会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明专利
    • Method of controlling semiconductor device and electrostatic actuator
    • 控制半导体器件和静电致动器的方法
    • JP2009201317A
    • 2009-09-03
    • JP2008042908
    • 2008-02-25
    • Toshiba Corp株式会社東芝
    • MIYANO SHINJI
    • H02N1/00B81B3/00H01H59/00
    • H02N1/006
    • PROBLEM TO BE SOLVED: To simply and accurately determine an electrostatic actuator state and restore the state to a normal operating state promptly when the occurrence of charging and the like is determined.
      SOLUTION: The hold voltage Vhold is applied to an upper electrode 14, while the grounding voltage Vss is applied to a lower electrode 15, and subsequently the voltage BE on the lower electrode 15 is used as the test voltage Vtest to separate the hold voltage Vhold on the upper electrode 14 so that the voltage TE on the upper electrode 14 may be placed in a high impedance state (hi-Z). A potential difference between the upper electrode 14 and the lower electrode 15 becomes Vhold-Vtest=Vmon. Thereafter, the voltage BE is restored to the grounding voltage Vss. The capacity between the electrodes 14 and 15 is measured on the basis of a drop range of the voltage TE due to a capacitive coupling at such a time to determine the open or closed state.
      COPYRIGHT: (C)2009,JPO&INPIT
    • 要解决的问题:为了简单而准确地确定静电致动器状态,并且当确定充电等的发生时,立即将状态恢复到正常操作状态。 解决方案:将保持电压Vhold施加到上电极14,同时将接地电压Vss施加到下电极15,随后将下电极15上的电压BE用作测试电压V test,以将 保持电压Vhold在上电极14上,使得上电极14上的电压TE可以被置于高阻抗状态(hi-Z)。 上电极14和下电极15之间的电位差成为Vhold-Vtest = Vmon。 此后,电压BE恢复到接地电压Vss。 电极14和15之间的电容是在这样一个时间由于电容耦合的电压TE的下降范围而被测量的,以确定打开或关闭状态。 版权所有(C)2009,JPO&INPIT
    • 2. 发明专利
    • Semiconductor storage device
    • 半导体存储设备
    • JP2007109366A
    • 2007-04-26
    • JP2006226798
    • 2006-08-23
    • Toshiba Corp株式会社東芝
    • NAGAI TAKESHIMIYANO SHINJI
    • G11C11/406G11C11/401G11C29/42
    • G06F11/106G11C2029/0411
    • PROBLEM TO BE SOLVED: To simplify command input and control thereof and also to reduce a transition time from a normal operation mode to a data holding mode and a transition time from the data holding mode to the normal operation mode.
      SOLUTION: When memory cells enter an operation mode which only holds data, a plurality of data are read out to generate and store a check bit for error detection and correction, and a refreshing is performed in a period within the error occurrence allowable range of an error correcting operation performed by the ECC circuits 16-1, 16-2 by using the check bit, and before the normal operation mode is restored from the operation mode which only holds data, a control circuit 17 performs control so that an error bit of the data is corrected by using the check bit. Then, in an entry/exit period, read/write and an ECC operation are sequentially performed for all the memory cells by a page mode operation, and also memory cells connected to a word line which is not accessed by the page mode operation, are sequentially activated and refreshed.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:简化其命令输入和控制,并且还减少从正常操作模式到数据保持模式的转换时间以及从数据保持模式到正常操作模式的转换时间。 解决方案:当存储单元进入仅保存数据的操作模式时,读出多个数据以生成并存储用于错误检测和校正的校验位,并且在错误发生允许范围内的周期内进行刷新 通过使用校验位由ECC电路16-1,16-2执行的纠错操作的范围,并且在从仅保存数据的操作模式恢复正常操作模式之前,控制电路17执行控制 通过使用校验位来校正数据的错误位。 然后,在入口/出口期间,通过页面模式操作对所有存储器单元顺序执行读/写和ECC操作,以及连接到未被页模式操作访问的字线的存储单元是 顺序激活和刷新。 版权所有(C)2007,JPO&INPIT
    • 8. 发明专利
    • FIELD-EFFECT TRANSISTOR
    • JPH01132170A
    • 1989-05-24
    • JP28947987
    • 1987-11-18
    • TOSHIBA CORP
    • MIYANO SHINJI
    • H01L21/338H01L29/10H01L29/778H01L29/812
    • PURPOSE:To obtain a new FET forming a channel in a homojunction interface and and the FET capable of being operated at high speed by a method wherein a first to a third individually specific semiconductor layers, a specific control gate, a specific source region, a specific drain region and the specific channel are provided. CONSTITUTION:The following are provided: a first semiconductor layer 11 of one conductivity type; a second semiconductor layer 12 which is formed on it and contains an impurity of the opposite conductivity type; a third semiconductor layer 13 which is formed on it, which is composed of a semiconductor material identical to that of the second semiconductor layer 12 and whose impurity concentration value is lower than that of the second semiconductor layer 12; a control gate 14 formed on it; a source region 15 and a drain region 16 which are formed by sandwiching the control gate 14; a channel 19 constituted by a potential well at an interface part between said second semiconductor layer 12 and said third semiconductor layer 13. For example, a P type GaAs layer 11, an n-type GaAs layer 12 and an undoped GaAs layer 13 are laminated; a Schottky gate electrode 14 is formed; after that, n type GaAs source and drain regions 15, 16 are formed.