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    • 3. 发明申请
    • SEMICONDUCTOR MANUFACTURING APPARATUS
    • 半导体制造设备
    • US20110107968A1
    • 2011-05-12
    • US12674578
    • 2007-09-14
    • Taek Yong JangByung Il LeeYoung Ho LeeSeung Beom Baek
    • Taek Yong JangByung Il LeeYoung Ho LeeSeung Beom Baek
    • C23C16/455C23C16/458C23C16/46
    • H01L21/68792C23C16/45521C23C16/4588C23C16/54C30B25/14C30B29/06H01L21/68721H01L21/68785
    • A semiconductor manufacturing apparatus includes: a reaction chamber for providing an airtight process space; a boat for loading/unloading a pair of semiconductor substrates into/from the reaction chamber, wherein the boat includes susceptors and rotary tables to be rotatably supported by a plurality of supporting rollers, each semiconductor substrate being mounted onto each susceptor and each susceptor being mounted onto each rotary table, respectively; heaters, arranged at backsides of the semiconductor substrates, for performing an epitaxial process in the reaction chamber; a process gas nozzle, installed to encircle an upper fringe of the semiconductor substrates; an exhaust gas nozzle, installed to encircle a lower fringe of the semiconductor substrates; and a purge gas nozzle for supplying a purge gas capable of preventing an outer wall of the process gas nozzle from being deposited, wherein the purge gas nozzle is arranged near to the process gas nozzle.
    • 半导体制造装置包括:用于提供气密处理空间的反应室; 用于将一对半导体基板装载到反应室中的船,其中,所述船包括由多个支撑辊可旋转地支撑的基座和旋转台,每个半导体基板安装在每个基座上,并且每个基座被安装 分别在每个旋转台上; 加热器,布置在半导体衬底的背面,用于在反应室中进行外延工艺; 工艺气体喷嘴,其安装成环绕半导体衬底的上边缘; 排气喷嘴,安装成环绕半导体衬底的下边缘; 以及用于供给能够防止工艺气体喷嘴的外壁的吹扫气体的吹扫气体喷嘴,其中吹扫气体喷嘴设置在工艺气体喷嘴附近。
    • 9. 发明授权
    • Heating system of batch type reaction chamber and method thereof
    • 分批式反应室加热系统及其方法
    • US07525068B2
    • 2009-04-28
    • US11513732
    • 2006-08-31
    • Taek Yong JangByoung Il LeeYoung Ho Lee
    • Taek Yong JangByoung Il LeeYoung Ho Lee
    • F27B5/14F26B19/00
    • F27B17/0025F27B5/04F27D3/0084H01L21/67109H01L21/67115
    • A heating system of a batch type reaction chamber for semiconductor device and a method thereof are disclosed. Each heat unit of heating groups has different height and caloric value at right angles according to the divided areas, thereby it can control an uniform temperature incline of the entire process space of the reaction chamber. Also, the reflecting plates are formed by each heating unit, so that the change of the heating unit can be simple. Furthermore, the divided reflecting blocks are adjacently connected to another reflecting block through the radiant wave shielding slit between them, so that the leakage of the radiant wave can be prevented and the reflecting blocks can be separately attached and deattached to each other. Also, the turning member is formed at the lower portion of the reflecting blocks, so that it can be easily attached and deattached.
    • 公开了一种用于半导体器件的间歇式反应室的加热系统及其方法。 加热组的每个加热单元根据分割区域具有不同的高度和直角热值,从而可以控制反应室整个工艺空间的均匀温度倾斜。 此外,反射板由每个加热单元形成,使得加热单元的变化可以简单。 此外,分割的反射块通过它们之间的辐射波屏蔽狭缝相邻地连接到另一个反射块,从而可以防止辐射波的泄漏,并且可以将反射块分开地附接和脱附。 此外,转动构件形成在反射块的下部,使得其可以容易地附接和脱附。