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1. 发明授权

US5772925A Anti-reflective coating composition 失效
标题翻译：防反射涂料组合物
公开(公告)号：US5772925A
公开(公告)日：1998-06-30
申请号：US891000
申请日：1997-07-10
申请人： Satoshi Watanabe , Toshinobu Ishihara , Ichiro Kaneko , Katsuyuki Oikawa , Yoshihumi Takeda
发明人： Satoshi Watanabe , Toshinobu Ishihara , Ichiro Kaneko , Katsuyuki Oikawa , Yoshihumi Takeda
IPC分类号： G03F7/11 , C08G73/10 , C08L79/08 , C09D179/08 , H01L21/027 , F21V9/00 , B05B5/00 , B05D5/06
CPC分类号： C08G73/105 , C08G73/101 , C08G73/1039 , C08G73/1064 , C08G73/1067 , C08G73/1082 , C09D179/08 , G02B1/111
摘要： An anti-reflective coating composition comprising a polyimide dissolved in an organic solvent is used to form an anti-reflective coating beneath a chemical amplification type resist layer. The composition allows a fine resist pattern to be formed with high accuracy in a convenient, efficient, reproducible manner.
摘要翻译：使用包含溶解在有机溶剂中的聚酰亚胺的抗反射涂层组合物在化学放大型抗蚀剂层下方形成抗反射涂层。该组合物允许以方便，有效，可再现的方式以高精度形成精细的抗蚀剂图案。

2. 发明授权

US06730453B2 High molecular weight silicone compounds, resist compositions, and patterning method 有权
标题翻译：高分子量硅氧烷化合物，抗蚀剂组合物和图案化方法
公开(公告)号：US06730453B2
公开(公告)日：2004-05-04
申请号：US09887320
申请日：2001-06-25
申请人： Mutsuo Nakashima , Ichiro Kaneko , Toshinobu Ishihara , Junji Tsuchiya , Jun Hatakeyama , Shigehiro Nagura
发明人： Mutsuo Nakashima , Ichiro Kaneko , Toshinobu Ishihara , Junji Tsuchiya , Jun Hatakeyama , Shigehiro Nagura
IPC分类号： G03F7075
CPC分类号： G03F7/0045 , C08G77/14 , C08G77/38 , C08G77/388 , C08G77/50 , G03F7/0392 , G03F7/0757
摘要： The invention provides a high molecular weight silicone compound comprising recurring units of formula (1) and having a weight average molecular weight of 1,000-50,000. Some or all of the hydrogen atoms of carboxyl groups or carboxyl and hydroxyl groups in the silicone compound may be replaced by acid labile groups. Z is a di- to hexavalent, non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; Z is a di- to hexavalent, normal or branched hydrocarbon group or non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; x, y and z are integers of 1-5 corresponding to the valence of Z and Z′; R1 is —OCHR—R′—OH or —NHCHR—R′—OH; R2 is alkyl or alkenyl or a monovalent, non-aromatic, polycyclic hydrocarbon or bridged cyclic hydrocarbon group; p1, p2, p3 and p4 are 0 or positive numbers. A resist composition comprising the high molecular weight silicone compound as a base resin is sensitive to actinic radiation and has a high sensitivity and resolution so that it is suitable for microfabrication with electron beams or deep UV. Since the composition has low absorption at the exposure wavelength of an ArF or KrF excimer laser, a finely defined pattern having walls perpendicular to the substrate can be readily formed.
摘要翻译：本发明提供了包含式（1）的重复单元并且具有1,000-50,000重均分子量的高分子量硅氧烷化合物。硅氧烷化合物中的羧基或羧基和羟基的一些或全部氢原子可被酸不稳定基团取代.Z为二价至六价，非芳香族，单环或多环烃或桥环状烃基; Z是二价至六价，正或支链烃基或非芳香族单环或多环烃或桥环状烃基; x，y和z是对应于Z和Z'的化合价的1-5的整数; R 1是-OCHR-R'-OH或-NHCHR-R'-OH; R 2是烷基或烯基或单价，非芳族，多环烃或桥连环烃基; p1，p2，p3和p4为0或正数。包含作为基础树脂的高分子量硅氧烷化合物的抗蚀剂组合物对光化辐射敏感，并且具有高灵敏度和分辨率，使得它适合于用电子束或深紫外线的微细加工。由于组成在ArF或KrF准分子激光器的曝光波长处具有低吸收，因此可以容易地形成具有垂直于衬底的壁的精细限定图案。

3. 发明授权

US06309796B1 High molecular weight silicone compounds resist compositions, and patterning method 有权
标题翻译：高分子量硅氧烷化合物抵抗组合物和图案化方法
公开(公告)号：US06309796B1
公开(公告)日：2001-10-30
申请号：US09129950
申请日：1998-08-06
申请人： Mutsuo Nakashima , Ichiro Kaneko , Toshinobu Ishihara , Junji Tsuchiya , Jun Hatakeyama , Shigehiro Nagura
发明人： Mutsuo Nakashima , Ichiro Kaneko , Toshinobu Ishihara , Junji Tsuchiya , Jun Hatakeyama , Shigehiro Nagura
IPC分类号： G03F7075
CPC分类号： G03F7/0045 , C08G77/14 , C08G77/38 , C08G77/388 , C08G77/50 , G03F7/0392 , G03F7/0757
摘要： The invention provides a high molecular weight silicone compound comprising recurring units of formula (1) and having a weight average molecular weight of 1,000-50,000. Some or all of the hydrogen atoms of carboxyl groups or carboxyl and hydroxyl groups in the silicone compound may be replaced by acid labile groups. Z is di- to hexavalent, non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; Z′ is a di- to hexavalent, normal or branched hydrocarbon group or non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; x, y and z are integers of 1-5 corresponding to the valence of Z and Z′; R1 is —OCHR—R′ —OH or —NHCHR—R′ —OH; R2 is alkyl or alkenyl or a monovalent, non-aromatic, polycyclic hydrocarbon or bridged cyclic hydrocarbon group; p1, p2, p3 and p4 are 0 or positive numbers. A resist composition comprising the high molecular weight silicone compound as a base resin is sensitive to actinic radiation and has a high sensitivity and resolution so that it is suitable for microfabrication with electron beams or deep UV. Since the composition has low absorption at the exposure wavelength of an ArF or KrF excimer laser, a finely defined pattern having walls perpendicular to the substrate can be readily formed.
摘要翻译：本发明提供了包含式（1）的重复单元并且具有1,000-50,000重均分子量的高分子量硅氧烷化合物。硅烷化合物中的羧基或羧基和羟基的一部分或全部氢原子可被酸不稳定基团取代.Z为二价至六价，非芳香族，单环或多环烃基或桥环状烃基; Z'是二价至六价，正或支链烃基或非芳香族单环或多环烃或桥连环烃基; x，y和z是对应于Z和Z'的化合价的1-5的整数; R 1是-OCHR-R'-OH或-NHCHR-R'-OH; R2是烷基或链烯基或单价，非芳族，多环烃或桥连环烃基; p1，p2，p3和p4为0或正数。包含作为基础树脂的高分子量硅氧烷化合物的抗蚀剂组合物对光化辐射敏感，并且具有高灵敏度和分辨率，使得它适合于用电子束或深紫外线的微细加工。由于组成在ArF或KrF准分子激光器的曝光波长处具有低吸收，因此可以容易地形成具有垂直于衬底的壁的精细限定图案。

4. 发明授权

US6066433A High molecular weight silicone compounds, chemically amplified positive resist compositions, and patterning method 失效
标题翻译：高分子量硅氧烷化合物，化学放大正性抗蚀剂组合物和图案化方法
公开(公告)号：US6066433A
公开(公告)日：2000-05-23
申请号：US37023
申请日：1998-03-09
申请人： Katsuya Takemura , Junji Tsuchiya , Ichiro Kaneko , Toshinobu Ishihara
发明人： Katsuya Takemura , Junji Tsuchiya , Ichiro Kaneko , Toshinobu Ishihara
IPC分类号： C08G77/14 , G03F7/004 , G03F7/075
CPC分类号： C08G77/14 , G03F7/0045 , G03F7/0757 , Y10S430/106
摘要： In a silicone polymer having phenolic hydroxyl groups, the hydrogen atoms of some of the phenolic hydroxyl groups are replaced by acid labile groups of at least one type. The silicone polymer is crosslinked at some of the remaining phenolic hydroxyl groups with crosslinking groups having C--O--C linkages within a molecule and/or between molecules. The silicone polymer has a Mw of 5,000 to 50,000. A chemically amplified positive resist composition comprising the silicone polymer as a base resin has a high sensitivity and resolution so that it is suitable for fine patterning with electron beams or deep UV. Because of improved oxygen plasma etching resistance, the composition is suitable for use in the two-layer resist technique.
摘要翻译：在具有酚羟基的硅氧烷聚合物中，一些酚羟基的氢原子被至少一种类型的酸不稳定基团取代。硅氧烷聚合物在一些剩余的酚羟基上与在分子内和/或分子之间具有C-O-C键的交联基团交联。有机硅聚合物的Mw为5,000至50,000。包含作为基础树脂的硅氧烷聚合物的化学放大型正性抗蚀剂组合物具有高灵敏度和分辨率，使其适用于用电子束或深紫外线精细构图。由于氧等离子体抗蚀刻性能的改善，组合物适用于双层抗蚀剂技术。

5. 发明授权

US5972560A High molecular weight silicone compound, chemically amplified positive resist composition and patterning method 失效
标题翻译：高分子量硅氧烷化合物，化学放大正性抗蚀剂组合物和图案化方法
公开(公告)号：US5972560A
公开(公告)日：1999-10-26
申请号：US16448
申请日：1998-01-30
申请人： Ichiro Kaneko , Mutsuo Nakashima , Toshinobu Ishihara , Junji Tsuchiya , Jun Hatakeyama , Shigehiro Nagura
发明人： Ichiro Kaneko , Mutsuo Nakashima , Toshinobu Ishihara , Junji Tsuchiya , Jun Hatakeyama , Shigehiro Nagura
IPC分类号： C08G77/50 , C08L83/14 , G03F7/004 , G03F7/075 , C08G77/04
CPC分类号： G03F7/0045 , C08G77/50 , C08L83/14 , G03F7/0757
摘要： The invention provides a high molecular weight silicone compound comprising recurring units of the general formula (1) and having a weight average molecular weight of 1,000-50,000. ##STR1## Z is a di- to hexavalent, monocyclic or polycyclic hydrocarbon group or bridged cyclic hydrocarbon group of 5-12 carbon atoms, R.sup.1 is a substituted or unsubstituted alkyl or alkenyl group of 1-8 carbon atoms, R.sup.2 is an acid labile group, m is 0 or an integer, n is an integer, satisfying m+n.ltoreq.5, x is an integer, p1 and p2 are positive numbers, q is 0 or a positive number, satisfying 0
摘要翻译：本发明提供了包含通式（1）的重复单元并具有1,000-50,000的重均分子量的高分子量硅氧烷化合物。 Z是5至12个碳原子的二至六价单环或多环烃基或桥环状烃基，R1是取代或未取代的1-8个碳原子的烷基或链烯基，R2是酸不稳定基团，m 是0或整数，n是整数，满足m + n <5，x是整数，p1和p2是正数，q是0或正数，满足0

6. 发明授权

US07206562B2 Cross polarized wave interference eliminating system and method 有权
标题翻译：交叉极化波干扰消除系统及方法
公开(公告)号：US07206562B2
公开(公告)日：2007-04-17
申请号：US10509966
申请日：2003-03-12
申请人： Ichiro Kaneko
发明人： Ichiro Kaneko
IPC分类号： H04B1/10
CPC分类号： H04W52/42 , H04B1/7097 , H04B7/10
摘要： Coefficient controllers (68, 78) control weighting coefficients for tapped transversal filters used in interference compensators (67, 77) on the basis of transmission power control information from reception determination devices (66, 78) on the V polarization side and H polarization side. The interference compensators (67, 77) control the normal compensation ranges of the interference compensators (67, 77) and adjust interference compensation amounts on the basis of the weighting coefficients from the coefficient controllers (68, 78).
摘要翻译：系数控制器（68,78）基于来自V偏振侧和H偏振侧的接收判定装置（66,78）的发送功率控制信息，控制在干扰补偿器（67,77）中使用的抽头横向滤波器的加权系数。干涉补偿器（67,77）控制干涉补偿器（67,77）的正常补偿范围，并且根据来自系数控制器（68,78）的加权系数来调整干扰补偿量。

7. 发明申请

US20050163271A1 Cross polarized wave interference eliminating system and method 有权
标题翻译：交叉极化波干扰消除系统及方法
公开(公告)号：US20050163271A1
公开(公告)日：2005-07-28
申请号：US10509966
申请日：2003-03-12
申请人： Ichiro Kaneko
发明人： Ichiro Kaneko
IPC分类号： H04J11/00 , H04B7/005 , H04B7/10 , H04B7/26 , H04W52/04 , H04W52/24 , H04B1/10
CPC分类号： H04W52/42 , H04B1/7097 , H04B7/10
摘要： Coefficient controllers (68, 78) control weighting coefficients for tapped transversal filters used in interference compensators (67, 77) on the basis of transmission power control information from reception determination devices (66, 78) on the V polarization side and H polarization side. The interference compensators (67, 77) control the normal compensation ranges of the interference compensators (67, 77) and adjust interference compensation amounts on the basis of the weighting coefficients from the coefficient controllers (68, 78).
摘要翻译：系数控制器（68,78）基于来自V偏振侧和H偏振侧的接收判定装置（66,78）的发送功率控制信息，控制在干扰补偿器（67,77）中使用的抽头横向滤波器的加权系数。干涉补偿器（67,77）控制干涉补偿器（67,77）的正常补偿范围，并且根据来自系数控制器（68,78）的加权系数来调整干扰补偿量。

8. 发明授权

US5298220A Method of preventing polymer scale formation 失效
标题翻译：防止聚合物垢形成的方法
公开(公告)号：US5298220A
公开(公告)日：1994-03-29
申请号：US000703
申请日：1993-01-05
申请人： Toshihide Shimizu , Ichiro Kaneko , Mikio Watanabe
发明人： Toshihide Shimizu , Ichiro Kaneko , Mikio Watanabe
IPC分类号： C08F2/00 , C08F2/02
CPC分类号： C08F2/004
摘要： This process is a method of preventing polymer scale formation in a polymerization vessel during the polymerization of a monomer having an ethylenically unsaturated double bond. The inner wall surface of a polymerization vessel is coated with a water-based coating solution containing (a) a water-soluble anionic dye and (b) at least water-insoluble cationic dye or water-insoluble nitrogen-containing organic compound, where the water-based coating solution has a pH of 7 or less. The coating solution is applied and then dried to form a coating.
摘要翻译：该方法是在具有烯键式不饱和双键的单体聚合期间防止聚合容器中聚合物垢形成的方法。聚合容器的内壁表面涂覆有含有（a）水溶性阴离子染料和（b）至少水不溶性阳离子染料或水不溶性含氮有机化合物的水性涂料溶液，其中水性涂布液的pH为7以下。涂布溶液，然后干燥以形成涂层。

9. 发明授权

US5235012A Method for polymerizing vinyl chloride with controlled water addition 失效
标题翻译：用可控加水聚合氯乙烯的方法
公开(公告)号：US5235012A
公开(公告)日：1993-08-10
申请号：US871504
申请日：1992-04-21
申请人： Ichiro Kaneko , Tadashi Amano , Toshimichi Koga
发明人： Ichiro Kaneko , Tadashi Amano , Toshimichi Koga
IPC分类号： C08F2/18 , C08F2/20 , C08F14/00 , C08F14/06
CPC分类号： C08F14/06
摘要： An improved method for the suspension polymerization is proposed which gives a PVC resin product having an increased plasticizer absorptivity and greatly decreased content of fish eyes. The invention can be achieved by additionally adding a limited volume of water into the polymerization mixture under proceeding of the polymerization reaction within a specified period of 30 to 70% monomer conversion and at such a controlled rate as not to unduly decrease the pressure inside of the reactor. The improvements are particularly remarkable when the dispersing agent added to the polymerization mixture is a ternary combination of (A) a water-soluble partially saponified polyvinyl alcohol of a high degree of polymerization and a high degree of saponification, (B) a hydroxypropyl methyl cellulose having specified degrees of substitution with methoxy and hydroxypropoxy groups and specified viscosity characteristics and (C) a monomer-soluble partially saponified polyvinyl alcohol of a low degree of polymerization and a low degree of saponification, each in a specified amount.
摘要翻译：提出了一种改进的悬浮聚合方法，其提供了具有增加的增塑剂吸收性和大大降低鱼眼含量的PVC树脂产品。本发明可以通过在30至70％单体转化的指定时间内，在聚合反应进行的前提下，将有限体积的水加入到聚合混合物中，并且以这样的控制速率，不会过度降低反应堆。当加入到聚合混合物中的分散剂是（A）高聚合度的水溶性部分皂化聚乙烯醇和高皂化度的三元组合时，（B）羟丙基甲基纤维素具有指定的甲氧基和羟丙氧基取代度和特定的粘度特性，和（C）低聚合度和低皂化度的单体可溶性部分皂化聚乙烯醇。

10. 发明授权

US5115051A Method of preventing polymer scale deposition in a polymerization vessel 失效
标题翻译：聚合物中存在聚合物沉降的方法
公开(公告)号：US5115051A
公开(公告)日：1992-05-19
申请号：US447856
申请日：1989-12-08
申请人： Toshihide Shimizu , Ichiro Kaneko , Mikio Watanabe
发明人： Toshihide Shimizu , Ichiro Kaneko , Mikio Watanabe
IPC分类号： C08F2/00
CPC分类号： C08F2/004
摘要： A method of preventing polymer scale deposition in a polymerization vessel during polymerization of a monomer having an ethylenically double bond, wherein said polymerization is carried out in a polymerization vessel of which the inner wall has been previously first coated with(A) a coating solution comprising a condensate of an aromatic compound and at least one member selected from the group consisting of metal compounds and inorganic colloids, and the coating thus formed has been then coated with(B) a coating solution comprising at least one member selected from the group consisting of anionic polymeric compounds, amphoteric polymeric compounds and hydroxyl group-containing polymeric compounds; and a polymerization vessel having a coating thus formed. According this method, polymer scale deposition on the inner wall, etc. of the polymerization vessel can be effectively prevented.

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