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1. 发明授权

US07177011B2 Image drawing apparatus and image drawing method 失效
标题翻译：图像绘图装置和图像绘制方法
公开(公告)号：US07177011B2
公开(公告)日：2007-02-13
申请号：US11154711
申请日：2005-06-17
申请人： Katsuto Sumi , Takayuki Uemura
发明人： Katsuto Sumi , Takayuki Uemura
IPC分类号： G03B27/54 , B41J2/455 , B41J15/14
CPC分类号： G03B27/54 , G03F7/70275 , G03F7/70291
摘要： In an image drawing apparatus and an image drawing method for forming a desired two-dimensional pattern on an image drawing surface by using a plurality of image drawing heads, uneven density and resolution caused by errors in relative positions of the heads and installation angles thereof and by an effect of pattern distortion can be reduced. A rectangular two-dimensional pixel array is installed in each of exposure heads in an exposure apparatus (image drawing apparatus) so as to make a predetermined angle with the direction of scanning, facing an exposure surface of a photosensitive material. Combinations of slits and photo detectors detect positions of light spots in the exposure surface comprising inter-head relay areas. Pixels in the pixel arrays are selected so as to realize N-overlay exposure ideally by causing overexposure and underexposure to be minimal in the inter-head relay areas.
摘要翻译：在图像绘制装置和图像绘制方法中，通过使用多个图像绘制头在图像绘制表面上形成期望的二维图案，由头部的相对位置的错误引起的不均匀的浓度和分辨率及其安装角度以及可以减少模式失真的效果。在曝光装置（图像绘制装置）中的每个曝光头中安装矩形二维像素阵列，以便与感光材料的曝光表面相对于扫描方向形成预定的角度。狭缝和光电检测器的组合检测在包括头间继电器区域的曝光表面中的光斑的位置。选择像素阵列中的像素，以便通过在头间继电器区域中使过度曝光和曝光不足最小来理想地实现N-覆盖曝光。

2. 发明授权

US07253882B2 Exposure method and exposure system 失效
标题翻译：曝光方法和曝光系统
公开(公告)号：US07253882B2
公开(公告)日：2007-08-07
申请号：US11020574
申请日：2004-12-27
申请人： Takao Ozaki , Takayuki Uemura , Yoji Okazaki , Norihisa Takada , Yuji Shimoyama , Daisuke Nakaya , Katsuto Sumi , Morimasa Sato , Mitsutoshi Tanaka
发明人： Takao Ozaki , Takayuki Uemura , Yoji Okazaki , Norihisa Takada , Yuji Shimoyama , Daisuke Nakaya , Katsuto Sumi , Morimasa Sato , Mitsutoshi Tanaka
IPC分类号： G03B27/54
CPC分类号： G03F7/70283 , G03F7/70291 , G03F7/70791
摘要： Light modulated by a spatial light modulator is projected onto photosensitive material and the photosensitive material is exposed to light in a predetermined pattern. The action of the spatial light modulator is controlled so that the amount of the light projected onto the photosensitive material is changed in at least two stages according to the part of the photosensitive material.
摘要翻译：由空间光调制器调制的光被投影到感光材料上，感光材料以预定图案曝光。控制空间光调制器的作用，使得投射到感光材料上的光的量根据感光材料的一部分至少改变两个阶段。

3. 发明授权

US07206013B2 Image recording apparatus, image forming method, and image forming apparatus 失效
标题翻译：图像记录装置，图像形成方法和图像形成装置
公开(公告)号：US07206013B2
公开(公告)日：2007-04-17
申请号：US10685649
申请日：2003-10-16
申请人： Katsuto Sumi , Akiko Ohno , Daisuke Nakaya , Yoshinori Katoh , Atsuko Shimizu , Hiroshi Matsuoka , Takayuki Uemura
发明人： Katsuto Sumi , Akiko Ohno , Daisuke Nakaya , Yoshinori Katoh , Atsuko Shimizu , Hiroshi Matsuoka , Takayuki Uemura
IPC分类号： B41J2/435
CPC分类号： H04N1/40037
摘要： The image recording apparatus scans a heat mode recording material with a light beam modulated in accordance with image information, to thereby record an image on the heat mode recording material. The apparatus includes an unit for generating a modulated signal, an unit for generating an additional signal at a timing of at least one of rising and falling of the modulated signal and a unit for generating a drive signal by adding the additional signal to the modulated. The image forming method and apparatus scan a photosensitive material with the light beam to record an image, and a power of the light beam is set to a power of a level at which a recording line width or a recording dot size, which is determined depending upon a threshold value for the photosensitive material to blacken, is substantially fixed even if defocus occurs.
摘要翻译：图像记录装置用根据图像信息调制的光束扫描加热模式记录材料，从而将图像记录在加热模式记录材料上。该装置包括用于产生调制信号的单元，用于在调制信号的上升和下降中的至少一个的定时产生附加信号的单元和用于通过将附加信号加到调制信号来产生驱动信号的单元。图像形成方法和装置用光束扫描感光材料以记录图像，并且将光束的功率设置为等于记录线宽度或记录点尺寸的电平，该记录线宽度或记录点尺寸取决于当感光材料变黑的阈值即使发生散焦也基本固定。

4. 发明申请

US20050280793A1 Image drawing apparatus and image drawing method 失效
标题翻译：图像绘图装置和图像绘制方法
公开(公告)号：US20050280793A1
公开(公告)日：2005-12-22
申请号：US11154711
申请日：2005-06-17
申请人： Katsuto Sumi , Takayuki Uemura
发明人： Katsuto Sumi , Takayuki Uemura
IPC分类号： G03B27/54
CPC分类号： G03B27/54 , G03F7/70275 , G03F7/70291
摘要： In an image drawing apparatus and an image drawing method for forming a desired two-dimensional pattern on an image drawing surface by using a plurality of image drawing heads, uneven density and resolution caused by errors in relative positions of the heads and installation angles thereof and by an effect of pattern distortion can be reduced. A rectangular two-dimensional pixel array is installed in each of exposure heads in an exposure apparatus (image drawing apparatus) so as to make a predetermined angle with the direction of scanning, facing an exposure surface of a photosensitive material. Combinations of slits and photo detectors detect positions of light spots in the exposure surface comprising inter-head relay areas. Pixels in the pixel arrays are selected so as to realize N-overlay exposure ideally by causing overexposure and underexposure to be minimal in the inter-head relay areas.
摘要翻译：在图像绘制装置和图像绘制方法中，通过使用多个图像绘制头在图像绘制表面上形成期望的二维图案，由头部的相对位置的错误引起的不均匀的浓度和分辨率及其安装角度以及可以减少模式失真的效果。在曝光装置（图像绘制装置）中的每个曝光头中安装矩形二维像素阵列，以便与感光材料的曝光表面相对于扫描方向形成预定的角度。狭缝和光电检测器的组合检测在包括头间继电器区域的曝光表面中的光斑的位置。选择像素阵列中的像素，以便通过在头间继电器区域中使过度曝光和曝光不足最小来理想地实现N-覆盖曝光。

5. 发明申请

US20050206866A1 Exposure method and exposure system 失效
标题翻译：曝光方法和曝光系统
公开(公告)号：US20050206866A1
公开(公告)日：2005-09-22
申请号：US11020574
申请日：2004-12-27
申请人： Takao Ozaki , Takayuki Uemura , Yoji Okazaki , Norihisa Takada , Yuji Shimoyama , Daisuke Nakaya , Katsuto Sumi , Morimasa Sato , Mitsutoshi Tanaka
发明人： Takao Ozaki , Takayuki Uemura , Yoji Okazaki , Norihisa Takada , Yuji Shimoyama , Daisuke Nakaya , Katsuto Sumi , Morimasa Sato , Mitsutoshi Tanaka
IPC分类号： G02F1/13 , G02F1/136 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70283 , G03F7/70291 , G03F7/70791
摘要： Light modulated by a spatial light modulator is projected onto photosensitive material and the photosensitive material is exposed to light in a predetermined pattern. The action of the spatial light modulator is controlled so that the amount of the light projected onto the photosensitive material is changed in at least two stages according to the part of the photosensitive material.
摘要翻译：由空间光调制器调制的光被投影到感光材料上，感光材料以预定图案曝光。控制空间光调制器的作用，使得投射到感光材料上的光的量根据感光材料的一部分至少改变两个阶段。

6. 发明授权

US06423964B1 Method and apparatus for adjusting amount of light in image exposure recording system 有权
公开(公告)号：US06423964B1
公开(公告)日：2002-07-23
申请号：US09802894
申请日：2001-03-12
申请人： Daisuke Nakaya , Akinori Hamana , Katsuto Sumi
发明人： Daisuke Nakaya , Akinori Hamana , Katsuto Sumi
IPC分类号： G01N2300
摘要： The amount of exposure to a light beam is coarsely adjusted by a coarse adjusting unit which has a wider adjustment range, and finely adjusted by a fine adjusting unit which has a narrower adjustment range but a higher adjustment accuracy. With the coarse and fine adjusting units, the amount of light of the light beam for recording an image can be adjusted to a nicety by a relatively inexpensive arrangement.

7. 发明授权

US08189171B2 Plotting state adjusting method and device 有权
标题翻译：绘图状态调整方法及装置
公开(公告)号：US08189171B2
公开(公告)日：2012-05-29
申请号：US12293822
申请日：2007-03-16
申请人： Naoto Kinjo , Katsuto Sumi , Ryo Kitano
发明人： Naoto Kinjo , Katsuto Sumi , Ryo Kitano
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70791 , G01D1/00 , G01D15/00 , G01D21/00 , H04N1/0473 , H04N1/1008 , H04N1/113 , H04N1/19505 , H04N1/19573 , H04N2201/04713 , H04N2201/0472 , H04N2201/04744 , H04N2201/04763
摘要： It is possible to set an optical magnification capable of making a recording position shift amount with respect to Y direction of the plotting point formed by a micro mirror within an allowance range from the relationship between a Y-direction distance between mirror images obtained by projecting micro mirrors constituting a DMD onto a substrate, an inclination angle of the DMD, an image pattern recording pitch, and an optical magnification.
摘要翻译：可以设置光学倍率，该光学倍率能够根据由微镜投影的镜像之间的Y方向距离之间的关系，将由微镜形成的绘图点的Y方向的记录位置偏移量设定在允许范围内在基板上构成DMD的反射镜，DMD的倾斜角，图像图案记录间距和光学倍率。

8. 发明申请

US20100014063A1 IMAGE EXPOSURE APPARATUS 审中-公开
标题翻译：图像曝光装置
公开(公告)号：US20100014063A1
公开(公告)日：2010-01-21
申请号：US11916048
申请日：2003-05-31
申请人： Katsuto Sumi , Shuichi Ishii
发明人： Katsuto Sumi , Shuichi Ishii
IPC分类号： G03B27/54 , G02B26/00
CPC分类号： G02B26/0833 , G02B3/0012 , G02B3/0056 , G02B27/0031 , G03F7/70216 , G03F7/70275 , G03F7/70291 , G03F7/70308
摘要： An image exposure apparatus includes: a spatial light modulating element, constituted by a plurality of pixel portions for individually modulating light irradiated thereon; a light source, for irradiating light on the spatial light modulating element; and a focusing optical system. The focusing optical system includes: an optical system, for focusing an image borne by each of the pixel portions; and a micro lens array, in which a plurality of micro lenses into which the light beams modulated by the pixel portions enter individually are provided in an array. The micro lens array is provided in the vicinity of a focusing position of the pixel portions by the focusing optical system. Each micro lens of the micro lens array has different powers in two directions within a plane perpendicular to the optical axis, to correct aberrations caused by anisotropic distortions in the pixel portions.
摘要翻译：一种图像曝光装置包括：空间光调制元件，由多个像素部分构成，用于分别调制在其上照射的光; 用于将光照射在空间光调制元件上的光源; 和聚焦光学系统。聚焦光学系统包括：光学系统，用于聚焦由每个像素部分承载的图像; 以及其中由像素部分调制的光束单独进入的多个微透镜设置在阵列中的微透镜阵列。微透镜阵列通过聚焦光学系统设置在像素部分的聚焦位置附近。微透镜阵列的每个微透镜在垂直于光轴的平面内的两个方向上具有不同的功率，以校正由像素部分中的各向异性造成的像差。

9. 发明申请

US20090296170A1 DRAWING DEVICE AND DRAWING METHOD 审中-公开
标题翻译：绘图装置和绘图方法
公开(公告)号：US20090296170A1
公开(公告)日：2009-12-03
申请号：US11917369
申请日：2006-05-25
申请人： Katsuto Sumi
发明人： Katsuto Sumi
IPC分类号： H04N1/04
CPC分类号： G02B26/0833 , G03F7/70291 , G03F7/70791
摘要： An image is highly accurately drawn by correcting an error due to waving or defective optical characteristics of a photosensitive material and by preventing an appearance of irregularity in the drawing caused by a defect in micromirrors. To achieve this, a part of the micromirrors constructing a DMD is adapted to serve as a use region and the remaining part as a non-use region, pixels are formed on a photosensitive material with the width of the DMD set narrower relative to a scan direction, and multiplex exposure using the micro mirrors is performed to form each of the pixels.
摘要翻译：通过校正由于波动的错误或感光材料的光学特性不良而导致的图像高度准确地绘制，并且防止由于微镜的缺陷引起的拉伸不规则性。为了实现这一点，构成DMD的微镜的一部分适于用作使用区域，而剩余部分被用作不使用区域，像素形成在感光材料上，其中DMD的宽度相对于扫描设置更窄方向和使用微反射镜的复用曝光被执行以形成每个像素。

10. 发明申请

US20090231634A1 IMAGE DRAWING APPARATUS AND METHOD 审中-公开
标题翻译：图像绘图装置和方法
公开(公告)号：US20090231634A1
公开(公告)日：2009-09-17
申请号：US11910212
申请日：2006-03-31
申请人： Katsuto Sumi
发明人： Katsuto Sumi
IPC分类号： H04N1/04
CPC分类号： G03F7/70791 , B41J2/465
摘要： In an image drawing apparatus which performs N-tuple image drawing, an image drawing head is mounted so that the pixel column direction of two-dimensionally arranged usable pixels and a scan direction of the image drawing head with respect to an image drawing surface form a predetermined set inclination angle. A pixel-to-utilize setting unit sets, based on variance in the inclination angles of pixel columns with respect to the scan direction, pixels-to-utilize, which are utilized in N-tuple image drawing, to operate among a great number of usable pixels. The pixel-to-utilize setting unit includes a pixel-to-utilize designation unit, a setting changing unit or the like. An image is drawn on the image drawing surface by causing the pixels-to-utilize, designated by setting, to operate while the image drawing head is relatively moved with respect to a stage.
摘要翻译：在进行N元组图像绘制的图像绘制装置中，安装图像绘制头，使得二维排列的可用像素的像素列方向和图像绘制头的扫描方向相对于图像绘制表面形成预先设定的倾斜角度。像素到利用设置单元基于像素列相对于扫描方向的倾斜角度的变化，将在N元组图像绘制中使用的要利用的像素设置在大量的可用像素像素利用设置单元包括像素利用指定单元，设置改变单元等。当图像绘制头相对于舞台相对移动时，通过使通过设置指定的像素被利用来在图像绘制表面上绘制图像。

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