会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Method of fabricating flash memory device
    • 制造闪存设备的方法
    • US08252661B2
    • 2012-08-28
    • US12781777
    • 2010-05-17
    • Sung Kee Park
    • Sung Kee Park
    • H01L21/76
    • H01L27/105G11C16/0408H01L27/11526H01L27/11531
    • A semiconductor device includes a semiconductor substrate having a cell region and a peripheral region. A cell array is defined within the cell region, the cell array having first, second, third, and fourth sides. A first decoder is defined within the peripheral region and provided adjacent to the first side of the cell array. A first isolation structure is formed at a first boundary region provided between the first side of the cell array and the peripheral region. A first active region is formed at a second boundary region that is provided between the second side of the cell array and the peripheral region. The first isolation structure has a first portion that has a first depth and a second portion that has a second depth.
    • 半导体器件包括具有单元区域和周边区域的半导体衬底。 单元阵列定义在单元区域内,单元阵列具有第一,第二,第三和第四面。 第一解码器被限定在外围区域内并且被提供为与单元阵列的第一侧相邻。 在设置在电池阵列的第一侧和周边区域之间的第一边界区域处形成第一隔离结构。 第一有源区形成在设置在电池阵列的第二侧和周边区域之间的第二边界区域。 第一隔离结构具有具有第一深度的第一部分和具有第二深度的第二部分。
    • 3. 发明授权
    • Method for self-localization of robot based on object recognition and environment information around recognized object
    • 基于对象识别和识别对象周围环境信息的机器人自定位方法
    • US08024072B2
    • 2011-09-20
    • US12292715
    • 2008-11-25
    • Sung Kee ParkSoon Yong Park
    • Sung Kee ParkSoon Yong Park
    • G05B15/00
    • B25J19/023B25J5/00G01C21/00G05D1/0251G05D1/0274G06T7/80G06T2207/10021G06T2207/30252
    • A method for self-localization of a robot, the robot including a camera unit, a database storing a map around a robot traveling path, and a position arithmetic unit estimating the position of the robot, includes: acquiring an image around the robot, in the camera unit. Further, the method includes recognizing, in the position arithmetic unit, an individual object in the image acquired by the camera unit, to generate position values on a camera coordinate system of local feature points of the individual objects and local feature points of a surrounding environment including the individual objects; and estimating, in the position arithmetic unit, the position of the robot on the basis of the map and the position values on the camera coordinate system of local feature points of the individual objects and local feature points of a surrounding environment including the individual objects.
    • 一种机器人自身定位的方法,包括相机单元的机器人,存储机器人行进路径周围的地图的数据库以及估计机器人的位置的位置运算单元,包括:在机器人周围获取图像, 相机单元。 此外,该方法包括在位置运算单元中识别由相机单元获取的图像中的单个对象,以在相机坐标系上生成各个对象的局部特征点和周围环境的局部特征点的位置值 包括个别物品; 以及在所述位置运算单元中,基于所述映射来估计所述机器人的位置,以及在包括所述各个对象的周围环境的各个对象和所述局部特征点的所述摄像机坐标系上的位置值。
    • 4. 发明申请
    • Method for self-localization of robot based on object recognition and environment information around recognized object
    • 基于对象识别和识别对象周围环境信息的机器人自定位方法
    • US20090210092A1
    • 2009-08-20
    • US12292715
    • 2008-11-25
    • Sung Kee ParkSoon Yong Park
    • Sung Kee ParkSoon Yong Park
    • B25J9/00B25J19/04
    • B25J19/023B25J5/00G01C21/00G05D1/0251G05D1/0274G06T7/80G06T2207/10021G06T2207/30252
    • A method for self-localization of a robot, the robot including a camera unit, a database storing a map around a robot traveling path, and a position arithmetic unit estimating the position of the robot, includes: acquiring an image around the robot, in the camera unit. Further, the method includes recognizing, in the position arithmetic unit, an individual object in the image acquired by the camera unit, to generate position values on a camera coordinate system of local feature points of the individual objects and local feature points of a surrounding environment including the individual objects; and estimating, in the position arithmetic unit, the position of the robot on the basis of the map and the position values on the camera coordinate system of local feature points of the individual objects and local feature points of a surrounding environment including the individual objects.
    • 一种机器人自身定位的方法,包括相机单元的机器人,存储机器人行进路径周围的地图的数据库以及估计机器人的位置的位置运算单元,包括:在机器人周围获取图像, 相机单元。 此外,该方法包括在位置运算单元中识别由相机单元获取的图像中的单个对象,以在相机坐标系上生成各个对象的局部特征点和周围环境的局部特征点的位置值 包括个别物品; 以及在所述位置运算单元中,基于所述映射来估计所述机器人的位置,以及在包括所述各个对象的周围环境的各个对象和所述局部特征点的所述摄像机坐标系上的位置值。
    • 5. 发明授权
    • Method of forming a gate in a stack gate flash EEPROM cell
    • 在堆叠栅极快速EEPROM单元中形成栅极的方法
    • US06204125B1
    • 2001-03-20
    • US09605632
    • 2000-06-28
    • Keun Woo LeeKi Seog KimJin ShinSung Kee Park
    • Keun Woo LeeKi Seog KimJin ShinSung Kee Park
    • H01L218247
    • H01L27/11521H01L21/28273
    • The present invention relates to a method of forming a gate in a stack gate flash EEPROM cell. In order to preventing a lateral bird's beak from occurring in an ONO dielectric layer during a reoxidation process to be performed after a formation of a cell gate having a stack structure formed by stacking a floating gate, an ONO dielectric layer and a control gate, an oxide layer and a nitride layer are sequentially formed on an entire structure before the reoxidation and after a formation of the cell gate. The oxide layer serves to reduce a stress in depositing the nitride layer, and the nitride layer serves to prevent an occurrence of the lateral bird's beak of the ONO dielectric layer during the reoxidation process. Accordingly, the present invention prevents the lateral bird's beak of the ONO dielectric layer, thereby improving a speed of cell erase operation.
    • 本发明涉及一种在堆叠栅极快闪EEPROM单元中形成栅极的方法。 为了防止在形成具有通过堆叠浮栅,ONO电介质层和控制栅形成的堆叠结构的电池栅极的再氧化工艺期间在ONO电介质层中发生侧面鸟嘴, 氧化层和氮化物层在再氧化之前和电池栅极形成之后的整个结构上依次形成。 氧化物层用于减少沉积氮化物层的应力,并且氮化物层用于在再氧化过程期间防止ONO电介质层的侧面鸟喙的发生。 因此,本发明能够防止ONO电介质层的横向鸟嘴,从而提高电池擦除操作的速度。
    • 7. 发明申请
    • METHOD OF FABRICATING FLASH MEMORY DEVICE
    • 制造闪存存储器件的方法
    • US20100291750A1
    • 2010-11-18
    • US12781777
    • 2010-05-17
    • Sung Kee Park
    • Sung Kee Park
    • H01L21/762
    • H01L27/105G11C16/0408H01L27/11526H01L27/11531
    • A semiconductor device includes a semiconductor substrate having a cell region and a peripheral region. A cell array is defined within the cell region, the cell array having first, second, third, and fourth sides. A first decoder is defined within the peripheral region and provided adjacent to the first side of the cell array. A first isolation structure is formed at a first boundary region provided between the first side of the cell array and the peripheral region. A first active region is formed at a second boundary region that is provided between the second side of the cell array and the peripheral region. The first isolation structure has a first portion that has a first depth and a second portion that has a second depth.
    • 半导体器件包括具有单元区域和周边区域的半导体衬底。 单元阵列定义在单元区域内,单元阵列具有第一,第二,第三和第四面。 第一解码器被限定在外围区域内并且被提供为与单元阵列的第一侧相邻。 在设置在电池阵列的第一侧和周边区域之间的第一边界区域处形成第一隔离结构。 第一有源区形成在设置在电池阵列的第二侧和周边区域之间的第二边界区域。 第一隔离结构具有具有第一深度的第一部分和具有第二深度的第二部分。
    • 8. 发明授权
    • Flash memory cell and method of manufacturing the same and programming/erasing reading method of flash memory cell
    • 闪存单元及其制造方法和闪存单元的编程/擦除读取方法
    • US07705395B2
    • 2010-04-27
    • US12247305
    • 2008-10-08
    • Sung Kee ParkYoung Seon YouYong Wook KimYoo Nam Jeon
    • Sung Kee ParkYoung Seon YouYong Wook KimYoo Nam Jeon
    • H01L29/788
    • H01L27/11521G11C11/5628G11C11/5635G11C11/5642G11C16/0458G11C2211/5612H01L27/115H01L29/7887
    • Disclosed is a flash memory cell and method of manufacturing the same, and programming/erasing/reading method thereof. The flash memory cell comprises a first tunnel oxide film formed at a given region of a semiconductor substrate, a first floating gate formed on the first tunnel oxide film, a second tunnel oxide film formed over the semiconductor substrate and along one sidewall of the first floating gate, a second floating gate isolated from the first floating gate while contacting the second tunnel oxide film, a dielectric film formed on the first floating gate and the second floating gate, a control gate formed on the dielectric film, a first junction region formed in the semiconductor substrate below one side of the second tunnel oxide film, and a second junction region formed in the semiconductor substrate below one side of the first tunnel oxide film. Therefore, the present invention can implement 2-bit cell or 3-bit cell of a high density using the existing process technology. Further, it can reduce the manufacture cost and implement a high-integrated flash memory cell that is advantageous than a conventional flash memory cell in view of charge storage/retention as well as programming time.
    • 公开了一种闪存单元及其制造方法及其编程/擦除/读取方法。 闪速存储单元包括形成在半导体衬底的给定区域的第一隧道氧化物膜,形成在第一隧道氧化物膜上的第一浮栅,形成在半导体衬底上并沿着第一浮置区的一个侧壁的第二隧道氧化膜 栅极,与第一沟槽氧化膜接触时与第一浮栅隔离的第二浮栅;形成在第一浮栅和第二浮栅上的电介质膜,形成在电介质膜上的控制栅, 位于第二隧道氧化膜的一侧以下的半导体衬底,以及形成在第一隧道氧化膜的一侧以下的半导体衬底中的第二结区。 因此,本发明可以使用现有的工艺技术来实现高密度的2比特单元或3比特单元。 此外,鉴于电荷存储/保持以及编程时间,它可以降低制造成本并实现比传统闪存单元有利的高集成闪存单元。