：提供了一种用于允许容易地安装/拆卸返回板的激光装置的放电电极和具有放电电极的激光装置。为此，在密封激光气体的激光室（2）内相对设置的一对阳极（5A）和阴极（5B），用于放电以激发流过空间的激光气体的结构在它们之间，由此振荡激光束，用于保持阳极（5A）的导电阳极基座（6），用于保持阴极（5B）的绝缘阴极基座（8）和用于电气的多个返回板连接阳极基体（6）和激光室（2）并向阳极（5A）供给电流，其中返回板（9B）的上部和下部分别与上固定板（9A）和下固定板（9C）。

8. 发明授权

US08710472B2 Target output device and extreme ultraviolet light source apparatus 有权
标题翻译：目标输出装置和极紫外光源装置
公开(公告)号：US08710472B2
公开(公告)日：2014-04-29
申请号：US13192857
申请日：2011-07-28
申请人： Takanobu Ishihara , Youichi Sasaki , Kouji Kakizaki , Masahiro Inoue , Takayuki Yabu , Hideo Hoshino
发明人： Takanobu Ishihara , Youichi Sasaki , Kouji Kakizaki , Masahiro Inoue , Takayuki Yabu , Hideo Hoshino
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A target output device may include: a main body for storing a target material; a nozzle unit, connected to the main body, for outputting the target material as a target; an electrode unit provided so as to face the nozzle unit; a voltage control unit that applies predetermined voltage between the electrode unit and the target material to generate electrostatic force therebetween for pulling out the target material through the nozzle unit; a pressure control unit that applies predetermined pressure to the target material; and an output control unit that causes the target to be outputted through the nozzle unit by controlling signal output timing of each of a first timing signal and a second timing signal, the first timing signal causing the voltage control unit to apply the predetermined voltage between the target material and the electrode unit at first timing, and the second timing signal causing the pressure control unit to apply the predetermined pressure to the target material at second timing.
摘要翻译：目标输出装置可以包括：用于存储目标材料的主体; 喷嘴单元，连接到主体，用于输出目标材料作为目标; 设置成面向喷嘴单元的电极单元; 电压控制单元，其在所述电极单元和所述目标材料之间施加预定电压，以在其间产生静电力，以通过所述喷嘴单元拉出所述目标材料; 压力控制单元，其向所述目标材料施加预定压力; 以及输出控制单元，其通过控制第一定时信号和第二定时信号中的每一个的信号输出定时使所述目标通过所述喷嘴单元输出，所述第一定时信号使所述电压控制单元在所述第一定时信号和所述第二定时信号之间施加所述预定电压目标材料和电极单元，以及第二定时信号，使得压力控制单元在第二定时将预定压力施加到目标材料。

9. 发明申请

US20110284774A1 TARGET OUTPUT DEVICE AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：目标输出装置和极端超紫外光源装置
公开(公告)号：US20110284774A1
公开(公告)日：2011-11-24
申请号：US13192857
申请日：2011-07-28
申请人： Takanobu ISHIHARA , Youichi Sasaki , Kouji Kakizaki , Masahiro Inoue , Takayuki Yabu , Hideo Hoshino
发明人： Takanobu ISHIHARA , Youichi Sasaki , Kouji Kakizaki , Masahiro Inoue , Takayuki Yabu , Hideo Hoshino
IPC分类号： G21K5/00 , H05H1/24
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A target output device may include: a main body for storing a target material; a nozzle unit, connected to the main body, for outputting the target material as a target; an electrode unit provided so as to face the nozzle unit; a voltage control unit that applies predetermined voltage between the electrode unit and the target material to generate electrostatic force therebetween for pulling out the target material through the nozzle unit; a pressure control unit that applies predetermined pressure to the target material; and an output control unit that causes the target to be outputted through the nozzle unit by controlling signal output timing of each of a first timing signal and a second timing signal, the first timing signal causing the voltage control unit to apply the predetermined voltage between the target material and the electrode unit at first timing, and the second timing signal causing the pressure control unit to apply the predetermined pressure to the target material at second timing.
摘要翻译：目标输出装置可以包括：用于存储目标材料的主体; 喷嘴单元，连接到主体，用于输出目标材料作为目标; 设置成面向喷嘴单元的电极单元; 电压控制单元，其在所述电极单元和所述目标材料之间施加预定电压，以在其间产生静电力，以通过所述喷嘴单元拉出所述目标材料; 压力控制单元，其向所述目标材料施加预定压力; 以及输出控制单元，其通过控制第一定时信号和第二定时信号中的每一个的信号输出定时使所述目标通过所述喷嘴单元输出，所述第一定时信号使所述电压控制单元在所述第一定时信号和所述第二定时信号之间施加所述预定电压目标材料和电极单元，以及第二定时信号，使得压力控制单元在第二定时将预定压力施加到目标材料。

10. 发明申请

US20100176310A1 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US20100176310A1
公开(公告)日：2010-07-15
申请号：US12385835
申请日：2009-04-21
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： H01J99/00
CPC分类号： G03F7/70891 , G03F7/70033 , G03F7/7085 , G03F7/70883 , H05G2/008
摘要： An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.
摘要翻译： EUV光源装置，能够容易地检测EUV光产生室的窗口的劣化等。 EUV光源装置包括驱动激光器，EUV光产生室，将激光束通入EUV光产生室的窗口，EUV聚光镜，激光束聚焦光学器件，其将激光束聚焦到目标材料，检测窗口的温度的温度传感器，以及激光束光学劣化判定处理单元，其基于当产生极紫外光时由温度传感器检测到的窗口的温度来确定窗口的劣化。

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