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    • 5. 发明申请
    • ETCHING METHOD AND METHOD FOR PERFORMING SURFACE PROCESSING ON SOLID MATERIAL FOR SOLAR CELL
    • 用于对太阳能电池进行固体表面处理的蚀刻方法和方法
    • US20140234198A1
    • 2014-08-21
    • US14237948
    • 2012-08-10
    • Mizuho MoritaJunichi UchikoshiKentaro TsukamotoTakabumi NagaiKenji Adachi
    • Mizuho MoritaJunichi UchikoshiKentaro TsukamotoTakabumi NagaiKenji Adachi
    • H01L31/0236H01L31/18
    • H01L31/02366H01L31/02363H01L31/18Y02E10/50
    • Provided is an etching method including: (1) bringing a material containing at least one organic compound having an N—F bond into contact with the surface of a solid material; and (2) a step of heating the solid material; whereby etching can be performed safely and in a simple manner, at a higher etching rate, without the use of a high-environmental-load gas that causes global warming or highly reactive and toxic fluorine gas or hydrofluoric acid. The etching method may further include: (3) a step of exposing the solid material to light from the side of the material containing at least one organic compound having an N—F bond; and (4) a step of removing the material containing at least one organic compound having an N—F bond together with the residue remained between said material and the solid material. In particular, performing heating at a high temperature and applying light irradiation make it possible to form inverted pyramid-shaped recesses that are suitable for applying light-trapping and/or anti-reflection processing to the surface of the solid material for a solar cell.
    • 提供一种蚀刻方法,包括:(1)使含有至少一种具有N-F键的有机化合物的材料与固体材料的表面接触; 和(2)加热固体材料的步骤; 从而能够以更高的蚀刻速度安全地且以简单的方式执行蚀刻,而不使用引起全球变暖的高环境负荷气体或高反应性和有毒的氟气或氢氟酸。 蚀刻方法可以进一步包括:(3)将固体材料从含有至少一种具有N-F键的有机化合物的材料侧暴露于光的步骤; 和(4)除去含有至少一种具有N-F键的有机化合物的材料与残留物在所述材料和固体材料之间的步骤。 特别是,在高温下进行加热并施加光照射使得可以形成适于对太阳能电池的固体材料的表面进行光捕获和/或抗反射处理的倒棱锥形凹部。
    • 6. 发明授权
    • Process for the recovery of surfactants
    • 回收表面活性剂的方法
    • US07157002B2
    • 2007-01-02
    • US10561176
    • 2004-06-18
    • Takabumi NagaiKazuhisa FujiiHideaki Asai
    • Takabumi NagaiKazuhisa FujiiHideaki Asai
    • B01D11/00
    • B01D19/0068B01D11/0407D06F43/08G03F7/3092H01L21/31133
    • The present invention relates to a method for recovering a surfactant from a water-carbon dioxide system comprising at least one type of surfactant, water and carbon dioxide, the method comprising the step of bringing the water-carbon dioxide system into contact with a dehydrating agent to remove water. Furthermore, the present invention relates to a method comprising the steps of installing a device for selectively removing a removal target in a circulation line in which circulated is a mixed system comprising carbon dioxide, a carbon dioxide-compatible surfactant and/or a cosolvent, and a removal target; circulating the mixed system; and selectively removing the removal target that has been incorporated into the surfactant and/or cosolvent.
    • 本发明涉及从包含至少一种表面活性剂,水和二氧化碳的水 - 二氧化碳体系中回收表面活性剂的方法,该方法包括使水 - 二氧化碳体系与脱水剂接触的步骤 去除水。 此外,本发明涉及一种方法,包括以下步骤:安装用于选择性地除去循环管线中的除去靶的装置,其中循环是包括二氧化碳,二氧化碳相容的表面活性剂和/或助溶剂的混合系统,以及 移除目标; 循环混合系统; 并且选择性地去除已经结合到表面活性剂和/或助溶剂中的去除靶。
    • 7. 发明授权
    • Branched surfactant having fluoroalkyl group and hydrocarbon group
    • 具有氟代烷基和烃基的支化表面活性剂
    • US07811473B2
    • 2010-10-12
    • US11596672
    • 2005-05-16
    • Takabumi NagaiKazuhisa Fujii
    • Takabumi NagaiKazuhisa Fujii
    • B01F1/00
    • B01F17/0057C07C305/06C07C307/10C07C309/17C11D1/004
    • The present invention relates to a surfactant represented by Formula (I):[Formula 1] wherein Rf represents a fluoroalkyl group which may have an ether bond; Rh represents an alkyl group; r represents 1 or 0; when r=0, Z1 and Z2 represent (CH2)n1—(X1)p1— and —(X2)q1—, respectively; and when r=1, Z1 and Z2 represent (CH2Y)p2—CH2— and —(CH2Y)q2—, respectively, wherein X1 and X2 may be the same or different and each represents a divalent linking group, p1 represents 0 or 1, q1 represents 0 or 1, n1 represents an integer of 1-10; Y represents O, S or NR, wherein R represents a hydrogen atom, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, or t-butyl; p2 and q2 each represent 0 or 1 but are not 0 at the same time; and M represents a hydrogen atom, alkali metal, ½ alkaline earth metal or ammonium.
    • 本发明涉及由式(I)表示的表面活性剂:[式1]其中Rf表示可具有醚键的氟代烷基; Rh表示烷基; r表示1或0; 当r = 0时,Z1和Z2分别表示(CH2)n1-(X1)p1和 - (X2)q1; 并且当r = 1时,Z 1和Z 2分别表示(CH 2 Y)p2-CH2-和 - (CH2Y)q2-,其中X1和X2可以相同或不同,并且各自表示二价连接基团,p1表示0或1 q1表示0或1,n1表示1〜10的整数, Y表示O,S或NR,其中R表示氢原子,甲基,乙基,正丙基,异丙基,正丁基,异丁基,仲丁基或叔丁基; p2和q2各自表示0或1,但不同时为0; M表示氢原子,碱金属,½碱土金属或铵。
    • 9. 发明申请
    • Process for the recovery of surfactants
    • 回收表面活性剂的方法
    • US20060124552A1
    • 2006-06-15
    • US10561176
    • 2004-06-18
    • Takabumi NagaiKazuhisa FujiiHideaki Asai
    • Takabumi NagaiKazuhisa FujiiHideaki Asai
    • C02F1/28
    • B01D19/0068B01D11/0407D06F43/08G03F7/3092H01L21/31133
    • The present invention relates to a method for recovering a surfactant from a water-carbon dioxide system comprising at least one type of surfactant, water and carbon dioxide, the method comprising the step of bringing the water-carbon dioxide system into contact with a dehydrating agent to remove water. Furthermore, the present invention relates to a method comprising the steps of installing a device for selectively removing a removal target in a circulation line in which circulated is a mixed system comprising carbon dioxide, a carbon dioxide-compatible surfactant and/or a cosolvent, and a removal target; circulating the mixed system; and selectively removing the removal target that has been incorporated into the surfactant and/or cosolvent.
    • 本发明涉及从包含至少一种表面活性剂,水和二氧化碳的水 - 二氧化碳体系中回收表面活性剂的方法,该方法包括使水 - 二氧化碳体系与脱水剂接触的步骤 去除水。 此外,本发明涉及一种方法,包括以下步骤:安装用于选择性地除去循环管线中的除去靶的装置,其中循环是包括二氧化碳,二氧化碳相容的表面活性剂和/或助溶剂的混合系统,以及 移除目标; 循环混合系统; 并且选择性地去除已经结合到表面活性剂和/或助溶剂中的去除靶。
    • 10. 发明授权
    • Branched surfactant having fluoroalkyl group and hydrocarbon group
    • 具有氟代烷基和烃基的支化表面活性剂
    • US07906042B2
    • 2011-03-15
    • US12696694
    • 2010-01-29
    • Takabumi NagaiKazuhisa Fujii
    • Takabumi NagaiKazuhisa Fujii
    • B01F1/00
    • B01F17/0057C07C305/06C07C307/10C07C309/17C11D1/004
    • The present invention relates to a surfactant represented by Formula (I): wherein Rf represents a fluoroalkyl group which may have an ether bond; Rh represents an alkyl group; r represents 1 or 0; when r=0, Z1 and Z2 represent (CH2)n1—(X1)p1— and —(X2)q1—, respectively; and when r=1, Z1 and Z2 represent (CH2Y)p2—CH2— and —(CH2Y)q2—, respectively, wherein X1 and X2 may be the same or different and each represents a divalent linking group, p1 represents 0 or 1, q1 represents 0 or 1, n1 represents an integer of 1-10; Y represents O, S or NR, wherein R represents a hydrogen atom, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, or t-butyl; p2 and q2 each represent 0 or 1 but are not 0 at the same time; and M represents a hydrogen atom, alkali metal, ½ alkaline earth metal or ammonium.
    • 本发明涉及由式(I)表示的表面活性剂:其中Rf表示可具有醚键的氟烷基; Rh表示烷基; r表示1或0; 当r = 0时,Z1和Z2分别表示(CH2)n1-(X1)p1和 - (X2)q1; 并且当r = 1时,Z 1和Z 2分别表示(CH 2 Y)p2-CH2-和 - (CH2Y)q2-,其中X1和X2可以相同或不同,并且各自表示二价连接基团,p1表示0或1 q1表示0或1,n1表示1〜10的整数, Y表示O,S或NR,其中R表示氢原子,甲基,乙基,正丙基,异丙基,正丁基,异丁基,仲丁基或叔丁基; p2和q2各自表示0或1,但不同时为0; M表示氢原子,碱金属,½碱土金属或铵。