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    • 6. 发明申请
    • Electron beam irradiating apparatus
    • 电子束照射装置
    • US20070040130A1
    • 2007-02-22
    • US11385483
    • 2006-03-21
    • Tsutomu NanatakiIwao OhwadaYuki BesshoTakayoshi Akao
    • Tsutomu NanatakiIwao OhwadaYuki BesshoTakayoshi Akao
    • A61N5/00
    • G21K5/04H01J37/317H01L21/67005
    • An electron beam irradiating apparatus includes a chamber being kept under vacuum, and housing a planar electron emitting element and a positioning unit and an object to be irradiated is directly irradiated with an electron beam emitted from the element. The planar electron emitting element includes: an emitter portion composed of a dielectric material; and a first electrode and a second electrode applied with a driving voltage for emitting electrons, and the first electrode is formed on a first surface of the emitter portion and has a plurality of through-holes where the emitter portion is exposed, a surface of the first electrode facing to the emitter portion around the through-holes is separated from the emitter portion, and the electron beam is emitted from the first surface of the emitter portion through the through-holes.
    • 电子束照射装置包括保持在真空下的室,并容纳平面电子发射元件和定位单元,并且被照射物体直接用从元件发射的电子束照射。 平面电子发射元件包括:由电介质材料构成的发射极部分; 以及施加有用于发射电子的驱动电压的第一电极和第二电极,并且所述第一电极形成在所述发射极部分的第一表面上,并且具有多个通过所述发射极部分露出的通孔, 面向通孔周围的发射极部分的第一电极与发射极部分分离,并且电子束通过通孔从发射器部分的第一表面发射。