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    • 2. 发明专利
    • SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
    • JPH04119652A
    • 1992-04-21
    • JP23890490
    • 1990-09-11
    • TOSHIBA CORP
    • NUMATA KENJI
    • H01L21/82H01L21/8242H01L27/10H01L27/108
    • PURPOSE:To enable a current level difference to be set large enough to serve as discriminating data by a method wherein a semiconductor device is provided with a discriminating circuit which contains a fuse element and a diode, and an impedance viewed from the standpoint of a connection node of a discriminating circuit toward an inner circuit is set larger than that toward the discriminating circuit. CONSTITUTION:A discriminating circuit 3 is composed of a fuse element 31 and a diode 32 connected in series between a connection node N and a power supply potential Vcc. On the other hand, a resistor R0 is an equivalent resistor of a wiring between an input pin 1 and the connection node N of the discriminating circuit, and a resistor Ra is an equivalent resistor of a wiring between the connection node N and the input circuit 2. An R1 is an equivalent resistor viewed from the connection node N toward the discriminating circuit 3 including the resistance of the fuse element 31. Apart from these resistors, an resistor Rb is a resistor which is inserted so as to enable a resistor, R2=Ra+Rb, viewed from the connection node N toward the input circuit 2 to be much larger than the equivalent resistor R1 toward a discriminating circuit 2 side. By this setup, discrimination data can be detected large enough in sensitivity, so that it can be discriminated that a redundant circuit system is utilized or not.
    • 5. 发明专利
    • SEMICONDUCTOR MEMORY AND MANUFACTURE THEREOF
    • JPS6341067A
    • 1988-02-22
    • JP18458986
    • 1986-08-06
    • TOSHIBA CORP
    • NUMATA KENJINAKAGAWA KAORU
    • H01L27/10H01L21/8242H01L27/108
    • PURPOSE:To inexpensively obtain a dynamic RAM having high reliability by overlapping a capacitor electrode and the gate electrode of an MOS transistor in a groove to be buried. CONSTITUTION:An Si3N4 film is deposited through a thermal oxide film on a p-type Si substrate 1 formed with a p-well by ion implantation, and patterned to form a field insulating film 2. Then, a first groove 3 is formed on a substrate 1. Then, a CVD oxide film is deposited, and etched back to bury an element separating insulating film 4 in the groove 2. A second groove 5 feeding in a direction Y is formed on the substrate 1 in the similar step. After a p type layer 6 is formed on the bottom of the second groove, it is thermally oxidized to form an oxide film, a CVD oxide film is deposited, and etched back to allow an element separating insulating film 7 to remain on the bottom of the groove 5. Thereafter, an n type layer 8 is formed on the sidewall of the groove 5, thermally oxidized to form a capacitor insulating film 9, while a capacitor electrode 10 is buried.
    • 6. 发明专利
    • SEMICONDUCTOR DEVICE
    • JPS62158359A
    • 1987-07-14
    • JP39686
    • 1986-01-06
    • TOSHIBA CORP
    • NUMATA KENJIYOKOYAMA SADAYUKIOGURA ISAO
    • H01L21/822H01L27/04H01L27/10H01L27/108
    • PURPOSE:To connect a drive circuit and a plurality of arrays, center lines thereof are displaced, without forming a wasteful region to the longer side length of a chip and using an oblique wiring by askew shaping one part of drive-circuit pattern block itself. CONSTITUTION:Decoders 121 and word-line drive circuits 122 for driving word lines in memory cells are shaped at the central section of a rectangular chip 11. Memory cell arrays 131 and 132 are each arranged at every two row along the shorter sides of the chip 11 in two regions divided by decoders 121, 122, and disposed under the state in which center lines along the longer sides of the chip 11 are displaced mutually. The displaced memory cell arrays 131, 132 are connected to the decoders 121 through the word-line drive circuits 122 by aslant forming the decoders 121. The central axes of the memory cell arrays 131, 132 and the central axes of patterns for the word-line drive circuits 122 are made parallel so that pattern sections being in contact with the memory cell arrays 131, 132 are not shaped askew positively at that time.
    • 7. 发明专利
    • Counter circuit
    • 计数器电路
    • JPS6154714A
    • 1986-03-19
    • JP17626284
    • 1984-08-24
    • Toshiba Corp
    • NUMATA KENJI
    • H03K23/52H03K23/00
    • PURPOSE: To decrease deviation in the operation timing of a counter circuit composed of count-up circuits connected in plural series stages and to increase the operation margin, and reduce the power consumption by inserting a buffer circuit which charges and discharge a load capacitor into the output stage of each count-up circuit.
      CONSTITUTION: Count-up data is set up with the 1st clock ϕ
      2 and stored temporarily. Count-up data Va and Vb, and Qn and Qn are outputted with the 2nd clock ϕ
      2 . Loads at points (a) and (b) are gate capacities of TRs 21,..., 26, and load capacities at the points (a) and (b) are much smaller than the load capacities of the Qn and Qn, so the loads are easily standardized. Therefore, the dimensions of a circuit 50 which counts up are easily reduced and standardized. Then, data at the points (a) and (b) are set up sufficiently while the clocks ϕ
      1 and ϕ
      2 are on with small current comsumption. Complementary data at the points (a) and (b) regard a ratioless type inveter, so there is no incontinent current and only the charging and discharging currents of the load capacitors are consumed.
      COPYRIGHT: (C)1986,JPO&Japio
    • 目的:减少由多个串联级连接的反馈电路构成的计数器电路的运算时间偏差,增加运算余量,通过插入对负载电容进行充放电的缓冲电路来降低功耗 每个递增电路的输出级。 构成:使用第一个时钟phi2设置计数数据并暂时存储。 计数数据Va和Vb以及Qn和Qn以第二时钟phi2输出。 (a)和(b)点的载荷是TRs 21,...,26的栅极容量,而点(a)和(b)的负载能力远小于Qn和Qn的负载能力,所以 负载容易标准化。 因此,计数的电路50的尺寸容易降低和标准化。 然后,在时钟phi1和phi2接通时,在点(a)和(b)处的数据被充分地建立,具有小的电流消耗。 点(a)和(b)中的互补数据考虑到无性式的不动产,因此不存在失禁电流,仅消耗负载电容器的充电和放电电流。
    • 8. 发明专利
    • WORD LINE DRIVING CIRCUIT FOR DYNAMIC RAM
    • JPH0358379A
    • 1991-03-13
    • JP19284789
    • 1989-07-26
    • TOSHIBA CORP
    • NUMATA KENJIFUJII HIDETAKE
    • G11C11/407
    • PURPOSE:To obtain a sufficient read/write margin and to secure reliability for a gate insulation film by dividing a capacitor for boost in a word line driving circuit into plural pieces, and limiting the potential of a word line at a prescribed value by driving them selectively. CONSTITUTION:When a row address strobe RAS goes to an L level and the word line driving circuit issues output, the capacitor 5 (51-53) for boost is charged while the output of a capacitor driving circuit 7 for boost is being set at the L level. When the output of the circuit 7 changes to an H level after the lapse of constant time, the capacitor 5 is driven sequentially, and an output node 10 is boosted. When a word line potential detection circuit 9 detects the fact that the potential of the node 10 arrives at a limitation potential set in advance, the output of the circuit 7 is stopped. Therefore, sufficient read/write can be performed in an area where source potential is low by obtaining a high boosting ratio, and the reliability for the gate insulation film can be secured in an area where the source potential is high.
    • 9. 发明专利
    • SEMICONDUCTOR STORAGE DEVICE
    • JPS63224250A
    • 1988-09-19
    • JP5535687
    • 1987-03-12
    • TOSHIBA CORP
    • NUMATA KENJI
    • G11C11/401H01L21/8242H01L27/10H01L27/108
    • PURPOSE:To provide a semiconductor storage device having high degree of integration and a decreased change-over region while employing folded arrangement for bit lines, by providing a word line on a gate electrode such that the word line jumps over a desired number of cell array block boundaries and is contacted with the gate electrodes at the block boundaries. CONSTITUTION:A pair of memory cells are provided in each semiconductor island region 1 and cell array blocks 2 are formed by partitioning in the 'low' direction. The cell array blocks 2 are arranged with deviation by one cell pitch and gate electrodes 6 of the memory cells are extended so as to be common to the blocks. A pair of bit lines BL of a sense amplifier S/A are arranged between the deviated cell array blocks 2. A word line 7 is provided on each gate electrode 6 by low-resistance wiring such that the word line 7 jumps over a desired number of block boundaries and is contacted with the gate electrodes 6 at the block boundaries. According to such constitution, there is no need of increasing the contact region and the cell array block 2 is allowed to have a relatively small width in the 'low' direction. Further, it is made possible to solve problems such as increase of a change-over region 3 and unbalanced capacitances of the bit lines BL.