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1. 发明申请

US20060093961A1 Method of verifying electron beam data 审中-公开
标题翻译：验证电子束数据的方法
公开(公告)号：US20060093961A1
公开(公告)日：2006-05-04
申请号：US11262710
申请日：2005-11-01
申请人： Sung-Hoon Jang , Byoung-Sup Ahn , Young-Hwa No
发明人： Sung-Hoon Jang , Byoung-Sup Ahn , Young-Hwa No
IPC分类号： G03C5/00
CPC分类号： H01J37/3026 , G03F1/68 , H01J2237/31762
摘要： A method of verifying electron beam data used to produce a photomask comprises dividing design data for the photomask into a plurality of repetitive regions, sequentially converting the sequential regions into electron beam data, and determining whether electron beam data corresponding to a current repetitive region is substantially identical to electron beam data corresponding to a previous repetitive region.
摘要翻译：验证用于产生光掩模的电子束数据的方法包括将用于光掩模的设计数据分成多个重复区域，将顺序区域顺序地转换成电子束数据，以及确定对应于当前重复区域的电子束数据是否基本上与对应于之前的重复区域的电子束数据相同。

2. 发明授权

US5674941A Antifogging abrasion resistant coating composition and synthetic resin article coated therewith 失效
标题翻译：防雾耐磨涂料组合物及其涂覆的合成树脂制品
公开(公告)号：US5674941A
公开(公告)日：1997-10-07
申请号：US335002
申请日：1994-04-15
申请人： Yong-Il Cho , Sung-Hoon Jang , Jung-Ok Park
发明人： Yong-Il Cho , Sung-Hoon Jang , Jung-Ok Park
IPC分类号： C08J7/04 , C08F265/04 , C09D4/00 , C09D4/02 , C09D4/06 , C09D5/00 , C09D133/00 , C09D133/04 , C09D163/00 , C09D183/04 , C09D183/06 , C09D183/08 , C09K3/18 , C09D143/04
CPC分类号： C09D4/06 , C08F265/04 , C09D4/00 , Y10T428/31507 , Y10T428/31511 , Y10T428/31663 , Y10T428/31667
摘要： A coating composition having excellent antifogging property, good abrasion resistance, improved adhesion to the substrate and good water resistance, which comprises an epoxy functional organosilane or the hydrolysate or condensate thereof; an amino functional organosilane or the hydrolysate or condensate thereof; a hydrophilic (meth)acrylate monomer, or a copolymer of two components selected from the hydrophilic (meth)acrylate monomer, another hydrophilic monomer and an organosilane and/or a terpolymer of the three components; a curing catalyst; and, optionally, a multi-functional (meth)acrylate monomer having at least two (meth)acryl groups and a radical polymerization initiator.
摘要翻译：包含环氧官能的有机硅烷或其水解产物或缩合物的涂料组合物具有优异的防雾性，良好的耐磨性，改善的与基材的粘合性和良好的耐水性。氨基官能的有机硅烷或其水解产物或缩合物; 亲水性（甲基）丙烯酸酯单体或选自亲水性（甲基）丙烯酸酯单体，其他亲水性单体和有机硅烷和/或三种成分的三元共聚物的两种成分的共聚物; 固化催化剂; 和任选的具有至少两个（甲基）丙烯酰基的多官能（甲基）丙烯酸酯单体和自由基聚合引发剂。

3. 发明授权

US07806979B2 Coating composition for protecting dazzling effect 有权
标题翻译：用于保护耀眼效果的涂料组合物
公开(公告)号：US07806979B2
公开(公告)日：2010-10-05
申请号：US10504609
申请日：2003-01-29
申请人： Yeong-Rae Chang , Yea-Mo Koo , Sung-Hoon Jang
发明人： Yeong-Rae Chang , Yea-Mo Koo , Sung-Hoon Jang
IPC分类号： C08K5/00 , C08K5/24 , B60C1/00 , B05D3/02
CPC分类号： C09D133/08 , C08L63/00 , C08L67/00 , C08L75/04 , C08L2666/14
摘要： The present invention relates to an antiglare coating composition, and more particularly to an antiglare coating composition comprising an acrylate binder resin, fine particles whose refractive index varies between 0.2 to 0.5 from the refractive index of the binder resin and whose average particle size ranges from 0.05 to 1 μm, and fine particles whose refractive index varies between 0.1 and whose average particle size ranges from 0.5 to 3 μm. A coating composition of the present invention has a superior antiglare effect, reduced image distortion, high contrast, and enhanced image clarity when applied to a high-resolution display by scattering and inducing internal diffusion of light.
摘要翻译：本发明涉及防眩光涂料组合物，更具体地说，涉及一种防眩光涂料组合物，其包含丙烯酸酯粘合剂树脂，其折射率从粘合剂树脂的折射率变化在0.2至0.5之间，其平均粒度为0.05 和1μm以下的平均粒径为0.5〜3μm的微粒，其折射率在0.1之间变化。当通过散射和诱导光的内部扩散应用于高分辨率显示器时，本发明的涂料组合物具有优异的防眩光效果，降低的图像失真，高对比度和增强的图像清晰度。

4. 发明授权

US07560198B2 Photo-mask having exposure blocking region and methods of designing and fabricating the same 有权
标题翻译：具有曝光阻挡区域的光掩模及其设计和制造方法
公开(公告)号：US07560198B2
公开(公告)日：2009-07-14
申请号：US11145985
申请日：2005-06-07
申请人： Il-Yong Jang , Seong-Woon Choi , Seong-Yong Moon , Jeong-Yun Lee , Sung-Hoon Jang
发明人： Il-Yong Jang , Seong-Woon Choi , Seong-Yong Moon , Jeong-Yun Lee , Sung-Hoon Jang
IPC分类号： G03F1/00
CPC分类号： G03F1/36
摘要： A photo-mask has a main mask pattern in a main region, a density correcting pattern in a peripheral region, and an exposure blocking pattern interposed between the main mask pattern and density correcting pattern. The exposure blocking pattern is configured to prevent the density correcting pattern from being transcribed to a wafer. The photo-mask is made by providing mask substrate on which a mask layer and a photoresist layer are disposed, providing design data that specifies at least the main mask pattern, and using the design data to derive exposure data that controls the exposure of the photoresist layer. The exposure data includes information that specifies the exposure blocking pattern, the portion of the peripheral region to be occupied by the density correcting pattern, and the pattern density of that portion of the peripheral region to be occupied by the density correcting pattern.
摘要翻译：光掩模在主区域中具有主掩模图案，在周边区域中具有浓度校正图案，以及插入在主掩模图案和密度校正图案之间的曝光阻挡图案。曝光阻挡图案被配置为防止将密度校正图案转录到晶片。光掩模是通过提供其上设置有掩模层和光致抗蚀剂层的掩模基板制成的，提供至少指定主掩模图案的设计数据，并且使用该设计数据来导出控制光致抗蚀剂曝光的曝光数据层。曝光数据包括指定曝光阻挡图案的信息，由密度校正图案占据的外围区域的部分以及由密度校正图案占据的外围区域的那部分的图案密度。

5. 发明申请

US20060051684A1 Photo-mask having exposure blocking region and methods of designing and fabricating the same 有权
公开(公告)号：US20060051684A1
公开(公告)日：2006-03-09
申请号：US11145985
申请日：2005-06-07
申请人： Il-Yong Jang , Seong-Woon Choi , Seong-Yong Moon , Jeong-Yun Lee , Sung-Hoon Jang
发明人： Il-Yong Jang , Seong-Woon Choi , Seong-Yong Moon , Jeong-Yun Lee , Sung-Hoon Jang
IPC分类号： G06F17/50 , G03C5/00 , G03F1/00
CPC分类号： G03F1/36
摘要： A photo-mask has a main mask pattern in a main region, a density correcting pattern in a peripheral region, and an exposure blocking pattern interposed between the main mask pattern and density correcting pattern. The exposure blocking pattern is configured to prevent the density correcting pattern from being transcribed to a wafer. The photo-mask is made by providing mask substrate on which a mask layer and a photoresist layer are disposed, providing design data that specifies at least the main mask pattern, and using the design data to derive exposure data that controls the exposure of the photoresist layer. The exposure data includes information that specifies the exposure blocking pattern, the portion of the peripheral region to be occupied by the density correcting pattern, and the pattern density of that portion of the peripheral region to be occupied by the density correcting pattern.

6. 发明申请

US20050239933A1 Anti-reflective coating composition and coating film with excellent stain resistance 有权
标题翻译：防反射涂料组合物和涂膜具有优异的耐污性
公开(公告)号：US20050239933A1
公开(公告)日：2005-10-27
申请号：US11104659
申请日：2005-04-13
申请人： Young-Eun Lee , Mi-Young Han , Yeong-Rae Chang , Jeong-Jin Hong , Sung-Hoon Jang
发明人： Young-Eun Lee , Mi-Young Han , Yeong-Rae Chang , Jeong-Jin Hong , Sung-Hoon Jang
IPC分类号： G02B1/11 , B32B7/02 , B32B27/18 , C03C17/30 , C08K5/24 , C09D5/00 , C09D125/18 , C09D165/00 , C09D183/04 , C09D183/08 , G02B1/111 , G02B1/16
CPC分类号： C09D183/08 , C08G77/24 , C08K5/54 , C08L83/00 , C08L83/08 , C09D165/00 , G02B1/11 , G02B2207/109
摘要： The present invention relates to a coating composition for forming an anti-reflective coating layer for a display device, comprising a fluorinated silane with low surface tension, a conductive polymer with antistatic properties, water, and a solvent. Thus, the coating film of the present invention prepared by coating the composition has high anti-reflection, excellent stain resistance to liquid-phase stains such as fingerprints and the solid-phase stains such as dust by controlling the refractive index, surface energy, and conductivity, and thus can be usefully applied to the outermost side of a display device, regardless of the type of substrates such as a Braun tube or a flat display film and the presence of other coating layers such as a hard coating layer and an anti-glare coating layer.
摘要翻译：本发明涉及一种用于形成用于显示装置的抗反射涂层的涂料组合物，其包含具有低表面张力的氟化硅烷，具有抗静电性能的导电聚合物，水和溶剂。因此，通过涂布组合物制备的本发明的涂膜通过控制折射率，表面能，以及表面能等而具有高的抗反射性，对指纹等的液相污渍以及灰尘等固相染料的耐污染性导电性，并且因此可以有效地应用于显示装置的最外侧，而不管诸如布朗管或平面显示膜的基板的类型，以及其它涂层如硬涂层和抗反射层的存在，眩光涂层。

7. 发明授权

US07204877B2 Anti-reflective coating composition and coating film with excellent stain resistance 有权
标题翻译：防反射涂料组合物和涂膜具有优异的耐污性
公开(公告)号：US07204877B2
公开(公告)日：2007-04-17
申请号：US11104659
申请日：2005-04-13
申请人： Young-Eun Lee , Mi-Young Han , Yeong-Rae Chang , Jeong-Jin Hong , Sung-Hoon Jang
发明人： Young-Eun Lee , Mi-Young Han , Yeong-Rae Chang , Jeong-Jin Hong , Sung-Hoon Jang
IPC分类号： C09D5/32 , C09D5/24
CPC分类号： C09D183/08 , C08G77/24 , C08K5/54 , C08L83/00 , C08L83/08 , C09D165/00 , G02B1/11 , G02B2207/109
摘要： The present invention relates to a coating composition for forming an anti-reflective coating layer for a display device, comprising a fluorinated silane with low surface tension, a conductive polymer with antistatic properties, water, and a solvent. Thus, the coating film of the present invention prepared by coating the composition has high anti-reflection, excellent stain resistance to liquid-phase stains such as fingerprints and the solid-phase stains such as dust by controlling the refractive index, surface energy, and conductivity, and thus can be usefully applied to the outermost side of a display device, regardless of the type of substrates such as a Braun tube or a flat display film and the presence of other coating layers such as a hard coating layer and an anti-glare coating layer.
摘要翻译：本发明涉及一种用于形成用于显示装置的抗反射涂层的涂料组合物，其包含具有低表面张力的氟化硅烷，具有抗静电性能的导电聚合物，水和溶剂。因此，通过涂布组合物制备的本发明的涂膜通过控制折射率，表面能，以及表面能等而具有高的抗反射性，对指纹等的液相污渍以及灰尘等固相染料的耐污染性导电性，并且因此可以有效地应用于显示装置的最外侧，而不管诸如布朗管或平面显示膜的基板的类型，以及其它涂层如硬涂层和抗反射层的存在，眩光涂层。

8. 发明申请

US20060047035A1 Coating composition for protecting dazzling effect 有权
标题翻译：用于保护耀眼效果的涂料组合物
公开(公告)号：US20060047035A1
公开(公告)日：2006-03-02
申请号：US10504609
申请日：2003-01-29
申请人： Yeong-Rae Chang , Yea-Mo Koo , Sung-Hoon Jang
发明人： Yeong-Rae Chang , Yea-Mo Koo , Sung-Hoon Jang
IPC分类号： B60C1/00
CPC分类号： C09D133/08 , C08L63/00 , C08L67/00 , C08L75/04 , C08L2666/14
摘要： The present invention relates to an antiglare coating composition, and more particularly to an antiglare coating composition comprising an acrylate binder resin, fine particles whose refractive index varies between 0.2 to 0.5 from the refractive index of the binder resin and whose average particle size ranges from 0.05 to 1 μm, and fine particles whose refractive index varies between 0.1 and whose average particle size ranges from 0.5 to 3 μm. A coating composition of the present invention has a superior antiglare effect, reduced image distortion, high contrast, and enhanced image clarity when applied to a high-resolution display by scattering and inducing internal diffusion of light.
摘要翻译：本发明涉及防眩光涂料组合物，更具体地说，涉及一种防眩光涂料组合物，其包含丙烯酸酯粘合剂树脂，其折射率从粘合剂树脂的折射率变化在0.2至0.5之间，其平均粒度为0.05 1μm的微粒，折射率在0.1之间的平均粒径为0.5〜3μm的微粒。当通过散射和诱导光的内部扩散应用于高分辨率显示器时，本发明的涂料组合物具有优异的防眩光效果，降低的图像失真，高对比度和增强的图像清晰度。

9. 发明授权

US07001697B2 Photomask having a transparency-adjusting layer, method of manufacturing the photomask, and exposure method using the photomask 有权
标题翻译：具有透明度调节层的光掩模，光掩模的制造方法和使用光掩模的曝光方法
公开(公告)号：US07001697B2
公开(公告)日：2006-02-21
申请号：US10623616
申请日：2003-07-22
申请人： Jong-Rak Park , Seong-Woon Choi , Gi-Sung Yeo , Sung-Hoon Jang
发明人： Jong-Rak Park , Seong-Woon Choi , Gi-Sung Yeo , Sung-Hoon Jang
IPC分类号： G01F9/00
CPC分类号： G02B27/0927 , G02B5/1871 , G02B27/09 , G02B27/0938 , G02B27/46 , G03F1/50 , G03F7/70191
摘要： A photomask for use in photolithography has substrate, a main pattern at one side of the substrate, and a transparency-adjusting layer at the other side of the substrate. The transparency-adjusting layer has a characteristic that allows it to change the intensity of the illumination incident on the main pattern during the exposure process accordingly. In manufacturing the photomask, a first exposure process is carried out on a wafer using just the substrate and main pattern. The critical dimensions of elements of the pattern formed on the wafer as a result of the first exposure process are measured. Differences between these critical dimensions and a reference critical dimension are then used in designing a layout of the transparency-adjusting layer in which the characteristic of the layer is varied to compensate for such differences.
摘要翻译：用于光刻的光掩模具有衬底，衬底一侧的主图案和衬底另一侧的透明度调节层。透明度调整层具有允许其在曝光处理期间改变在主图案上入射的照明强度的特性。在制造光掩模时，仅使用基板和主图案在晶片上进行第一曝光处理。测量作为第一曝光处理的结果在晶片上形成的图案的元件的临界尺寸。然后在设计透明度调整层的布局时，将这些关键尺寸与参考临界尺寸之间的差异用于改变层的特性以补偿这种差异。

10. 发明授权

US5679458A Antifogging abrasion resistant coating composition and synthetic resin article coated therewith 失效
公开(公告)号：US5679458A
公开(公告)日：1997-10-21
申请号：US638270
申请日：1996-04-26
申请人： Yong-Il Cho , Sung-Hoon Jang , Jung-Ok Park
发明人： Yong-Il Cho , Sung-Hoon Jang , Jung-Ok Park
IPC分类号： C08J7/04 , C08F265/04 , C09D4/00 , C09D4/02 , C09D4/06 , C09D5/00 , C09D133/00 , C09D133/04 , C09D163/00 , C09D183/04 , C09D183/06 , C09D183/08 , C09K3/18 , B32B9/04
CPC分类号： C09D4/06 , C08F265/04 , C09D4/00 , Y10T428/31507 , Y10T428/31511 , Y10T428/31663 , Y10T428/31667
摘要： A coating composition having excellent antifogging property, good abrasion resistance, improved adhesion to the substrate and good water resistance, which comprises an epoxy functional organosilane or the hydrolysate or condensate thereof; an amino functional organosilane or the hydrolysate or condensate thereof; a hydrophilic (meth)acrylate monomer, or a copolymer of two components selected from the hydrophilic (meth)acrylate monomer, another hydrophilic monomer and an organosilane and/or a terpolymer of the three components; a curing catalyst; and, optionally, a multi-functional (meth)acrylate monomer having at least two (meth)acryl groups and a radical polymerization initiator.

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