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1. 发明授权

US5208629A Optical projection exposure method and system using the same 失效
标题翻译：光学投影曝光方法和使用该方法的系统
公开(公告)号：US5208629A
公开(公告)日：1993-05-04
申请号：US863454
申请日：1992-04-03
申请人： Seitaro Matsuo , Yoshinobu Takeuchi , Kazuhiko Komatsu , Emi Tamechika , Katsuhiro Harada , Yoshiaki Mimura , Toshiyuki Horiuchi
发明人： Seitaro Matsuo , Yoshinobu Takeuchi , Kazuhiko Komatsu , Emi Tamechika , Katsuhiro Harada , Yoshiaki Mimura , Toshiyuki Horiuchi
IPC分类号： G03F7/20
CPC分类号： G03F7/705 , G03F7/70091 , G03F7/70125 , G03F7/70241 , G03F7/7025 , G03F7/70308
摘要： According to this invention, illumination light for illuminating a mask on which a micropattern is drawn is inclined at an angle corresponding to a numerical aperture of an optical projection lens located below the mask with respect to an optical axis. The illumination light is obliquely incident on the mask to expose the micropattern on an object located below the optical projection lens.

2. 发明授权

US08421999B2 Projection exposure apparatus and projection exposure method 有权
标题翻译：投影曝光装置和投影曝光方法
公开(公告)号：US08421999B2
公开(公告)日：2013-04-16
申请号：US12523917
申请日：2008-01-17
申请人： Toshiyuki Horiuchi , Hiroshi Kobayashi
发明人： Toshiyuki Horiuchi , Hiroshi Kobayashi
IPC分类号： G03B27/32 , G03B27/44
CPC分类号： G03F7/70191 , G02B3/0056 , G02B3/0087 , G02B26/02 , G02B26/0875 , G03F7/70275 , G03F7/70291 , G03F7/70466 , G03F7/70558
摘要： Exposure areas are wholly overlapped by moving a gradient refractive index lens array in a direction perpendicular to a scanning direction, or by providing a plurality of gradient refractive index lens arrays, an optical filter having a density distribution of lightness and darkness to compensate light transmission nonuniformity of the gradient refractive index lens array is arranged, or an opening control plate for limitedly using only of a uniform portion is provided. Two or more means may be simultaneously provided among the aforementioned mean. Moreover, any one of a microscopic transmission shutter array, a microscopic reflection shutter array, and a microscopic light emitter array is used instead of a mask, or an illuminating device and the mask.
摘要翻译：曝光区域通过在垂直于扫描方向的方向上移动梯度折射率透镜阵列或通过提供多个梯度折射率透镜阵列，具有明暗度密度分布的滤光器来补偿光透射不均匀性而完全重叠设置了梯度折射率透镜阵列，或者仅限于仅使用均匀部分的开启控制板。在上述平均值之间可以同时提供两种或更多种方法。此外，使用微观透射快门阵列，微观反射快门阵列和微观光发射器阵列中的任一种代替掩模，照明装置和掩模。

3. 发明申请

US20100195078A1 PROJECTION EXPOSURE APPARATUS AND PROJECTION EXPOSURE METHOD 有权
标题翻译：投影曝光装置和投影曝光方法
公开(公告)号：US20100195078A1
公开(公告)日：2010-08-05
申请号：US12523917
申请日：2008-01-17
申请人： Toshiyuki Horiuchi , Hiroshi Kobayashi
发明人： Toshiyuki Horiuchi , Hiroshi Kobayashi
IPC分类号： G03B27/72
CPC分类号： G03F7/70191 , G02B3/0056 , G02B3/0087 , G02B26/02 , G02B26/0875 , G03F7/70275 , G03F7/70291 , G03F7/70466 , G03F7/70558
摘要： Exposure areas are wholly overlapped by moving a gradient refractive index lens array in a direction perpendicular to a scanning direction, or by providing a plurality of gradient refractive index lens arrays, an optical filter having a density distribution of lightness and darkness to compensate light transmission nonuniformity of the gradient refractive index lens array is arranged, or an opening control plate for limitedly using only of a uniform portion is provided. Two or more means may be simultaneously provided among the aforementioned mean. Moreover, any one of a microscopic transmission shutter array, a microscopic reflection shutter array, and a microscopic light emitter array is used instead of a mask, or an illuminating device and the mask.
摘要翻译：曝光区域通过在垂直于扫描方向的方向上移动梯度折射率透镜阵列或通过提供多个梯度折射率透镜阵列，具有明暗度密度分布的滤光器来补偿光透射不均匀性而完全重叠设置了梯度折射率透镜阵列，或者仅限于仅使用均匀部分的开启控制板。在上述平均值之间可以同时提供两种或更多种方法。此外，使用微观透射快门阵列，微观反射快门阵列和微观光发射器阵列中的任一种代替掩模，照明装置和掩模。

4. 发明申请

US20090147226A1 Inner Surface Exposure Apparatus and Inner Surface Exposure Method Technical Field 审中-公开
标题翻译：内表面曝光装置及内表面曝光方法技术领域
公开(公告)号：US20090147226A1
公开(公告)日：2009-06-11
申请号：US12087651
申请日：2006-12-25
申请人： Toshiyuki Horiuchi , Katsuyuki Fujita , Takashi Yasuda
发明人： Toshiyuki Horiuchi , Katsuyuki Fujita , Takashi Yasuda
IPC分类号： G03B27/42
CPC分类号： G03F7/24 , G03F7/703
摘要： An apparatus and a method for exposing a photosensitive material deposited on the inner surface of a tube such as a circular or polygonal tube to light to form a predetermined exposed pattern are provided. The apparatus includes: a guide rod that is inserted into the inner space of an exposure object and emits an exposure light beam toward the inner side of the exposure object; and a stage for changing the relative positions of the exposure object and the guide rod and/or the relative angle between the exposure object and the guide rod. After the irradiation spot of the exposure light beam is brought into focus and/or is adjusted to an exposure starting point, the exposure light beam is projected onto a predetermined position on the exposure object to form a predetermined exposed pattern of a photosensitive material deposited on the inner surface of the exposure object.
摘要翻译：提供了一种用于将沉积在诸如圆形或多边形管的管的内表面上的感光材料曝光以形成预定的暴露图案的装置和方法。该装置包括：导杆，其被插入到曝光对象的内部空间中，并且朝向曝光对象的内侧发射曝光光束; 以及用于改变曝光对象和导杆的相对位置和/或曝光对象与导杆之间的相对角度的台。在曝光光束的照射点被聚焦和/或被调整到曝光开始点之后，曝光光束被投射到曝光对象上的预定位置上，以形成沉积在其上的感光材料的预定曝光图案曝光对象的内表面。

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