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1. 发明授权

US07602503B2 Methods for measuring a wavefront of an optical system 有权
标题翻译：用于测量光学系统的波前的方法
公开(公告)号：US07602503B2
公开(公告)日：2009-10-13
申请号：US11708618
申请日：2007-02-21
申请人： Sherman K. Poultney
发明人： Sherman K. Poultney
IPC分类号： G01B9/02
CPC分类号： G01J9/0215 , G01J2009/0219 , G02B5/1838 , G03F7/70591 , G03F7/706 , G03F7/7085
摘要： A method for measuring a wavefront of an optical system. A first step of the method includes directing electromagnetic radiation uniformly at an object plane having a first grating positioned therein. Lines of the first grating comprise a plurality of dots. A second step of the method includes projecting an image of the first grating onto a focal plane having a second grating positioned therein. A third step of the method includes measuring the wavefront of the optical system based on a fringe pattern produced by the second grating.
摘要翻译：一种用于测量光学系统的波前的方法。该方法的第一步包括将电磁辐射均匀地引导到具有位于其中的第一光栅的物平面。第一光栅的线包括多个点。该方法的第二步骤包括将第一光栅的图像投影到具有定位在其中的第二光栅的焦平面上。该方法的第三步骤包括基于由第二光栅产生的条纹图案来测量光学系统的波前。

2. 发明授权

US06847461B1 System and method for calibrating a spatial light modulator array using shearing interferometry 有权
标题翻译：使用剪切干涉法校准空间光调制器阵列的系统和方法
公开(公告)号：US06847461B1
公开(公告)日：2005-01-25
申请号：US10765947
申请日：2004-01-29
申请人： Azat M. Latypov , Sherman K. Poultney
发明人： Azat M. Latypov , Sherman K. Poultney
IPC分类号： G01B9/02 , G03F7/20 , G01J1/20
CPC分类号： G03F7/70516 , G03F7/70291
摘要： A system for calibrating a spatial light modulator array includes an illumination system and a spatial light modulator array that reflects or transmits light from the illumination system. A projection optical system images the spatial light modulator array onto an image plane. A shearing interferometer creates an interference pattern in the image plane. A controller controls modulation of elements of the spatial light modulator array. The shearing interferometer includes a diffraction grating, a prism, a folding mirror or any other arrangement for generating shear. The shearing interferometer can be a stretching shearing interferometer, a lateral shearing interferometer, or a rotational shearing interferometer. The shearing interferometer may include a diffraction grating with a pitch corresponding to a shear of the light by an integer number of elements. The projection optics resolves each element of the spatial light modulator array in the image plane. The controller can modulate alternate columns of elements of the spatial light modulator array.
摘要翻译：用于校准空间光调制器阵列的系统包括照明系统和反射或透射来自照明系统的光的空间光调制器阵列。投影光学系统将空间光调制器阵列成像到平面上。剪切干涉仪在图像平面中产生干涉图案。控制器控制空间光调制器阵列的元件的调制。剪切干涉仪包括衍射光栅，棱镜，折叠镜或用于产生剪切的任何其它布置。剪切干涉仪可以是拉伸剪切干涉仪，横向剪切干涉仪或旋转剪切干涉仪。剪切干涉仪可以包括衍射光栅，其具有对应于整个数量的光的剪切的间距。投影光学器件可以分辨图像平面中空间光调制器阵列的每个元素。控制器可以调制空间光调制器阵列的元件的交替列。

3. 发明授权

US5610102A Method for co-registering semiconductor wafers undergoing work in one or more blind process modules 失效
标题翻译：在一个或多个盲目处理模块中共同对准正在进行工作的半导体晶片的方法
公开(公告)号：US5610102A
公开(公告)日：1997-03-11
申请号：US152780
申请日：1993-11-15
申请人： George J. Gardopee , Paul J. Clapis , Joseph P. Prusak , Sherman K. Poultney
发明人： George J. Gardopee , Paul J. Clapis , Joseph P. Prusak , Sherman K. Poultney
IPC分类号： G01R31/26 , G01R31/28 , H01L21/677 , H01L21/68 , H01L21/302
CPC分类号： H01L21/67796 , G06F2203/0382 , Y10S148/162 , Y10S414/136
摘要： A method for co-registering a semiconductor wafer (14) undergoing work in one or more blind process modules (10), (12) requires a means (16), (18) for consistently and repeatably registering the semiconductor wafer (14) to each process module (10), (12). Given this consistent and repeatable singular wafer registration means (16), (18), the location of the coordinate axes of each process module (10), (12) is determined with respect to the position of the semiconductor wafer (14) that is registered therein. The present invention method provides three approaches for determining the location of these axes: (1) an absolute location of the axes, (2) a relative location of the axes using one blind process module (10) to measure the position of a pattern etched into the semiconductor wafer (14) with another blind process module (12), and (3) a relative location of the axes using one blind process module (10) to measure surface or layer thickness characteristics in the semiconductor wafer (14) as modified by wafer processing. Regardless of which approach is followed, the determination of the location of the coordinate axes in each process module (10), (12) is an effective co-registration of the semiconductor wafer (14).
摘要翻译：一种用于共同对准在一个或多个盲工艺模块（10），（12）中进行工作的半导体晶片（14）的方法需要用于将半导体晶片（14）一致地和可重复地对准的装置（16），（18）每个处理模块（10），（12）。给定这种一致且可重复的奇异晶片登记装置（16），（18），每个处理模块（10），（12）的坐标轴的位置相对于半导体晶片（14）的位置来确定，在其中注册。本发明方法提供了用于确定这些轴的位置的三种方法：（1）轴的绝对位置，（2）使用一个盲处理模块（10）的轴的相对位置，以测量蚀刻的图案的位置通过另一个盲目处理模块（12）进入半导体晶片（14），和（3）使用一个盲目处理模块（10）的轴的相对位置，以测量半导体晶片（14）中的表面或层厚度特性通过晶片处理。不管遵循哪种方法，在每个处理模块（10），（12）中确定坐标轴的位置是半导体晶片（14）的有效共同配准。

4. 发明授权

US5563709A Apparatus for measuring, thinning and flattening silicon structures 失效
标题翻译：用于测量，变薄和平坦化硅结构的设备
公开(公告)号：US5563709A
公开(公告)日：1996-10-08
申请号：US304983
申请日：1994-09-13
申请人： Sherman K. Poultney
发明人： Sherman K. Poultney
IPC分类号： G01B11/06 , G01B11/30 , G01J9/00
CPC分类号： G01B11/06 , G01B11/306 , G01J9/00
摘要： A system is provided for processing wafers, such as silicon and silicon-on-insulator wafers. The processing includes thinning and flattening of the wafers at a work station located directly beneath a down looking metrology apparatus for directing light onto the wafer and measuring the light wavefronts reflected from the wafer. The metrology apparatus for flattening includes the feature of a multiple lens array for arranging the reflected wavefronts into a plurality of light spots, and a charge-coupled-device light responsive device for receiving the light spots and determining the shape of the wavefronts. The system also provides a wafer transport system for moving one or more wafers into one or more work stations beneath the metrology apparatus in a vacuum chamber.
摘要翻译：提供了一种用于处理诸如硅和绝缘体上硅晶片之类的晶片的系统。该处理包括在位于下方的测量装置正下方的工作站上使晶片变薄和变平，用于将光引导到晶片上并测量从晶片反射的光波前。用于平坦化的测量装置包括用于将反射波前布置成多个光点的多透镜阵列的特征，以及用于接收光斑并确定波前形状的电荷耦合器件光响应装置。该系统还提供了一个晶片传送系统，用于将一个或多个晶片移动到在真空室内的测量装置下方的一个或多个工作站中。

5. 发明授权

US4433245A Fraunhofer line discriminator 失效
标题翻译：弗劳恩霍夫线鉴别器
公开(公告)号：US4433245A
公开(公告)日：1984-02-21
申请号：US342613
申请日：1982-01-25
申请人： Sherman K. Poultney
发明人： Sherman K. Poultney
IPC分类号： G01C11/02 , G01J3/26 , G01J3/44 , F21V9/16
CPC分类号： G01J3/4406 , G01C11/02 , G01J3/26
摘要： An apparatus for the detection of fluorescence. An airborne optical system carried in an aircraft or spaceship scans a sunlit swath of terrain over a field of view defined by a selected one of the fringe rings of a Fabry-Perot etalon designed to pass a selected Fraunhofer line. A first series of detectors are disposed to sense light intensity over a predetermined arc within said selected ring. A second like series of detectors are disposed to sense light intensity just outside said selected ring. Electronic means are connected to said first and second plurality of detectors for determining the fluorescence reflected from the swath of terrain.
摘要翻译：荧光检测装置。在飞机或宇宙飞船上携带的机载光学系统在被设计成通过所选择的弗劳恩霍夫线路的法布里 - 珀罗标准具的边缘环中选定的一个边界定义的视场上扫描太阳光照的地形。设置第一系列检测器以感测在所述选定环内的预定电弧上的光强度。设置第二类似的一系列检测器以感测恰好在所述选定环外的光强度。电子装置连接到所述第一和第二多个检测器，用于确定从地形条带反射的荧光。

6. 发明授权

US07158238B2 System and method for calibrating a spatial light modulator array using shearing interferometry 有权
标题翻译：使用剪切干涉法校准空间光调制器阵列的系统和方法
公开(公告)号：US07158238B2
公开(公告)日：2007-01-02
申请号：US11150344
申请日：2005-06-13
申请人： Azat M. Latypov , Sherman K. Poultney
发明人： Azat M. Latypov , Sherman K. Poultney
IPC分类号： G01B9/02 , G01J1/20
CPC分类号： G03F7/70591 , G01J9/0215 , G02B26/0833 , G03F7/70291
摘要： A system for calibrating a spatial light modulator array includes an illumination system and a spatial light modulator array that reflects or transmits light from the illumination system. A projection optical system images the spatial light modulator array onto an image plane. A shearing interferometer creates an interference pattern in the image plane. A controller controls modulation of elements of the spatial light modulator array. The shearing interferometer includes a diffraction grating, a prism, a folding mirror or any other arrangement for generating shear. The shearing interferometer can be a stretching shearing interferometer, a lateral shearing interferometer, or a rotational shearing interferometer. The shearing interferometer may include a diffraction grating with a pitch corresponding to a shear of the light by an integer number of elements. The projection optics resolves each element of the spatial light modulator array in the image plane. The controller can modulate alternate columns of elements of the spatial light modulator array.
摘要翻译：用于校准空间光调制器阵列的系统包括照明系统和反射或透射来自照明系统的光的空间光调制器阵列。投影光学系统将空间光调制器阵列成像到平面上。剪切干涉仪在图像平面中产生干涉图案。控制器控制空间光调制器阵列的元件的调制。剪切干涉仪包括衍射光栅，棱镜，折叠镜或用于产生剪切的任何其它布置。剪切干涉仪可以是拉伸剪切干涉仪，横向剪切干涉仪或旋转剪切干涉仪。剪切干涉仪可以包括衍射光栅，其具有对应于整个数量的光的剪切的间距。投影光学器件可以分辨图像平面中空间光调制器阵列的每个元素。控制器可以调制空间光调制器阵列的元件的交替列。

7. 发明授权

US06867846B2 Tailored reflecting diffractor for EUV lithographic system aberration measurement 有权
$Tailored reflecting diffractor for EUV lithographic system aberration measurement$
标题翻译：用于EUV光刻系统像差测量的量身定制的反射衍射器
公开(公告)号：US06867846B2
公开(公告)日：2005-03-15
申请号：US10753557
申请日：2004-01-09
申请人： Sherman K. Poultney
发明人： Sherman K. Poultney
IPC分类号： G01J9/02 , G02B5/18 , G03F7/20 , G03B27/52 , G03B27/42 , G03B27/54
CPC分类号： G03F7/706 , G01J9/0215 , G02B5/1838
摘要： A wavefront measurement system includes a source of electromagnetic radiation. An imaging system directs the electromagnetic radiation at an object plane that it uniformly illuminates. A first grating is positioned in the object plane to condition the radiation entering the input of a projection optic. A projection optical system projects an image of the first grating onto the focal plane. A second grating is positioned at the focal plane that receives a diffracted image of the source to form a shearing interferometer. A CCD detector receives the image of the first grating through the projection optical system and the second grating that forms a fringe pattern if there are aberrations in the projection optical system. Phaseshift readout of fringe pattern can be accomplished by stepping the first grating in a lateral direction and reading each frame with the CCD detector. The first grating includes a plurality of reflecting lines each formed by a plurality of reflecting dots. The first grating has a pitch that is ½ times the magnification of the projection system times the pitch of the second grating for achromatic operation.
摘要翻译：波前测量系统包括电磁辐射源。成像系统将电磁辐射引导到均匀照明的物平面。第一光栅定位在物平面中，以调节进入投影光学器件输入的辐射。投影光学系统将第一光栅的图像投影到焦平面上。第二光栅位于焦平面处，接收源的衍射图像以形成剪切干涉仪。如果在投影光学系统中存在像差，CCD检测器通过投影光学系统和第二光栅接收第一光栅的图像，其形成条纹图案。条纹图案的移相读数可以通过沿横向方向步进第一光栅并用CCD检测器读取每个帧来实现。第一光栅包括多个由多个反射点形成的反射线。第一光栅具有投影系统的倍率的1/2倍的间距乘以第二光栅的间距用于消色差操作。

8. 发明授权

US4729658A Very wide spectral coverage grating spectrometer 失效
标题翻译：非常宽的光谱覆盖光栅光谱仪
公开(公告)号：US4729658A
公开(公告)日：1988-03-08
申请号：US871056
申请日：1986-06-05
申请人： Sherman K. Poultney
发明人： Sherman K. Poultney
IPC分类号： G01J3/18 , G01J3/28 , G01J3/36
CPC分类号： G01J3/18 , G01J2003/1828 , G01J2003/1885 , G01J3/2803
摘要： A very wide spectral coverage grating spectrometer which gathers light from a scene being viewed and collimates that light. A mosaic grating is disposed in collimated space which disperses the collimated light. The dispersed light is focused onto a detector array.
摘要翻译：一种非常宽的光谱覆盖光栅光谱仪，可以从正在观看的场景中收集光并准直光。马赛克光栅设置在准直空间中，分散准直光。分散的光聚焦到检测器阵列上。

9. 发明授权

US07595931B2 Grating for EUV lithographic system aberration measurement 有权
标题翻译：用于EUV光刻系统像差测量的光栅
公开(公告)号：US07595931B2
公开(公告)日：2009-09-29
申请号：US11037178
申请日：2005-01-19
申请人： Sherman K. Poultney
发明人： Sherman K. Poultney
IPC分类号： G06K7/10 , G02B5/18
CPC分类号： G03F7/706 , G01J9/0215 , G02B5/1838
摘要： A grating includes an absorptive substrate and a plurality of reflective lines on the absorptive substrate. Each reflective line is formed by a plurality of reflective areas. The reflective areas can be arranged in a regular pattern. The reflective areas are between 70 nm and 120 nm in diameter. The reflective areas can be circular. The reflective areas can have a random height distribution.
摘要翻译：光栅包括吸收性基板和吸收性基板上的多条反射线。每个反射线由多个反射区域形成。反射区域可以以规则的形式布置。反射区域的直径在70nm和120nm之间。反射区域可以是圆形的。反射区域可以具有随机的高度分布。

10. 发明申请

US20090021748A1 Method and system for wavefront measurements of an optical system 有权
标题翻译：光学系统的波前测量方法和系统
公开(公告)号：US20090021748A1
公开(公告)日：2009-01-22
申请号：US12178524
申请日：2008-07-23
申请人： Azat M. Latypov , Sherman K. Poultney , Yuli Vladimirsky
发明人： Azat M. Latypov , Sherman K. Poultney , Yuli Vladimirsky
IPC分类号： G01B9/02
CPC分类号： G03F7/706 , G01J9/0215
摘要： A wavefront measurement system includes a source of electromagnetic radiation. An illumination system delivers the electromagnetic radiation to an object plane. A source of a diffraction pattern is in the object plane. A projection optical system projects the diffraction pattern onto an image plane, which includes a mechanism (e.g., a shearing grating) to introduce the lateral shear. A detector is located optically conjugate with the pupil of the projection optical system, and receives an instant fringe pattern, resulting from the interference between sheared wavefronts, from the image plane. The diffraction pattern is dynamically scanned across a pupil of the projection optical system, and the resulting time-integrated interferogram obtained from the detector is used to measure the wavefront aberration across the entire pupil.
摘要翻译：波前测量系统包括电磁辐射源。照明系统将电磁辐射传送到物体平面。衍射图案的来源在物体平面中。投影光学系统将衍射图案投影到图像平面上，该图像平面包括用于引入横向剪切的机构（例如，剪切光栅）。检测器与投影光学系统的光瞳光学共轭，并且从图像平面接收由剪切波前的干涉导致的即时条纹图案。衍射图案被动态地扫描投影光学系统的光瞳，并且由检测器获得的所得到的时间积分干涉图用于测量整个瞳孔上的波前像差。

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