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    • 4. 发明授权
    • Double-negative positive-working photohardenable elements
    • 双负性正性可光硬化元素
    • US4123272A
    • 1978-10-31
    • US797832
    • 1977-05-17
    • John A. Quinn
    • John A. Quinn
    • H05K3/06G03C1/46G03F7/00G03F7/09G03F7/095H05K3/00G03C1/68
    • G03F7/0955H05K3/0073
    • A positive-working imaging element is described comprising a support coated first with a negative-working, solvent-developable, photohardenable stratum, then over-coated with a second negative-working, solvent-developable, photohardenable stratum; the second stratum serves as a mask for the first stratum since it contains ingredients which strongly absorb radiation actinic to the first stratum. The second stratum is imagewise exposed, solvent developed, and the resulting actinically opaque image used as a negative in exposing the first stratum, which is solvent developed to remove the composition in unexposed, but not in exposed areas. Optionally, a separating layer can be present between the photohardenable strata and a cover layer can be present over the second stratum. Positive-working low relief images suitable for lithographic printing plates, printed circuit resists, and contact-speed lithographic films are obtained from the elements of this invention.
    • 描述了一种正性成像元件,其包括首先用负性溶剂显影的可光硬化层涂覆的载体,然后用第二负性,溶剂可显影的可光硬化层覆盖; 第二层作为第一层的掩模,因为它含有强吸收对第一层的辐射光的成分。 第二层是成像曝光,溶剂显影,并且所得的光化不透明图像在暴露第一层时用作阴性,其是溶剂显影以除去未曝光但不在曝光区域中的组合物。 任选地,可光硬化层之间可以存在分离层,并且覆盖层可以存在于第二层上。 从本发明的元件获得适用于平版印刷版,印刷电路抗蚀剂和接触速度光刻胶膜的正性低浮雕图像。
    • 9. 发明授权
    • Enlargement of photopolymer images in photopolymer mask
    • 在光聚合物掩模中增加光聚合物图像
    • US4518666A
    • 1985-05-21
    • US509702
    • 1983-06-30
    • John A. QuinnJames W. O'Neil
    • John A. QuinnJames W. O'Neil
    • G03C5/00G03F1/56G03F7/26G03F7/40G03F9/00
    • G03F1/56G03F7/40
    • Process of enlarging image areas covered by a stencil or relief image area formed in a photopolymer mask consisting essentially of (a) contacting said image area with a swelling agent and optionally a diluent to effect enlargement, and (b) removing excess swelling agent, i.e., evaporation, air impingement including heating. Additional image enlargement is possible by further contacting the image with a more concentrated swelling agent. The process is particularly useful in enlarging halftone image dots of photopolymer litho masks wherein the halftone image areas consist of hardened upper skins which rest on softer undervolumes having a lesser degree of polymerization or hardening.
    • 扩大由在光聚合物掩模中形成的模板或浮雕图像区域覆盖的图像区域的过程,其基本上由(a)使所述图像区域与溶胀剂和任选的稀释剂接触以实现扩大,和(b)除去过量的溶胀剂,即 ,蒸发,空气冲击,包括加热。 通过进一步使图像与更浓缩的溶胀剂接触可以进一步增加图像。 该方法在扩大光聚合物光刻掩模的半色调图像点中特别有用,其中半色调图像区域由硬化的上皮层组成,其固化在具有较低聚合或硬化程度的较软的下体积上。