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    • 4. 发明授权
    • Method of preparing a magnetic material
    • 磁性材料的制备方法
    • US4723994A
    • 1988-02-09
    • US919931
    • 1986-10-17
    • Stanford R. OvshinskyHellmut FritzscheJulius J. HarwoodAlan M. KadinJohn E. Keem
    • Stanford R. OvshinskyHellmut FritzscheJulius J. HarwoodAlan M. KadinJohn E. Keem
    • B22F9/08B22F9/14H01F1/057H01F1/02
    • H01F1/0574B22F9/08B22F9/14H01F1/0571
    • A method of forming a magnetic material. The magnetic material is a solid mass of grains, and has magnetic parameters characterized by: (1) a maximum magnetic energy product, (BH).sub.max, greater than 15 megagaussoersteds; and (2) a remanence greater than 9 kilogauss. The magnetic material is prepared by a two step solidification, heat treatment process. The solidification process is carried out by: (a) providing a molten precursor alloy; (b) atomizing the molten alloy through nozzle means to form individual droplets of the molten alloy; and (c) quenching the droplets of the molten alloy to form solid particles of the alloy. The solid particles have a morphology characterized as being one or more of (i) amorphous; (ii) microcrystalline; or (iii) polycrystalline. The grains within the solid have, at this stage of the process, an average grain characteristic dimension less than that of the heat treated magnetic material. In the second, or heat treating, stage of the process, the atomized solid particles are heat treated to form a solid material comprised or grains meeting at grain boundaries. The grains and grain boundaries have the morphology of the magnetic material.
    • 一种形成磁性材料的方法。 磁性材料是固体颗粒,具有磁性参数,其特征在于:(1)最大磁能积(BH)max,大于15兆比特; 和(2)大于9千字节的剩磁。 磁性材料通过两步固化,热处理工艺制备。 凝固过程通过以下步骤进行:(a)提供熔融前体合金; (b)通过喷嘴装置使熔融合金雾化以形成熔融合金的单个液滴; 和(c)淬灭熔融合金的液滴以形成合金的固体颗粒。 固体颗粒具有以下特征的形态:(i)无定形的一种或多种; (ii)微晶; 或(iii)多晶。 在该过程的这个阶段,固体颗粒的平均颗粒特征尺寸小于热处理的磁性材料的平均颗粒特征尺寸。 在该方法的第二阶段或热处理阶段,雾化的固体颗粒被热处理以形成在晶界处相遇的固体材料或颗粒。 晶粒和晶界具有磁性材料的形态。
    • 7. 发明授权
    • High performance, small area thin film transistor
    • 高性能,小面积薄膜晶体管
    • US4620208A
    • 1986-10-28
    • US549996
    • 1983-11-08
    • Hellmut FritzscheRobert R. Johnson
    • Hellmut FritzscheRobert R. Johnson
    • H01L29/786H01L29/78
    • H01L29/78642
    • A high performance, small area thin film transistor has a drain region, an insulating layer, and a source region at least portions of the edge of which form a non-coplanar surface with respect to a substrate. The insulative layer is formed in between the source and drain regions. A deposited semiconductor overlies the non-coplanar surface to form a current conduction channel between the drain and source. A gate insulator and gate electrode overly at least a portion of the deposited semiconductor adjacent thereto. The length of the current conduction channel is determined by the thickness of the insulative layer and therefore can be made short without precision photolithography. The non-coplanar surface can be formed by utilizing a dry process to simultaneously etch through several layers in a continuous one-step process. A second dielectric layer may be formed above the three previous layers. This decouples the gate electrode from the source region by creating two capacitances in series, thereby limiting further the capacitance between the gate electrode and the source region.
    • 高性能,小面积薄膜晶体管具有漏极区,绝缘层和源极区,其边缘的至少部分相对于衬底形成非共面。 绝缘层形成在源区和漏区之间。 沉积的半导体覆盖非共面表面以在漏极和源极之间形成电流传导沟道。 栅极绝缘体和栅电极超过与其相邻的沉积半导体的至少一部分。 电流传导通道的长度由绝缘层的厚度确定,因此可以在没有精密光刻的情况下做得很短。 可以通过利用干法在连续的一步法中同时蚀刻几层来形成非共面表面。 可以在三个先前层之上形成第二介电层。 这通过产生串联的两个电容来将栅电极与源极区分开,从而进一步限制栅电极和源极区之间的电容。