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1. 发明授权

US06556290B2 Defect inspection method and apparatus therefor 有权
公开(公告)号：US06556290B2
公开(公告)日：2003-04-29
申请号：US09797597
申请日：2001-03-05
申请人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
发明人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
IPC分类号： G01N2100
CPC分类号： G01N21/956
摘要： A defect inspection apparatus for inspecting a fine circuit pattern with high resolution to detect a defective portion is constructed to have an objective lens for detecting an image of a sample, a laser illumination unit for illuminating the sample through the objective lens, a unit for reducing the coherence of the laser illumination, an accumulation type detector, and a unit for processing the detected image signal.

2. 发明授权

US07251024B2 Defect inspection method and apparatus therefor 有权
标题翻译：缺陷检查方法及其设备
公开(公告)号：US07251024B2
公开(公告)日：2007-07-31
申请号：US10971109
申请日：2004-10-25
申请人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
发明人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
IPC分类号： G11B7/00 , G01J5/02 , G01N21/35
CPC分类号： G01N21/956
摘要： A defect inspection apparatus for inspecting a fine circuit pattern with high resolution to detect a defective portion is constructed to have an objective lens for detecting an image of a sample, a laser illumination unit for illuminating the sample through the objective lens, a unit for reducing the coherence of the laser illumination, an accumulation type detector, and a unit for processing the detected image signal.
摘要翻译：用于检测高分辨率的精细电路图案以检测缺陷部分的缺陷检查装置被构造成具有用于检测样本的图像的物镜，用于通过物镜照射样品的激光照明单元，用于减少激光照明的相干性，累积型检测器和用于处理检测到的图像信号的单元。

3. 发明申请

US20050083519A1 Defect inspection method and apparatus therefor 有权
标题翻译：缺陷检查方法及其设备
公开(公告)号：US20050083519A1
公开(公告)日：2005-04-21
申请号：US10971109
申请日：2004-10-25
申请人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
发明人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
IPC分类号： G01B11/30 , G01N21/956 , G02B21/06 , G06T1/00 , G11B7/00
CPC分类号： G01N21/956
摘要： A defect inspection apparatus for inspecting a fine circuit pattern with high resolution to detect a defective portion is constructed to have an objective lens for detecting an image of a sample, a laser illumination unit for illuminating the sample through the objective lens, a unit for reducing the coherence of the laser illumination, an accumulation type detector, and a unit for processing the detected image signal.
摘要翻译：用于检测高分辨率的精细电路图案以检测缺陷部分的缺陷检查装置被构造成具有用于检测样本的图像的物镜，用于通过物镜照射样品的激光照明单元，用于减少激光照明的相干性，累积型检测器和用于处理检测到的图像信号的单元。

4. 发明授权

US06819416B2 Defect inspection method and apparatus therefor 失效
标题翻译：缺陷检查方法及其设备
公开(公告)号：US06819416B2
公开(公告)日：2004-11-16
申请号：US10295909
申请日：2002-11-18
申请人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
发明人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
IPC分类号： G01N2100
CPC分类号： G01N21/956
摘要： A method of inspecting a pattern formed on a substrate, comprising the steps of emitting an ultraviolet laser beam from a light source, polarizing the ultraviolet laser beam, scanning the polarized ultraviolet laser beam on a pupil of an objective lens, illuminating a sample with the polarized ultraviolet laser beam after the polarized ultraviolet light beam has passed through the objective lens, analyzing light reflected from the sample as a result of the illuminating step after the reflected light has passed through the objective lens, detecting an image of the sample formed by the analyzed light with a time delay integration sensor, outputting signals corresponding to the detected image of the sample from the time delay integration sensor in parallel, and processing the parallel signals outputted from the time delay integration sensor to detect a defect of a pattern on the sample.
摘要翻译：一种检查形成在基板上的图案的方法，包括以下步骤：从光源发射紫外激光束，使紫外激光束偏振，扫描物镜的光瞳上的偏振紫外激光束，照射样品在偏光紫外光束通过物镜之后，偏振紫外激光束作为反射光通过物镜后的照明步骤的结果分析从样品反射的光，检测由所述物镜形成的样品的图像用时间延迟积分传感器对光进行分析，并行地从时间延迟积分传感器输出与检测出的样本图像相对应的信号，对从时间延迟积分传感器输出的并行信号进行处理，检测样本上的图案缺陷。

5. 发明授权

US06621571B1 Method and apparatus for inspecting defects in a patterned specimen 有权
标题翻译：用于检查图案样品中的缺陷的方法和装置
公开(公告)号：US06621571B1
公开(公告)日：2003-09-16
申请号：US09698167
申请日：2000-10-30
申请人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Toshihiko Nakata , Hiroaki Shishido , Minoru Yoshida , Sachio Uto
发明人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Toshihiko Nakata , Hiroaki Shishido , Minoru Yoshida , Sachio Uto
IPC分类号： G01N2188
CPC分类号： G01N21/95607 , G01N21/9501 , G01N2021/95615
摘要： In a method and apparatus for detecting pattern defects, a UV laser is focused on a pupil of an objective lens and scanned; the focused and scanned UV lens illuminates a specimen on which patterns are formed; the specimen illuminated by the UV laser is imaged: and the resulting image of the specimen is compared with a previously stored reference image. The specimen illuminated by UV light is imaged using an anti-blooming time delay integration image sensor or a back-illumination time delay integration image sensor; and the resulting specimen image is compared with a previously stored reference image.
摘要翻译：在用于检测图案缺陷的方法和装置中，UV激光聚焦在物镜的光瞳上并进行扫描; 聚焦和扫描的UV透镜照亮形成图案的样本; 对由UV激光照射的样品进行成像：将样品的所得图像与先前存储的参考图像进行比较。使用抗起霜时间延迟积分图像传感器或反照明时间延迟积分图像传感器对由UV光照射的样本进行成像; 并将所得样品图像与先前存储的参考图像进行比较。

6. 发明授权

US07791725B2 Method and equipment for detecting pattern defect 有权
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US07791725B2
公开(公告)日：2010-09-07
申请号：US12271348
申请日：2008-11-14
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01J4/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An inspection apparatus and method includes a light source which emits an ultraviolet laser beam, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.
摘要翻译：一种检查装置和方法，包括发射紫外线激光的光源，具有偏振光控制器和物镜的照明单元，用于利用从光源发出并通过偏振光控制器和物镜的光照射样本，检测单元，具有用于检测由照明单元照射的样本的光的传感器;处理器，处理从传感器输出的信号以检测样本上的缺陷;以及显示器，显示从处理器输出的信息。处理器处理从传感器输出的信号形成的图像，其中图像以斑点图案被减少。

7. 发明授权

US07456963B2 Method and equipment for detecting pattern defect 失效
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US07456963B2
公开(公告)日：2008-11-25
申请号：US11593091
申请日：2006-11-06
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01J4/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An Inspection apparatus and method includes utilizing an emitter which emits a light beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer, and an objective lens, for illuminating a specimen with a polarization condition controlled and coherency reduced light beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the light beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.
摘要翻译：检查装置和方法包括利用发射光束的发射器，照明光学系统，检测光学系统和处理器。照明光学系统包括偏振控制器，相干减少器和物镜，用于照射具有偏振状态的样本并通过物镜降低光束的相干性。检测光学系统包括成像透镜和用于检测由通过照明光学系统的光束照射的样本的图像的传感器。处理器处理从传感器输出的信号并检测样本上的缺陷。

8. 发明申请

US20110001972A1 Method And Equipment For Detecting Pattern Defect 有权
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US20110001972A1
公开(公告)日：2011-01-06
申请号：US12876709
申请日：2010-09-07
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01J4/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An inspection apparatus and method includes a light source, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.
摘要翻译：一种检查装置和方法，包括光源，具有偏振控制器和物镜的照明单元，用于利用从光源发射并通过偏振控制器和物镜的光照射样本;检测单元，具有用于检测由所述照明单元照射的样本的光;处理器，其处理从所述传感器输出的信号以检测所述样本上的缺陷;以及显示器，其显示从所述处理器输出的信息。处理器处理从传感器输出的信号形成的图像，其中图像以斑点图案被减少。

9. 发明申请

US20050253081A1 Method and equipment for detecting pattern defect 有权
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US20050253081A1
公开(公告)日：2005-11-17
申请号：US11184981
申请日：2005-07-20
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21/00 , G01N21/88 , G01N21/95 , G01N21/956 , G02B5/09 , G02B26/12
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An Inspection apparatus and method includes utilizing a laser source which emits an ultraviolet laser beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer and an objective lens for illuminating a specimen with a polarization condition controlled and coherency reduced ultraviolet laser beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the ultraviolet laser beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.
摘要翻译：一种检查装置和方法，包括利用发射紫外激光束的激光源，照明光学系统，检测光学系统和处理器。照明光学系统包括偏振控制器，相干减少器和用于照射具有偏振状态的样本的物镜，并且通过物镜减少紫外激光束的相干性。检测光学系统包括成像透镜和用于检测通过照明光学系统由紫外线激光束照射的样本的图像的传感器。处理器处理从传感器输出的信号并检测样本上的缺陷。

10. 发明授权

US06800859B1 Method and equipment for detecting pattern defect 失效
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US06800859B1
公开(公告)日：2004-10-05
申请号：US09473296
申请日：1999-12-28
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21956
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： With a view to provide a method and equipment for detecting a minute circuit pattern with a high resolution, pattern defect detecting equipment is provided, comprising: an ultraviolet laser source; coherence reducing means for reducing the coherence of the ultraviolet laser beam emitted from this ultraviolet laser source; projecting means for projecting the ultraviolet laser beam passing through this coherence reducing means on a pupil of an objecting lens; illuminating means for illuminating a detection field of view in the object uniformly by the ultraviolet laser beam projected on the pupil of the objective lens by this projecting means through the objective lens; image detecting means for detecting an image of the object illuminated almost uniformly by the illuminating means; and detecting means for detecting a defect on the object by comparing image data obtained from the image of the object detected by this image detecting means to image data stored beforehand.
摘要翻译：为了提供用于检测具有高分辨率的微小电路图案的方法和设备，提供了图案缺陷检测设备，包括：紫外激光源; 相干减少装置，用于减少从该紫外激光源发出的紫外激光束的相干性; 投影装置，用于将穿过该相干减少装置的紫外激光束投射在物镜的瞳孔上; 照射装置，用于通过该投影装置通过物镜通过投射在物镜的光瞳上的紫外激光束均匀地照射物体中的检测视场; 图像检测装置，用于检测照明装置几乎均匀地照亮的物体的图像; 以及检测装置，用于通过将从该图像检测装置检测的对象的图像获得的图像数据与预先存储的图像数据进行比较来检测对象上的缺陷。

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