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1. 发明授权

US08562320B2 Resin molding device 失效
标题翻译：树脂成型装置
公开(公告)号：US08562320B2
公开(公告)日：2013-10-22
申请号：US12450341
申请日：2008-03-18
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Jiro Yamanaka , Kengo Iwahara , Kouji Fukae
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Jiro Yamanaka , Kengo Iwahara , Kouji Fukae
IPC分类号： B29C47/06 , B29C47/20 , B29C47/88
CPC分类号： B29C47/20 , B29C47/0023 , B29C47/065 , B29C47/067 , B29C47/56 , B29C47/881 , B29C47/882 , B29C47/8835 , B29C47/884 , B29C47/8895 , B29C47/90 , B29C47/905 , B29C47/908 , B29C47/92 , B29C2947/9258 , B29C2947/92619 , B29C2947/92704 , B29C2947/92714 , B29C2947/92809 , B29C2947/92857 , B29C2947/92923 , B29C2947/92971 , B29K2027/08 , B29K2027/16 , B29K2027/18 , B29K2077/00 , B29L2009/00 , B29L2023/22
摘要： A resin molding device which molds a resin tube 1 from a molten resin has a tube molding portion 14 and a spindle 15 as jigs which define inner and outer diameters of the resin tube.
摘要翻译：树脂管1从熔融树脂成型的树脂成型装置具有管成型部14和主轴15作为限定树脂管的内径和外径的夹具。

2. 发明授权

US08807573B2 Metal gasket 有权
标题翻译：金属垫片
公开(公告)号：US08807573B2
公开(公告)日：2014-08-19
申请号：US13981218
申请日：2012-01-12
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Koji Sato , Yoshinori Uchino , Masamichi Iwaki
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Koji Sato , Yoshinori Uchino , Masamichi Iwaki
IPC分类号： F16J15/02 , F16J15/08
CPC分类号： F16J15/08 , F16J15/027 , F16J15/0881 , F16J15/0893
摘要： An annular metal gasket for sealing a space between members by being pressed in the vertical direction in a state of being mounted between the members, the metal gasket comprising an annular outer ring having a substantially C-shaped cross-section and having a circumferential-direction opening formed therein, and an annular inner ring fitted inside the outer ring. The inner ring is formed so as to have a polygonal cross-section. Bend parts having an Inner angle larger than 180° are formed between the upper corner part and the inner- and outer-circumference-side corner parts; and between the lower corner part and the inner- and outer-circumference-side corner parts.
摘要翻译：一种用于通过在安装在所述构件之间的状态下沿垂直方向被按压而在构件之间密封空间的环形金属衬垫，所述金属衬垫包括具有基本上C形横截面并具有圆周方向的环形外圈开口形成在其中，以及安装在外圈内的环形内圈。内圈形成为具有多边形横截面。内角大于180°的弯曲部分形成在上角部与内周侧和外周侧角部之间; 并且在下角部与内周侧和外周侧角部之间。

3. 发明授权

US08206833B2 Metal oxide film, laminate, metal member and process for producing the same 有权
标题翻译：金属氧化物膜，层压体，金属构件及其制造方法
公开(公告)号：US08206833B2
公开(公告)日：2012-06-26
申请号：US11917614
申请日：2006-05-09
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa
IPC分类号： B32B9/00
CPC分类号： C25D11/06 , C25D11/18 , Y10T428/265
摘要： A metal oxide film suitable for protection of metals, composed mainly of aluminum. A metal oxide film includes a film of an oxide of a metal composed mainly of aluminum, having a thickness of 10 nm or greater, and exhibiting a moisture release rate from the film of 1E18 mol./cm2 or less. Further, there is provided a process for producing a metal oxide film, wherein a metal composed mainly of aluminum is subjected to anodic oxidation in a chemical solution of 4 to 10 pH value so as to obtain a metal oxide film.
摘要翻译：适用于主要由铝组成的金属保护金属氧化物膜。金属氧化物膜包括厚度为10nm以上的主要由铝构成的金属的氧化物的膜，并且具有1E18mol / cm 2以下的膜的水分释放率。此外，提供了一种制造金属氧化物膜的方法，其中主要由铝组成的金属在pH值为4至10的化学溶液中进行阳极氧化，以获得金属氧化物膜。

4. 发明授权

US08137787B1 Metal material having formed thereon chromium oxide passive film and method for producing the same, and parts contacting with fluid and system for supplying fluid and exhausting gas 失效
标题翻译：在其上形成有氧化铬钝化膜的金属材料及其制造方法，以及与流体接触的部件和用于供应流体和排出气体的系统
公开(公告)号：US08137787B1
公开(公告)日：2012-03-20
申请号：US09889269
申请日：2000-01-13
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Nobukazu Ikeda , Eiji Ideta , Akihiro Morimoto , Tetsutaro Ogushi , Takehisa Konishi
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Nobukazu Ikeda , Eiji Ideta , Akihiro Morimoto , Tetsutaro Ogushi , Takehisa Konishi
IPC分类号： B32B15/04 , B32B9/00 , B32B19/00
CPC分类号： C23C8/02 , C23C26/00 , Y10T428/24322 , Y10T428/24355 , Y10T428/31678
摘要： The object of the present invention is to form a chromium-oxide film, excellent in corrosion resistance, without containing an oxide film of other metal onto the metallic material. The chromium-oxide passivation film, excellent in corrosion resistance, without containing the oxide film of other metal can be formed inexpensively and in a short time, and a fluid supplying system for safely supplying fluid with hard corrosivity is able to be provided. One step of forming the passivation film consisting of a chromium oxide layer by giving heat treatment, in an oxidizing atmosphere, after coating chromium on the metallic material having a surface roughness (Ra) not more than 1.5 μm.
摘要翻译：本发明的目的是形成耐腐蚀性优异的氧化铬膜，而不含金属材料上的其它金属的氧化膜。可以廉价且短时间地形成不含有其它金属的氧化物膜的耐腐蚀性优异的氧化铬钝化膜，能够提供用于安全地供给具有硬腐蚀性的流体的流体供给系统。在表面粗糙度（Ra）不大于1.5μm的金属材料上涂覆铬后，在氧化气氛中进行热处理，形成由氧化铬层构成的钝化膜的一个步骤。

5. 发明授权

US08124240B2 Protective film structure of metal member, metal component employing protective film structure, and equipment for producing semiconductor or flat-plate display employing protective film structure 有权
标题翻译：金属构件的保护膜结构，采用保护膜结构的金属成分，以及使用保护膜结构制造半导体或平板显示器的设备
公开(公告)号：US08124240B2
公开(公告)日：2012-02-28
申请号：US11917633
申请日：2006-06-16
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
IPC分类号： B32B9/00
CPC分类号： C23C4/02 , C23C8/80 , C23C28/00 , C23C28/042 , C25D11/02 , C25D11/04 , C25D11/08 , C25D11/10 , C25D11/16 , C25D11/18 , Y10T428/26 , Y10T428/265 , Y10T428/31678
摘要： A protective film structure of a metal member for use in an apparatus for manufacturing a semiconductor or the like, the protective film structure including a first coating layer of faultless aluminum oxide formed by direct anodic oxidation of a base-material metal of an aluminum alloy; and a second coating layer formed on the first coating layer and made of yttrium oxide by a plasma spraying method.
摘要翻译：一种用于半导体制造装置的金属构件的保护膜结构，所述保护膜结构包括由铝合金的基材金属的直接阳极氧化形成的无缺陷氧化铝的第一涂层; 以及通过等离子喷涂法形成在第一涂层上并由氧化钇制成的第二涂层。

6. 发明申请

US20110139334A1 BONDING METHOD AND RESIN MEMBER BONDED THEREBY 审中-公开
标题翻译：粘合方法和树脂粘结在一起
公开(公告)号：US20110139334A1
公开(公告)日：2011-06-16
申请号：US13034504
申请日：2011-02-24
申请人： TADAHIRO OHMI , Kazumi Tsukamoto , Yasuyuki Shirai
发明人： TADAHIRO OHMI , Kazumi Tsukamoto , Yasuyuki Shirai
IPC分类号： B32B37/02 , B32B37/08 , B32B37/06
CPC分类号： B29C66/001 , B29C65/02 , B29C65/16 , B29C66/1142 , B29C66/5221 , B29C66/71 , B29K2023/06 , B29K2023/12 , B29K2023/38 , B29K2027/06 , B29K2027/12 , B29K2027/14 , B29K2027/16 , B29K2027/18 , B29K2071/00 , Y10T156/10 , Y10T428/31504
摘要： By performing thermal fusion bonding in the state where a bonding portion is covered with a bonding portion cover and the concentrations of oxygen and moisture inside the bonding portion cover are set lower than the concentrations of oxygen and moisture in the atmosphere, it is possible to reduce elution from a bonded resin-based pipe.
摘要翻译：通过在接合部被接合部覆盖物覆盖的状态下进行热熔融接合，并且将接合部覆盖物内的氧气和水分的浓度设定为低于大气中的氧气和水分的浓度，可以减少从粘结树脂基管中洗脱。

7. 发明申请

US20090142588A1 Protective Film Structure of Metal Member, Metal Component Employing Protective Film Structure, and Equipment for Producing Semiconductor or Flat-Plate Display Employing Protective Film Structure 有权
标题翻译：金属部件的保护膜结构，使用保护膜结构的金属部件以及使用保护膜结构的半导体或平板显示器的生产设备
公开(公告)号：US20090142588A1
公开(公告)日：2009-06-04
申请号：US11917633
申请日：2006-06-16
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
IPC分类号： B32B15/00
CPC分类号： C23C4/02 , C23C8/80 , C23C28/00 , C23C28/042 , C25D11/02 , C25D11/04 , C25D11/08 , C25D11/10 , C25D11/16 , C25D11/18 , Y10T428/26 , Y10T428/265 , Y10T428/31678
摘要： Multifunction production equipment enabling a plurality of processes in which deposition of reaction products on the inner wall of the processing chamber of equipment for producing a semiconductor or a flat-plate display, metal contamination due to corrosion of the inner wall, or the like, and fluctuation of the process due to discharged gas are suppressed, and a protective film structure for use therein. On the surface of a metal material, a first coating layer having an oxide coating of 1μ thick or less formed as an underlying layer by direct oxidation of a parent material, and a second coating layer of about 200 μm thick are formed. With such an arrangement, corrosion resistance against irradiation with ions or radicals can be imparted to a second layer protective film, and the effect of a protective layer for preventing corrosion of the surface of parent metal caused by diffusing molecules or ions into the second layer protective film can be imparted to the first layer oxide film. Consequently, contamination of the substrate with metals generated from each metal member and the inner surface of the process chamber is reduced, and stripping of the second layer protective film due to lowering in adhesion of the second layer protective film due to corrosion of the interface between the parent material and the second layer protective film can be suppressed.
摘要翻译：多功能生产设备能够实现多个工艺，其中在用于制造半导体或平板显示器的设备的处理室的内壁上沉积反应产物，由于内壁的腐蚀而引起的金属污染等，以及排出气体的处理的波动被抑制，以及用于其中的保护膜结构。在金属材料的表面上，形成通过母材直接氧化形成作为下层的1μm厚以下的氧化物被膜的第1被覆层和200μm厚的第2被覆层。通过这样的布置，可以对第二层保护膜赋予对离子或自由基的照射的耐腐蚀性，以及用于防止母体金属表面由于扩散分子或离子而导致的第二层保护层的腐蚀的保护层的效果可以将膜施加到第一层氧化物膜。因此，由金属构件和处理室的内表面产生的金属对衬底的污染减少，并且由于第二层保护膜的粘附性的降低而导致的第二层保护膜的剥离可以抑制母材和第二层保护膜。

8. 发明申请

US20090038946A1 METAL OXIDE FILM, LAMINATE, METAL MEMBER AND PROCESS FOR PRODUCING THE SAME 有权
标题翻译：金属氧化物膜，层压板，金属构件及其制造方法
公开(公告)号：US20090038946A1
公开(公告)日：2009-02-12
申请号：US11917614
申请日：2006-05-09
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa
IPC分类号： C25D7/12 , B32B15/04 , C23F13/00
CPC分类号： C25D11/06 , C25D11/18 , Y10T428/265
摘要： A metal oxide film suitable for protection of metals, composed mainly of aluminum. A metal oxide film includes a film of an oxide of a metal composed mainly of aluminum, having a thickness of 10 nm or greater, and exhibiting a moisture release rate from the film of 1E18 mol./cm2 or less. Further, there is provided a process for producing a metal oxide film, wherein a metal composed mainly of aluminum is subjected to anodic oxidation in a chemical solution of 4 to 10 pH value so as to obtain a metal oxide film.
摘要翻译：适用于主要由铝组成的金属保护金属氧化物膜。金属氧化物膜包括厚度为10nm以上的主要由铝构成的金属的氧化物的膜，并且具有1E18mol / cm 2以下的膜的水分释放率。此外，提供了一种制造金属氧化物膜的方法，其中主要由铝组成的金属在pH值为4至10的化学溶液中进行阳极氧化，以获得金属氧化物膜。

9. 发明申请

US20050011935A1 Welding method for fluorine-passivated memberfor welding, fluorine-passivated method after being weld, and welded parts priority data 失效
标题翻译：用于焊接的氟钝化件的焊接方法，焊接后的氟钝化方法以及焊接部件优先数据
公开(公告)号：US20050011935A1
公开(公告)日：2005-01-20
申请号：US10805555
申请日：2004-03-19
申请人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
发明人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
IPC分类号： B23K9/16 , B23K1/20 , B23K9/23 , B23K35/38
CPC分类号： B23K35/383 , B23K1/20 , Y10T428/12535 , Y10T428/12979 , Y10T428/31678
摘要： The present invention provides a welding method for materials to be welded which are subjected to fluoride passivation treatment, and a fluoride passivation retreatment method, wherein, when fluoride passivation retreatment was conducted after welding, there is no generation of particles or dust, and superior resistance is provided to fluorine system gases. In the present invention, when materials to be welded comprising stainless steel subjected to fluoride passivation treatment are welded, hydrogen is added to the gas (the back shield gas) flowing through the materials to be welded. Furthermore, in the welding method for materials to be welded which are subjected to fluoride passivation treatment in accordance with the present invention, the thickness of the fluoride passivated film in a predetermined range from the butt end surfaces of the materials to be welded, comprising stainless steel subjected to a fluoride passivation treatment, is set to 10 nm or less, and welding is conducted. Furthermore, in the fluoride passivation retreatment method in accordance with the present invention, after conducting the welding method described above, at least the welded parts are heated, and a gas containing fluorine gas is caused to flow in the interior part.
摘要翻译：本发明提供一种待进行氟化物钝化处理的待焊接材料的焊接方法，以及氟化物钝化再处理方法，其中，在焊接后进行氟化物钝化再处理时，不产生颗粒或灰尘，且具有优异的电阻被提供给氟系气体。在本发明中，当焊接包含不锈钢的待焊接材料进行氟化物钝化处理时，向流过待焊接材料的气体（背面保护气体）添加氢。此外，在根据本发明的被氟化物钝化处理的待焊接材料的焊接方法中，氟化钝化膜的厚度在待焊接材料的对接端面的预定范围内，包括不锈钢进行氟化物钝化处理的钢被设定为10nm以下，进行焊接。此外，在本发明的氟化物钝化再处理方法中，在进行了上述的焊接方法之后，至少加热了焊接部，并且使含有氟气的气体在内部流动。

10. 发明授权

US06818320B2 Welding method for welded members subjected to fluoride passivation treatment, fluoride passivation retreatment method, and welded parts 失效
标题翻译：氟化物钝化处理焊接件的焊接方法，氟化物钝化再处理方法和焊接部件
公开(公告)号：US06818320B2
公开(公告)日：2004-11-16
申请号：US09748883
申请日：2000-12-27
申请人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
发明人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
IPC分类号： B21D3900
CPC分类号： B23K35/383 , B23K1/20 , Y10T428/12535 , Y10T428/12979 , Y10T428/31678
摘要： A welding method for materials to be welded which are subjected to fluoride passivation treatment, and a fluoride passivation retreatment method, wherein, when fluoride passivation retreatment is conducted after welding, there is no generation of particles or dust. The method provides superior resistance to fluorine system gases. During fluoride passivation treatment, hydrogen is added to the gas (the back shield gas) flowing through the materials to be welded. In one embodiment of the welding method, the thickness of the fluoride passivated film in a predetermined range from the butt end surfaces of the materials to be welded is set to 10 nm or less, followed by subsequent welding. Furthermore, the fluoride passivation retreatment method, includes the steps of heating at least the welded parts following welding and flowing a gas containing fluorine gas in the interior portion of the parts.
摘要翻译：对经过氟化物钝化处理的待焊接材料的焊接方法以及氟化物钝化再处理方法，其中，在焊接后进行氟化物钝化再处理时，不产生颗粒或灰尘。该方法提供了优异的耐氟体系气体阻力。在氟化物钝化处理期间，将氢气流入待焊接材料的气体（背面保护气体）。在焊接方法的一个实施例中，氟化钝化膜在待焊接材料的对接端面的预定范围内的厚度设定为10nm以下，随后进行焊接。此外，氟化物钝化再处理方法包括以下步骤：至少在焊接之后加热焊接部分，并且在部件的内部部分使含有氟气的气体流动。

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