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1. 再颁专利

USRE37762E1 Scanning exposure apparatus and exposure method 有权
标题翻译：扫描曝光装置和曝光方法
公开(公告)号：USRE37762E1
公开(公告)日：2002-06-25
申请号：US09247857
申请日：1999-02-11
申请人： Seiji Miyazaki , Kei Nara , Masami Seki , Masamitsu Yanagihara , Tomohide Hamada
发明人： Seiji Miyazaki , Kei Nara , Masami Seki , Masamitsu Yanagihara , Tomohide Hamada
IPC分类号： G03B2742
CPC分类号： G03F9/7003 , G03F7/70275 , G03F7/70358 , G03F7/70475 , G03F7/70791
摘要： The present invention is directed to scanning exposure apparatus and exposure method to achieve simultaneous projection of images of plural regions on a mask onto a photosensitive substrate with correcting an orthogonality error of a pattern on the mask or photosensitive substrate. If the pattern on the mask or photosensitive substrate has an orthogonality error causing a deviation of a certain angle in a first direction perpendicular to a scanning direction as it goes in the scanning direction, the mask and the photosensitive substrate are rotated relative to each other in the plane thereof to align one coordinate axis in a coordinate system of each pattern with the first direction. Then a relative displacement is given by an amount of the orthogonality error between positions of images projected through a first optical system and positions of images projected through a second optical system, and relative positions of the mask and the photosensitive substrate are continuously changed by the amount of the orthogonality error in the first direction in accordance with the position of the mask or photosensitive substrate in the scanning direction.
摘要翻译：本发明涉及扫描曝光装置和曝光方法，以通过校正掩模或感光基底上的图案的正交性误差来将掩模上的多个区域的图像同时投影到感光基板上。如果掩模或感光基板上的图案具有在沿着扫描方向进入垂直于扫描方向的第一方向上产生一定角度的偏差的正交性误差，则掩模和感光基板相对于彼此旋转其平面将每个图案的坐标系中的一个坐标轴与第一方向对齐。然后通过第一光学系统投影的图像的位置和通过第二光学系统投影的图像的位置之间的正交性误差的量给出相对位移，并且掩模和感光基板的相对位置连续地改变量根据掩模或感光基板在扫描方向上的位置，在第一方向上的正交性误差。

2. 发明授权

US5602620A Scanning exposure apparatus and exposure method 失效
标题翻译：扫描曝光装置和曝光方法
公开(公告)号：US5602620A
公开(公告)日：1997-02-11
申请号：US490212
申请日：1995-06-14
申请人： Seiji Miyazaki , Kei Nara , Masami Seki , Masamitsu Yanagihara
发明人： Seiji Miyazaki , Kei Nara , Masami Seki , Masamitsu Yanagihara
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42 , G01B11/00
CPC分类号： G03F9/7003 , G03F7/70275 , G03F7/70358 , G03F7/70475 , G03F7/70791 , G03F9/70
摘要： The present invention is directed to scanning exposure apparatus and exposure method to achieve simultaneous projection of images of plural regions on a mask onto a photosensitive substrate with correcting an orthogonality error of a pattern on the mask or photosensitive substrate. If the pattern on the mask or photosensitive substrate has an orthogonality error causing a deviation of a certain angle in a first direction perpendicular to a scanning direction as it goes in the scanning direction, the mask and the photosensitive substrate are rotated relative to each other in the plane thereof to align one coordinate axis in a coordinate system of each pattern with the first direction. Then a relative displacement is given by an amount of the orthogonality error between positions of images projected through a first optical system and positions of images projected through a second optical system, and relative positions of the mask and the photosensitive substrate are continuously changed by the amount of the orthogonality error in the first direction in accordance with the position of the mask or photosensitive substrate in the scanning direction.
摘要翻译：本发明涉及扫描曝光装置和曝光方法，以通过校正掩模或感光基底上的图案的正交性误差来将掩模上的多个区域的图像同时投影到感光基板上。如果掩模或感光基板上的图案具有在沿着扫描方向进入垂直于扫描方向的第一方向上产生一定角度的偏差的正交性误差，则掩模和感光基板相对于彼此旋转其平面将每个图案的坐标系中的一个坐标轴与第一方向对齐。然后通过第一光学系统投影的图像的位置和通过第二光学系统投影的图像的位置之间的正交性误差的量给出相对位移，并且掩模和感光基板的相对位置连续地改变量根据掩模或感光基板在扫描方向上的位置，在第一方向上的正交性误差。

3. 发明授权

US5623343A Exposure method and apparatus 失效
标题翻译：曝光方法和装置
公开(公告)号：US5623343A
公开(公告)日：1997-04-22
申请号：US548402
申请日：1995-10-26
申请人： Kei Nara , Masamitsu Yanagihara , Seiji Miyazaki
发明人： Kei Nara , Masamitsu Yanagihara , Seiji Miyazaki
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G01B11/00
CPC分类号： G03F7/70225 , G03F7/70275 , G03F7/70358 , G03F9/70
摘要： In the first step of an exposure method of the present invention, an alignment optical system is arranged to oppose one of a first mask mark on a photomask and a first substrate mark on a photosensitive substrate, thereby detecting a first deviation amount between the position of the first mask mark and that of the first substrate mark. In the second step, the alignment optical system is arranged to oppose one of a second mask mark on the photomask and a second substrate mark on the photosensitive substrate, thereby detecting a second deviation mark between the position of the second mask mark and that of the second substrate mark. In the third step, correction values for minimizing the first and second deviation amounts are calculated. In the fourth step, the relative positional relationship between the image of an original pattern on the photomask and a shot area on the photosensitive substrate is adjusted on the basis of a correction value. In the fifth step, at least one of the first and second steps is executed subsequent to the fourth step to newly detect the first or second deviation amount. In the sixth step, the first to fifth steps are repeatedly executed until one of the first and second deviation amounts detected in the fifth step falls within a predetermined allowance.
摘要翻译：在本发明的曝光方法的第一步骤中，对准光学系统被布置为与光掩模上的第一掩模标记和感光基板上的第一基板标记中的一个相对，从而检测在光敏基板的位置之间的第一偏移量第一个掩码标记和第一个掩码标记。在第二步骤中，对准光学系统布置成与光掩模上的第二掩码标记和感光基板上的第二基板标记之一相对，从而检测第二掩模标记的位置与第二掩模标记的位置之间的第二偏移标记第二基板标记。在第三步骤中，计算用于使第一和第二偏移量最小化的校正值。在第四步骤中，基于校正值来调整光掩模上的原始图案的图像与感光基板上的照射区域之间的相对位置关系。在第五步骤中，在第四步骤之后执行第一和第二步骤中的至少一个，以重新检测第一或第二偏差量。在第六步骤中，重复执行第一至第五步骤，直到在第五步骤中检测到的第一和第二偏移量之一落入预定余量之内。

4. 发明授权

US5625436A Scanning type exposure apparatus and exposure method 失效
标题翻译：扫描式曝光装置和曝光方法
公开(公告)号：US5625436A
公开(公告)日：1997-04-29
申请号：US689691
申请日：1996-08-13
申请人： Masamitsu Yanagihara , Susumu Mori , Tsuyoshi Naraki , Masami Seki , Seiji Miyazaki , Tsuyoshi Narabe , Hiroshi Chiba
发明人： Masamitsu Yanagihara , Susumu Mori , Tsuyoshi Naraki , Masami Seki , Seiji Miyazaki , Tsuyoshi Narabe , Hiroshi Chiba
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70275 , G03F7/70241 , G03F7/70258 , G03F7/70358 , G03F7/70858 , G03F7/70883 , G03F9/70
摘要： In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change of shape of the substrate; and an imaging position changing device for changing the position of said image projected via the at least one projection optical systems in accordance with the change in magnification.
摘要翻译：在扫描型曝光装置中，通过以与所述掩模和所述基板相对于所述投影光学系统的倍率相对于投影光学系统沿预定方向扫描所述掩模上的图案区域的整个表面，提供了多个照明光学系统，用于利用来自各个光源的各个光束照射掩模上的图案区域的各个区域; 多个投影光学系统被布置为对应于各个照明光学系统，所述投影光学系统将由各个照明光学系统照射的区域的各个图像投射到所述基板上的相应的投影区域上; 用于获取和存储基板的形状变化的存储装置; 放大率改变装置，用于根据基板的形状变化来改变至少一个投影光学系统的放大率; 以及成像位置改变装置，用于根据放大率的变化改变经由至少一个投影光学系统投影的所述图像的位置。

5. 再颁专利

USRE37361E1 Scanning type exposure apparatus and exposure method 有权
公开(公告)号：USRE37361E1
公开(公告)日：2001-09-11
申请号：US09300376
申请日：1999-04-27
申请人： Masamitsu Yanagihara , Susumu Mori , Tsuyoshi Naraki , Masami Seki , Seiji Miyazaki , Tsuyohsi Narabe , Hiroshi Chiba
发明人： Masamitsu Yanagihara , Susumu Mori , Tsuyoshi Naraki , Masami Seki , Seiji Miyazaki , Tsuyohsi Narabe , Hiroshi Chiba
IPC分类号： H01L21027
CPC分类号： G03F7/70275 , G03F7/70241 , G03F7/70258 , G03F7/70358 , G03F7/70858 , G03F7/70883 , G03F9/70
摘要： In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change of shape of the substrate; and an imaging position changing device for changing the position of said image projected via the at least one projection optical systems in accordance with the change in magnification. An exposure apparatus for exposing a pattern of a mask onto a substrate includes an image transfer system, an imaging characteristic adjusting mechanism and an exposure system. The image transfer system projects the pattern of the mask onto the substrate while moving the mask and the substrate synchronously during the projection of the pattern onto the substrate such that portions of the pattern overlap each other. The imaging characteristic adjusting mechanism is disposed in a space between the mask and the substrate, and adjusts imaging characteristics of a portion of the image transfer system that projects the pattern onto the substrate. The exposure system exposes the pattern during the synchronous movement of the mask and the substrate by the image transfer system.

6. 发明授权

US5581075A Multi-beam scanning projection exposure apparatus and method with beam monitoring and control for uniform exposure of large area 失效
标题翻译：多光束扫描投影曝光装置和方法，具有大面积均匀曝光的光束监视和控制
公开(公告)号：US5581075A
公开(公告)日：1996-12-03
申请号：US446509
申请日：1995-05-22
申请人： Tsuyoshi Naraki , Masamitsu Yanagihara , Hiroshi Shirasu , Tomohide Hamada , Tetsuo Kikuchi , Noriaki Yamamoto
发明人： Tsuyoshi Naraki , Masamitsu Yanagihara , Hiroshi Shirasu , Tomohide Hamada , Tetsuo Kikuchi , Noriaki Yamamoto
IPC分类号： G03F7/20 , G01J1/32
CPC分类号： G03F7/7005 , G03F7/70091 , G03F7/70275 , G03F7/70358 , G03F7/70475 , G03F7/70791
摘要： An exposure apparatus comprises a plurality of illumination optical systems for generating a plurality of light beams, a plurality of projection optical systems disposed corresponding to the plurality of illumination optical systems, respectively, a plurality of light intensity detectors, provided respectively for the plurality of illumination optical systems, for detecting individual intensities of the plurality of light beams, a light intensity changing device for changing the respective intensities of the plurality of light beams, and a control device for controlling the light intensity changing device and uniformizing the intensities of the plurality of light beams to a substantially fixed level.
摘要翻译：曝光装置包括多个用于产生多个光束的照明光学系统，分别对应于多个照明光学系统设置的多个投影光学系统，分别为多个照明设置的多个光强度检测器用于检测多个光束的各个强度的光学系统，用于改变多个光束的各个强度的光强度改变装置，以及用于控制光强度改变装置的控制装置，并且使多个光束的强度均匀化光束达到基本上固定的水平。

7. 发明授权

US5978094A Alignment device and method based on imaging characteristics of the image pickup system 失效
标题翻译：基于图像拾取系统的成像特性的对准装置和方法
公开(公告)号：US5978094A
公开(公告)日：1999-11-02
申请号：US940289
申请日：1997-09-30
申请人： Tsuyoshi Narabe , Kei Nara , Masamitsu Yanagihara
发明人： Tsuyoshi Narabe , Kei Nara , Masamitsu Yanagihara
IPC分类号： G01B11/27 , G03F7/20 , G03F9/00 , H01L21/027 , G01B11/00
CPC分类号： G03F7/70358 , G01B11/27 , G03F9/70
摘要： An alignment device includes an image pickup optical system for picking up an image of a first reference mark disposed on a mask and an image of a second reference mark disposed on a photosensitive substrate through an image pickup optical system, a memory for storing information associated with the imaging characteristics of the image pickup optical system, and a correction system for correcting the positions of the first and second reference marks, detected using image information from the image pickup system, on the basis of the information associated with the imaging characteristics of the image pickup optical system.
摘要翻译：对准装置包括：图像拾取光学系统，用于拾取设置在掩模上的第一参考标记的图像和通过图像拾取光学系统设置在感光基板上的第二参考标记的图像;存储器，用于存储与图像拾取光学系统的成像特性，以及用于校正使用来自图像拾取系统的图像信息检测的第一和第二参考标记的位置的校正系统，其基于与图像的成像特性相关联的信息拾取光学系统。

8. 发明授权

US5999244A Projection exposure apparatus, method for correcting positional discrepancy of projected image, and method for determining image formation characteristic of projection optical system 失效
标题翻译：投影曝光装置，用于校正投影图像的位置偏差的方法以及用于确定投影光学系统的图像形成特性的方法
公开(公告)号：US5999244A
公开(公告)日：1999-12-07
申请号：US743096
申请日：1996-11-04
申请人： Masamitsu Yanagihara , Kei Hara , Seiji Miyazaki , Hideki Koitabashi , Yoichi Hamashima , Hiroshi Kitano , Yoshiyuki Katamata
发明人： Masamitsu Yanagihara , Kei Hara , Seiji Miyazaki , Hideki Koitabashi , Yoichi Hamashima , Hiroshi Kitano , Yoshiyuki Katamata
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/706 , G03F7/70258 , G03F7/70275 , G03F7/70358 , G03F7/70691
摘要： Positional discrepancies of images of segmental areas, which are caused by stretching of a substrate in the Y direction, are corrected by changing magnifications of respective projection optical systems and inclinations of parallel plane glass pieces with respect optical axes. After that, positional discrepancies of the images after the correction are accurately detected by using a calibration system for the projection optical systems. Thus it is possible to confirm whether or not the positional discrepancies are accurately corrected. If the correction is insufficient as a result of the confirmation, at least one of correction of the magnifications of the respective projection optical systems and shift of the images projected through the respective projection optical systems onto the substrate is executed again so that amounts of the positional discrepancies are sufficiently small. On the other hand, the positional discrepancy can be easily determined by storing positional information and a detected signal concerning an image formed by a projection optical system in synchronization with a clock, followed by signal processing.
摘要翻译：通过改变各个投影光学系统的放大率和平行平面玻璃片相对于光轴的倾斜来校正由Y方向上的基板的拉伸引起的节段区域的图像的位置差异。之后，通过使用投影光学系统的校准系统来精确地检测校正后的图像的位置偏差。因此，可以确认位置差异是否被精确地校正。如果作为确认的结果校正不足，则再次执行各个投影光学系统的放大率的校正和通过各个投影光学系统投影的图像的移位中的至少一个，使得位置差异足够小。另一方面，通过与时钟同步地存储与投影光学系统形成的图像有关的位置信息和检测信号，接着进行信号处理，可以容易地确定位置偏差。

9. 发明授权

US10255491B2 Guidance system, detection device, and position assessment device 有权
公开(公告)号：US10255491B2
公开(公告)日：2019-04-09
申请号：US13885909
申请日：2011-10-25
申请人： Masakazu Sekiguchi , Tetsuya Yamamoto , Masahiro Nei , Masamitsu Yanagihara , Satoshi Hagiwara , Isao Totsuka , Tomoyuki Matsuyama
发明人： Masakazu Sekiguchi , Tetsuya Yamamoto , Masahiro Nei , Masamitsu Yanagihara , Satoshi Hagiwara , Isao Totsuka , Tomoyuki Matsuyama
IPC分类号： G06K9/00 , G08B7/06 , B66B3/00
摘要： To appropriately guide a subject person while protecting a privacy of the subject person despite use of an captured image of the subject person, a guidance system includes: an image capturing unit capable of capturing an image containing a subject person from a first direction; a detection unit that detects a size of an image of the subject person from the image captured by the image capturing unit; and a guidance unit that provides guidance for the subject person based on a detection result of the detection unit.

10. 发明授权

US06552775B1 Exposure method and apparatus 有权
标题翻译：曝光方法和装置
公开(公告)号：US06552775B1
公开(公告)日：2003-04-22
申请号：US09718373
申请日：2000-11-24
申请人： Masamitsu Yanagihara , Tomohiro Katsume
发明人： Masamitsu Yanagihara , Tomohiro Katsume
IPC分类号： G03B2752
CPC分类号： G03F7/70225 , G03F7/70258 , G03F7/70275 , G03F7/70358 , G03F9/7003
摘要： An exposure apparatus and a method which make it possible to enhance the fineness of pattern in spite of the trend to enlarge the size of the photosensitive substrate and device. In this apparatus, a mask and the photosensitive substrate are allowed to synchronously scan, and the optical projecting system thereof is provided with a scanning direction adjusting means which is designed to adjust the position of scanning direction of a projected image to be projected onto the substrate, wherein a non-linear component of error is determined in advance and the result thus determined is stored as a correction value for the apparatus, thereby enabling the pattern exposure to be performed while continuously controlling the image-adjusting mechanism on the basis of the correction value.
摘要翻译：尽管趋向于增大感光基板和装置的尺寸，但是可以提高图案细度的曝光装置和方法。在该装置中，掩模和感光基板被允许同步扫描，并且其光学投影系统设置有扫描方向调整装置，该扫描方向调整装置被设计成调整要投影到基板上的投影图像的扫描方向的位置其中，预先确定误差的非线性分量，并且将由此确定的结果存储为装置的校正值，从而能够在基于校正的基础上连续控制图像调整机构的同时执行图案曝光值。

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