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    • 5. 发明授权
    • Highly purified titanium material, method for preparation of it and sputtering target using it
    • 高纯钛材料,其制备方法和溅射靶材
    • US06210634B1
    • 2001-04-03
    • US09280001
    • 1999-03-29
    • Takashi IshigamiMituo KawaiNoriaki Yagi
    • Takashi IshigamiMituo KawaiNoriaki Yagi
    • C22C1400
    • C22B9/228C22B34/1295C22C14/00C23C14/3414H01L2924/01019H01L2924/01024H01L2924/01028H01L2924/01074
    • The crude Ti particles prepared by molten salt electrolysis or Iodide method are classified into each particle diameter according to contents of impurities, and the crude Ti particles having a desired particle diameter are selected from the crude Ti particles classified depending on each particle diameter. Otherwise, the crude Ti particles are acid-treated. Then they are electron-beam-melted. Through the above production process, there is prepared a highly purified Ti material having an oxygen content of not more than 350 ppm, Fe, Ni and Cr contents of not more than 15 ppm each, Na and K contents of not more than 0.5 ppm each, a reduction of area as a material characteristic of not less than 70%, and a thermal conductivity of not less than 16 W/m K. In short, the highly purified Ti material satisfying high purity, good processability and good thermal conductivity can be obtained. A film having more uniform thickness of film and inside structure can be obtained from a sputtering target prepared using the above highly purified Ti material.
    • 通过熔盐电解或碘化法制备的粗Ti粒子根据杂质的含量分为各个粒径,具有所需粒径的粗Ti粒子选自根据各粒径分级的粗Ti粒子。 否则,粗Ti颗粒被酸处理。 然后电子束熔化。 通过上述制造方法,制备氧含量不大于350ppm,Fe,Ni和Cr含量不高于15ppm的高纯度Ti材料,Na和K含量不大于0.5ppm ,作为材料特性不小于70%的面积的减小,以及不低于16W / m K的热导率。简而言之,高纯度,高加工性和良好导热性的高纯度Ti材料可以是 获得。 可以从使用上述高纯度Ti材料制备的溅射靶获得具有更均匀厚度的膜和内部结构的膜。
    • 8. 发明授权
    • Highly purified titanium material, method for preparation of it and sputtering target using it
    • 高纯钛材料,其制备方法和溅射靶材
    • US06400025B1
    • 2002-06-04
    • US09280653
    • 1999-03-29
    • Takashi IshigamiMituo KawaiNoriaki Yagi
    • Takashi IshigamiMituo KawaiNoriaki Yagi
    • H01L2348
    • C22B9/228C22B34/1295C22C14/00C23C14/3414H01L2924/01019H01L2924/01024H01L2924/01028H01L2924/01074
    • The crude Ti particles prepared by molten salt electrolysis or Iodide method are classified into each particle diameter according to contents of impurities, and the crude Ti particles having a desired particle diameter are selected from the crude Ti particles classified depending on each particle diameter. Otherwise, the crude Ti particles are acid-treated. Then they are electron-beam-melted. Through the above production process, there is prepared a highly purified Ti material having an oxygen content of not more than 350 ppm, Fe, Ni and Cr contents of not more than 15 ppm each, Na and K contents of not more than 0.5 ppm each, a reduction of area as a material characteristic of not less than 70%, and a thermal conductivity of not less than 16 W/m K. In short, the highly purified Ti material satisfying high purity, good processability and good thermal conductivity can be obtained. A film having more uniform thickness of film and inside structure can be obtained from a sputtering target prepared using the above highly purified Ti material.
    • 通过熔盐电解或碘化法制备的粗Ti粒子根据杂质的含量分为各个粒径,具有所需粒径的粗Ti粒子选自根据各粒径分级的粗Ti粒子。 否则,粗Ti颗粒被酸处理。 然后电子束熔化。 通过上述制造方法,制备氧含量不大于350ppm,Fe,Ni和Cr含量不高于15ppm的高纯度Ti材料,Na和K含量不大于0.5ppm ,作为材料特性不小于70%的面积的减小,以及不低于16W / m K的热导率。简而言之,高纯度,高加工性和良好导热性的高纯度Ti材料可以是 获得。 可以从使用上述高纯度Ti材料制备的溅射靶获得具有更均匀厚度的膜和内部结构的膜。
    • 10. 发明授权
    • Highly purified titanium material and its named article, a sputtering
target
    • 高纯钛材料及其命名物,溅射靶
    • US5204057A
    • 1993-04-20
    • US924770
    • 1992-04-09
    • Takashi IshigamiMituo KawaiNoriaki Yagi
    • Takashi IshigamiMituo KawaiNoriaki Yagi
    • C22B9/22C22B34/12C22C14/00C23C14/34
    • C22C14/00C22B34/1295C22B9/228C23C14/3414H01L2924/01019H01L2924/01024H01L2924/01028H01L2924/01074
    • The crude Ti particles prepared by molten salt electrolysis or Iodide method are classified into each particle diameter according to contents of impurities, and the crude Ti particles having a desired particle diameter are selected from the crude Ti particles classified depending on each particle diameter. Otherwise, the crude Ti particles are acid-treated. Then they are electron-beam-melted. Through the above production process, there is prepared a highly purified Ti material having an oxygen content of not more than 350 ppm, Fe, Ni and Cr contents of not more than 15 ppm each, Na and K contents of not more than 0.5 ppm each, a reduction of area as a material characteristic of not less than 70%, and a thermal conductivity of not less than 16 W/m K. In short, the highly purified Ti material satisfying high purity, good processability and good thermal conductivity can be obtained. A film having more uniform thickness of film and inside structure can be obtained from a sputtering target prepared using the above highly purified Ti material.
    • 通过熔盐电解或碘化法制备的粗Ti粒子根据杂质的含量分为各个粒径,具有所需粒径的粗Ti粒子选自根据各粒径分级的粗Ti粒子。 否则,粗Ti颗粒被酸处理。 然后电子束熔化。 通过上述制造方法,制备氧含量不大于350ppm,Fe,Ni和Cr含量不高于15ppm的高纯度Ti材料,Na和K含量不大于0.5ppm ,作为材料特性不小于70%的面积的减小,以及不低于16W / m K的热导率。简而言之,高纯度,高加工性和良好导热性的高纯度Ti材料可以是 获得。 可以从使用上述高纯度Ti材料制备的溅射靶获得具有更均匀厚度的膜和内部结构的膜。