会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Heating system of batch type reaction chamber and method thereof
    • 分批式反应室加热系统及其方法
    • US07525068B2
    • 2009-04-28
    • US11513732
    • 2006-08-31
    • Taek Yong JangByoung Il LeeYoung Ho Lee
    • Taek Yong JangByoung Il LeeYoung Ho Lee
    • F27B5/14F26B19/00
    • F27B17/0025F27B5/04F27D3/0084H01L21/67109H01L21/67115
    • A heating system of a batch type reaction chamber for semiconductor device and a method thereof are disclosed. Each heat unit of heating groups has different height and caloric value at right angles according to the divided areas, thereby it can control an uniform temperature incline of the entire process space of the reaction chamber. Also, the reflecting plates are formed by each heating unit, so that the change of the heating unit can be simple. Furthermore, the divided reflecting blocks are adjacently connected to another reflecting block through the radiant wave shielding slit between them, so that the leakage of the radiant wave can be prevented and the reflecting blocks can be separately attached and deattached to each other. Also, the turning member is formed at the lower portion of the reflecting blocks, so that it can be easily attached and deattached.
    • 公开了一种用于半导体器件的间歇式反应室的加热系统及其方法。 加热组的每个加热单元根据分割区域具有不同的高度和直角热值,从而可以控制反应室整个工艺空间的均匀温度倾斜。 此外,反射板由每个加热单元形成,使得加热单元的变化可以简单。 此外,分割的反射块通过它们之间的辐射波屏蔽狭缝相邻地连接到另一个反射块,从而可以防止辐射波的泄漏,并且可以将反射块分开地附接和脱附。 此外,转动构件形成在反射块的下部,使得其可以容易地附接和脱附。
    • 2. 发明申请
    • Heating system of batch type reaction chamber and method thereof
    • 分批式反应室加热系统及其方法
    • US20070166656A1
    • 2007-07-19
    • US11513732
    • 2006-08-31
    • Taek Yong JangByoung Il LeeYoung Ho Lee
    • Taek Yong JangByoung Il LeeYoung Ho Lee
    • F27D1/00
    • F27B17/0025F27B5/04F27D3/0084H01L21/67109H01L21/67115
    • A heating system of a batch type reaction chamber for semiconductor device and a method thereof are disclosed. Each heat unit of heating groups has different height and caloric value at right angles according to the divided areas, thereby it can control an uniform temperature incline of the entire process space of the reaction chamber. Also, the reflecting plates are formed by each heating unit, so that the change of the heating unit can be simple. Furthermore, the divided reflecting blocks are adjacently connected to another reflecting block through the radiant wave shielding slit between them, so that the leakage of the radiant wave can be prevented and the reflecting blocks can be separately attached and deattached to each other. Also, the turning member is formed at the lower portion of the reflecting blocks, so that it can be easily attached and deattached.
    • 公开了一种用于半导体器件的间歇式反应室的加热系统及其方法。 加热组的每个加热单元根据分割区域具有不同的高度和直角热值,从而可以控制反应室整个工艺空间的均匀温度倾斜。 此外,反射板由每个加热单元形成,使得加热单元的变化可以简单。 此外,分割的反射块通过它们之间的辐射波屏蔽狭缝相邻地连接到另一个反射块,从而可以防止辐射波的泄漏,并且可以将反射块分开地附接和脱附。 此外,转动构件形成在反射块的下部,使得其可以容易地附接和脱附。
    • 3. 发明申请
    • Semiconductor manufacturing device and method
    • 半导体制造装置及方法
    • US20080026598A1
    • 2008-01-31
    • US11493359
    • 2006-07-26
    • Taek Yong JangByoung Il LeeYoung Ho LeeKwan Sun HurSueng Beom Baek
    • Taek Yong JangByoung Il LeeYoung Ho LeeKwan Sun HurSueng Beom Baek
    • H01L21/00
    • H01L21/67103C23C16/4401C23C16/4588
    • A semiconductor manufacturing device and a method thereof capable of processing semiconductor substrates having a large diameter in a state that the semiconductor substrates keep standing and are opposed to each other are disclosed. The semiconductor manufacturing device includes a reaction chamber for providing an airtight process space; a boat including a pair of susceptors as the processing device mounted to the reaction chamber; a driving device for rotating the susceptors; a heater; a loading device for inserting the heater into an inner space of the susceptors; a supply nozzle and an exhaust nozzle; and a lifting device for inserting the exhaust nozzle into the space between the holders. The semiconductor manufacturing device according to present invention can prevent the transformation of the semiconductor substrate and the contamination owing to the minute dust and maintain the uniform temperature gradient of the semiconductor substrate.
    • 公开了半导体制造装置及其方法,其能够在半导体基板保持站立并彼此相对的状态下处理具有大直径的半导体基板。 半导体制造装置包括用于提供气密处理空间的反应室; 包括一对基座的船,作为安装在反应室上的处理装置; 用于旋转所述基座的驱动装置; 加热器 用于将加热器插入到所述基座的内部空间中的装载装置; 供给喷嘴和排气喷嘴; 以及用于将排气喷嘴插入保持器之间的空间中的提升装置。 根据本发明的半导体制造装置可以防止半导体衬底的转变和由于微小的灰尘引起的污染并且保持半导体衬底的均匀的温度梯度。
    • 4. 发明授权
    • Apparatus and method for forming polycrystalline silicon thin film
    • 多晶硅薄膜形成装置及方法
    • US07439116B2
    • 2008-10-21
    • US11513990
    • 2006-08-31
    • Taek Yong JangByoung Il LeeYoung Ho Lee
    • Taek Yong JangByoung Il LeeYoung Ho Lee
    • H01L21/00
    • C23C16/45525C23C16/18C23C16/24C23C16/45555C23C16/56H01L21/02422H01L21/02532H01L21/02672Y10T117/1016
    • Apparatus and method for forming a polycrystalline silicon thin film by converting an amorphous silicon thin film into the polycrystalline silicon thin film using a metal are provided. The method includes: a metal nucleus adsorbing step of introducing a vapor phase metal compound into a process space where the glass substrate having the amorphous silicon formed thereon is disposed, to adsorb a metal nucleus contained in the metal compound into the amorphous silicon layer; a metal nucleus distribution region-forming step of forming a community region including a plurality of silicon particles every metal nucleus in a plane boundary region occupied by the metal compound by a self-limited mechanism due to the adsorption of the metal nucleus; and an excess gas removing step of purging and removing an excess gas which is not adsorbed in the metal nucleus distribution region-forming step.
    • 提供了通过使用金属将非晶硅薄膜转换成多晶硅薄膜来形成多晶硅薄膜的装置和方法。 该方法包括:将气相金属化合物引入到其中形成有非晶硅的玻璃基板的处理空间中的金属核吸附步骤,以将金属化合物中所含的金属核吸附到非晶硅层中; 金属核分布区域形成步骤,由于金属核的吸附,通过自限制机构在金属化合物占据的平面边界区域中形成每个金属核包含多个硅颗粒的共同体区域; 以及过量除气步骤,其净化并除去未被吸附在金属核分布区域形成步骤中的过量气体。
    • 5. 发明申请
    • SEMICONDUCTOR MANUFACTURING APPARATUS
    • 半导体制造设备
    • US20110107968A1
    • 2011-05-12
    • US12674578
    • 2007-09-14
    • Taek Yong JangByung Il LeeYoung Ho LeeSeung Beom Baek
    • Taek Yong JangByung Il LeeYoung Ho LeeSeung Beom Baek
    • C23C16/455C23C16/458C23C16/46
    • H01L21/68792C23C16/45521C23C16/4588C23C16/54C30B25/14C30B29/06H01L21/68721H01L21/68785
    • A semiconductor manufacturing apparatus includes: a reaction chamber for providing an airtight process space; a boat for loading/unloading a pair of semiconductor substrates into/from the reaction chamber, wherein the boat includes susceptors and rotary tables to be rotatably supported by a plurality of supporting rollers, each semiconductor substrate being mounted onto each susceptor and each susceptor being mounted onto each rotary table, respectively; heaters, arranged at backsides of the semiconductor substrates, for performing an epitaxial process in the reaction chamber; a process gas nozzle, installed to encircle an upper fringe of the semiconductor substrates; an exhaust gas nozzle, installed to encircle a lower fringe of the semiconductor substrates; and a purge gas nozzle for supplying a purge gas capable of preventing an outer wall of the process gas nozzle from being deposited, wherein the purge gas nozzle is arranged near to the process gas nozzle.
    • 半导体制造装置包括:用于提供气密处理空间的反应室; 用于将一对半导体基板装载到反应室中的船,其中,所述船包括由多个支撑辊可旋转地支撑的基座和旋转台,每个半导体基板安装在每个基座上,并且每个基座被安装 分别在每个旋转台上; 加热器,布置在半导体衬底的背面,用于在反应室中进行外延工艺; 工艺气体喷嘴,其安装成环绕半导体衬底的上边缘; 排气喷嘴,安装成环绕半导体衬底的下边缘; 以及用于供给能够防止工艺气体喷嘴的外壁的吹扫气体的吹扫气体喷嘴,其中吹扫气体喷嘴设置在工艺气体喷嘴附近。
    • 10. 发明申请
    • Liquid lens
    • 液体镜片
    • US20070217023A1
    • 2007-09-20
    • US11715371
    • 2007-03-08
    • Sung Chan KimHa Yong JungJin Hyuck YangYoung Ho Lee
    • Sung Chan KimHa Yong JungJin Hyuck YangYoung Ho Lee
    • G02B3/12
    • G02B3/14G02B13/0045G02B13/006G02B13/0075G02B13/009G02B26/005
    • A liquid lens comprises a cylindrical body having a pair of glass lenses which are coupled to upper and lower openings of the body, respectively; an aspheric transmitting partition lens inserted and fixed in the central portion of the body; an auto-focus lens section composed of a first insulating liquid layer and a first electrolyte layer which are filled under the transmitting partition lens so as to form an interface therebetween; an optical zoom lens section composed of a second insulating liquid layer and a second electrolyte layer which are filled above the transmitting partition lens so as to form an interface therebetween; and a minute auto-focus lens section composed of a third insulating liquid layer of which the upper surface comes in contact with the lower surface of the transmitting partition lens and of which the lower surface forms an interface with the first electrolyte layer such that the third insulating liquid layer is not mixed with the first electrolyte layer.
    • 液体透镜包括具有一对玻璃透镜的圆柱体,所述玻璃透镜分别联接到主体的上部和下部开口; 插入并固定在主体的中心部分的非球面透射分隔透镜; 一个由第一绝缘液体层和第一电解质层构成的自动对焦透镜部分,其被填充在发射分隔透镜下面以形成它们之间的界面; 由第二绝缘液体层和第二电解质层组成的光学变焦透镜部分,其被填充在发射分隔透镜的上方以形成它们之间的界面; 以及由上表面与发射分隔透镜的下表面接触并且其下表面与第一电解质层形成界面的第三绝缘液体层组成的分钟自动对焦透镜部分,使得第三绝缘液体层 绝缘液体层不与第一电解质层混合。