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1. 发明授权

US07091507B2 Light generator and exposure apparatus 有权
标题翻译：光发生器和曝光装置
公开(公告)号：US07091507B2
公开(公告)日：2006-08-15
申请号：US11060198
申请日：2005-02-17
申请人： Fumitaro Masaki , Akira Miyake
发明人： Fumitaro Masaki , Akira Miyake
IPC分类号： H05H1/00 , H05H1/24 , G21G4/00 , G01J1/00
CPC分类号： H05G2/001 , G03F7/70916 , G03F7/70925
摘要： A light generator for irradiating a laser onto a target, for generating plasma, and for producing light from the plasma, includes a first optical system for introducing the light to the target, a second optical system for introducing the light, and a unit for irradiating the laser onto debris that attaches to at least one of the first and second optical systems by changing an irradiation condition of the laser differently from that used to generate the plasma.
摘要翻译：一种用于将激光照射到靶上用于产生等离子体并用于从等离子体产生光的光发生器包括：用于将光引入靶的第一光学系统，用于引入光的第二光学系统和用于照射的单元通过改变激光的照射条件与用于产生等离子体的照射条件不同，将激光附着到第一和第二光学系统中的至少一个的碎片上。

2. 发明授权

US09063277B2 Mirror, method of manufacturing the same, exposure apparatus, and device manufacturing method 有权
标题翻译：镜子，制造方法，曝光装置和装置制造方法
公开(公告)号：US09063277B2
公开(公告)日：2015-06-23
申请号：US13332582
申请日：2011-12-21
申请人： Fumitaro Masaki , Akira Miyake
发明人： Fumitaro Masaki , Akira Miyake
IPC分类号： B05D5/06 , F21V9/04 , G03B27/32 , G03B27/54 , G02B5/08 , G03F7/20 , G21K1/06 , B82Y10/00
CPC分类号： G02B5/0816 , B82Y10/00 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70958 , G21K1/062 , G21K2201/064 , G21K2201/067
摘要： A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier layer which is arranged between the first layer and the second layer, and prevents a diffusion of a material of the first layer and a material of the second layer, and a third step of bringing a shape of the reflection layer close to a target shape by changing a layer thickness profile of the shape adjusting layer after the second step, the third step including a process of partially annealing the shape adjusting layer.
摘要翻译：一种制造反射镜的方法包括：在基板上布置具有由热变化的层厚度的形状调整层的第一步骤，在形状调整层上布置包括第一层的反射层的第二步骤，第二层和布置在第一层和第二层之间的阻挡层，并且防止第一层的材料和第二层的材料的扩散，以及使反射形状的第三步骤通过在第二步骤之后改变形状调整层的层厚度轮廓，接近目标形状的层，第三步骤包括部分退火形状调节层的过程。

3. 发明授权

US07349524B2 X-ray generator and exposure apparatus 有权
标题翻译： X射线发生器和曝光装置
公开(公告)号：US07349524B2
公开(公告)日：2008-03-25
申请号：US11246485
申请日：2005-10-07
申请人： Fumitaro Masaki , Akira Miyake
发明人： Fumitaro Masaki , Akira Miyake
IPC分类号： G21G4/00
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70175
摘要： An X-ray generator for generating plasma and X-ray emitted from the plasma includes a unit for generating the plasma, and plural reflection optical systems for introducing the X-ray through different optical paths.
摘要翻译：用于产生等离子体的X射线发生器和从等离子体发射的X射线包括用于产生等离子体的单元和用于通过不同光路引入X射线的多个反射光学系统。

4. 发明申请

US20100182583A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20100182583A1
公开(公告)日：2010-07-22
申请号：US12690503
申请日：2010-01-20
申请人： Naoya Iizuka , Fumitaro Masaki , Akira Miyake
发明人： Naoya Iizuka , Fumitaro Masaki , Akira Miyake
IPC分类号： G03B27/72 , G03B27/32
CPC分类号： G03B27/32 , G03B27/72 , G03F7/70575 , G03F7/70891
摘要： An exposure apparatus 1 comprises a collecting mirror 104 configured to collect emitted light from plasma 101, an illumination optical system which includes illumination system mirrors 201 to 204 and is configured to illuminate a reticle 301 light collected by the collecting mirror 104 using the second reflective optical element 201 to 204, and a projection optical system configured to project a pattern of the reticle 301 onto a wafer 308. At a predetermined temperature, a first wavelength where a reflectance of light entering the collecting mirror 104 or the illumination system mirrors 201 to 204 at a predetermined angle is peaked is shorter than a second wavelength where a reflectance of light in the projection optical system is peaked.
摘要翻译：曝光装置1包括被配置为收集来自等离子体101的发射光的收集镜104，照明光学系统，其包括照明系统镜201至204，并且被配置为使用第二反射光学照明收集反射镜104收集的标线片301的光元件201至204，以及投影光学系统，其配置为将标线片301的图案投影到晶片308上。在预定温度下，入射到聚光镜104或照明系统的光的反射率的第一波长201至204 峰值的预定角度比投影光学系统中的光的反射率达到峰值的第二波长短。

5. 发明申请

US20070287076A1 MULTILAYER MIRROR, EVALUATION METHOD, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD 失效
标题翻译：多层反射镜，评价方法，曝光装置，装置制造方法
公开(公告)号：US20070287076A1
公开(公告)日：2007-12-13
申请号：US11760155
申请日：2007-06-08
申请人： Fumitaro Masaki , Akira Miyake
发明人： Fumitaro Masaki , Akira Miyake
IPC分类号： G21K5/00 , G03F1/00
CPC分类号： G03F7/70958 , B82Y10/00 , G21K1/062 , G21K2201/067
摘要： A multilayer mirror used for EUV light includes a substrate, a reflection layer for reflecting the EUV light, a stress compensation layer, formed between the substrate and the reflection layer, for compensating a deformation of the substrate by the reflection layer, wherein the substrate has a first area, in which the stress compensation layer is layered but no reflection layer is layered.
摘要翻译：用于EUV光的多层反射镜包括基板，用于反射EUV光的反射层，形成在基板和反射层之间的应力补偿层，用于补偿反射层对基板的变形，其中基板具有其中应力补偿层被层叠但没有反射层的第一区域被层叠。

6. 发明授权

US06999172B2 Optical apparatus 失效
公开(公告)号：US06999172B2
公开(公告)日：2006-02-14
申请号：US10280806
申请日：2002-10-25
申请人： Fumitaro Masaki , Akira Miyake
发明人： Fumitaro Masaki , Akira Miyake
IPC分类号： G01J4/00 , G02F1/07 , G02B5/30
CPC分类号： G03F7/70566 , G01N21/21 , G01N23/20
摘要： An optical apparatus that measures a polarization dependent characteristic of a measured object includes a light source for emitting non-linearly polarized light in an extreme ultraviolet region or an X-ray region, and a rotary polarizer for reflecting the light emitted from the light source, the polarizer including a set of mirrors repeating three or more reflections and being arranged such that an optical axis of incident light and that of outgoing light are aligned with the same straight line.

7. 发明申请

US20050178979A1 Light generator and exposure apparatus 有权
标题翻译：光发生器和曝光装置
公开(公告)号：US20050178979A1
公开(公告)日：2005-08-18
申请号：US11060198
申请日：2005-02-17
申请人： Fumitaro Masaki , Akira Miyake
发明人： Fumitaro Masaki , Akira Miyake
IPC分类号： G21K5/00 , A61N5/00 , G03F7/20 , G21G4/00 , G21G5/00 , G21K5/02 , G21K5/08 , H01J35/00 , H01L21/027 , H05G2/00 , H05H1/00 , H05H1/24
CPC分类号： H05G2/001 , G03F7/70916 , G03F7/70925
摘要： A light generator for irradiating a laser onto a target, for generating plasma, and for producing light from the plasma, includes a first optical system for introducing the light to the target, a second optical system for introducing the light, and a unit for irradiating the laser onto debris that attaches to at least one of the first and second optical systems by changing an irradiation condition of the laser differently from that used to generate the plasma.
摘要翻译：一种用于将激光照射到靶上用于产生等离子体并用于从等离子体产生光的光发生器包括：用于将光引入靶的第一光学系统，用于引入光的第二光学系统和用于照射的单元通过改变激光的照射条件与用于产生等离子体的照射条件不同，将激光附着到第一和第二光学系统中的至少一个的碎片上。

8. 发明授权

US08760628B2 Filter, exposure apparatus, and method of manufacturing device 有权
标题翻译：过滤器，曝光装置和制造装置的方法
公开(公告)号：US08760628B2
公开(公告)日：2014-06-24
申请号：US13330776
申请日：2011-12-20
申请人： Naoya Iizuka , Fumitaro Masaki , Akira Miyake
发明人： Naoya Iizuka , Fumitaro Masaki , Akira Miyake
IPC分类号： G03B7/26 , G03B27/54
CPC分类号： G02B5/208 , G02B27/14 , G02B2207/123 , G03F7/70191 , G03F7/70575
摘要： A filter reflects first light having a first wavelength, and transmits second light having a second wavelength shorter than the first wavelength. The filter includes a plurality of plate members positioned parallel to each other with gaps therebetween in a first direction. An enveloping surface formed by end surfaces of the plurality of plate members forms a flat surface, which is nonparallel to the first direction. The filter transmits the second light to the second direction.
摘要翻译：滤光器反射具有第一波长的第一光，并且透射具有比第一波长短的第二波长的第二光。过滤器包括多个平板状的板状构件，在第一方向上具有间隙。由多个板构件的端面形成的包络面形成与第一方向不平行的平坦面。过滤器将第二个光发射到第二个方向。

9. 发明授权

US08730449B2 Optical device and device manufacturing method 有权
标题翻译：光学器件和器件制造方法
公开(公告)号：US08730449B2
公开(公告)日：2014-05-20
申请号：US13029386
申请日：2011-02-17
申请人： Naoya Iizuka , Fumitaro Masaki , Akira Miyake
发明人： Naoya Iizuka , Fumitaro Masaki , Akira Miyake
IPC分类号： G03B27/42
CPC分类号： G02B5/1857 , G02B5/1814 , G02B5/1828 , G02B27/4244 , G03B27/72 , G03F7/70575
摘要： An optical device includes a wavelength separation filter configured to separate incident light into light having a first wavelength and light having a second wavelength, the wavelength separation filter including a blazed grating whose cross-sectional shape is a saw-tooth shape formed by one-dimensionally arranging a plurality of grating elements, wherein the blazed grating is configured to exert a first power on the light having the first wavelength, of the light having the first wavelength and the light having the second wavelength, by gradually changing angles surfaces of the plurality of grating elements make with a base plane, and to exert a second power on the light having the second wavelength, of the light having the first wavelength and the light having the second wavelength, by gradually changing lengths of the plurality of grating elements along a direction in which the plurality of grating elements are arranged.
摘要翻译：光学装置包括：波长分离滤光器，其被配置为将入射光分离成具有第一波长的光和具有第二波长的光，所述波长分离滤光器包括闪耀的光栅，其横截面形状是由一维形成的锯齿形状布置多个光栅元件，其中闪光光栅被配置为通过逐渐改变多个光栅元件的角度表面，对具有第一波长的光和具有第二波长的光施加具有第一波长的光的第一光焦度通过逐渐改变多个光栅元件的沿着方向的长度，光栅元件与基底平面形成并且具有具有第一波长的光和具有第二波长的光的具有第二波长的光的第二功率其中布置有多个光栅元件。

10. 发明授权

US07433447B2 X-ray generator and exposure apparatus 有权
公开(公告)号：US07433447B2
公开(公告)日：2008-10-07
申请号：US11876746
申请日：2007-10-22
申请人： Fumitaro Masaki , Akira Miyake
发明人： Fumitaro Masaki , Akira Miyake
IPC分类号： G21G4/00
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70175
摘要： An X-ray generator for generating plasma and X-ray emitted from the plasma includes a unit for generating the plasma, and plural reflection optical systems for introducing the X-ray through different optical paths.

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