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1. 发明授权

US07253882B2 Exposure method and exposure system 失效
标题翻译：曝光方法和曝光系统
公开(公告)号：US07253882B2
公开(公告)日：2007-08-07
申请号：US11020574
申请日：2004-12-27
申请人： Takao Ozaki , Takayuki Uemura , Yoji Okazaki , Norihisa Takada , Yuji Shimoyama , Daisuke Nakaya , Katsuto Sumi , Morimasa Sato , Mitsutoshi Tanaka
发明人： Takao Ozaki , Takayuki Uemura , Yoji Okazaki , Norihisa Takada , Yuji Shimoyama , Daisuke Nakaya , Katsuto Sumi , Morimasa Sato , Mitsutoshi Tanaka
IPC分类号： G03B27/54
CPC分类号： G03F7/70283 , G03F7/70291 , G03F7/70791
摘要： Light modulated by a spatial light modulator is projected onto photosensitive material and the photosensitive material is exposed to light in a predetermined pattern. The action of the spatial light modulator is controlled so that the amount of the light projected onto the photosensitive material is changed in at least two stages according to the part of the photosensitive material.
摘要翻译：由空间光调制器调制的光被投影到感光材料上，感光材料以预定图案曝光。控制空间光调制器的作用，使得投射到感光材料上的光的量根据感光材料的一部分至少改变两个阶段。

2. 发明申请

US20050206866A1 Exposure method and exposure system 失效
标题翻译：曝光方法和曝光系统
公开(公告)号：US20050206866A1
公开(公告)日：2005-09-22
申请号：US11020574
申请日：2004-12-27
申请人： Takao Ozaki , Takayuki Uemura , Yoji Okazaki , Norihisa Takada , Yuji Shimoyama , Daisuke Nakaya , Katsuto Sumi , Morimasa Sato , Mitsutoshi Tanaka
发明人： Takao Ozaki , Takayuki Uemura , Yoji Okazaki , Norihisa Takada , Yuji Shimoyama , Daisuke Nakaya , Katsuto Sumi , Morimasa Sato , Mitsutoshi Tanaka
IPC分类号： G02F1/13 , G02F1/136 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70283 , G03F7/70291 , G03F7/70791
摘要： Light modulated by a spatial light modulator is projected onto photosensitive material and the photosensitive material is exposed to light in a predetermined pattern. The action of the spatial light modulator is controlled so that the amount of the light projected onto the photosensitive material is changed in at least two stages according to the part of the photosensitive material.
摘要翻译：由空间光调制器调制的光被投影到感光材料上，感光材料以预定图案曝光。控制空间光调制器的作用，使得投射到感光材料上的光的量根据感光材料的一部分至少改变两个阶段。

3. 发明授权

US07206013B2 Image recording apparatus, image forming method, and image forming apparatus 失效
标题翻译：图像记录装置，图像形成方法和图像形成装置
公开(公告)号：US07206013B2
公开(公告)日：2007-04-17
申请号：US10685649
申请日：2003-10-16
申请人： Katsuto Sumi , Akiko Ohno , Daisuke Nakaya , Yoshinori Katoh , Atsuko Shimizu , Hiroshi Matsuoka , Takayuki Uemura
发明人： Katsuto Sumi , Akiko Ohno , Daisuke Nakaya , Yoshinori Katoh , Atsuko Shimizu , Hiroshi Matsuoka , Takayuki Uemura
IPC分类号： B41J2/435
CPC分类号： H04N1/40037
摘要： The image recording apparatus scans a heat mode recording material with a light beam modulated in accordance with image information, to thereby record an image on the heat mode recording material. The apparatus includes an unit for generating a modulated signal, an unit for generating an additional signal at a timing of at least one of rising and falling of the modulated signal and a unit for generating a drive signal by adding the additional signal to the modulated. The image forming method and apparatus scan a photosensitive material with the light beam to record an image, and a power of the light beam is set to a power of a level at which a recording line width or a recording dot size, which is determined depending upon a threshold value for the photosensitive material to blacken, is substantially fixed even if defocus occurs.
摘要翻译：图像记录装置用根据图像信息调制的光束扫描加热模式记录材料，从而将图像记录在加热模式记录材料上。该装置包括用于产生调制信号的单元，用于在调制信号的上升和下降中的至少一个的定时产生附加信号的单元和用于通过将附加信号加到调制信号来产生驱动信号的单元。图像形成方法和装置用光束扫描感光材料以记录图像，并且将光束的功率设置为等于记录线宽度或记录点尺寸的电平，该记录线宽度或记录点尺寸取决于当感光材料变黑的阈值即使发生散焦也基本固定。

4. 发明授权

US06423964B1 Method and apparatus for adjusting amount of light in image exposure recording system 有权
公开(公告)号：US06423964B1
公开(公告)日：2002-07-23
申请号：US09802894
申请日：2001-03-12
申请人： Daisuke Nakaya , Akinori Hamana , Katsuto Sumi
发明人： Daisuke Nakaya , Akinori Hamana , Katsuto Sumi
IPC分类号： G01N2300
摘要： The amount of exposure to a light beam is coarsely adjusted by a coarse adjusting unit which has a wider adjustment range, and finely adjusted by a fine adjusting unit which has a narrower adjustment range but a higher adjustment accuracy. With the coarse and fine adjusting units, the amount of light of the light beam for recording an image can be adjusted to a nicety by a relatively inexpensive arrangement.

5. 发明授权

US07177011B2 Image drawing apparatus and image drawing method 失效
标题翻译：图像绘图装置和图像绘制方法
公开(公告)号：US07177011B2
公开(公告)日：2007-02-13
申请号：US11154711
申请日：2005-06-17
申请人： Katsuto Sumi , Takayuki Uemura
发明人： Katsuto Sumi , Takayuki Uemura
IPC分类号： G03B27/54 , B41J2/455 , B41J15/14
CPC分类号： G03B27/54 , G03F7/70275 , G03F7/70291
摘要： In an image drawing apparatus and an image drawing method for forming a desired two-dimensional pattern on an image drawing surface by using a plurality of image drawing heads, uneven density and resolution caused by errors in relative positions of the heads and installation angles thereof and by an effect of pattern distortion can be reduced. A rectangular two-dimensional pixel array is installed in each of exposure heads in an exposure apparatus (image drawing apparatus) so as to make a predetermined angle with the direction of scanning, facing an exposure surface of a photosensitive material. Combinations of slits and photo detectors detect positions of light spots in the exposure surface comprising inter-head relay areas. Pixels in the pixel arrays are selected so as to realize N-overlay exposure ideally by causing overexposure and underexposure to be minimal in the inter-head relay areas.
摘要翻译：在图像绘制装置和图像绘制方法中，通过使用多个图像绘制头在图像绘制表面上形成期望的二维图案，由头部的相对位置的错误引起的不均匀的浓度和分辨率及其安装角度以及可以减少模式失真的效果。在曝光装置（图像绘制装置）中的每个曝光头中安装矩形二维像素阵列，以便与感光材料的曝光表面相对于扫描方向形成预定的角度。狭缝和光电检测器的组合检测在包括头间继电器区域的曝光表面中的光斑的位置。选择像素阵列中的像素，以便通过在头间继电器区域中使过度曝光和曝光不足最小来理想地实现N-覆盖曝光。

6. 发明授权

US07212225B2 Enhanced resolution image recording method and enhanced resolution image recording apparatus 失效
标题翻译：增强分辨率图像记录方法和增强分辨率图像记录装置
公开(公告)号：US07212225B2
公开(公告)日：2007-05-01
申请号：US10244469
申请日：2002-09-17
申请人： Katsuto Sumi , Daisuke Nakaya , Takeshi Fujii , Hiroshi Sunagawa , Koji Wada
发明人： Katsuto Sumi , Daisuke Nakaya , Takeshi Fujii , Hiroshi Sunagawa , Koji Wada
IPC分类号： B41J2/47
CPC分类号： B41J19/16 , B41J2/45 , B41J2/47
摘要： The image recording method and apparatus are used to record an image formed by a group of light source elements disposed in a two-dimensional manner corresponding to recording pixels on a recording medium. In the image recording method and apparatus, an image recording position on the recording medium by the group of light source elements is moved in a direction that contains a component in at least one of two-dimensional disposing directions of the group of light source elements during the recording while modulating, in response to the movement, each recording pixel of the group of light source elements in accordance with an image to be recorded to thereby record the image on the recording medium. The image recording position is moved in accordance with a set magnification for changing the resolution par recording pixel of the group of light source elements. Further, the image recording position is moved by giving a relative speed difference between the relative movement of the group of light source elements and the recording medium and the tracking of the relative movement made by the image recording position by the group of light source elements.
摘要翻译：图像记录方法和装置用于记录由对应于记录介质上的记录像素的二维方式设置的一组光源元件形成的图像。在图像记录方法和装置中，通过该光源元件组的记录介质上的图像记录位置在包含该组光源元件的二维布置方向中的至少一个中的分量的方向上移动记录，同时响应于移动，根据要记录的图像调制光源元件组的每个记录像素，从而将图像记录在记录介质上。根据用于改变光源元件组的分辨率参数记录像素的设定倍率移动图像记录位置。此外，通过在光源元件组和记录介质的相对移动之间相对速度差以及光源元件组对图像记录位置的相对运动的跟踪来移动图像记录位置。

7. 发明申请

US20050052980A1 Optical power adjusting method and apparatus 审中-公开
标题翻译：光功率调节方法及装置
公开(公告)号：US20050052980A1
公开(公告)日：2005-03-10
申请号：US10935088
申请日：2004-09-08
申请人： Atsuko Shimizu , Katsuto Sumi , Daisuke Nakaya
发明人： Atsuko Shimizu , Katsuto Sumi , Daisuke Nakaya
IPC分类号： G03F7/20 , G03B27/00 , G03B27/22 , G06K15/12 , G11B7/00
CPC分类号： G06K15/1214
摘要： An optical power adjusting method and apparatus for preventing unevenness of exposure of a photosensitive material arising from the difference in wavelength of the light beams. The relationship between the output value and wavelength of the light receiving section is stored in a storage section for a light beam that satisfies the relationship with respect to the optical power and wavelength required for exposing the photosensitive material at a predetermined exposure level. The correspondence between the laser beam emitting section and its wavelength is stored in another storage section. Each laser beam is received separately by the light receiving section, and the optical power of each laser beam is adjusted by the optical power adjusting section such that the output value of the light receiving section for each laser beam received separately satisfies the relationship between the output value and wavelength.
摘要翻译：一种光功率调节方法和装置，用于防止由于光束的波长差引起的感光材料的曝光不均匀。光接收部分的输出值和波长之间的关系被存储在用于光束的存储部分中，该光束满足关于以预定曝光水平曝光感光材料所需的光学功率和波长的关系。激光束发射部分与其波长之间的对应关系被存储在另一个存储部分中。每个激光束由光接收部分别接收，并且每个激光束的光功率由光功率调节部分调节，使得分别接收的每个激光束的光接收部分的输出值满足输出价值和波长。

8. 发明授权

US07126624B2 Image recording method and image recording apparatus 失效
公开(公告)号：US07126624B2
公开(公告)日：2006-10-24
申请号：US10188365
申请日：2002-07-03
申请人： Daisuke Nakaya , Koji Wada , Katsuto Sumi , Hiroshi Sunagawa
发明人： Daisuke Nakaya , Koji Wada , Katsuto Sumi , Hiroshi Sunagawa
IPC分类号： B41J2/47
CPC分类号： H04N1/047 , G06K15/1238 , H04N1/06 , H04N1/195 , H04N2201/02416 , H04N2201/0426 , H04N2201/0471 , H04N2201/0472 , H04N2201/04729 , H04N2201/04732 , H04N2201/04755 , H04N2201/04762 , H04N2201/04789 , H04N2201/04791
摘要： The image recording method and image recording apparatus synchronize phase of a light deflector with rotation of a drum in response to the drum start point detection signal generated each time the drum rotates once, expose the two-dimensional image of one frame formed by a group of light sources disposed two-dimensionally onto the recording medium while causing the image at rest on the recording medium relatively thereto, thereafter move the optical system in the auxiliary scanning direction by an integral multiple of a pixel pitch forming one frame as well as deflect an angle of the light deflector in the main scanning direction by one frame so as to expose the next frame and on for one rotation of the drum. When the position is dislocated in the auxiliary scanning direction at the time the recording medium is to be exposed in a subsequent one rotation of the drum, the method and apparatus correct the dislocation of the position in the auxiliary scanning direction by changing an auxiliary scanning movement speed in a non-exposure time zone between the previous and subsequent rotations of the drum.Accordingly, the method and apparatus can prevent the occurrence of streaked unevenness in the surface exposure and spiral exposure.

9. 发明申请

US20050280793A1 Image drawing apparatus and image drawing method 失效
标题翻译：图像绘图装置和图像绘制方法
公开(公告)号：US20050280793A1
公开(公告)日：2005-12-22
申请号：US11154711
申请日：2005-06-17
申请人： Katsuto Sumi , Takayuki Uemura
发明人： Katsuto Sumi , Takayuki Uemura
IPC分类号： G03B27/54
CPC分类号： G03B27/54 , G03F7/70275 , G03F7/70291
摘要： In an image drawing apparatus and an image drawing method for forming a desired two-dimensional pattern on an image drawing surface by using a plurality of image drawing heads, uneven density and resolution caused by errors in relative positions of the heads and installation angles thereof and by an effect of pattern distortion can be reduced. A rectangular two-dimensional pixel array is installed in each of exposure heads in an exposure apparatus (image drawing apparatus) so as to make a predetermined angle with the direction of scanning, facing an exposure surface of a photosensitive material. Combinations of slits and photo detectors detect positions of light spots in the exposure surface comprising inter-head relay areas. Pixels in the pixel arrays are selected so as to realize N-overlay exposure ideally by causing overexposure and underexposure to be minimal in the inter-head relay areas.
摘要翻译：在图像绘制装置和图像绘制方法中，通过使用多个图像绘制头在图像绘制表面上形成期望的二维图案，由头部的相对位置的错误引起的不均匀的浓度和分辨率及其安装角度以及可以减少模式失真的效果。在曝光装置（图像绘制装置）中的每个曝光头中安装矩形二维像素阵列，以便与感光材料的曝光表面相对于扫描方向形成预定的角度。狭缝和光电检测器的组合检测在包括头间继电器区域的曝光表面中的光斑的位置。选择像素阵列中的像素，以便通过在头间继电器区域中使过度曝光和曝光不足最小来理想地实现N-覆盖曝光。

10. 发明授权

US08189171B2 Plotting state adjusting method and device 有权
标题翻译：绘图状态调整方法及装置
公开(公告)号：US08189171B2
公开(公告)日：2012-05-29
申请号：US12293822
申请日：2007-03-16
申请人： Naoto Kinjo , Katsuto Sumi , Ryo Kitano
发明人： Naoto Kinjo , Katsuto Sumi , Ryo Kitano
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70791 , G01D1/00 , G01D15/00 , G01D21/00 , H04N1/0473 , H04N1/1008 , H04N1/113 , H04N1/19505 , H04N1/19573 , H04N2201/04713 , H04N2201/0472 , H04N2201/04744 , H04N2201/04763
摘要： It is possible to set an optical magnification capable of making a recording position shift amount with respect to Y direction of the plotting point formed by a micro mirror within an allowance range from the relationship between a Y-direction distance between mirror images obtained by projecting micro mirrors constituting a DMD onto a substrate, an inclination angle of the DMD, an image pattern recording pitch, and an optical magnification.
摘要翻译：可以设置光学倍率，该光学倍率能够根据由微镜投影的镜像之间的Y方向距离之间的关系，将由微镜形成的绘图点的Y方向的记录位置偏移量设定在允许范围内在基板上构成DMD的反射镜，DMD的倾斜角，图像图案记录间距和光学倍率。

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