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    • 1. 发明授权
    • Method for manufacturing fin transistor that prevents etching loss of a spin-on-glass insulation layer
    • 用于制造防止玻璃化玻璃绝缘层的蚀刻损失的鳍式晶体管的方法
    • US07687355B2
    • 2010-03-30
    • US11965835
    • 2007-12-28
    • Dong Sun SheenSeok Pyo SongYoung Ho Lee
    • Dong Sun SheenSeok Pyo SongYoung Ho Lee
    • H01L21/336
    • H01L29/66795H01L29/7851
    • A method for manufacturing a fin transistor includes forming a trench by etching a semiconductor substrate. A flowable insulation layer is filled in the trench to form a field insulation layer defining an active region. The portion of the flowable insulation layer coming into contact with a gate forming region is etched so as to protrude the gate forming region in the active region. A protective layer over the semiconductor substrate is formed to fill the portion of the etched flowable insulation layer. The portion of the protective layer formed over the active region is removed to expose the active region of the semiconductor substrate. The exposed active region of the semiconductor substrate is cleaned. The protective layer remaining on the portion of the etched flowable insulation layer is removed. Gates are formed over the protruded gate forming regions in the active region.
    • 一种制造鳍式晶体管的方法包括:通过蚀刻半导体衬底形成沟槽。 可流动的绝缘层填充在沟槽中以形成限定有源区的场绝缘层。 与栅极形成区域接触的可流动绝缘层的部分被蚀刻以便在有源区域中突出栅极形成区域。 形成半导体衬底上方的保护层以填充该可蚀刻的可流动绝缘层的部分。 在有源区上形成的保护层的部分被去除以暴露半导体衬底的有源区。 清洁半导体衬底的暴露的有源区。 残留在可蚀刻的可流动绝缘层的部分上的保护层被去除。 在活性区域中的突出的栅极形成区域上形成栅极。
    • 5. 发明授权
    • Heating system of batch type reaction chamber and method thereof
    • 分批式反应室加热系统及其方法
    • US07525068B2
    • 2009-04-28
    • US11513732
    • 2006-08-31
    • Taek Yong JangByoung Il LeeYoung Ho Lee
    • Taek Yong JangByoung Il LeeYoung Ho Lee
    • F27B5/14F26B19/00
    • F27B17/0025F27B5/04F27D3/0084H01L21/67109H01L21/67115
    • A heating system of a batch type reaction chamber for semiconductor device and a method thereof are disclosed. Each heat unit of heating groups has different height and caloric value at right angles according to the divided areas, thereby it can control an uniform temperature incline of the entire process space of the reaction chamber. Also, the reflecting plates are formed by each heating unit, so that the change of the heating unit can be simple. Furthermore, the divided reflecting blocks are adjacently connected to another reflecting block through the radiant wave shielding slit between them, so that the leakage of the radiant wave can be prevented and the reflecting blocks can be separately attached and deattached to each other. Also, the turning member is formed at the lower portion of the reflecting blocks, so that it can be easily attached and deattached.
    • 公开了一种用于半导体器件的间歇式反应室的加热系统及其方法。 加热组的每个加热单元根据分割区域具有不同的高度和直角热值,从而可以控制反应室整个工艺空间的均匀温度倾斜。 此外,反射板由每个加热单元形成,使得加热单元的变化可以简单。 此外,分割的反射块通过它们之间的辐射波屏蔽狭缝相邻地连接到另一个反射块,从而可以防止辐射波的泄漏,并且可以将反射块分开地附接和脱附。 此外,转动构件形成在反射块的下部,使得其可以容易地附接和脱附。
    • 7. 发明申请
    • Liquid lens
    • 液体镜片
    • US20070217023A1
    • 2007-09-20
    • US11715371
    • 2007-03-08
    • Sung Chan KimHa Yong JungJin Hyuck YangYoung Ho Lee
    • Sung Chan KimHa Yong JungJin Hyuck YangYoung Ho Lee
    • G02B3/12
    • G02B3/14G02B13/0045G02B13/006G02B13/0075G02B13/009G02B26/005
    • A liquid lens comprises a cylindrical body having a pair of glass lenses which are coupled to upper and lower openings of the body, respectively; an aspheric transmitting partition lens inserted and fixed in the central portion of the body; an auto-focus lens section composed of a first insulating liquid layer and a first electrolyte layer which are filled under the transmitting partition lens so as to form an interface therebetween; an optical zoom lens section composed of a second insulating liquid layer and a second electrolyte layer which are filled above the transmitting partition lens so as to form an interface therebetween; and a minute auto-focus lens section composed of a third insulating liquid layer of which the upper surface comes in contact with the lower surface of the transmitting partition lens and of which the lower surface forms an interface with the first electrolyte layer such that the third insulating liquid layer is not mixed with the first electrolyte layer.
    • 液体透镜包括具有一对玻璃透镜的圆柱体,所述玻璃透镜分别联接到主体的上部和下部开口; 插入并固定在主体的中心部分的非球面透射分隔透镜; 一个由第一绝缘液体层和第一电解质层构成的自动对焦透镜部分,其被填充在发射分隔透镜下面以形成它们之间的界面; 由第二绝缘液体层和第二电解质层组成的光学变焦透镜部分,其被填充在发射分隔透镜的上方以形成它们之间的界面; 以及由上表面与发射分隔透镜的下表面接触并且其下表面与第一电解质层形成界面的第三绝缘液体层组成的分钟自动对焦透镜部分,使得第三绝缘液体层 绝缘液体层不与第一电解质层混合。
    • 8. 发明申请
    • Heating system of batch type reaction chamber and method thereof
    • 分批式反应室加热系统及其方法
    • US20070166656A1
    • 2007-07-19
    • US11513732
    • 2006-08-31
    • Taek Yong JangByoung Il LeeYoung Ho Lee
    • Taek Yong JangByoung Il LeeYoung Ho Lee
    • F27D1/00
    • F27B17/0025F27B5/04F27D3/0084H01L21/67109H01L21/67115
    • A heating system of a batch type reaction chamber for semiconductor device and a method thereof are disclosed. Each heat unit of heating groups has different height and caloric value at right angles according to the divided areas, thereby it can control an uniform temperature incline of the entire process space of the reaction chamber. Also, the reflecting plates are formed by each heating unit, so that the change of the heating unit can be simple. Furthermore, the divided reflecting blocks are adjacently connected to another reflecting block through the radiant wave shielding slit between them, so that the leakage of the radiant wave can be prevented and the reflecting blocks can be separately attached and deattached to each other. Also, the turning member is formed at the lower portion of the reflecting blocks, so that it can be easily attached and deattached.
    • 公开了一种用于半导体器件的间歇式反应室的加热系统及其方法。 加热组的每个加热单元根据分割区域具有不同的高度和直角热值,从而可以控制反应室整个工艺空间的均匀温度倾斜。 此外,反射板由每个加热单元形成,使得加热单元的变化可以简单。 此外,分割的反射块通过它们之间的辐射波屏蔽狭缝相邻地连接到另一个反射块,从而可以防止辐射波的泄漏,并且可以将反射块分开地附接和脱附。 此外,转动构件形成在反射块的下部,使得其可以容易地附接和脱附。