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    • 2. 发明专利
    • Electrode for secondary battery
    • 二次电池电极
    • JP2007128782A
    • 2007-05-24
    • JP2005321387
    • 2005-11-04
    • Sanyo Electric Co LtdSumitomo Electric Ind Ltd三洋電機株式会社住友電気工業株式会社
    • YOSHIDA KENTAROAWATA HIDEAKIOKUNO KAZUKIIHARA HIROHIKOYAGI HIROMASA
    • H01M4/02H01M4/13H01M4/139H01M10/05
    • Y02E60/122
    • PROBLEM TO BE SOLVED: To provide an electrode for a secondary battery capable of suppressing reduction of a battery capacity caused by the fact that an active material layer falls off from a current collector or inside fractures occur because of swelling and contraction accompanied with charge and discharge, and provide the secondary battery provided with this electrode.
      SOLUTION: This is the electrode for the secondary battery in which the active material layer containing the active material to carry out storing and release of metal ions is equipped on the current collector, the active material layer contains oxygen, and in this active material layer, oxygen concentration of the boundary part to the current collector and oxygen concentration inside the active material layer satisfy (oxygen concentration at the boundary part of active material layer)/(oxygen concentration inside active material layer)
    • 要解决的问题:提供一种能够抑制活性物质层从集电体脱落的事实引起的电池容量的降低的二次电池用电极,或者由于伴随着发生膨胀和收缩而发生内部断裂 充电和放电,并提供设置有该电极的二次电池。 解决方案:这是用于二次电池的电极,其中含有活性材料的活性材料层用于进行金属离子的储存和释放的装置设置在集电器上,活性材料层含有氧,并且在该活性物质中 材料层,与集电体的边界部分的氧浓度和活性物质层内的氧浓度满足(活性物质层的边界部位的氧浓度)/(活性物质层内的氧浓度)<3。 通过降低边界部分的氧浓度,金属离子和氧气反应形成氧化物,并且通过该氧化物可以抑制与集电体的粘合强度降低或活性物质层内部被氧化物断裂 作为起点。 活性物质层可以通过气相法形成。 版权所有(C)2007,JPO&INPIT
    • 3. 发明专利
    • Proton conductive material, proton conductive structure, fuel cell and manufacturing method of proton conductive structure
    • 原子导电材料,导体导电结构,燃料电池和制导导体结构的制造方法
    • JP2005197062A
    • 2005-07-21
    • JP2004001459
    • 2004-01-06
    • Sumitomo Electric Ind Ltd住友電気工業株式会社
    • KAMIMURA TAKUIHARA HIROHIKO
    • C01F17/00C23C14/08H01B1/06H01B13/00H01M8/02
    • Y02P70/56
    • PROBLEM TO BE SOLVED: To provide a proton (a hydrogen ion) conductive material having high performance, a proton conductive structure, a fuel cell and the manufacturing method of the proton conductive material. SOLUTION: The proton conductive material is am amorphous structure material having composition comprising at least one kind of a first element selected from the group comprising Mg, Ca, Sr, and Ba, at least one kind of a second element selected from the group comprising Ce, Zr, Ti, and Hf, and oxygen, and in the amorphous structure, a position of a first peak of a diffraction pattern of the material in X-ray diffraction measurement using CuKα rays is present between 25° and 35°, and the half-value width of the peak is 2° or more. The proton conductive material is manufactured by direct growth on a substrate having hydrogen transmission property at low temperature and used for a solid electrolyte for a fuel cell. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供具有高性能的质子(氢离子)导电材料,质子传导结构,燃料电池和质子传导材料的制造方法。 解决方案:质子传导材料是具有包含至少一种选自Mg,Ca,Sr和Ba的第一元素的组成的非晶结构材料,至少一种选自以下的第二元素: 包含Ce,Zr,Ti和Hf的基团和氧,并且在非晶结构中,使用CuKα射线的X射线衍射测量中的材料的衍射图案的第一峰的位置在25°和35°之间 ,峰值的半值宽度为2°以上。 质子传导材料通过在低温下具有氢传递性能的基板上直接生长并用于燃料电池的固体电解质来制造。 版权所有(C)2005,JPO&NCIPI
    • 6. 发明专利
    • Vacuum vapor-deposition apparatus, and method for operating the apparatus
    • 真空蒸发器沉积装置,以及操作装置的方法
    • JP2007023319A
    • 2007-02-01
    • JP2005204935
    • 2005-07-13
    • Sumitomo Electric Ind Ltd住友電気工業株式会社
    • AWATA HIDEAKIIHARA HIROHIKOEMURA KATSUJIYOSHIDA KENTARO
    • C23C14/24C23C14/56
    • PROBLEM TO BE SOLVED: To provide a vacuum vapor-deposition apparatus which prevents a splash material from depositing on a long strip of a substrate even if splash has occurred, and minimizes a part having no vaporizing material deposited on the long strip of the substrate.
      SOLUTION: This vacuum vapor-deposition apparatus comprises: a substrate-conveying unit 3 for continuously conveying the long strip of the substrate; a heating devices 51 and 52 for heating the vaporizing material in a crucible 4; a vaporizing-material-supplying device 7 for supplying the vaporizing material to the crucible 4; an opening and closing shutter 6; a device 81 for detecting an amount of a molten metal; a temperature-detecting device 82; and a control means 9. The opening and closing shutter 6 is movably arranged in between the long strip and the crucible 4, closes a passage between the crucible 4 and the long strip when set at a closing position, and prevents the vaporizing material from depositing on the long strip. The operation method includes the steps of: stopping the travel of the long strip and closing a passage between the long strip and the crucible 4 with the opening and closing shutter 6; and supplying the vaporizing material to the crucible 4. The operation method also includes prohibiting the supply of the vaporizing material to the crucible 4 during a film-forming step.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供一种真空蒸镀装置,其即使发生飞溅也能防止飞溅物沉积在基板的长条上,并且使没有蒸发材料的部分沉积在长条带上最小化 底物。 该真空蒸镀装置包括:基板输送单元3,用于连续输送基板的长条; 用于加热坩埚4中的汽化材料的加热装置51和52; 用于将蒸发材料供应到坩埚4的蒸发材料供给装置7; 打开和关闭挡板6; 用于检测熔融金属量的装置81; 温度检测装置82; 开闭闸门6可移动地布置在长条和坩埚4之间,当设置在关闭位置时,关闭坩埚4和长条之间的通道,并防止蒸发材料沉积 在长条上。 所述操作方法包括以下步骤:通过所述打开和关闭挡板6停止所述长条的移动并关闭所述长条与所述坩埚4之间的通道; 并将蒸发材料供应到坩埚4.操作方法还包括在成膜步骤期间禁止向坩埚4供应汽化材料。 版权所有(C)2007,JPO&INPIT
    • 10. 发明专利
    • Film thickness monitor
    • 电影厚度监视器
    • JPS61138106A
    • 1986-06-25
    • JP26045284
    • 1984-12-10
    • Sumitomo Electric Ind Ltd
    • IHARA HIROHIKOHASHIMOTO YOSHIKAZU
    • G01B7/06G01B15/00G01B15/02H01L21/203H01L21/285H01L21/66
    • PURPOSE: To make possible continuous monitoring by impressing a negative voltage to an electrode plate for monitoring film thickness installed in a vapor deposition device and measuring the ion current flowing in the electrode plate in accordance with the part of the vapor deposition material ionized by an electron gun.
      CONSTITUTION: The vapor deposition material contained in a crucible 3 disposed in a vapor deposition chamber 1 is evaporated by an electron bun 4 and the electrode 5 for monitoring film thickness is installed in the intermediate position between a substrate 2 and a crucible 3 in the chamber 1. A galvanometer 6 is connected to the electrode 5. A negative voltage is kept impressed to the electrode 5 and the vapor deposition material ionized by the electron gun 4 is captured. The ion current is measured by the galvanometer 6 by which the vapor deposition rate and the entire film thickness are monitored.
      COPYRIGHT: (C)1986,JPO&Japio
    • 目的:通过向电极板施加负电压以监测安装在气相沉积装置中的膜厚并测量根据由电子离子化的气相沉积材料的一部分在电极板中流动的离子电流来进行连续监测 枪。 构成:设置在蒸镀室1内的坩埚3中所含的气相沉积材料被电子束4蒸发,将用于监控膜厚度的电极5安装在基板2与坩埚3之间的中间位置 电流计6连接到电极5.负电压保持施加到电极5,并且捕获由电子枪4离子化的气相沉积材料。 离子电流由检流计6测量,通过该检流计6监测气相沉积速率和整个膜厚度。