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    • 1. 发明授权
    • Semiconductor laser element and method of manufacturing thereof
    • 半导体激光元件及其制造方法
    • US08358674B2
    • 2013-01-22
    • US13051805
    • 2011-03-18
    • Shinya SonobeShingo MasuiTakashi Miyoshi
    • Shinya SonobeShingo MasuiTakashi Miyoshi
    • H01S5/00
    • H01S5/0425B82Y20/00H01S5/2086H01S5/22H01S5/221H01S5/2214H01S5/222H01S5/3202H01S5/3214H01S5/34333H01S2301/176
    • A semiconductor laser element having; a substrate, a semiconductor layer laminated a first conductivity type semiconductor layer, an active layer and a second conductivity type semiconductor layer in that order on the substrate, a stripe-like ridge formed on the upper face of the second conductivity type semiconductor layer, a conductive oxide layer formed on the upper face of the ridge, a dielectric layer, with a refractive index that is lower than the refractive index of the semiconductor layer, formed on the side faces of the ridge, and a metal layer formed so as to cover the conductive oxide layer and the dielectric layer, the surface of the conductive oxide layer is exposed from the dielectric layer, and the side faces of the conductive oxide layer are sloped with respect to the upper face of the ridge, and the inclination angle of the side faces of the conductive oxide layer with respect to the normal direction is greater than the inclination angle of the side faces of the ridge with respect to the normal direction.
    • 一种半导体激光元件,具有: 衬底,在衬底上依次层叠第一导电型半导体层,有源层和第二导电类型半导体层的半导体层,形成在第二导电类型半导体层的上表面上的条状脊, 形成在脊的上表面上的导电氧化物层,形成在脊的侧面上的具有低于半导体层的折射率的折射率的介电层和形成为覆盖的金属层 导电氧化物层和电介质层,导电氧化物层的表面从电介质层露出,导电氧化物层的侧面相对于脊的上表面倾斜,并且倾斜角度 导电氧化物层相对于法线方向的侧面大于脊相对于法线方向的侧面的倾斜角度。
    • 6. 发明授权
    • Nitride semiconductor laser element
    • 氮化物半导体激光元件
    • US07804882B2
    • 2010-09-28
    • US11812007
    • 2007-06-14
    • Shingo MasuiKazutaka Tsukayama
    • Shingo MasuiKazutaka Tsukayama
    • H01S3/08
    • H01S5/34333B82Y20/00H01S5/0213H01S5/0218H01S5/12H01S5/1228H01S5/1231
    • A nitride semiconductor laser element, comprises a substrate and a nitride semiconductor layer in which a first semiconductor layer, an active layer, and a second semiconductor layer are laminated in this order on the substrate, wherein recessed and raised portions are formed in the first semiconductor layer and/or the second semiconductor layer, a semiconductor layer that embeds the recessed and raised portions are formed on the semiconductor layer in which said recessed and raised portions are formed, the semiconductor layer in which the recessed and raised portions are formed is equipped with a side face having a first region extending downward and a second region extending farther downward continuously from the first region, and the second region has a greater slope with respect to the normal direction of the substrate than the first region.
    • 氮化物半导体激光元件包括基板和氮化物半导体层,其中第一半导体层,有源层和第二半导体层依次层叠在基板上,其中在第一半导体中形成凹凸部 层和/或第二半导体层,嵌入凹凸部的半导体层形成在形成有凹部和凸部的半导体层上,形成有凹部和凸部的半导体层配备有 具有向下延伸的第一区域和从所述第一区域连续向下延伸的第二区域的侧面,并且所述第二区域相对于所述基板的法线方向具有比所述第一区域更大的倾斜度。
    • 8. 发明授权
    • Nitride semiconductor laser element
    • 氮化物半导体激光元件
    • US08406264B2
    • 2013-03-26
    • US12902974
    • 2010-10-12
    • Shingo Masui
    • Shingo Masui
    • H01S5/125H01S5/183
    • H01S5/0201B82Y20/00H01S5/0202H01S5/22H01S5/34333H01S2301/173
    • A nitride semiconductor laser element includes a laminate. The laminate includes on a substrate a first conductivity type nitride semiconductor layer, an active layer, and a second conductivity type nitride semiconductor layer, and constitutes a cavity resonator. The laminate includes an element region, an exposed region and an island layer. The element region is a region in which the laser element is formed. The exposed region is a region in which at least the first conductivity type nitride semiconductor layer is exposed on both sides of the element region in the cavity direction, and which is provided continuously in a cavity resonating direction of the laser element. The island layer is separated from the element region by the exposed region, and that is disposed in a corner of the nitride semiconductor laser element.
    • 氮化物半导体激光元件包括层叠体。 层叠体在基板上包括第一导电型氮化物半导体层,有源层和第二导电型氮化物半导体层,并且构成空腔谐振器。 层压体包括元件区域,暴露区域和岛状层。 元件区域是形成激光元件的区域。 曝光区域是至少第一导电型氮化物半导体层在空腔方向上在元件区域的两侧露出的区域,并且在激光元件的空腔谐振方向上连续地设置。 岛层通过暴露区域与元件区域分离,并且设置在氮化物半导体激光元件的角部中。