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    • 3. 发明授权
    • Particle distribution analysis method for computer readable storage medium for storing program for executing the method
    • 用于存储用于执行该方法的程序的计算机可读存储介质的粒子分布分析方法
    • US08768644B2
    • 2014-07-01
    • US13175219
    • 2011-07-01
    • Kunio MiyauchiHiroyuki Nakayama
    • Kunio MiyauchiHiroyuki Nakayama
    • G01N31/00
    • G01N15/0625G01N15/0227G06K9/6212G06K9/6218H01L22/20
    • There is provided a support method for a particle distribution analysis for a substrate. In the support method, histogram data of inter-particle distances are created for all particles on a target substrate subjected to the particle distribution analysis from particle coordinate data of the target substrate. Further, histogram data of inter-particle distances are created for multiple virtual substrates each having the same number of randomly distributed particles as the particles on the target substrate. Based on a difference between the histogram data of the target substrate and the histogram data of each of the virtual substrates, determination data are created by quantifying a distance between the histogram data of the target substrate and the histogram data of the multiple virtual substrates, and the determination data are displayed on a display unit.
    • 提供了用于衬底的粒子分布分析的支持方法。 在支持方法中,通过目标基板的粒子坐标数据,对经过粒子分布分析的目标基板上的所有粒子产生粒子间距离的直方图数据。 此外,针对每个具有与目标衬底上的粒子相同数量的随机分布的粒子的多个虚拟衬底创建颗粒间距离的直方图数据。 基于目标基板的直方图数据和每个虚拟基板的直方图数据之间的差异,通过量化目标基板的直方图数据与多个虚拟基板的直方图数据之间的距离来创建确定数据,以及 确定数据显示在显示单元上。
    • 4. 发明授权
    • Substrate transfer device and substrate transfer method
    • 基板转印装置和基板转印方法
    • US08409328B2
    • 2013-04-02
    • US12726598
    • 2010-03-18
    • Jun YamawakuJunji OikawaHiroyuki Nakayama
    • Jun YamawakuJunji OikawaHiroyuki Nakayama
    • B03C3/016
    • H01L21/67781H01L21/67017
    • A substrate transfer device includes an atmosphere introduction unit and an atmosphere exhaust unit provided at a top and a bottom portion of a main body of the device, respectively; and a substrate transfer mechanism provided between the atmosphere introduction unit and the atmosphere exhaust unit. The substrate transfer device further includes a downward flow forming unit provided, adjacent to the atmosphere introduction unit, to allow an atmosphere to be introduced through the atmosphere introduction unit and to downwardly flow through the substrate transfer mechanism and be exhausted through the atmosphere exhaust unit; and a gas ionizing unit for ionizing the atmosphere and a particle collecting unit for collecting particles included in the atmosphere, the gas ionizing unit and the particle collecting unit being sequentially provided in the direction in which the atmosphere downwardly flows, between the downward flow forming unit and the substrate transfer mechanism.
    • 基板转印装置包括分别设置在装置的主体的顶部和底部的气氛引入单元和气体排出单元; 以及设置在大气引入单元和大气排气单元之间的基板输送机构。 基板转印装置还包括与大气引入单元相邻设置的向下流动形成单元,以允许气氛通过大气引入单元引入并向下流过基板传送机构并通过大气排气单元排出; 和用于使气氛离子化的气体离子化单元和用于收集包含在大气中的颗粒的颗粒收集单元,气体离子化单元和颗粒收集单元沿着大气向下流动的方向依次设置在下流形成单元 和基板转印机构。
    • 8. 发明申请
    • PLASMA PROCESSING APPARATUS AND METHOD
    • 等离子体加工设备和方法
    • US20120285623A1
    • 2012-11-15
    • US13559373
    • 2012-07-26
    • Tsuyoshi MORIYAHiroyuki Nakayama
    • Tsuyoshi MORIYAHiroyuki Nakayama
    • H01L21/3065B05C11/00
    • H01J37/32431H01J2237/022
    • There is provided a plasma processing apparatus including a plasma generating unit for generating a plasma in a processing chamber in which a set processing is performed on a substrate serving as an object to be processed. The plasma processing apparatus further includes a particle moving unit for electrostatically driving particles in a region above the substrate to be removed out of the region above the substrate in the processing chamber while the processing on the substrate is performed by using the plasma. In addition, there is provided a plasma processing method of a plasma processing apparatus including the steps of generating plasma in a processing chamber in which a set processing is performed on a substrate serving as an object to be processed; and performing the processing on the substrate by the plasma.
    • 提供了一种等离子体处理装置,其包括等离子体产生单元,用于在处理室中产生等离子体,其中对作为待处理对象的基板进行设定处理。 等离子体处理装置还包括一个粒子移动单元,用于在通过使用等离子体进行基板上的处理的同时,在处理室中的基板上方的区域中,将基板上方的区域中的颗粒静电驱动。 此外,提供了一种等离子体处理装置的等离子体处理方法,其包括以下步骤:在对作为被处理对象的基板进行设定处理的处理室中产生等离子体; 并通过等离子体对衬底进行处理。
    • 10. 发明授权
    • Silica aerogel coating and its production method
    • 二氧化硅气凝胶涂料及其制备方法
    • US08298622B2
    • 2012-10-30
    • US11407907
    • 2006-04-21
    • Hiroyuki NakayamaKazuhiro YamadaYasuhiro SakaiMaki Yamada
    • Hiroyuki NakayamaKazuhiro YamadaYasuhiro SakaiMaki Yamada
    • C08F2/48
    • B01J19/123C01B33/1585
    • Methods for producing a silica aerogel coating by: producing a wet gel formed by the hydrolysis and polymerization of an alkoxysilane having an ultraviolet-polymerizable unsaturated group; organically modifying the wet gel with an organic-modifying agent to obtain an organically modified silica having a modification ratio of 10-30% based on a total amount of Si—OH in the wet gel; coating a dispersion of the organically modified silica on a substrate to form a layer; and subjecting the layer of the organically modified silica to ultraviolet irradiation and baking, wherein the silica aerogel coating includes the organically modified silica and wherein the silica aerogel coating has a refractive index in the range of 1.05-1.2.
    • 二氧化硅气凝胶涂层的制造方法:制造通过具有紫外线聚合性不饱和基团的烷氧基硅烷的水解和聚合而形成的湿凝胶; 用有机改性剂有机改性湿凝胶,得到基于湿凝胶中Si-OH总量的改性比为10-30%的有机改性二氧化硅; 将有机改性二氧化硅的分散体涂布在基材上以形成层; 并对有机改性二氧化硅层进行紫外线照射和烘烤,其中二氧化硅气凝胶涂层包括有机改性二氧化硅,其中二氧化硅气凝胶涂层的折射率在1.05-1.2范围内。