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    • 4. 发明授权
    • Fluorocopolymer material with sulfonic acid functional groups as a solid polyelectrolyte for use in fuel cells
    • 具有磺酸官能团的含氟共聚物材料作为用于燃料电池的固体聚电解质
    • US07455934B1
    • 2008-11-25
    • US09700185
    • 1999-05-10
    • Takayuki ArakiNoritoshi OkaYoshito TanakaTakayuki NakamuraTetsuo Shimizu
    • Takayuki ArakiNoritoshi OkaYoshito TanakaTakayuki NakamuraTetsuo Shimizu
    • H01M10/08
    • H01S5/22C08J5/2237C08J2327/12G02B2006/12097G02B2006/12176H01B1/122H01M8/0289H01M8/1025H01M8/1039H01M8/1067H01S5/0655H01S5/20H01S5/2004H01S5/2213H01S5/2218H01S5/2227
    • The invention is a material for a solid polyelectrolyte, comprising a multi-segmented fluoropolymer that comprises a block copolymer and/or a graft copolymer, wherein the copolymer contains one or more blocks essentially consisting of segment A and one or more blocks essentially consisting of segment B, the segment A combines with the segment B, wherein the segment A has a molecular weight of 5,000 to 1,000.000, and the Segment A is a copolymer chain comprising (a) an ethylenicfluoromonomer containing sulfonic acid functional groups each represented by Formula (1) CX2═CX1—(O)n—Rf—SO2Y, wherein X and X1 may be the same or different and are each hydrogen or fluorine; Y is FI, Cl, or OY1 wherein y1 is hydrogen, alkali metal or C1-C5 alkyl; Rf is C1 to C40 divalent fluoroalkylene or C1 to C40 divalent fluoroalkylene having one or more ether bonds; and n is 0 or 1; and (b) at least one type of ethylenic fluoromonomer copolymerizable with the ethylenic fluoromonomer (a) and containing no sulfonic acid functional groups, the segment B is a fluoropolymer containing no sulfonic acid functional groups, has a molecular weight of 3,000 to 1,200,000, and has a crystalline melting point of 100° C. or higher or a glass transition point of 100° C. or higher, wherein the ratio of segment A:segment B in the segmented fluoropolymer is 5:9˜to 98:2 30:70 to 90:10 wt. %.
    • 本发明是用于固体聚电解质的材料,其包含多段含氟聚合物,其包含嵌段共聚物和/或接枝共聚物,其中所述共聚物含有一个或多个基本上由片段A组成的嵌段和一个或多个基本上由片段 B,段A与段B结合,其中段A的分子量为5,000〜1,000.000,段A为共聚物链,其包含(a)含有各自由式(1)表示的磺酸官能团的烯键式氟单体, CX 2 - - - - - - - - - - - - - - - - - - - - - - - - - - - - (O) SUP> 1可以相同或不同,分别为氢或氟; Y是FI,Cl或OY 1,其中y 1是氢,碱金属或C 1 -C 5 烷基; Rf是C 1至C 40二价氟代亚烷基或C 1至C 40二价氟代亚烷基,其具有一个或多个醚 债券 并且n为0或1; 和(b)至少一种可与烯属含氟单体(a)共聚并且不含磺酸官能团的烯属含氟单体,段B是不含磺酸官能团的含氟聚合物,分子量为3,000至1,200,000, 具有100℃以上的结晶熔点或100℃以上的玻璃化转变温度,其中分段含氟聚合物中A段:B段的比例为5:9〜98:2 30:70 至90:10重量 %。
    • 10. 发明授权
    • Fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same
    • 具有酸反应性基团的含氟聚合物和由其制备的化学放大型光致抗蚀剂组合物
    • US06908724B2
    • 2005-06-21
    • US10262893
    • 2002-10-03
    • Takayuki ArakiMeiten KohYoshito TanakaTakuji IshikawaHirokazu AoyamaTetsuo Shimizu
    • Takayuki ArakiMeiten KohYoshito TanakaTakuji IshikawaHirokazu AoyamaTetsuo Shimizu
    • G03F7/004G03F7/038G03F7/039G03F7/075
    • G03F7/039G03F7/0045G03F7/0046G03F7/0382G03F7/0392G03F7/0395G03F7/0397G03F7/0758Y10S430/106Y10S430/108
    • There is provided a novel fluorine-containing polymer having an acid-reactive group which has a high transparency against energy rays (radioactive rays) in a vacuum ultraviolet region (157 nm), and further there are provided a material for fluorine-containing base polymer prepared from the polymer and suitable for a photoresist and a chemically amplifying type resist composition obtained therefrom.The polymer has a number average molecular weight of from 1,000 to 1,000,000 and represented by the formula: —(M1)—(M2)—(A)—, wherein M1 is a structural unit having an acid-labile or acid-degradable functional group, M2 is a structural unit of fluorine-containing acryl ester, A is a structural unit derived from other copolymerizable monomer, the percent by mole ratio M1/M2 is 1 to 99/99 to 1 and the polymer comprises from 1 to 99% by mole of the structural unit M1, from 1 to 99% by mole of the structural unit M2 and from 0 to 98% by mole of the structural unit A1. The material for fluorine-containing base polymer comprises a fluorine-containing polymer having an acid-reactive group such as the above-mentioned polymer and is suitable for a photoresist, and the chemically amplifying type resist composition is obtained from those polymer and material.
    • 提供了一种具有酸反应性基团的新型含氟聚合物,其具有对真空紫外区域(157nm)中的能量射线(放射线)的高透明性,并且还提供了含氟基础聚合物 由聚合物制备并适用于由其获得的光致抗蚀剂和化学放大型抗蚀剂组合物。 聚合物的数均分子量为1,000〜1,000,000,由下式表示: - (M1) - (M2) - (A) - ,其中M1是具有酸不稳定性或酸可降解官能团的结构单元 M2是含氟丙烯酸酯的结构单元,A是来自其它可共聚单体的结构单元,M1 / M2的摩尔比为1〜99/99〜1,聚合物的含量为1〜99% 结构单元M1的摩尔数,结构单元M2的1〜99摩尔%和结构单元A1的0〜98摩尔%。 含氟基础聚合物的材料包括具有酸反应性基团的含氟聚合物如上述聚合物,并且适用于光致抗蚀剂,化学放大型抗蚀剂组合物由那些聚合物和材料获得。